JP3790995B2 - 接合方法及びこの方法により作成されるデバイス並びに接合装置 - Google Patents
接合方法及びこの方法により作成されるデバイス並びに接合装置 Download PDFInfo
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- JP3790995B2 JP3790995B2 JP2005013920A JP2005013920A JP3790995B2 JP 3790995 B2 JP3790995 B2 JP 3790995B2 JP 2005013920 A JP2005013920 A JP 2005013920A JP 2005013920 A JP2005013920 A JP 2005013920A JP 3790995 B2 JP3790995 B2 JP 3790995B2
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Description
あった。特に金においては大気暴露1時間経過後もAr雰囲気での接合強度と同等レベルが得られた。また、被接合物どうしを接合させる際、加圧手段によって該被接合物へ150Mpa以上の圧力を与えることによって、より強固に被接合物どうしを接合させることができることを見出した。この際、接合部を構成する金属が、金や銅、Alである場合、特に有効に接合することができた。
以下に本発明の第1実施形態について、図面を参照して説明する。図15に本発明にかかる接合装置の第1実施形態を示す。この実施形態では第1の被接合物である半導体からなるチップ20と第2の被接合物である基板22を接合するための装置を例として上げる。チップ20の接合面には電極である金からなる金属電極20aを有し、基板22の接合面には電極である金属電極22aがチップ側金属電極20aに対向した位置に配している。チップ側金属電極20aと基板側金属電極22aとが、加圧されることにより接合される。
続いて、図16を参照しつつ本発明にかかる接合装置の第2実施形態について詳述する。本実施形態が上記第1実施形態と大きく相違するは、被接合物の接合部が金属からなる母材の表面に金膜を形成して構成されている点であり、その他の構成は第1実施形態と同様である。以下、第1実施形態との相違点を中心に第2実施形態について詳細に述べる。なお、第1実施形態と同一の構成および動作については、その構成および動作の説明を省略する。
続いて本発明にかかる接合装置の第3実施形態について詳述する。本実施形態が上記第1および第2実施形態と大きく相違する点は、接合部表面に微小な凹凸が形成されている点であり、その他の構成および動作は上記第1および第2実施形態と同様であり、説明を省略する。以下、本実施形態に特有の構成について詳述する。
続いて第4実施形態について詳細に述べる。以下、上記第1ないし第3実施形態と異なる点について述べ、上記第1ないし第3実施形態と同一の構成および動作についての説明は省略する。
続いて、本発明の第5実施形態について詳述する。本実施形態が、上記第1ないし第4実施形態と大きく相違する点は、チップ20が発光素子である点である。以下、本実施形態に特有の構成について詳細に述べる。図12に側面発光素子とファイバーを固定するV溝の付いたPLC(Planner Light wave guide Circuit)基板との調芯方法を説明する図を、図13にその側面図を示す。この実施形態では第1の被接合物である機能デバイスとなる発光素子20と第2の被接合物である基板22を調芯して接合するための装置を例として上げる。発光素子20の接合面には電極である金からなる金属電極を有し、基板22の接合面には電極である金属電極が発光素子側金属電極に対向した位置に配している。発光素子側金属電極と基板側金属電極が発光点41と光ファイバー46との位置を調芯後、加熱により接合される。
続いて本発明の第6実施形態について詳細に述べる。本実施形態が上記第1ないし第5実施形態と大きく相違する点は、被接合物を接合する前に、接合部に上述したレベリングを施している点である(図8〜図11参照)。以下、本実施形態に特有の構成について詳細に述べる。
以下に本発明の第7実施形態について詳細に述べる。図19に本発明にかかる接合装置の第7実施形態を示す。この第7実施形態では第1の被接合物である半導体からなるチップ20と第2の被接合物であるウエハーからなる基板22を接合するための装置を例として上げる。チップ20の接合面には電極である金からなる金属電極であるバンプ20aを複数有し、基板22の接合面には電極である金属パッド22aがチップ側金属電極に対向した位置に配している。チップ側金属電極と基板側金属電極が、エネルギー波による処理の後、加圧により接合される。
