JP2017500428A - 処理フィラー、それを含有する組成物およびそれから調製される物品 - Google Patents
処理フィラー、それを含有する組成物およびそれから調製される物品 Download PDFInfo
- Publication number
- JP2017500428A JP2017500428A JP2016546896A JP2016546896A JP2017500428A JP 2017500428 A JP2017500428 A JP 2017500428A JP 2016546896 A JP2016546896 A JP 2016546896A JP 2016546896 A JP2016546896 A JP 2016546896A JP 2017500428 A JP2017500428 A JP 2017500428A
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- Prior art keywords
- anhydride
- treated
- filler
- slurry
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000203 mixture Substances 0.000 title claims abstract description 93
- 239000000945 filler Substances 0.000 title claims abstract description 80
- 238000000034 method Methods 0.000 claims abstract description 78
- -1 cyclic imides Chemical class 0.000 claims abstract description 63
- 230000008569 process Effects 0.000 claims abstract description 61
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 49
- 239000002002 slurry Substances 0.000 claims abstract description 44
- 150000008064 anhydrides Chemical class 0.000 claims abstract description 20
- 238000001035 drying Methods 0.000 claims abstract description 14
- 238000010058 rubber compounding Methods 0.000 claims abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 142
- 239000000377 silicon dioxide Substances 0.000 claims description 63
- 229920001971 elastomer Polymers 0.000 claims description 55
- 239000005060 rubber Substances 0.000 claims description 53
- 229920000642 polymer Polymers 0.000 claims description 44
- 239000007822 coupling agent Substances 0.000 claims description 30
- 150000001282 organosilanes Chemical class 0.000 claims description 25
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 claims description 15
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 11
- 125000000524 functional group Chemical group 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- 244000043261 Hevea brasiliensis Species 0.000 claims description 10
- 229920003052 natural elastomer Polymers 0.000 claims description 10
- 229920001194 natural rubber Polymers 0.000 claims description 10
- 239000005077 polysulfide Substances 0.000 claims description 9
- 229920001021 polysulfide Polymers 0.000 claims description 9
- 150000008117 polysulfides Polymers 0.000 claims description 9
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 239000004594 Masterbatch (MB) Substances 0.000 claims description 7
- 150000002367 halogens Chemical class 0.000 claims description 7
- 229960002317 succinimide Drugs 0.000 claims description 7
- 125000003396 thiol group Chemical class [H]S* 0.000 claims description 7
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 6
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 6
- 229940014800 succinic anhydride Drugs 0.000 claims description 6
