JP2018523305A5 - - Google Patents
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- Publication number
- JP2018523305A5 JP2018523305A5 JP2017567324A JP2017567324A JP2018523305A5 JP 2018523305 A5 JP2018523305 A5 JP 2018523305A5 JP 2017567324 A JP2017567324 A JP 2017567324A JP 2017567324 A JP2017567324 A JP 2017567324A JP 2018523305 A5 JP2018523305 A5 JP 2018523305A5
- Authority
- JP
- Japan
- Prior art keywords
- leds
- led substrate
- recess
- heater according
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 14
- 238000005538 encapsulation Methods 0.000 claims 4
- 238000009413 insulation Methods 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 238000007789 sealing Methods 0.000 claims 2
- 239000002775 capsule Substances 0.000 claims 1
- 239000008393 encapsulating agent Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/753,991 | 2015-06-29 | ||
| US14/753,991 US20160379854A1 (en) | 2015-06-29 | 2015-06-29 | Vacuum Compatible LED Substrate Heater |
| PCT/US2016/039262 WO2017003866A1 (en) | 2015-06-29 | 2016-06-24 | Vacuum compatible led substrate heater |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018523305A JP2018523305A (ja) | 2018-08-16 |
| JP2018523305A5 true JP2018523305A5 (enExample) | 2019-07-25 |
| JP6886928B2 JP6886928B2 (ja) | 2021-06-16 |
Family
ID=57602729
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017567324A Active JP6886928B2 (ja) | 2015-06-29 | 2016-06-24 | 真空対応式led基板ヒータ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20160379854A1 (enExample) |
| JP (1) | JP6886928B2 (enExample) |
| KR (1) | KR102553101B1 (enExample) |
| CN (1) | CN107710395A (enExample) |
| TW (1) | TW201701428A (enExample) |
| WO (1) | WO2017003866A1 (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10224224B2 (en) | 2017-03-10 | 2019-03-05 | Micromaterials, LLC | High pressure wafer processing systems and related methods |
| US10622214B2 (en) | 2017-05-25 | 2020-04-14 | Applied Materials, Inc. | Tungsten defluorination by high pressure treatment |
| KR102405723B1 (ko) | 2017-08-18 | 2022-06-07 | 어플라이드 머티어리얼스, 인코포레이티드 | 고압 및 고온 어닐링 챔버 |
| US10276411B2 (en) | 2017-08-18 | 2019-04-30 | Applied Materials, Inc. | High pressure and high temperature anneal chamber |
| US11177128B2 (en) | 2017-09-12 | 2021-11-16 | Applied Materials, Inc. | Apparatus and methods for manufacturing semiconductor structures using protective barrier layer |
| CN117936417A (zh) | 2017-11-11 | 2024-04-26 | 微材料有限责任公司 | 用于高压处理腔室的气体输送系统 |
| US10854483B2 (en) | 2017-11-16 | 2020-12-01 | Applied Materials, Inc. | High pressure steam anneal processing apparatus |
| KR20200075892A (ko) | 2017-11-17 | 2020-06-26 | 어플라이드 머티어리얼스, 인코포레이티드 | 고압 처리 시스템을 위한 컨덴서 시스템 |
| FR3076431A1 (fr) * | 2017-12-28 | 2019-07-05 | Aeroform France | Dispositif de chauffage sans contact |
| JP7239598B2 (ja) | 2018-03-09 | 2023-03-14 | アプライド マテリアルズ インコーポレイテッド | 金属含有材料の高圧アニーリングプロセス |
| KR102078157B1 (ko) * | 2018-04-16 | 2020-02-17 | 세메스 주식회사 | 기판 가열 유닛 및 이를 갖는 기판 처리 장치 |
| US10950429B2 (en) | 2018-05-08 | 2021-03-16 | Applied Materials, Inc. | Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom |
| US10748783B2 (en) | 2018-07-25 | 2020-08-18 | Applied Materials, Inc. | Gas delivery module |
| US10675581B2 (en) | 2018-08-06 | 2020-06-09 | Applied Materials, Inc. | Gas abatement apparatus |
| KR101961864B1 (ko) | 2018-08-17 | 2019-03-26 | 남윤종 | 폐엘이디 칩 분리 장치 |
| WO2020117462A1 (en) | 2018-12-07 | 2020-06-11 | Applied Materials, Inc. | Semiconductor processing system |
| JP7077989B2 (ja) | 2019-02-20 | 2022-05-31 | 株式会社デンソー | 車両用空調ユニット |