以下に本発明の第8実施形態について詳細に述べる。まず、本実施形態における、被接合物について図24を参照しつつ詳述する。図24に示すように、本実施形態ではデバイス829と蓋830との接合を行う。デバイス829の接合面には、接合部として輪郭上に1μm以上の厚さで金メッキ831が形成されている。また、蓋830のの接合面には金薄膜832がスパッタリングまたはフラッシュメッキにより形成されている。なお、圧膜メッキ831と薄膜832側を、逆に形成してもよい。図24はチップ状態の図であるが、図25に示すように、ダイシング前のウエハー上での接合が最も効率がよい。
本発明の第9実施形態について、図29を参照しつつ詳述する。この実施形態では、被接合物であるウエハーを上下に対向して保持させた状態でチャンバーを閉じ、真空内でArプラズマ、酸素プラズマにより処理後、接合させ、場合によっては加熱により強度アップさせる装置である。装置構成は、上ウエハー537を保持し、Z軸531により昇降制御と加圧制御を行うヘッド部と、下ウエハー538を保持し、場合によってはウエハーをアライメントするステージ部に分けられる。Z軸531には圧力検出手段が組み込まれ、Z軸サーボモータのトルク制御へフィードバックすることで加圧力制御を行う。別途アクチュエータにより昇降可能なチャンバー壁533が下降し、チャンバー台540に固定パッキン535を介して接地した状態で真空に引き、反応ガスを導入してプラズマ処理(表面活性化処理)を行い、ヘッド部が下降して両ウエハーを接合する構成となっている。
本発明の第10実施形態について図30を参照しつつ詳述する。本実施形態では、真空中でプラズマ洗浄(表面活性化処理)した後、大気中で被接合物を接合する。少なくとも一方の被接合物を洗浄チャンバーに搬入し、洗浄後の被接合物を接合部へ搬出する搬送手段でつなぎ、接合中に後続の被接合物を洗浄する接合装置となる。
続いて、本発明の第11実施形態について図31を参照しつつ詳細に述べる。この実施形態では第1の被接合物である上ウエハーと第2の被接合物である下ウエハーを接合するための装置として例に上げる。まず、装置構成について記述する。上ウエハーを保持するヘッド907と下ウエハーを保持するステージ908が真空チャンバー911中に配置され、ヘッドはトルク制御式昇降駆動モータ901が連結されたZ軸昇降機構(上下駆動機構)902とZ軸昇降機構902を回転させるθ軸機構と、ヘッド部をXY水平方向へアライメント移動させるXYアライメントテーブル906により、X、Y、θ方向のアライメント移動手段とZ方向の昇降手段からなる。
なお、本発明は上記した各実施形態に限定されるものではなく、その趣旨を逸脱しない限りにおいて上述したもの以外に種々の変更を行うことが可能である。例えば、第1実施形態おいて、同一の装置で被接合物の表面活性化処理(洗浄)から被接合物の接合までを一括した処理として実行していたが、エネルギー波による被接合物の表面活性化処理と、被接合物の接合を行う接合処理とを、それぞれ別の装置で行っても構わない。
20a…バンプ(接合部)
22…チップ(被接合物)
22a…バンプ(接合部)
25…上下駆動機構
26…ヘッド部
28…実装機構(ステージ)
42,44…プローブ
531…Z軸(上下駆動機構)
532…ピストン型ヘッド(ヘッド)
539…下部電極(ステージ)
550…倣い機構(球面軸受け)
Claims (43)
- 金属からなる接合部を有する被接合物どうしを、前記接合部をプラズマで処理した後、10−5 Torr以上の低真空下または大気中で前記接合部どうしを衝合させて加圧することにより該接合部に再付着した有機物や酸化膜からなる付着物層を押し破って室温〜180℃以下の低温加熱下で固相で常温接合することを特徴とする接合方法。
- 前記接合部の硬度が20Hv〜200Hvであることを特徴とする請求項1記載の接合方法。
- 前記接合部は金で構成される請求項1または2記載の接合方法。
- 前記被接合物の前記接合部は、硬度が200Hv以下である母材の表面に金膜を形成して構成され、
該被接合物どうしを接合した後、前記金膜を前記母材に拡散させる請求項1または2記載の接合方法。 - 前記被接合物は、前記接合部が、前記母材が銅で、該母材の表面に金膜を形成して構成された複数の金属バンプからなる半導体またはMEMSデバイスであり、該被接合物どうしを接合した後、前記金膜を前記母材に拡散させる請求項4記載の接合方法。
- 前記プラズマは減圧プラズマである請求項1〜5のいずれかに記載の接合方法。
- 少なくとも一方の前記被接合物が半導体であり、
交番電源により生じた+−方向が切り替わる電界によって生成した前記減圧プラズマによって、各前記被接合物の前記接合部をプラズマ洗浄した後、前記被接合物どうしを固相で常温接合する請求項6記載の接合方法。 - 前記交番電源は、バイアス電圧Vdc値を調整可能なRFプラズマ発生電源である請求項7記載の接合方法。
- 前記交番電源は、パルス幅を調整可能なパルス波発生電源である請求項7記載の接合方法。
- 少なくとも一方の前記被接合物の前記接合部の表面粗さRyが120nm〜2μmである請求項1〜9のいずれかに記載の接合方法。
