JP2017508187A5 - - Google Patents

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Publication number
JP2017508187A5
JP2017508187A5 JP2016560865A JP2016560865A JP2017508187A5 JP 2017508187 A5 JP2017508187 A5 JP 2017508187A5 JP 2016560865 A JP2016560865 A JP 2016560865A JP 2016560865 A JP2016560865 A JP 2016560865A JP 2017508187 A5 JP2017508187 A5 JP 2017508187A5
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JP
Japan
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acid
composition
fluoride
microelectronic device
sulfone
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JP2016560865A
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Japanese (ja)
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JP2017508187A (ja
JP6776125B2 (ja
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Priority claimed from PCT/US2014/071540 external-priority patent/WO2015095726A1/en
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Publication of JP2017508187A5 publication Critical patent/JP2017508187A5/ja
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Publication of JP6776125B2 publication Critical patent/JP6776125B2/ja
Expired - Fee Related legal-status Critical Current
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JP2016560865A 2013-12-20 2014-12-19 イオン注入レジストの除去のための非酸化性の強酸の使用 Expired - Fee Related JP6776125B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201361919177P 2013-12-20 2013-12-20
US61/919,177 2013-12-20
US201462045946P 2014-09-04 2014-09-04
US62/045,946 2014-09-04
US201462046495P 2014-09-05 2014-09-05
US62/046,495 2014-09-05
PCT/US2014/071540 WO2015095726A1 (en) 2013-12-20 2014-12-19 Use of non-oxidizing strong acids for the removal of ion-implanted resist

Publications (3)

Publication Number Publication Date
JP2017508187A JP2017508187A (ja) 2017-03-23
JP2017508187A5 true JP2017508187A5 (enExample) 2018-05-24
JP6776125B2 JP6776125B2 (ja) 2020-10-28

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JP2016560865A Expired - Fee Related JP6776125B2 (ja) 2013-12-20 2014-12-19 イオン注入レジストの除去のための非酸化性の強酸の使用

Country Status (8)

Country Link
US (2) US20160322232A1 (enExample)
EP (1) EP3084809A4 (enExample)
JP (1) JP6776125B2 (enExample)
KR (1) KR102352475B1 (enExample)
CN (1) CN105960699B (enExample)
SG (2) SG10201805234YA (enExample)
TW (1) TWI662379B (enExample)
WO (1) WO2015095726A1 (enExample)

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JP7150433B2 (ja) * 2017-12-28 2022-10-11 東京応化工業株式会社 リワーク方法、及び酸性洗浄液
KR102069345B1 (ko) * 2018-03-06 2020-01-22 에스케이씨 주식회사 반도체 공정용 조성물 및 반도체 공정
JP7196177B2 (ja) * 2018-07-20 2022-12-26 富士フイルム株式会社 処理液および処理方法
TWI824164B (zh) 2019-07-11 2023-12-01 德商馬克專利公司 光阻移除劑組合物及自基板移除光阻膜之方法

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