- 229920002554 vinyl polymer Polymers 0.000 claims description 6
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 239000003945 anionic surfactant Substances 0.000 claims description 5
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 5
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 claims description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 4
- 239000002280 amphoteric surfactant Substances 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 239000002736 nonionic surfactant Substances 0.000 claims description 4
- 238000007142 ring opening reaction Methods 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 229910000077 silane Inorganic materials 0.000 claims description 4
- JSFVRHAXCYPWRJ-UHFFFAOYSA-N 2-[4-(chloromethyl)phenyl]ethyl-triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCC1=CC=C(CCl)C=C1 JSFVRHAXCYPWRJ-UHFFFAOYSA-N 0.000 claims description 3
- IOLWRXMELRWXQY-UHFFFAOYSA-N 2-[4-(chloromethyl)phenyl]ethyl-trimethoxysilane Chemical compound CO[Si](OC)(OC)CCC1=CC=C(CCl)C=C1 IOLWRXMELRWXQY-UHFFFAOYSA-N 0.000 claims description 3
- OXGPXSALMHTDHQ-UHFFFAOYSA-N 3-chloroprop-1-enyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=CCCl OXGPXSALMHTDHQ-UHFFFAOYSA-N 0.000 claims description 3
- HFQOZNKPLKXDTP-UHFFFAOYSA-N 3-chloroprop-1-enyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=CCCl HFQOZNKPLKXDTP-UHFFFAOYSA-N 0.000 claims description 3
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 claims description 3
- 239000004115 Sodium Silicate Substances 0.000 claims description 3
- MEWGTFVEQWELBF-UHFFFAOYSA-N [4-(chloromethyl)phenyl]-triethoxysilane Chemical compound CCO[Si](OCC)(OCC)C1=CC=C(CCl)C=C1 MEWGTFVEQWELBF-UHFFFAOYSA-N 0.000 claims description 3
- ZXOFHTCCTUEJQJ-UHFFFAOYSA-N [4-(chloromethyl)phenyl]-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(CCl)C=C1 ZXOFHTCCTUEJQJ-UHFFFAOYSA-N 0.000 claims description 3
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical group [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 claims description 3
- 239000008199 coating composition Substances 0.000 claims description 3
- 239000008119 colloidal silica Substances 0.000 claims description 3
- 239000000839 emulsion Substances 0.000 claims description 3
- 150000007524 organic acids Chemical class 0.000 claims description 3
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 3
- SKSOAAKYLIWZKU-UHFFFAOYSA-N triethoxy-[2-(4-methylphenyl)ethyl]silane Chemical compound CCO[Si](OCC)(OCC)CCC1=CC=C(C)C=C1 SKSOAAKYLIWZKU-UHFFFAOYSA-N 0.000 claims description 3
- PNVQXNRVDYKIKF-UHFFFAOYSA-N trimethoxy-[2-(4-methylphenyl)ethyl]silane Chemical compound CO[Si](OC)(OC)CCC1=CC=C(C)C=C1 PNVQXNRVDYKIKF-UHFFFAOYSA-N 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 2
- 239000004111 Potassium silicate Substances 0.000 claims description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 2