- 一方の前記被接合物を保持するヘッドと、
他方の前記被接合物を保持するステージと、
前記ヘッドまたは前記ステージの少なくとも一方を前記被接合物の接合面とほぼ垂直な方向に位置制御し、かつ、加圧制御が可能な上下駆動機構とを設け、
少なくとも一方の前記被接合物の前記接合部の表面粗さRyが120nm〜2μmである前記被接合物どうしを接合する際、該接合時に、前記上下駆動機構を駆動して、前記被接合物どうしを加圧した後、前記上下駆動機構を停止させて、一定時間、前記ヘッドの前記ステージからの高さを一定に保つ請求項10記載の接合方法。 - 少なくとも一方の前記被接合物の前記接合部をレベリングした後、各前記被接合物の前記接合部を前記プラズマで処理した後、固相で常温接合する請求項1〜9のいずれかに記載の接合方法。
- 前記レベリングを対向する前記被接合物により、該被接合物どうしを接合する前に行う請求項12記載の接合方法。
- 減圧下のチャンバー内で、
接合させる前記被接合物の接合面どうしが対向配置されていない状態において、前記接合部を前記プラズマで処理した後、
少なくとも一方の前記被接合物を移動させて、前記接合面どうしが対向配置された状態にした後、さらに、
少なくとも一方の前記被接合物を前記接合面にほぼ垂直な方向へ移動させて、前記接合部どうしを衝合させることにより、前記被接合物どうしを固相で接合する請求項1〜13のいずれかに記載の接合方法。 - 前記接合部を前記プラズマによって処理する際、少なくとも一方の前記被接合物の接合面の対向する位置に金属電極を配置して、スパッタすることにより該被接合物の前記接合面に前記金属電極を構成する金属からなる金属膜を形成し、前記被接合物どうしを固相で接合する請求項1〜14のいずれかに記載の接合方法。
- 大気中で前記被接合物どうしの接合を行う請求項1〜15のいずれかに記載の接合方法。
- 前記被接合物の一方が、前記接合部を電極として電気的に機能するデバイスであって、
前記接合部の表面が金または銅からなり、接合する前記被接合物の前記接合部を前記プラズマにより洗浄した後、該接合部にガスにより付着層を形成し、大気中で金属電極からなる前記接合部どうしを接触させ、前記デバイスを電気的に機能させた状態で最適位置に調整した後、固相で常温接合する請求項16記載の接合方法。 - 一方の前記被接合物が発光素子であり、該発光素子の電極として機能する前記接合部に電源からのプローブを接触させ、該発光素子を電気的に機能させた状態で、該発光素子の発光点を認識手段により認識し、該発光素子の位置を最適位置に調整した後、固相で常温接合する請求項17記載の接合方法。
- 一方の前記被接合物がチップであり、もう一方の前記被接合物が複数の前記チップを実装するウエハーからなり、複数の前記チップを前記ウエハーに連続して接合する請求項16〜18のいずれかに記載の接合方法。
- 前記チップを前記ウエハーに連続して接合していく途中において、一定時間経過後、前記ウエハーを再度前記プラズマによって処理し、その後続けて前記チップを該ウエハーに接合する請求項19記載の接合方法。
- 前記被接合物が、半導体もしくはMEMSデバイスからなるチップ、またはウエハーである請求項1〜20のいずれかに記載の接合方法。
- 請求項1〜21のいずれかに記載の接合方法で形成された半導体デバイスまたはMEMSデバイスなどのデバイス。
- 一方の被接合物を保持するヘッドと、
他方の被接合物を保持するステージと、
前記ヘッドまたは前記ステージの少なくとも一方を前記被接合物の接合面とほぼ垂直な方向に加圧制御が可能な上下駆動機構とを備え、
金属からなる接合部を有する前記被接合物どうしを、前記接合部をプラズマで処理した後、10 −5 Torr以上の低真空下または大気中で前記接合部どうしを衝合させて加圧することにより該接合部に再付着した有機物や酸化膜からなる付着物層を押し破って室温〜180℃以下の低温加熱下で固相で常温接合することを特徴とする接合装置。 - 前記接合部の硬度が20Hv〜200Hvである被接合物どうしを接合することを特徴とする請求項23記載の接合装置。
- 前記プラズマを発生させるエネルギー波照射手段を備えた請求項23または24記載の接合装置。
- 前記接合部が金で構成される前記被接合物どうしを接合する請求項23ないし25のいずれかに記載の接合装置。
- 前記被接合物の前記接合部は、硬度が200Hv以下である母材の表面に金膜を形成して構成され、
該被接合物どうしを接合した後、前記金膜を前記母材に拡散させる請求項23ないし25のいずれかに記載の接合装置。 - 前記被接合物は、前記接合部が、前記母材が銅で、該母材の表面に金膜を形成して構成された複数の金属バンプからなる半導体またはMEMSデバイスであり、該被接合物どうしを接合した後、前記金膜を前記母材に拡散させる請求項27記載の接合装置。
- 前記プラズマは減圧プラズマである請求項23〜28のいずれかに記載の接合装置。
