CN1252798C - 喷嘴清扫装置以及具备该喷嘴清扫装置的基板处理装置 - Google Patents

喷嘴清扫装置以及具备该喷嘴清扫装置的基板处理装置 Download PDF

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Publication number
CN1252798C
CN1252798C CNB031326617A CN03132661A CN1252798C CN 1252798 C CN1252798 C CN 1252798C CN B031326617 A CNB031326617 A CN B031326617A CN 03132661 A CN03132661 A CN 03132661A CN 1252798 C CN1252798 C CN 1252798C
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CN
China
Prior art keywords
mentioned
treatment fluid
fluid supply
supply nozzle
wiper member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CNB031326617A
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English (en)
Chinese (zh)
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CN1497659A (zh
Inventor
高木善则
水野博喜
清野和昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
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Dainippon Screen Manufacturing Co Ltd
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Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Publication of CN1497659A publication Critical patent/CN1497659A/zh
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Publication of CN1252798C publication Critical patent/CN1252798C/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Coating Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Materials For Photolithography (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CNB031326617A 2002-10-07 2003-09-30 喷嘴清扫装置以及具备该喷嘴清扫装置的基板处理装置 Expired - Fee Related CN1252798C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP293302/02 2002-10-07
JP293302/2002 2002-10-07
JP2002293302A JP3940054B2 (ja) 2002-10-07 2002-10-07 ノズル清掃装置およびこのノズル清掃装置を備えた基板処理装置

Publications (2)

Publication Number Publication Date
CN1497659A CN1497659A (zh) 2004-05-19
CN1252798C true CN1252798C (zh) 2006-04-19

Family

ID=32284253

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB031326617A Expired - Fee Related CN1252798C (zh) 2002-10-07 2003-09-30 喷嘴清扫装置以及具备该喷嘴清扫装置的基板处理装置

Country Status (4)

Country Link
JP (1) JP3940054B2 (ko)
KR (1) KR100578392B1 (ko)
CN (1) CN1252798C (ko)
TW (1) TWI234797B (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4324538B2 (ja) * 2004-10-04 2009-09-02 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
KR100945360B1 (ko) 2005-12-29 2010-03-08 엘지디스플레이 주식회사 롤 스토커 및 이를 이용한 액정표시장치의 제조방법
KR100787908B1 (ko) 2006-07-28 2007-12-27 주식회사 케이씨텍 예비 토출 장치와 이를 포함하는 기판 코팅 장치 및 기판 코팅 방법
JP4850680B2 (ja) * 2006-12-15 2012-01-11 中外炉工業株式会社 吐出ノズルの清掃装置
KR200467097Y1 (ko) * 2007-11-30 2013-05-27 주식회사 케이씨텍 슬릿코터의 예비토출장치
JP2010240550A (ja) * 2009-04-03 2010-10-28 Dainippon Screen Mfg Co Ltd 基板処理装置
JP5138058B2 (ja) * 2011-03-07 2013-02-06 東レ株式会社 清掃部材と塗布器の清掃方法及び清掃装置並びにディスプレイ用部材の製造方法
JP5537581B2 (ja) * 2012-03-08 2014-07-02 株式会社東芝 塗布装置及び塗布体の製造方法
CN103567160B (zh) * 2012-07-27 2015-07-15 北京京东方光电科技有限公司 一种自动清洁印刷电路板的装置及其使用方法
CN105436037B (zh) * 2016-01-06 2018-10-30 苏州赛腾精密电子股份有限公司 一种针头清胶机构及点胶机
EP3524553B1 (en) * 2016-11-02 2022-10-19 Zuiko Corporation Sheet-feeding system and sheet-feeding method
JP2019018127A (ja) * 2017-07-12 2019-02-07 株式会社 ハリーズ 清掃システム、透明基板の清掃方法及び電子部品の製造方法
KR102000017B1 (ko) * 2017-07-21 2019-07-18 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
JP6909854B2 (ja) * 2017-07-27 2021-07-28 東京エレクトロン株式会社 塗布処理装置、塗布処理方法及びコンピュータ記憶媒体
JP7408676B2 (ja) * 2019-10-28 2024-01-05 京セラ株式会社 塗装装置および払拭方法

Also Published As

Publication number Publication date
CN1497659A (zh) 2004-05-19
KR20040032055A (ko) 2004-04-14
TWI234797B (en) 2005-06-21
KR100578392B1 (ko) 2006-05-10
JP2004122067A (ja) 2004-04-22
JP3940054B2 (ja) 2007-07-04
TW200414277A (en) 2004-08-01

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Granted publication date: 20060419

Termination date: 20120930