- 125000000129 anionic group Chemical group 0.000 claims description 2
- 229920001222 biopolymer Polymers 0.000 claims description 2
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 2
- 239000000194 fatty acid Substances 0.000 claims description 2
- 229930195729 fatty acid Natural products 0.000 claims description 2
- 125000006038 hexenyl group Chemical group 0.000 claims description 2
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 claims description 2
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 claims description 2
- 229910052912 lithium silicate Inorganic materials 0.000 claims description 2
- 229910052913 potassium silicate Inorganic materials 0.000 claims description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 claims description 2
- 235000019353 potassium silicate Nutrition 0.000 claims description 2
- 239000000741 silica gel Substances 0.000 claims description 2
- 229910002027 silica gel Inorganic materials 0.000 claims description 2
- 150000004665 fatty acids Chemical class 0.000 claims 1
- 239000000243 solution Substances 0.000 description 32
- 125000000217 alkyl group Chemical group 0.000 description 29
- 239000000463 material Substances 0.000 description 22
- 125000003118 aryl group Chemical group 0.000 description 21
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 20
- 238000005859 coupling reaction Methods 0.000 description 14
- 125000000753 cycloalkyl group Chemical group 0.000 description 14
- 230000008878 coupling Effects 0.000 description 13
- 238000010168 coupling process Methods 0.000 description 13
- 238000002156 mixing Methods 0.000 description 13
- 125000003367 polycyclic group Chemical group 0.000 description 13
- 229910052717 sulfur Inorganic materials 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 12
- 125000001072 heteroaryl group Chemical group 0.000 description 12
- 125000000592 heterocycloalkyl group Chemical group 0.000 description 12
- 239000011593 sulfur Substances 0.000 description 12
- 125000003710 aryl alkyl group Chemical group 0.000 description 11
- 239000000523 sample Substances 0.000 description 11
- 229920003048 styrene butadiene rubber Polymers 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 239000000443 aerosol Substances 0.000 description 8
- 239000008367 deionised water Substances 0.000 description 8
- 229910021641 deionized water Inorganic materials 0.000 description 8
- 239000002174 Styrene-butadiene Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000005062 Polybutadiene Substances 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 125000005842 heteroatom Chemical group 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 6
- 229920002857 polybutadiene Polymers 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 239000013065 commercial product Substances 0.000 description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 5
