JP3931111B2 - 基板保持装置及び基板検査装置 - Google Patents

基板保持装置及び基板検査装置 Download PDF

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Publication number
JP3931111B2
JP3931111B2 JP2002157941A JP2002157941A JP3931111B2 JP 3931111 B2 JP3931111 B2 JP 3931111B2 JP 2002157941 A JP2002157941 A JP 2002157941A JP 2002157941 A JP2002157941 A JP 2002157941A JP 3931111 B2 JP3931111 B2 JP 3931111B2
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JP
Japan
Prior art keywords
substrate holder
substrate
base
fulcrum
jack
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002157941A
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English (en)
Japanese (ja)
Other versions
JP2003344294A (ja
JP2003344294A5 (ko
Inventor
守 安田
暢夫 藤崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Priority to JP2002157941A priority Critical patent/JP3931111B2/ja
Priority to KR10-2004-7001004A priority patent/KR20050005390A/ko
Priority to CNB038007347A priority patent/CN100483115C/zh
Priority to PCT/JP2003/006611 priority patent/WO2003102561A1/ja
Priority to TW092114436A priority patent/TWI313039B/zh
Publication of JP2003344294A publication Critical patent/JP2003344294A/ja
Publication of JP2003344294A5 publication Critical patent/JP2003344294A5/ja
Application granted granted Critical
Publication of JP3931111B2 publication Critical patent/JP3931111B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • G01N2201/021—Special mounting in general

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Liquid Crystal (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2002157941A 2002-05-30 2002-05-30 基板保持装置及び基板検査装置 Expired - Fee Related JP3931111B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2002157941A JP3931111B2 (ja) 2002-05-30 2002-05-30 基板保持装置及び基板検査装置
KR10-2004-7001004A KR20050005390A (ko) 2002-05-30 2003-05-27 기판 보호 유지 장치 및 기판 검사 장치
CNB038007347A CN100483115C (zh) 2002-05-30 2003-05-27 基板保持装置和基板检验装置
PCT/JP2003/006611 WO2003102561A1 (fr) 2002-05-30 2003-05-27 Dispositif de maintien de substrat et dispositif d'inspection de substrat
TW092114436A TWI313039B (en) 2002-05-30 2003-05-28 Substrate holding appatatus and substrate examination apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002157941A JP3931111B2 (ja) 2002-05-30 2002-05-30 基板保持装置及び基板検査装置

Publications (3)

Publication Number Publication Date
JP2003344294A JP2003344294A (ja) 2003-12-03
JP2003344294A5 JP2003344294A5 (ko) 2005-10-06
JP3931111B2 true JP3931111B2 (ja) 2007-06-13

Family

ID=29706474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002157941A Expired - Fee Related JP3931111B2 (ja) 2002-05-30 2002-05-30 基板保持装置及び基板検査装置

Country Status (5)

Country Link
JP (1) JP3931111B2 (ko)
KR (1) KR20050005390A (ko)
CN (1) CN100483115C (ko)
TW (1) TWI313039B (ko)
WO (1) WO2003102561A1 (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4700365B2 (ja) * 2005-02-09 2011-06-15 オリンパス株式会社 基板検査装置
CN101261234B (zh) * 2008-03-26 2010-06-09 广州中国科学院工业技术研究院 表面缺陷检测装置
CN101256157B (zh) * 2008-03-26 2010-06-02 广州中国科学院工业技术研究院 表面缺陷检测方法和装置
CN101995674B (zh) * 2009-08-13 2013-07-03 爱德牌工程有限公司 用于lcd玻璃的宏观检查设备
US8432540B2 (en) * 2010-03-31 2013-04-30 Cooper S.K. Kuo Support mechanism for inspection systems
JP5722049B2 (ja) * 2011-01-06 2015-05-20 オリンパス株式会社 基板検査システム
CN102629029B (zh) * 2011-11-04 2015-05-13 京东方科技集团股份有限公司 取向膜摩擦方法和装置
KR101326655B1 (ko) * 2012-02-29 2013-11-08 한국표준과학연구원 전도 및 근접복사열 가열수단을 이용한 적외선 열화상 부품 결함 측정 장치
CN103594391B (zh) * 2012-08-14 2017-09-26 营口金辰机械股份有限公司 太阳能电池组件翻转检查机构
JP6053154B2 (ja) * 2013-03-28 2016-12-27 リンテック株式会社 光照射装置および光照射方法
KR101703904B1 (ko) * 2015-08-28 2017-02-22 (주)오로스 테크놀로지 웨이퍼 그립핑 장치 및 이를 포함하는 양면 웨이퍼 스트레스 검사장치
CN107768287B (zh) * 2017-11-03 2020-02-14 德淮半导体有限公司 一种用于测试晶圆的方法和装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2870990B2 (ja) * 1990-06-01 1999-03-17 株式会社日本マイクロニクス 液晶表示パネル用プローバ
JP2740580B2 (ja) * 1991-04-16 1998-04-15 シャープ株式会社 外観検査装置
JPH0559219U (ja) * 1992-01-21 1993-08-06 テクノエイト株式会社 基板検査装置
JPH06118112A (ja) * 1992-10-05 1994-04-28 Asia Electron Inc テストボード固定機構
JPH08189947A (ja) * 1995-01-09 1996-07-23 Fujitsu Ltd 印刷配線板検査装置
JP3590170B2 (ja) * 1995-12-04 2004-11-17 オリンパス株式会社 基板搬送装置及びこれを用いた基板外観検査装置
JPH09236755A (ja) * 1996-02-29 1997-09-09 Jeol Ltd 顕微鏡の試料ステージの位置補正方法および試料ステージ
JP3782525B2 (ja) * 1996-10-09 2006-06-07 オリンパス株式会社 基板検査装置
JP3958852B2 (ja) * 1997-12-22 2007-08-15 株式会社日本マイクロニクス 被測定基板の検査装置
JP2000162133A (ja) * 1998-09-21 2000-06-16 Olympus Optical Co Ltd 基板検査装置および該基板検査装置に用いられるパラレルリンク機構
JP2002090303A (ja) * 2000-09-20 2002-03-27 Olympus Optical Co Ltd ホルダ機構
JP2003014649A (ja) * 2001-06-27 2003-01-15 Hitachi Kokusai Electric Inc 板状物体検査装置

Also Published As

Publication number Publication date
CN100483115C (zh) 2009-04-29
JP2003344294A (ja) 2003-12-03
TW200307339A (en) 2003-12-01
WO2003102561A1 (fr) 2003-12-11
KR20050005390A (ko) 2005-01-13
TWI313039B (en) 2009-08-01
CN1578907A (zh) 2005-02-09

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