- 少なくとも一方の前記被接合物が半導体であり、
交番電源により生じた+−方向が切り替わる電界によって生成した前記減圧プラズマによって、各前記被接合物の前記接合部をプラズマ洗浄した後、前記被接合物どうしを固相で常温接合する請求項29記載の接合装置。 - 前記交番電源は、バイアス電圧Vdc値を調整可能なRFプラズマ発生電源である請求項30記載の接合装置。
- 前記交番電源は、パルス幅を調整可能なパルス波発生電源である請求項30記載の接合装置。
- 少なくとも一方の前記被接合物の前記接合部の表面粗さRyが120nm〜2μmである前記被接合物どうしを接合する請求項23〜32のいずれかに記載の接合装置。
- 前記上下駆動手段は、前記ヘッドまたは前記ステージの少なくとも一方を前記被接合物の接合面とほぼ垂直な方向に位置制御可能に構成されており、
前記被接合物どうしを接合する際、該接合時に、前記上下駆動機構を駆動して、前記被接合物どうしを加圧した後、前記上下駆動機構を停止させて、一定時間、前記ヘッドの前記ステージからの高さを一定に保つ請求項33記載の接合装置。 - 少なくとも一方の前記被接合物の前記接合部をレベリングした後、各前記被接合物の前記接合部を前記プラズマで処理した後、固相で常温接合する請求項23〜32のいずれかに記載の接合装置。
- 前記レベリングを、前記ヘッドおよび前記ステージにそれぞれ対向保持された前記被接合物どうしを衝合させることにより行った後、各前記被接合物の前記接合部を前記プラズマで処理した後、固相で常温接合する請求項35記載の接合装置。
- 真空チャンバー内に、
前記ヘッドと、
前記ステージと、
前記上下駆動機構と、
前記ステージまたは前記ヘッドの少なくとも一方を側方へ移動させる移動手段とを備え、
前記エネルギー波照射手段は、各前記被接合物に対して個別に前記プラズマによる処理を行うことが可能に構成されており、
減圧下の前記真空チャンバー内で、
前記移動手段によって、接合させる前記被接合物の接合面どうしが対向配置されていない状態にして、前記接合部を前記プラズマで処理した後、
少なくとも一方の前記被接合物を移動させて、前記接合面どうしが対向配置された状態にした後、さらに、
前記上下駆動機構によって、少なくとも一方の前記被接合物を前記接合面にほぼ垂直な方向へ移動させて、前記接合部どうしを衝合させることにより、前記被接合物どうしを固相で接合する請求項25〜36のいずれかに記載の接合装置。 - 前記接合部を前記プラズマによって処理する際、少なくとも一方の前記被接合物の接合面の対向する位置に金属電極を配置して、スパッタすることにより該被接合物の前記接合面に前記金属電極を構成する金属からなる金属膜を形成し、前記被接合物どうしを固相で接合する請求項23〜37のいずれかに記載の接合装置。
- 大気中で前記被接合物どうしの接合を行う請求項23〜38のいずれかに記載の接合装置。
- 前記被接合物の一方が、前記接合部を電極として電気的に機能するデバイスであって、
前記機能デバイスを保持する前記ヘッドと、
他方の前記被接合物を保持する前記ステージと、
前記ヘッドまたは前記ステージの少なくとも一方を上下動する前記上下駆動機構と、
前記機能デバイスを電気的に機能させるプローブと、
前記機能デバイスの機能を認識する認識手段と、
前記機能デバイスと前記被接合物の相対的な位置を補正するアライメントテーブルとを備え、
前記接合部の表面が金または銅からなり、接合する前記被接合物の前記接合部を前記プラズマにより洗浄した後、該接合部にガスにより付着層を形成し、大気中で金属電極からなる前記接合部どうしを接触させ、前記デバイスを電気的に機能させた状態で最適位置に調整した後、固相で常温接合する請求項39記載の接合装置。 - 一方の前記被接合物が発光素子であり、該発光素子の電極として機能する前記接合部に前記プローブを接触させ、該発光素子を電気的に機能させた状態で、該発光素子の発光点を認識手段により認識し、該発光素子の位置を最適位置に調整した後、固相で常温接合する請求項40記載の接合装置。
- 一方の前記被接合物がチップであり、もう一方の前記被接合物が複数の前記チップを実装するウエハーからなり、複数の前記チップを前記ウエハーに連続して接合する請求項39〜41のいずれかに記載の接合装置。
- 前記チップを前記ウエハーに連続して接合していく途中において、一定時間経過後、前記ウエハーを再度前記プラズマによって処理し、その後続けて前記チップを該ウエハーに接合する請求項42記載の接合装置。
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JP2014021044A (ja) * | 2012-07-23 | 2014-02-03 | Denso Corp | 半導体装置の製造方法 |
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