- 229910052809 inorganic oxide Inorganic materials 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 125000005592 polycycloalkyl group Polymers 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 238000005096 rolling process Methods 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 238000005303 weighing Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 125000000304 alkynyl group Chemical group 0.000 description 4
- 229910052799 carbon Chemical group 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000008187 granular material Substances 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052914 metal silicate Inorganic materials 0.000 description 3
- DEQZTKGFXNUBJL-UHFFFAOYSA-N n-(1,3-benzothiazol-2-ylsulfanyl)cyclohexanamine Chemical compound C1CCCCC1NSC1=NC2=CC=CC=C2S1 DEQZTKGFXNUBJL-UHFFFAOYSA-N 0.000 description 3
- 229920000620 organic polymer Polymers 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 229920001897 terpolymer Polymers 0.000 description 3
- 229920001169 thermoplastic Polymers 0.000 description 3
- 239000004416 thermosoftening plastic Substances 0.000 description 3
- 238000004448 titration Methods 0.000 description 3
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
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- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 229910018557 Si O Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
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- 125000003262 carboxylic acid ester group Chemical group [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
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- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 239000011630 iodine Substances 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
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- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
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- 125000001424 substituent group Chemical group 0.000 description 2
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 2
- 125000002130 sulfonic acid ester group Chemical group 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
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- 125000000101 thioether group Chemical group 0.000 description 2
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 2
- XSIGLRIVXRKQRA-UHFFFAOYSA-N triethoxysilylmethanethiol Chemical compound CCO[Si](CS)(OCC)OCC XSIGLRIVXRKQRA-UHFFFAOYSA-N 0.000 description 2
- MJYQFWSXKFLTAY-OVEQLNGDSA-N (2r,3r)-2,3-bis[(4-hydroxy-3-methoxyphenyl)methyl]butane-1,4-diol;(2r,3r,4s,5s,6r)-6-(hydroxymethyl)oxane-2,3,4,5-tetrol Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O.C1=C(O)C(OC)=CC(C[C@@H](CO)[C@H](CO)CC=2C=C(OC)C(O)=CC=2)=C1 MJYQFWSXKFLTAY-OVEQLNGDSA-N 0.000 description 1
