TWI592760B - 與經外塗佈之光致抗蝕劑一起使用之塗層組合物 - Google Patents
與經外塗佈之光致抗蝕劑一起使用之塗層組合物 Download PDFInfo
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- TWI592760B TWI592760B TW104141825A TW104141825A TWI592760B TW I592760 B TWI592760 B TW I592760B TW 104141825 A TW104141825 A TW 104141825A TW 104141825 A TW104141825 A TW 104141825A TW I592760 B TWI592760 B TW I592760B
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Classifications
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- G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
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- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
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- A41D27/22—Loops or hooks for hanging-up
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- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45F—TRAVELLING OR CAMP EQUIPMENT: SACKS OR PACKS CARRIED ON THE BODY
- A45F4/00—Travelling or camp articles which may be converted into other articles or into objects for other use; Sacks or packs carried on the body and convertible into other articles or into objects for other use
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- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45F—TRAVELLING OR CAMP EQUIPMENT: SACKS OR PACKS CARRIED ON THE BODY
- A45F4/00—Travelling or camp articles which may be converted into other articles or into objects for other use; Sacks or packs carried on the body and convertible into other articles or into objects for other use
- A45F4/14—Coats or capes convertible into tent coverings
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- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47G—HOUSEHOLD OR TABLE EQUIPMENT
- A47G9/00—Bed-covers; Counterpanes; Travelling rugs; Sleeping rugs; Sleeping bags; Pillows
- A47G9/06—Travelling rugs; Sleeping rugs
- A47G9/062—Travelling rugs; Sleeping rugs for covering the ground, e.g. picnic or beach blankets
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- A—HUMAN NECESSITIES
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
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- A41D2300/00—Details of garments
- A41D2300/30—Closures
- A41D2300/324—Closures using snap fasteners
-
- A—HUMAN NECESSITIES
- A41—WEARING APPAREL
- A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
- A41D2300/00—Details of garments
- A41D2300/30—Closures
- A41D2300/33—Closures using straps or ties
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Laminated Bodies (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462097667P | 2014-12-30 | 2014-12-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201626109A TW201626109A (zh) | 2016-07-16 |
| TWI592760B true TWI592760B (zh) | 2017-07-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104141825A TWI592760B (zh) | 2014-12-30 | 2015-12-11 | 與經外塗佈之光致抗蝕劑一起使用之塗層組合物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11762292B2 (enExample) |
| JP (2) | JP2016139123A (enExample) |
| KR (2) | KR102110178B1 (enExample) |
| CN (1) | CN105739236B (enExample) |
