JP2012068357A - 平版印刷版原版 - Google Patents

平版印刷版原版 Download PDF

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Publication number
JP2012068357A
JP2012068357A JP2010211946A JP2010211946A JP2012068357A JP 2012068357 A JP2012068357 A JP 2012068357A JP 2010211946 A JP2010211946 A JP 2010211946A JP 2010211946 A JP2010211946 A JP 2010211946A JP 2012068357 A JP2012068357 A JP 2012068357A
Authority
JP
Japan
Prior art keywords
group
printing plate
lithographic printing
plate precursor
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
JP2010211946A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012068357A5 (https=
Inventor
Koji Hayashi
浩司 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Priority to JP2010211946A priority Critical patent/JP2012068357A/ja
Priority to CN2011800455270A priority patent/CN103109235A/zh
Priority to PCT/JP2011/069238 priority patent/WO2012039233A1/ja
Priority to EP11826679.0A priority patent/EP2620813A4/en
Priority to US13/825,136 priority patent/US8785107B2/en
Publication of JP2012068357A publication Critical patent/JP2012068357A/ja
Publication of JP2012068357A5 publication Critical patent/JP2012068357A5/ja
Revoked legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3035—Imagewise removal using liquid means from printing plates fixed on a cylinder or on a curved surface; from printing cylinders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08—Developable by water or the fountain solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP2010211946A 2010-09-22 2010-09-22 平版印刷版原版 Revoked JP2012068357A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2010211946A JP2012068357A (ja) 2010-09-22 2010-09-22 平版印刷版原版
CN2011800455270A CN103109235A (zh) 2010-09-22 2011-08-19 平版印刷版原版
PCT/JP2011/069238 WO2012039233A1 (ja) 2010-09-22 2011-08-19 平版印刷版原版
EP11826679.0A EP2620813A4 (en) 2010-09-22 2011-08-19 ORIGINAL LITHOGRAPHIC PRINTING PLATE
US13/825,136 US8785107B2 (en) 2010-09-22 2011-08-19 Lithographic printing plate precursor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010211946A JP2012068357A (ja) 2010-09-22 2010-09-22 平版印刷版原版

Publications (2)

Publication Number Publication Date
JP2012068357A true JP2012068357A (ja) 2012-04-05
JP2012068357A5 JP2012068357A5 (https=) 2013-12-19

Family

ID=45873723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010211946A Revoked JP2012068357A (ja) 2010-09-22 2010-09-22 平版印刷版原版

Country Status (5)

Country Link
US (1) US8785107B2 (https=)
EP (1) EP2620813A4 (https=)
JP (1) JP2012068357A (https=)
CN (1) CN103109235A (https=)
WO (1) WO2012039233A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014079960A (ja) * 2012-10-17 2014-05-08 Eastman Kodak Co 平版印刷版用組成物及び平版印刷版原版
KR20140065351A (ko) * 2012-11-21 2014-05-29 신닛테츠 수미킨 가가쿠 가부시키가이샤 잉크젯 하지용 처리제
CN108778768B (zh) * 2016-03-30 2020-04-03 富士胶片株式会社 平版印刷版原版及其层叠体以及平版印刷版原版的制造方法
JP6707132B2 (ja) * 2016-07-06 2020-06-10 富士フイルム株式会社 感光性組成物、転写フィルム、硬化膜、並びに、タッチパネル及びその製造方法
JP6977065B2 (ja) * 2018-01-31 2021-12-08 富士フイルム株式会社 平版印刷版原版、及び、平版印刷版の作製方法

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JP2006343667A (ja) * 2005-06-10 2006-12-21 Fujifilm Holdings Corp 平版印刷版原版
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WO2009054904A1 (en) * 2007-10-24 2009-04-30 Eastman Kodak Company Negative-working imageable elements and methods of use
WO2009109579A1 (en) * 2008-03-05 2009-09-11 Eastman Kodak Company Sensitizer/initiator combination for negative-working thermal-sensitive compositions usable for lithographic plates
JP2009538446A (ja) * 2006-05-26 2009-11-05 イーストマン コダック カンパニー ネガ型輻射線感光性組成物及び画像形成性材料
JP2010511914A (ja) * 2006-12-07 2010-04-15 イーストマン コダック カンパニー ネガ型輻射線感受性組成物及び画像形成材料

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JP2003057806A (ja) * 2001-08-16 2003-02-28 Fuji Photo Film Co Ltd 平版印刷版用原版
JP2007017948A (ja) * 2005-05-11 2007-01-25 Fujifilm Corp 感光性平版印刷版
JP2006343667A (ja) * 2005-06-10 2006-12-21 Fujifilm Holdings Corp 平版印刷版原版
JP2009538446A (ja) * 2006-05-26 2009-11-05 イーストマン コダック カンパニー ネガ型輻射線感光性組成物及び画像形成性材料
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WO2009054904A1 (en) * 2007-10-24 2009-04-30 Eastman Kodak Company Negative-working imageable elements and methods of use
WO2009109579A1 (en) * 2008-03-05 2009-09-11 Eastman Kodak Company Sensitizer/initiator combination for negative-working thermal-sensitive compositions usable for lithographic plates

Also Published As

Publication number Publication date
WO2012039233A1 (ja) 2012-03-29
EP2620813A1 (en) 2013-07-31
EP2620813A4 (en) 2014-05-21
US20130196268A1 (en) 2013-08-01
US8785107B2 (en) 2014-07-22
CN103109235A (zh) 2013-05-15

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