JP2016139123A5 - - Google Patents
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- Publication number
- JP2016139123A5 JP2016139123A5 JP2015243934A JP2015243934A JP2016139123A5 JP 2016139123 A5 JP2016139123 A5 JP 2016139123A5 JP 2015243934 A JP2015243934 A JP 2015243934A JP 2015243934 A JP2015243934 A JP 2015243934A JP 2016139123 A5 JP2016139123 A5 JP 2016139123A5
- Authority
- JP
- Japan
- Prior art keywords
- resist
- imaged
- optionally substituted
- layer
- ester
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 229920002120 photoresistant polymer Polymers 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- -1 phthalate ester Chemical class 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 150000001454 anthracenes Chemical class 0.000 description 3
- 239000008199 coating composition Substances 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- NIQCNGHVCWTJSM-UHFFFAOYSA-N dimethyl benzenedicarboxylate Natural products COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462097667P | 2014-12-30 | 2014-12-30 | |
| US62/097,667 | 2014-12-30 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018146000A Division JP6788639B2 (ja) | 2014-12-30 | 2018-08-02 | オーバーコートされたフォトレジストと共に使用するためのコーティング組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016139123A JP2016139123A (ja) | 2016-08-04 |
| JP2016139123A5 true JP2016139123A5 (enExample) | 2017-06-01 |
Family
ID=56163995
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015243934A Pending JP2016139123A (ja) | 2014-12-30 | 2015-12-15 | オーバーコートされたフォトレジストと共に使用するためのコーティング組成物 |
| JP2018146000A Active JP6788639B2 (ja) | 2014-12-30 | 2018-08-02 | オーバーコートされたフォトレジストと共に使用するためのコーティング組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018146000A Active JP6788639B2 (ja) | 2014-12-30 | 2018-08-02 | オーバーコートされたフォトレジストと共に使用するためのコーティング組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11762292B2 (enExample) |
| JP (2) | JP2016139123A (enExample) |
| KR (2) | KR102110178B1 (enExample) |
| CN (1) | CN105739236B (enExample) |
| TW (1) | TWI592760B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10203602B2 (en) * | 2016-09-30 | 2019-02-12 | Rohm And Haas Electronic Materials Korea Ltd. | Coating compositions for use with an overcoated photoresist |
| US20180364575A1 (en) * | 2017-06-15 | 2018-12-20 | Rohm And Haas Electronic Materials Korea Ltd. | Coating compositions for use with an overcoated photoresist |
| JPWO2020066477A1 (ja) * | 2018-09-27 | 2021-05-20 | 富士フイルム株式会社 | パターン形成方法、及び、有機溶剤現像用レジスト積層体 |
| US12393118B2 (en) * | 2021-05-28 | 2025-08-19 | Dupont Electronic Materials International, Llc | Composition for photoresist underlayer |
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| JP5894106B2 (ja) * | 2012-06-18 | 2016-03-23 | 信越化学工業株式会社 | レジスト下層膜形成用化合物、これを用いたレジスト下層膜材料、レジスト下層膜形成方法、パターン形成方法 |
| KR102307208B1 (ko) * | 2012-10-31 | 2021-10-01 | 닛산 가가쿠 가부시키가이샤 | 에스테르기를 갖는 실리콘함유 레지스트 하층막 형성조성물 |
| US10508181B2 (en) * | 2012-12-18 | 2019-12-17 | Nissan Chemical Industries, Ltd. | Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound |
| WO2014167671A1 (ja) * | 2013-04-10 | 2014-10-16 | 千代田ケミカル株式会社 | 感光性樹脂組成物 |
| KR101674989B1 (ko) * | 2013-05-21 | 2016-11-22 | 제일모직 주식회사 | 레지스트 하층막용 조성물, 이를 사용한 패턴 형성 방법 및 상기 패턴을 포함하는 반도체 집적회로 디바이스 |
| KR102255221B1 (ko) * | 2013-12-27 | 2021-05-24 | 롬엔드하스전자재료코리아유한회사 | 나노리소그래피용 유기 바닥 반사방지 코팅 조성물 |
| JP6569204B2 (ja) * | 2014-10-08 | 2019-09-04 | 大日本印刷株式会社 | 積層体の製造方法および積層体 |
| US11092894B2 (en) * | 2014-12-31 | 2021-08-17 | Rohm And Haas Electronic Materials Korea Ltd. | Method for forming pattern using anti-reflective coating composition comprising photoacid generator |
| US9499698B2 (en) * | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
| TWI646397B (zh) * | 2015-10-31 | 2019-01-01 | 南韓商羅門哈斯電子材料韓國公司 | 與外塗佈光致抗蝕劑一起使用的塗料組合物 |
| US10203602B2 (en) * | 2016-09-30 | 2019-02-12 | Rohm And Haas Electronic Materials Korea Ltd. | Coating compositions for use with an overcoated photoresist |
-
2015
- 2015-12-11 TW TW104141825A patent/TWI592760B/zh active
- 2015-12-15 JP JP2015243934A patent/JP2016139123A/ja active Pending
- 2015-12-23 CN CN201510980497.2A patent/CN105739236B/zh active Active
- 2015-12-26 KR KR1020150187001A patent/KR102110178B1/ko active Active
- 2015-12-28 US US14/980,222 patent/US11762292B2/en active Active
-
2018
- 2018-01-08 KR KR1020180002165A patent/KR20180006474A/ko not_active Withdrawn
- 2018-08-02 JP JP2018146000A patent/JP6788639B2/ja active Active
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