JP2020503406A5 - - Google Patents

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JP2020503406A5
JP2020503406A5 JP2019533498A JP2019533498A JP2020503406A5 JP 2020503406 A5 JP2020503406 A5 JP 2020503406A5 JP 2019533498 A JP2019533498 A JP 2019533498A JP 2019533498 A JP2019533498 A JP 2019533498A JP 2020503406 A5 JP2020503406 A5 JP 2020503406A5
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styrene
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JP6835969B2 (ja
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JP2019533498A 2016-12-21 2017-12-19 ブロックコポリマーの自己組織化のための新規組成物及び方法 Active JP6835969B2 (ja)

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JP2021014975A JP7652577B2 (ja) 2016-12-21 2021-02-02 ブロックコポリマーの自己組織化のための新規組成物及び方法

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US201662437426P 2016-12-21 2016-12-21
US62/437,426 2016-12-21
PCT/EP2017/083514 WO2018114930A1 (en) 2016-12-21 2017-12-19 Novel compositions and processes for self-assembly of block copolymers

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JP2020503406A JP2020503406A (ja) 2020-01-30
JP2020503406A5 true JP2020503406A5 (enExample) 2021-01-21
JP6835969B2 JP6835969B2 (ja) 2021-02-24

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JP2019533498A Active JP6835969B2 (ja) 2016-12-21 2017-12-19 ブロックコポリマーの自己組織化のための新規組成物及び方法
JP2021014975A Active JP7652577B2 (ja) 2016-12-21 2021-02-02 ブロックコポリマーの自己組織化のための新規組成物及び方法
JP2023013720A Pending JP2023061994A (ja) 2016-12-21 2023-02-01 ブロックコポリマーの自己組織化のための新規組成物及び方法

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JP2023013720A Pending JP2023061994A (ja) 2016-12-21 2023-02-01 ブロックコポリマーの自己組織化のための新規組成物及び方法

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US (1) US11067893B2 (enExample)
EP (2) EP3858872B1 (enExample)
JP (3) JP6835969B2 (enExample)
KR (2) KR102267528B1 (enExample)
CN (1) CN110114377B (enExample)
SG (1) SG10202108825RA (enExample)
TW (2) TWI737872B (enExample)
WO (1) WO2018114930A1 (enExample)

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TWI737872B (zh) * 2016-12-21 2021-09-01 德商馬克專利公司 用於嵌段共聚物之自組裝之新穎組合物及方法
KR20230092990A (ko) * 2020-10-20 2023-06-26 메르크 파텐트 게엠베하 유도 자기 조립(dsa)을 위한 포스포네이트 말단 브러시 폴리머
CN112799280A (zh) * 2020-12-31 2021-05-14 北京科华微电子材料有限公司 硝基苯甲醇磺酸酯化合物作为增速剂在光刻胶中的应用、用于制备光刻胶的组合物
WO2022243216A1 (en) * 2021-05-18 2022-11-24 Merck Patent Gmbh Hydrophobic crosslinkable pinning underlayers with improved dry etch capabilities for patterning directed self-assembly of ps-b-pmma type block copolymers

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