- 125000006657 (C1-C10) hydrocarbyl group Chemical group 0.000 description 1
- OWRCNXZUPFZXOS-UHFFFAOYSA-N 1,3-diphenylguanidine Chemical compound C=1C=CC=CC=1NC(=N)NC1=CC=CC=C1 OWRCNXZUPFZXOS-UHFFFAOYSA-N 0.000 description 1
- 125000004972 1-butynyl group Chemical group [H]C([H])([H])C([H])([H])C#C* 0.000 description 1
- 125000000530 1-propynyl group Chemical group [H]C([H])([H])C#C* 0.000 description 1
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 1
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- ZSDSQXJSNMTJDA-UHFFFAOYSA-N trifluralin Chemical compound CCCN(CCC)C1=C([N+]([O-])=O)C=C(C(F)(F)F)C=C1[N+]([O-])=O ZSDSQXJSNMTJDA-UHFFFAOYSA-N 0.000 description 1
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- YGLOWFUKVQMIQC-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropylhexasulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSSSSSCCC[Si](OC)(OC)OC YGLOWFUKVQMIQC-UHFFFAOYSA-N 0.000 description 1
- JTTSZDBCLAKKAY-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSSSCCC[Si](OC)(OC)OC JTTSZDBCLAKKAY-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本出願は、2013年10月7日に出願された米国仮特許出願第61/887,713号の利益を主張し、これにより、この米国仮特許出願は、その全体が本明細書に参考として援用される。
本発明は、処理フィラーの調製プロセス、そのプロセスにより製造された処理フィラー、ならびにこのような処理フィラーを含む組成物および物品に関する。
乗用車やトラックタイヤの転がり抵抗を減らし、湿潤牽引力を向上させるためのシリカ/シランフィラー系の使用については、当該技術分野において公知である。転がり抵抗を減らすと燃料消費量が少なくなる。
本発明では、(a)あらかじめ乾燥させていない未処理フィラーを含むスラリーを、処理剤を含む処理組成物で処理し、それにより処理フィラースラリーを形成させること、および(b)上記処理フィラースラリーを乾燥させて処理フィラーを製造することを含む処理フィラーの製造プロセスが提供される。処理剤には、無水物、環状イミド、およびこれらの誘導体のうちの少なくとも一つを含めることができる。
すでに述べたように、本発明は、処理フィラーを製造するプロセスを提供する。上記プロセスは、(a)あらかじめ乾燥させていない未処理フィラーを含み得るスラリーを、処理剤を含む処理組成物で処理し、それにより処理フィラースラリーを形成させること、および(b)処理フィラースラリーを乾燥させて処理フィラーを製造することを含むことができる。
(R1)a(R2)bSiX4−a−b (I)
で表されるものが含まれる。式(I)では、R1は、それぞれの「a」に対して独立に、1〜36個の炭素原子および官能基を有するヒドロカルビル基である。ヒドロカルビル基の官能基は、ビニル、アリル、ヘキセニル、エポキシ(オキシラン)、グリシドキシ、(メタ)アクリルオキシ、スルフィド、イソシアナト(−NCO)、ポリスルフィド、メルカプト、またはハロゲンである。式(I)では、R2は、それぞれの「b」に対して独立に、1〜36個の炭素原子を有するヒドロカルビル基または水素である。式(I)のXは、独立に、ハロゲンまたは1〜36個の炭素原子を有するアルコキシであり;下付き文字の「a」は、0、1、2または3であり;下付き文字の「b」は、0、1または2であり;(a+b)は、1、2または3である。但し、いくつかの実施形態では、bが1の場合、(a+b)は2または3である。本発明のいくつかのさらなる実施形態では、処理組成物は、式(I)で表されるカップリング剤をさらに含み、この場合、Xはアルコキシであり;aは1であり;bは0であり;R1のヒドロカルビルの官能基はハロゲンである。
(R3)c(R4)dSiY4−c−d (II)
で表されるオルガノシランを挙げることができる。式(II)では、R3はそれぞれの「c」に対して独立に、1〜12個の炭素原子および官能基を有するヒドロカルビル基であってよい。官能基は、スルフィドであっても、ポリスルフィドであっても、メルカプトであってもよい。式(II)では、R4は、それぞれの「d」に対して独立に、1〜18個の炭素原子を有するヒドロカルビル基であっても、水素であってもよい。それぞれのYは、それぞれ独立に、ハロゲンであっても、1〜12個の炭素原子を有するアルコキシ基であってもよい。下付き文字の「c」は、0、1、2または3であり得;下付き文字の「b」は、0、1または2であり得;c+dは、1、2または3であり得る。但し、いくつかの実施形態では、bが1の場合、a+bは、2または3である。式(II)のR3およびR4基は、処理フィラーを混ぜ合わせることができるポリマー組成物と反応することが可能なように選択され得る。
さらに、硫黄含有オルガノシランは、次の式(III)
Z’−alk−Sn’−alk−Z’ (III)
で表されるビス(アルコキシシリルアルキル)ポリスルフィドを含み得る。式(III)では、「alk」は1〜18個の炭素原子を有する二価の炭化水素ラジカルを表し、n’は2〜12の整数であり、Z’は