| TW (1) | TWI592760B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10203602B2 (en) * | 2016-09-30 | 2019-02-12 | Rohm And Haas Electronic Materials Korea Ltd. | Coating compositions for use with an overcoated photoresist |
| US20180364575A1 (en) * | 2017-06-15 | 2018-12-20 | Rohm And Haas Electronic Materials Korea Ltd. | Coating compositions for use with an overcoated photoresist |
| JPWO2020066477A1 (ja) * | 2018-09-27 | 2021-05-20 | 富士フイルム株式会社 | パターン形成方法、及び、有機溶剤現像用レジスト積層体 |
| US12393118B2 (en) * | 2021-05-28 | 2025-08-19 | Dupont Electronic Materials International, Llc | Composition for photoresist underlayer |
Family Cites Families (64)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2123702C3 (de) * | 1971-05-13 | 1988-05-26 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung eines Reliefbildes |
| DE3209327A1 (de) * | 1982-03-15 | 1983-09-15 | Cassella Ag, 6000 Frankfurt | Verfahren zur herstellung von aetzreservedrucken auf hydrophoben textilmaterialien |
| DE3236560A1 (de) * | 1982-10-02 | 1984-04-05 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches schichtuebertragungsmaterial und verfahren zur herstellung einer photoresistschablone |
| US5232813A (en) * | 1990-01-31 | 1993-08-03 | Fuji Photo Film Co., Ltd. | Ps plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer |
| US5994031A (en) * | 1996-09-09 | 1999-11-30 | Konica Corporation | Method of processing presensitized planographic printing plate |
| WO2000016988A1 (en) * | 1998-09-21 | 2000-03-30 | R/H Consulting, Inc. | Lithographic printing plates for use with laser imaging apparatus |
| US20020015917A1 (en) * | 1998-12-31 | 2002-02-07 | Lee Geun Su | Multi-oxygen containing compound for preventing acid diffusion, and photoresist composition containing the same |
| KR100498440B1 (ko) * | 1999-11-23 | 2005-07-01 | 삼성전자주식회사 | 백본이 환상 구조를 가지는 감광성 폴리머와 이를포함하는 레지스트 조성물 |
| US7258956B2 (en) * | 2000-07-06 | 2007-08-21 | Cabot Corporation | Printing plates comprising modified pigment products |
| JP4654544B2 (ja) * | 2000-07-12 | 2011-03-23 | 日産化学工業株式会社 | リソグラフィー用ギャップフィル材形成組成物 |
| AU2001292783A1 (en) * | 2000-09-19 | 2002-04-02 | Shipley Company, L.L.C. | Antireflective composition |
| US6787286B2 (en) * | 2001-03-08 | 2004-09-07 | Shipley Company, L.L.C. | Solvents and photoresist compositions for short wavelength imaging |
| US7332266B2 (en) * | 2001-04-10 | 2008-02-19 | Nissan Chemical Industries, Ltd. | Composition for forming anti-reflective coating for use in lithography |
| JP4401600B2 (ja) * | 2001-06-29 | 2010-01-20 | 富士フイルム株式会社 | 感光性平版印刷版 |
| TW591341B (en) | 2001-09-26 | 2004-06-11 | Shipley Co Llc | Coating compositions for use with an overcoated photoresist |
| JP4373082B2 (ja) * | 2001-12-28 | 2009-11-25 | 富士通株式会社 | アルカリ可溶性シロキサン重合体、ポジ型レジスト組成物、レジストパターン及びその製造方法、並びに、電子回路装置及びその製造方法 |
| US7078157B2 (en) * | 2003-02-27 | 2006-07-18 | Az Electronic Materials Usa Corp. | Photosensitive composition and use thereof |
| US6811964B2 (en) * | 2003-03-26 | 2004-11-02 | Fuji Photo Film Co., Ltd. | Method and apparatus for producing coating liquid for photothermographic material |
