JP2014501442A5 - - Google Patents

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Publication number
JP2014501442A5
JP2014501442A5 JP2013543728A JP2013543728A JP2014501442A5 JP 2014501442 A5 JP2014501442 A5 JP 2014501442A5 JP 2013543728 A JP2013543728 A JP 2013543728A JP 2013543728 A JP2013543728 A JP 2013543728A JP 2014501442 A5 JP2014501442 A5 JP 2014501442A5
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JP
Japan
Prior art keywords
substrate
lithography system
lithography
unit
vacuum chamber
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Application number
JP2013543728A
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English (en)
Japanese (ja)
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JP2014501442A (ja
JP6158091B2 (ja
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Priority claimed from PCT/EP2011/072654 external-priority patent/WO2012080278A1/en
Publication of JP2014501442A publication Critical patent/JP2014501442A/ja
Publication of JP2014501442A5 publication Critical patent/JP2014501442A5/ja
Application granted granted Critical
Publication of JP6158091B2 publication Critical patent/JP6158091B2/ja
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JP2013543728A 2010-12-14 2011-12-13 リソグラフィシステム及びこのようなリソグラフィシステムで基板を処理する方法 Active JP6158091B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US42274510P 2010-12-14 2010-12-14
US61/422,745 2010-12-14
US201161480163P 2011-04-28 2011-04-28
US61/480,163 2011-04-28
PCT/EP2011/072654 WO2012080278A1 (en) 2010-12-14 2011-12-13 Lithography system and method of processing substrates in such a lithography system

Publications (3)

Publication Number Publication Date
JP2014501442A JP2014501442A (ja) 2014-01-20
JP2014501442A5 true JP2014501442A5 (enExample) 2015-02-05
JP6158091B2 JP6158091B2 (ja) 2017-07-05

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ID=45418651

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013543728A Active JP6158091B2 (ja) 2010-12-14 2011-12-13 リソグラフィシステム及びこのようなリソグラフィシステムで基板を処理する方法

Country Status (8)

Country Link
US (1) US8895943B2 (enExample)
EP (1) EP2681624B1 (enExample)
JP (1) JP6158091B2 (enExample)
KR (1) KR101907433B1 (enExample)
CN (1) CN103370655B (enExample)
RU (1) RU2579533C2 (enExample)
TW (1) TWI548950B (enExample)
WO (1) WO2012080278A1 (enExample)

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JP2016207755A (ja) * 2015-04-17 2016-12-08 株式会社ニコン 露光システム及び交換方法
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CN108290694B (zh) * 2015-10-01 2021-05-04 因特瓦克公司 用于衬底制造的晶圆板和掩模装置
EP3667696A1 (en) * 2018-12-14 2020-06-17 ASML Netherlands B.V. Stage apparatus suitable for electron beam inspection apparatus
EP4117017A1 (en) * 2021-07-05 2023-01-11 ASML Netherlands B.V. Charged particle detector
EP4202970A1 (en) * 2021-12-24 2023-06-28 ASML Netherlands B.V. Alignment determination method and computer program

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