3,3’−ビス(トリメトキシシリルプロピル)ジスルフィド、3,3’−ビス(トリエトキシシリルプロピル)テトラスルフィド、
3,3’−ビス(トリメトキシシリルプロピル)テトラスルフィド、2,2’−ビス(トリエトキシシリルエチル)テトラスルフィド、
3,3’−ビス(トリメトキシシリルプロピル)トリスルフィド、3,3’−ビス(トリエトキシシリルプロピル)トリスルフィド、
3,3’−ビス(トリブトキシシリルプロピル)ジスルフィド、3,3’−ビス(トリメトキシシリルプロピル)ヘキサスルフィド、および
3,3’−ビス(トリオクトキシシリルプロピル)テトラスルフィド、ならびにこれらの混合物。
また、硫黄含有オルガノシランは、次の式(IV)
(a)アルカリ金属シリケートと酸とを組み合わせて、未処理スラリーを形成させること;
(b)任意選択的に、未処理スラリーを、処理剤を含む処理組成物で処理して処理スラリーを形成させること;
(c)(a)の未処理スラリーを乾燥して、または(b)の処理スラリーを乾燥して、いずれの場合にも、乾燥沈殿シリカを生成すること;
(d)処理剤を含む処理組成物と共に、ステップ(c)の乾燥沈殿シリカの水性スラリーを形成させ、処理シリカスラリーを形成させること;および
(e)処理シリカスラリーを乾燥して、乾燥処理沈殿シリカを製造することを含む、処理沈殿シリカを製造するプロセスに関する。
本出願の実施例で報告したシリカのCTAB表面積値は、CTAB溶液および以下に記載の方法を使って測定した。Metrohm Interchangeable「Snap−In」50ミリリットルビュレットを装着したMetrohm 751 Titrino自動滴定装置、および550nmフィルターを装着したBrinkmann Probe Colorimeter Model PC 910を用いて分析を行った。加えて、Mettler Toledo HB43または同等装置を使用して105℃でのシリカの水分損失を測定し、シリカと残留CTAB溶液を分離するためにFisher Scientific Centrific(商標)Centrifuge Model 225を使用した。過剰のCTABは、AEROSOL(登録商標)OT(ジオクチルナトリウムスルホスクシネート;Cytec Industries,Incから入手可能)の溶液で最大濁度が得られるまで自動滴定により測定し、この最大濁度は、プローブ比色計で検出した。最大濁度点は、150ミリボルトの読みに対応するものとして取得した。所与の重量のシリカに吸着したCTABの量と、CTAB分子により占められている空間がわかったのち、シリカの外側比表面積を計算し、乾燥重量基準で平方メートル/グラムとして報告した。
Claims (32)
- 処理フィラーの製造プロセスであって、前記プロセスは、
(a)あらかじめ乾燥させていない未処理フィラーを含むスラリーを、処理剤を含む処理組成物で処理し、それにより、処理フィラースラリーを形成させる工程、および
(b)前記処理フィラースラリーを乾燥させて処理フィラーを製造する工程を含み、
前記処理剤が、無水物、環状イミド、およびこれらの誘導体のうちの少なくとも一つを含む、プロセス。 - 前記未処理フィラーが、ケイ酸アルミニウム、シリカゲル、コロイド状シリカ、沈殿シリカ、およびこれらの混合物から選択される、請求項1に記載のプロセス。
- 前記フィラーが沈殿シリカを含む、請求項1に記載のプロセス。
- 前記処理剤が、前記環状イミドおよび/または環状無水物の開環生成物を含む、請求項1に記載のプロセス。
- 前記処理剤が、前記無水物および/または前記環状イミドの塩を含む、請求項1に記載のプロセス。
- 前記処理剤が、安息香酸無水物、酢酸無水物、マレイン酸無水物、コハク酸無水物、マレイミド、スクシンイミド、および/またはこれらの誘導体のうちの少なくとも一つを含む、請求項1に記載のプロセス。
- 前記無水物、前記環状イミド、および/またはこれらの誘導体が、それぞれ独立に、炭素−炭素二重結合を有する少なくとも一つの基をさらに含む、請求項1に記載のプロセス。
- 前記処理組成物が、次式(II)により表されるオルガノシランカップリング剤
(R1)a(R2)bSiX4−a−b (II)、
をさらに含み、
式中、各R1は、独立に、1〜36個の炭素原子および官能基を含むヒドロカルビル基であり、前記ヒドロカルビル基の前記官能基は、ビニル、アリル、ヘキセニル、エポキシ、グリシドキシ、(メタ)アクリルオキシ、スルフィド、イソシアナト、ポリスルフィド、メルカプト、またはハロゲンであり;各R2は、独立に、1〜36個の炭素原子を有するヒドロカルビル基または水素であり;Xは、独立に、ハロゲンまたは1〜36個の炭素原子を有するアルコキシであり;aは、0、1、2、または3であり;bは、0、1、または2であり;(a+b)は、1、2、または3であるが、ただし、bが1の場合は、(a+b)は2または3である、請求項1に記載のプロセス。 - 前記処理組成物が、式(II)で表される前記オルガノシランとは異なるオルガノシランをさらに含む、請求項8に記載のプロセス。
- 前記処理組成物が、(4−クロロメチル−フェニル)トリメトキシシラン、(4−クロロメチル−フェニル)トリエトキシシラン、[2−(4−クロロメチル−フェニル)−エチル]トリメトキシシラン、[2−(4−クロロメチル−フェニル)−エチル]トリエトキシシラン、(3−クロロ−プロペニル)−トリメトキシシラン、(3−クロロ−プロペニル)−トリエトキシシラン、(3−クロロ−プロピル)−トリエトキシシラン、(3−クロロ−プロピル)−トリメトキシシラン、トリメトキシ−(2−p−トリル−エチル)シランおよびトリエトキシ−(2−p−トリル−エチル)シラン、およびこれらの組合せからなる群から選択されるオルガノシランを含むカップリング剤をさらに含む、請求項1に記載のプロセス。
- 前記処理組成物が、前記処理剤とは異なる非カップリング剤をさらに含み、前記処理剤とは異なる前記非カップリング剤が、生体高分子、脂肪酸、有機酸、ポリマーエマルジョン、ポリマーコーティング組成物、およびこれらの組合せの一つまたは複数である、請求項1に記載のプロセス。
- 前記処理組成物が、アニオン性界面活性剤、非イオン性界面活性剤、両性界面活性剤、およびこれらの組合せから選択され、未処理フィラーの重量を基準にして1重量%超〜25重量%の量で存在する非カップリング剤をさらに含む、請求項1に記載のプロセス。
- 前記処理フィラーが処理沈殿シリカを含み、
前記処理組成物が、
(i)少なくとも1種のカップリング剤と、