| JP4152810B2 (ja) * | 2003-06-13 | 2008-09-17 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| US20060108710A1 (en) * | 2004-11-24 | 2006-05-25 | Molecular Imprints, Inc. | Method to reduce adhesion between a conformable region and a mold |
| KR100740824B1 (ko) * | 2003-07-16 | 2007-07-19 | 도오꾜오까고오교 가부시끼가이샤 | 포지티브 포토레지스트 조성물 및 레지스트 패턴 형성 방법 |
| TWI360726B (en) * | 2003-10-30 | 2012-03-21 | Nissan Chemical Ind Ltd | Sublayer coating-forming composition containing de |
| JP4485241B2 (ja) * | 2004-04-09 | 2010-06-16 | Ａｚエレクトロニックマテリアルズ株式会社 | 水溶性樹脂組成物およびそれを用いたパターン形成方法 |
| JP2005326491A (ja) * | 2004-05-12 | 2005-11-24 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物及びレジストパターン形成方法 |
| US20060057491A1 (en) * | 2004-05-18 | 2006-03-16 | Rohm And Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
| CN100541327C (zh) * | 2004-05-21 | 2009-09-16 | 明德国际仓储贸易(上海)有限公司 | 液晶显示元件散乱层光阻组成物 |
| EP1602982B1 (en) * | 2004-05-31 | 2013-12-18 | FUJIFILM Corporation | Planographic printing method |
| JP4379596B2 (ja) * | 2004-06-10 | 2009-12-09 | 信越化学工業株式会社 | 犠牲膜形成用組成物、パターン形成方法、犠牲膜及びその除去方法 |
| US7691556B2 (en) * | 2004-09-15 | 2010-04-06 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
| EP1742108B1 (en) * | 2005-07-05 | 2015-10-28 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
| JP4654993B2 (ja) * | 2005-08-19 | 2011-03-23 | Ｊｓｒ株式会社 | 樹脂組成物、それを用いた二層積層膜、およびバンプ形成方法 |
| JP4553835B2 (ja) * | 2005-12-14 | 2010-09-29 | 信越化学工業株式会社 | 反射防止膜材料、及びこれを用いたパターン形成方法、基板 |
| EP1989593A2 (en) * | 2006-02-13 | 2008-11-12 | Dow Corning Corporation | Antireflective coating material |
| JP4409524B2 (ja) * | 2006-03-28 | 2010-02-03 | 富士通株式会社 | レジストパターン厚肉化材料、レジストパターンの製造方法、及び半導体装置の製造方法 |
| KR101423057B1 (ko) * | 2006-08-28 | 2014-07-25 | 닛산 가가쿠 고교 가부시키 가이샤 | 액상첨가제를 포함하는 레지스트 하층막 형성 조성물 |
| KR100852706B1 (ko) * | 2007-03-02 | 2008-08-19 | 삼성에스디아이 주식회사 | 격벽 형성용 조성물, 및 이를 이용하여 제조된 플라즈마디스플레이 패널 |
| US20080286689A1 (en) * | 2007-05-14 | 2008-11-20 | Hong Zhuang | Antireflective Coating Compositions |
| WO2009034998A1 (ja) * | 2007-09-11 | 2009-03-19 | Nissan Chemical Industries, Ltd. | 窒素含有シリル基を含むポリマーを含有するレジスト下層膜形成組成物 |
| JP5337983B2 (ja) * | 2007-09-19 | 2013-11-06 | 日産化学工業株式会社 | 多環式脂肪族環を有するポリマーを含むリソグラフィー用レジスト下層膜形成組成物 |
| JP5077026B2 (ja) * | 2008-04-02 | 2012-11-21 | Ｊｓｒ株式会社 | レジスト下層膜形成用組成物及びそれを用いたデュアルダマシン構造の形成方法 |
| US8173346B2 (en) * | 2008-05-28 | 2012-05-08 | Presstek, Inc. | Printing members having permeability-transition layers and related methods |
| US20100092894A1 (en) * | 2008-10-14 | 2010-04-15 | Weihong Liu | Bottom Antireflective Coating Compositions |
| US8501383B2 (en) * | 2009-05-20 | 2013-08-06 | Rohm And Haas Electronic Materials Llc | Coating compositions for use with an overcoated photoresist |
| US9244352B2 (en) | 2009-05-20 | 2016-01-26 | Rohm And Haas Electronic Materials, Llc | Coating compositions for use with an overcoated photoresist |
| KR101764259B1 (ko) * | 2009-06-02 | 2017-08-03 | 닛산 가가쿠 고교 가부시키 가이샤 | 설파이드 결합을 갖는 실리콘 함유 레지스트 하층막 형성 조성물 |
| US8507192B2 (en) * | 2010-02-18 | 2013-08-13 | Az Electronic Materials Usa Corp. | Antireflective compositions and methods of using same |
