JP2019517026A5 - - Google Patents

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JP2019517026A5
JP2019517026A5 JP2018559777A JP2018559777A JP2019517026A5 JP 2019517026 A5 JP2019517026 A5 JP 2019517026A5 JP 2018559777 A JP2018559777 A JP 2018559777A JP 2018559777 A JP2018559777 A JP 2018559777A JP 2019517026 A5 JP2019517026 A5 JP 2019517026A5
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light
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wavelength
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JP2018559777A 2016-05-13 2017-05-12 光増感化学又は感光性化学増幅レジストを用いた限界寸法制御 Active JP6909374B2 (ja)

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US201662335977P 2016-05-13 2016-05-13
US62/335,977 2016-05-13
PCT/US2017/032435 WO2017197279A1 (en) 2016-05-13 2017-05-12 Critical dimension control by use of photo-sensitized chemicals or photo-sensitized chemically amplified resist

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JP2019517026A JP2019517026A (ja) 2019-06-20
JP2019517026A5 true JP2019517026A5 (cg-RX-API-DMAC7.html) 2020-06-25
JP6909374B2 JP6909374B2 (ja) 2021-07-28

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US (1) US10551743B2 (cg-RX-API-DMAC7.html)
JP (1) JP6909374B2 (cg-RX-API-DMAC7.html)
KR (1) KR102475021B1 (cg-RX-API-DMAC7.html)
CN (1) CN109313394B (cg-RX-API-DMAC7.html)
TW (1) TWI657314B (cg-RX-API-DMAC7.html)
WO (1) WO2017197279A1 (cg-RX-API-DMAC7.html)

Families Citing this family (13)

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JP6774814B2 (ja) 2015-08-20 2020-10-28 国立大学法人大阪大学 化学増幅型レジスト材料及びパターン形成方法
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KR102177192B1 (ko) 2016-05-13 2020-11-10 도쿄엘렉트론가부시키가이샤 광 작용제의 사용에 의한 임계 치수 제어

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