JP2014523636A5 - - Google Patents

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Publication number
JP2014523636A5
JP2014523636A5 JP2014513642A JP2014513642A JP2014523636A5 JP 2014523636 A5 JP2014523636 A5 JP 2014523636A5 JP 2014513642 A JP2014513642 A JP 2014513642A JP 2014513642 A JP2014513642 A JP 2014513642A JP 2014523636 A5 JP2014523636 A5 JP 2014523636A5
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JP
Japan
Prior art keywords
chamber
electrostatic chuck
substrate
dry chemical
providing
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JP2014513642A
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English (en)
Japanese (ja)
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JP2014523636A (ja
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Priority claimed from US13/273,090 external-priority patent/US9673037B2/en
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Publication of JP2014523636A publication Critical patent/JP2014523636A/ja
Publication of JP2014523636A5 publication Critical patent/JP2014523636A5/ja
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JP2014513642A 2011-05-31 2012-05-29 基板凍結乾燥装置及び方法 Withdrawn JP2014523636A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161491727P 2011-05-31 2011-05-31
US61/491,727 2011-05-31
US13/273,090 US9673037B2 (en) 2011-05-31 2011-10-13 Substrate freeze dry apparatus and method
US13/273,090 2011-10-13
PCT/US2012/039855 WO2012166727A2 (en) 2011-05-31 2012-05-29 Substrate freeze dry apparatus and method

Publications (2)

Publication Number Publication Date
JP2014523636A JP2014523636A (ja) 2014-09-11
JP2014523636A5 true JP2014523636A5 (enExample) 2015-07-09

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JP2014513642A Withdrawn JP2014523636A (ja) 2011-05-31 2012-05-29 基板凍結乾燥装置及び方法

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US (1) US9673037B2 (enExample)
JP (1) JP2014523636A (enExample)
CN (1) CN103650116B (enExample)
TW (1) TWI571948B (enExample)
WO (1) WO2012166727A2 (enExample)

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