| JP2012022191A (ja) * | 2010-07-15 | 2012-02-02 | Nissan Chem Ind Ltd | イオン性重合体を含むレジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| JP5890990B2 (ja) * | 2010-11-01 | 2016-03-22 | 株式会社キーエンス | インクジェット光造形法における、光造形品形成用モデル材、光造形品の光造形時の形状支持用サポート材および光造形品の製造方法 |
| JP5518772B2 (ja) * | 2011-03-15 | 2014-06-11 | 信越化学工業株式会社 | パターン形成方法 |
| KR101910682B1 (ko) * | 2011-04-25 | 2018-10-22 | 에이지씨 가부시키가이샤 | 발수발유제 조성물, 그 제조 방법 및 물품 |
| WO2012147210A1 (ja) * | 2011-04-28 | 2012-11-01 | Jsr株式会社 | レジスト下層膜形成用組成物及びパターン形成方法 |
| US9240327B2 (en) * | 2011-08-04 | 2016-01-19 | Nissan Chemical Industries, Ltd. | Resist underlayer film-forming composition for EUV lithography containing condensation polymer |
| JP5882776B2 (ja) * | 2012-02-14 | 2016-03-09 | 信越化学工業株式会社 | レジスト下層膜形成用組成物、及びパターン形成方法 |
| JP5894106B2 (ja) * | 2012-06-18 | 2016-03-23 | 信越化学工業株式会社 | レジスト下層膜形成用化合物、これを用いたレジスト下層膜材料、レジスト下層膜形成方法、パターン形成方法 |
| KR102307208B1 (ko) * | 2012-10-31 | 2021-10-01 | 닛산 가가쿠 가부시키가이샤 | 에스테르기를 갖는 실리콘함유 레지스트 하층막 형성조성물 |
| US10508181B2 (en) * | 2012-12-18 | 2019-12-17 | Nissan Chemical Industries, Ltd. | Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound |
| WO2014167671A1 (ja) * | 2013-04-10 | 2014-10-16 | 千代田ケミカル株式会社 | 感光性樹脂組成物 |
| KR101674989B1 (ko) * | 2013-05-21 | 2016-11-22 | 제일모직 주식회사 | 레지스트 하층막용 조성물, 이를 사용한 패턴 형성 방법 및 상기 패턴을 포함하는 반도체 집적회로 디바이스 |
| KR102255221B1 (ko) * | 2013-12-27 | 2021-05-24 | 롬엔드하스전자재료코리아유한회사 | 나노리소그래피용 유기 바닥 반사방지 코팅 조성물 |
| JP6569204B2 (ja) * | 2014-10-08 | 2019-09-04 | 大日本印刷株式会社 | 積層体の製造方法および積層体 |
| US11092894B2 (en) * | 2014-12-31 | 2021-08-17 | Rohm And Haas Electronic Materials Korea Ltd. | Method for forming pattern using anti-reflective coating composition comprising photoacid generator |
| US9499698B2 (en) * | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
| TWI646397B (zh) * | 2015-10-31 | 2019-01-01 | 南韓商羅門哈斯電子材料韓國公司 | 與外塗佈光致抗蝕劑一起使用的塗料組合物 |
| US10203602B2 (en) * | 2016-09-30 | 2019-02-12 | Rohm And Haas Electronic Materials Korea Ltd. | Coating compositions for use with an overcoated photoresist |
-
2015
- 2015-12-11 TW TW104141825A patent/TWI592760B/zh active
- 2015-12-15 JP JP2015243934A patent/JP2016139123A/ja active Pending
- 2015-12-23 CN CN201510980497.2A patent/CN105739236B/zh active Active
- 2015-12-26 KR KR1020150187001A patent/KR102110178B1/ko active Active
- 2015-12-28 US US14/980,222 patent/US11762292B2/en active Active
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2018
- 2018-01-08 KR KR1020180002165A patent/KR20180006474A/ko not_active Withdrawn
- 2018-08-02 JP JP2018146000A patent/JP6788639B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN105739236B (zh) | 2022-07-19 |
| KR20180006474A (ko) | 2018-01-17 |
| US20160187778A1 (en) | 2016-06-30 |
| KR20160082470A (ko) | 2016-07-08 |
| JP6788639B2 (ja) | 2020-11-25 |
| TW201626109A (zh) | 2016-07-16 |
| US11762292B2 (en) | 2023-09-19 |
| KR102110178B1 (ko) | 2020-05-13 |
| JP2019003200A (ja) | 2019-01-10 |
| JP2016139123A (ja) | 2016-08-04 |
| CN105739236A (zh) | 2016-07-06 |
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