| JP7198434B2 (ja) * | 2019-03-27 | 2023-01-04 | ウシオ電機株式会社 | 加熱処理方法及び光加熱装置 |
| JP7623305B2 (ja) * | 2019-06-24 | 2025-01-28 | ラム リサーチ コーポレーション | 基板表面の蒸気洗浄 |
| KR102747715B1 (ko) * | 2019-10-15 | 2024-12-31 | 주식회사 케이씨텍 | 복사 열원을 이용한 기판 처리 장치 |
| JP7398935B2 (ja) * | 2019-11-25 | 2023-12-15 | 東京エレクトロン株式会社 | 載置台、及び、検査装置 |
| US11901222B2 (en) | 2020-02-17 | 2024-02-13 | Applied Materials, Inc. | Multi-step process for flowable gap-fill film |
| JP7717717B2 (ja) * | 2020-04-01 | 2025-08-04 | ラム リサーチ コーポレーション | 熱エッチングのための急速かつ正確な温度制御 |
| JP7677797B2 (ja) * | 2021-01-07 | 2025-05-15 | 株式会社Screenホールディングス | 熱処理装置および熱処理方法 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5937142A (en) * | 1996-07-11 | 1999-08-10 | Cvc Products, Inc. | Multi-zone illuminator for rapid thermal processing |
| US6067931A (en) * | 1996-11-04 | 2000-05-30 | General Electric Company | Thermal processor for semiconductor wafers |
| US6818864B2 (en) * | 2002-08-09 | 2004-11-16 | Asm America, Inc. | LED heat lamp arrays for CVD heating |
| JP3776092B2 (ja) * | 2003-03-25 | 2006-05-17 | 株式会社ルネサステクノロジ | エッチング装置、エッチング方法および半導体装置の製造方法 |
| US20070013057A1 (en) * | 2003-05-05 | 2007-01-18 | Joseph Mazzochette | Multicolor LED assembly with improved color mixing |
| JP4442171B2 (ja) * | 2003-09-24 | 2010-03-31 | 東京エレクトロン株式会社 | 熱処理装置 |
| KR101073423B1 (ko) * | 2005-04-19 | 2011-10-17 | 덴끼 가가꾸 고교 가부시키가이샤 | 금속 베이스 회로 기판, led, 및 led 광원 유닛 |
| JP5055756B2 (ja) * | 2005-09-21 | 2012-10-24 | 東京エレクトロン株式会社 | 熱処理装置及び記憶媒体 |
| CN101846247B (zh) * | 2005-12-22 | 2013-04-17 | 松下电器产业株式会社 | 具有led的照明器具 |
| KR100855065B1 (ko) * | 2007-04-24 | 2008-08-29 | 삼성전기주식회사 | 발광 다이오드 패키지 |
| WO2009012301A2 (en) * | 2007-07-16 | 2009-01-22 | Lumination Llc | Red line emitting complex fluoride phosphors activated with mn4+ |
| JP5084420B2 (ja) * | 2007-09-21 | 2012-11-28 | 東京エレクトロン株式会社 | ロードロック装置および真空処理システム |
| JP2009099925A (ja) * | 2007-09-27 | 2009-05-07 | Tokyo Electron Ltd | アニール装置 |
| JP2010129861A (ja) * | 2008-11-28 | 2010-06-10 | Tokyo Electron Ltd | 熱処理装置 |
| KR20110039080A (ko) * | 2009-10-09 | 2011-04-15 | 알티반도체 주식회사 | 백라이트 유닛 및 그 제조 방법 |
| US20110217848A1 (en) * | 2010-03-03 | 2011-09-08 | Bergman Eric J | Photoresist removing processor and methods |
| JP5526876B2 (ja) * | 2010-03-09 | 2014-06-18 | 東京エレクトロン株式会社 | 加熱装置及びアニール装置 |
| CN102214766A (zh) * | 2010-04-02 | 2011-10-12 | 游森溢 | 发光二极管封装结构 |
| JP2012023330A (ja) * | 2010-06-14 | 2012-02-02 | Tokyo Electron Ltd | 加熱源装置及びアニール装置 |
| US10211380B2 (en) * | 2011-07-21 | 2019-02-19 | Cree, Inc. | Light emitting devices and components having improved chemical resistance and related methods |
| US9842753B2 (en) * | 2013-04-26 | 2017-12-12 | Applied Materials, Inc. | Absorbing lamphead face |
| US20150085466A1 (en) * | 2013-09-24 | 2015-03-26 | Intematix Corporation | Low profile led-based lighting arrangements |
| CN107546157A (zh) * | 2013-11-22 | 2018-01-05 | 应用材料公司 | 易取灯头 |
| KR101458963B1 (ko) * | 2014-02-18 | 2014-11-12 | 민정은 | 급속 열처리장치용 히터장치 |
| US9728430B2 (en) * | 2015-06-29 | 2017-08-08 | Varian Semiconductor Equipment Associates, Inc. | Electrostatic chuck with LED heating |
-
2015
- 2015-06-29 US US14/753,991 patent/US20160379854A1/en not_active Abandoned
-
2016
- 2016-06-02 TW TW105117295A patent/TW201701428A/zh unknown
- 2016-06-24 KR KR1020187002306A patent/KR102553101B1/ko active Active
- 2016-06-24 WO PCT/US2016/039262 patent/WO2017003866A1/en not_active Ceased
- 2016-06-24 JP JP2017567324A patent/JP6886928B2/ja active Active
- 2016-06-24 CN CN201680038070.3A patent/CN107710395A/zh active Pending
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