KR101907433B1 - 리소그라피 시스템 및 이러한 리소그라피 시스템에서 기판을 프로세싱하는 방법 - Google Patents

리소그라피 시스템 및 이러한 리소그라피 시스템에서 기판을 프로세싱하는 방법 Download PDF

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KR101907433B1
KR101907433B1 KR1020137018345A KR20137018345A KR101907433B1 KR 101907433 B1 KR101907433 B1 KR 101907433B1 KR 1020137018345 A KR1020137018345 A KR 1020137018345A KR 20137018345 A KR20137018345 A KR 20137018345A KR 101907433 B1 KR101907433 B1 KR 101907433B1
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South Korea
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substrate
lithographic
lithography
unit
lithography system
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Korean (ko)
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KR20130131398A (ko
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구이도 데 뵈르
헨드릭 얀 데 용
빈센트 실베스터 쿠이퍼
에르빈 슬롯
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마퍼 리쏘그라피 아이피 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31774—Multi-beam

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  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020137018345A 2010-12-14 2011-12-13 리소그라피 시스템 및 이러한 리소그라피 시스템에서 기판을 프로세싱하는 방법 Active KR101907433B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US42274510P 2010-12-14 2010-12-14
US61/422,745 2010-12-14
US201161480163P 2011-04-28 2011-04-28
US61/480,163 2011-04-28
PCT/EP2011/072654 WO2012080278A1 (en) 2010-12-14 2011-12-13 Lithography system and method of processing substrates in such a lithography system

Publications (2)

Publication Number Publication Date
KR20130131398A KR20130131398A (ko) 2013-12-03
KR101907433B1 true KR101907433B1 (ko) 2018-10-12

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KR1020137018345A Active KR101907433B1 (ko) 2010-12-14 2011-12-13 리소그라피 시스템 및 이러한 리소그라피 시스템에서 기판을 프로세싱하는 방법

Country Status (8)

Country Link
US (1) US8895943B2 (enExample)
EP (1) EP2681624B1 (enExample)
JP (1) JP6158091B2 (enExample)
KR (1) KR101907433B1 (enExample)
CN (1) CN103370655B (enExample)
RU (1) RU2579533C2 (enExample)
TW (1) TWI548950B (enExample)
WO (1) WO2012080278A1 (enExample)

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US8907280B1 (en) 2012-09-19 2014-12-09 Sandia Corporation Fast electron microscopy via compressive sensing
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CN107111251B (zh) * 2014-11-14 2020-10-20 Asml荷兰有限公司 用于在光刻系统中转移基材的加载锁定系统和方法
JP2016207755A (ja) * 2015-04-17 2016-12-08 株式会社ニコン 露光システム及び交換方法
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Also Published As

Publication number Publication date
EP2681624A1 (en) 2014-01-08
TWI548950B (zh) 2016-09-11
JP6158091B2 (ja) 2017-07-05
US8895943B2 (en) 2014-11-25
JP2014501442A (ja) 2014-01-20
RU2013132215A (ru) 2015-01-20
US20120175527A1 (en) 2012-07-12
KR20130131398A (ko) 2013-12-03
RU2579533C2 (ru) 2016-04-10
EP2681624B1 (en) 2016-07-20
CN103370655A (zh) 2013-10-23
CN103370655B (zh) 2016-03-16
WO2012080278A1 (en) 2012-06-21
TW201241575A (en) 2012-10-16

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