JP2018523305A5 - - Google Patents

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Publication number
JP2018523305A5
JP2018523305A5 JP2017567324A JP2017567324A JP2018523305A5 JP 2018523305 A5 JP2018523305 A5 JP 2018523305A5 JP 2017567324 A JP2017567324 A JP 2017567324A JP 2017567324 A JP2017567324 A JP 2017567324A JP 2018523305 A5 JP2018523305 A5 JP 2018523305A5
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JP
Japan
Prior art keywords
leds
led substrate
recess
heater according
pattern
Prior art date
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Application number
JP2017567324A
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English (en)
Japanese (ja)
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JP2018523305A (ja
JP6886928B2 (ja
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Publication date
Priority claimed from US14/753,991 external-priority patent/US20160379854A1/en
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Publication of JP2018523305A publication Critical patent/JP2018523305A/ja
Publication of JP2018523305A5 publication Critical patent/JP2018523305A5/ja
Application granted granted Critical
Publication of JP6886928B2 publication Critical patent/JP6886928B2/ja
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JP2017567324A 2015-06-29 2016-06-24 真空対応式led基板ヒータ Active JP6886928B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/753,991 2015-06-29
US14/753,991 US20160379854A1 (en) 2015-06-29 2015-06-29 Vacuum Compatible LED Substrate Heater
PCT/US2016/039262 WO2017003866A1 (en) 2015-06-29 2016-06-24 Vacuum compatible led substrate heater

Publications (3)

Publication Number Publication Date
JP2018523305A JP2018523305A (ja) 2018-08-16
JP2018523305A5 true JP2018523305A5 (enExample) 2019-07-25
JP6886928B2 JP6886928B2 (ja) 2021-06-16

Family

ID=57602729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017567324A Active JP6886928B2 (ja) 2015-06-29 2016-06-24 真空対応式led基板ヒータ

Country Status (6)

Country Link
US (1) US20160379854A1 (enExample)
JP (1) JP6886928B2 (enExample)
KR (1) KR102553101B1 (enExample)
CN (1) CN107710395A (enExample)
TW (1) TW201701428A (enExample)
WO (1) WO2017003866A1 (enExample)

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US10276411B2 (en) 2017-08-18 2019-04-30 Applied Materials, Inc. High pressure and high temperature anneal chamber
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KR102078157B1 (ko) * 2018-04-16 2020-02-17 세메스 주식회사 기판 가열 유닛 및 이를 갖는 기판 처리 장치
US10950429B2 (en) 2018-05-08 2021-03-16 Applied Materials, Inc. Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom
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JP7623305B2 (ja) * 2019-06-24 2025-01-28 ラム リサーチ コーポレーション 基板表面の蒸気洗浄
KR102747715B1 (ko) * 2019-10-15 2024-12-31 주식회사 케이씨텍 복사 열원을 이용한 기판 처리 장치
JP7398935B2 (ja) * 2019-11-25 2023-12-15 東京エレクトロン株式会社 載置台、及び、検査装置
US11901222B2 (en) 2020-02-17 2024-02-13 Applied Materials, Inc. Multi-step process for flowable gap-fill film
JP7717717B2 (ja) * 2020-04-01 2025-08-04 ラム リサーチ コーポレーション 熱エッチングのための急速かつ正確な温度制御
JP7677797B2 (ja) * 2021-01-07 2025-05-15 株式会社Screenホールディングス 熱処理装置および熱処理方法

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