(ii)アニオン性、非イオン性、および/または両性界面活性剤から選択され、未処理フィラーの重量を基準にして1重量%超〜25重量%の量で存在する非カップリング剤とをさらに含む、請求項1に記載のプロセス。 - 請求項1に記載のプロセスにより製造された処理フィラー。
- 請求項1に記載のプロセスにより製造された前記処理フィラーを含むゴム組成物。
- 天然ゴムを含む、請求項15に記載のゴム組成物。
- ゴム配合マスターバッチである、請求項15に記載のゴム組成物。
- 処理沈殿シリカの製造プロセスであって、前記プロセスは、
(a)アルカリ金属シリケートと酸とを組み合わせて、あらかじめ乾燥させていない未処理シリカを含むスラリーを形成させる工程;
(b)前記スラリーを、処理剤を含む処理組成物で処理し、それにより、処理スラリーを形成させる工程、および
(c)前記処理スラリーを乾燥させて、処理沈殿シリカを製造する工程を含み、
前記処理剤が、無水物、環状イミド、およびこれらの誘導体のうちの少なくとも一つを含む、プロセス。 - 前記処理剤が、前記環状イミドおよび/または環状無水物の開環生成物を含む、請求項18に記載のプロセス。
- 前記処理剤が、前記無水物および/または前記環状イミドの塩を含む、請求項18に記載のプロセス。
- 前記処理剤が、安息香酸無水物、酢酸無水物、マレイン酸無水物、コハク酸無水物、マレイミド、スクシンイミド、および/またはこれらの誘導体のうちの少なくとも一つを含む、請求項18に記載のプロセス。
- 前記無水物、前記環状イミド、および/またはこれらの誘導体が、それぞれ独立に、炭素−炭素二重結合を有する少なくとも一つの基をさらに含む、請求項18に記載のプロセス。
- 前記アルカリ金属シリケートが、ケイ酸アルミニウム、ケイ酸リチウム、ケイ酸ナトリウム、および/またはケイ酸カリウムを含む、請求項18に記載のプロセス。
- 前記処理組成物が、(4−クロロメチル−フェニル)トリメトキシシラン、(4−クロロメチル−フェニル)トリエトキシシラン、[2−(4−クロロメチル−フェニル)−エチル]トリメトキシシラン、[2−(4−クロロメチル−フェニル)−エチル]トリエトキシシラン、(3−クロロ−プロペニル)−トリメトキシシラン、(3−クロロ−プロペニル)−トリエトキシシラン、(3−クロロ−プロピル)−トリエトキシシラン、(3−クロロ−プロピル)−トリメトキシシラン、トリメトキシ−(2−p−トリル−エチル)シランおよびトリエトキシ−(2−p−トリル−エチル)シラン、およびこれらの組合せからなる群から選択されるオルガノシランを含むカップリング剤をさらに含む、請求項18に記載のプロセス。
- 前記処理組成物が、アニオン性界面活性剤、非イオン性界面活性剤、両性界面活性剤、およびこれらの組合せから選択され、未処理フィラーの重量を基準にして1重量%超〜25重量%の量で存在する非カップリング剤をさらに含む、請求項18に記載のプロセス。
- 処理沈殿シリカの製造プロセスであって、前記プロセスは、
(a)アルカリ金属シリケートと酸とを組み合わせて、あらかじめ乾燥させていない未処理シリカを含む未処理スラリーを形成させる工程;
(b)前記未処理スラリーを乾燥して、乾燥沈殿シリカを生成する工程;
(c)処理剤および、任意選択的にカップリング剤および/または、任意選択的に非カップリング剤を含む処理組成物と共に前記乾燥沈殿シリカの水性スラリーを形成させ、処理沈殿シリカスラリーを形成させる工程、および
(d)前記処理沈殿シリカスラリーを乾燥して、乾燥処理沈殿シリカを製造する工程を含み、
前記処理剤が、無水物、環状イミド、およびこれらの誘導体のうちの少なくとも一つを含む、プロセス。 - 前記処理剤が、前記環状イミドおよび/または環状無水物の開環生成物を含む、請求項26に記載のプロセス。
- 前記処理剤が、前記無水物および/または前記環状イミドの塩を含む、請求項26に記載のプロセス。
- 前記処理剤が、安息香酸無水物、酢酸無水物、マレイン酸無水物、コハク酸無水物、マレイミド、スクシンイミド、および/またはこれらの誘導体のうちの少なくとも一つを含む、請求項26に記載のプロセス。
- 前記無水物、前記環状イミド、および/またはこれらの誘導体が、それぞれ独立に、炭素−炭素二重結合を有する少なくとも一つの基をさらに含む、請求項26に記載のプロセス。
- 請求項26に記載の方法により調製された処理沈殿シリカ。
- 請求項26に記載のプロセスにより製造された前記処理沈殿シリカを含むゴム組成物。
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EP (4) | EP3055359B1 (ja) |
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CN (5) | CN105764999B (ja) |
AR (6) | AR097951A1 (ja) |
AU (4) | AU2014332185B2 (ja) |
BR (4) | BR112016007705B1 (ja) |
CA (4) | CA2926633C (ja) |
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HK (3) | HK1221243A1 (ja) |
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IL (4) | IL244768B (ja) |
MX (4) | MX2016004451A (ja) |
PH (4) | PH12016500629A1 (ja) |
PL (3) | PL3055359T3 (ja) |
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RS (1) | RS62323B1 (ja) |
RU (4) | RU2642795C2 (ja) |
SG (5) | SG11201602695SA (ja) |
SI (3) | SI3055359T1 (ja) |
TW (4) | TWI656156B (ja) |
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CN114956772B (zh) * | 2022-06-15 | 2023-02-03 | 青岛农业大学 | 一种含有改性木粉的3d打印保温胶凝材料及其制备方法与应用 |
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