JP2011521438A5 - - Google Patents

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Publication number
JP2011521438A5
JP2011521438A5 JP2010545889A JP2010545889A JP2011521438A5 JP 2011521438 A5 JP2011521438 A5 JP 2011521438A5 JP 2010545889 A JP2010545889 A JP 2010545889A JP 2010545889 A JP2010545889 A JP 2010545889A JP 2011521438 A5 JP2011521438 A5 JP 2011521438A5
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JP
Japan
Prior art keywords
feature
pattern
polymerizable material
labyrinth
mesa
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JP2010545889A
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Japanese (ja)
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JP5216871B2 (ja
JP2011521438A (ja
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Priority claimed from US12/367,079 external-priority patent/US8361371B2/en
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Publication of JP2011521438A5 publication Critical patent/JP2011521438A5/ja
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JP2010545889A 2008-02-08 2009-02-09 インプリント・リソグラフィにおけるはみ出し低減 Active JP5216871B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US2715308P 2008-02-08 2008-02-08
US61/027,153 2008-02-08
US9409208P 2008-09-04 2008-09-04
US61/094,092 2008-09-04
US12/367,079 US8361371B2 (en) 2008-02-08 2009-02-06 Extrusion reduction in imprint lithography
US12/367,079 2009-02-06
PCT/US2009/000803 WO2009099666A1 (en) 2008-02-08 2009-02-09 Extrusion reduction in imprint lithography

Publications (3)

Publication Number Publication Date
JP2011521438A JP2011521438A (ja) 2011-07-21
JP2011521438A5 true JP2011521438A5 (cg-RX-API-DMAC7.html) 2012-03-22
JP5216871B2 JP5216871B2 (ja) 2013-06-19

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JP2010545889A Active JP5216871B2 (ja) 2008-02-08 2009-02-09 インプリント・リソグラフィにおけるはみ出し低減

Country Status (7)

Country Link
US (2) US8361371B2 (cg-RX-API-DMAC7.html)
EP (1) EP2240826A4 (cg-RX-API-DMAC7.html)
JP (1) JP5216871B2 (cg-RX-API-DMAC7.html)
KR (3) KR102171030B1 (cg-RX-API-DMAC7.html)
CN (1) CN101939704B (cg-RX-API-DMAC7.html)
TW (1) TWI430015B (cg-RX-API-DMAC7.html)
WO (1) WO2009099666A1 (cg-RX-API-DMAC7.html)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101801652B (zh) * 2007-04-23 2014-10-29 数字光学公司 微光学器件的批量制造、相应的工具、以及最终结构
JP5238742B2 (ja) * 2010-03-19 2013-07-17 株式会社東芝 加工方法および加工装置
JP5836652B2 (ja) 2011-06-10 2015-12-24 キヤノン株式会社 インプリント方法、インプリント装置及び物品の製造方法
JP5906598B2 (ja) * 2011-08-03 2016-04-20 大日本印刷株式会社 半導体インプリント用テンプレート
JP2013038117A (ja) * 2011-08-04 2013-02-21 Jx Nippon Oil & Energy Corp 微細パターンを転写するための転写ヘッド及びそれを用いた微細パターンの形成方法
JP6200135B2 (ja) * 2012-07-24 2017-09-20 キヤノン株式会社 インプリント装置、インプリント方法、および、物品製造方法
US20140205702A1 (en) * 2013-01-24 2014-07-24 Kabushiki Kaisha Toshiba Template, manufacturing method of the template, and position measuring method in the template
US20140209567A1 (en) * 2013-01-29 2014-07-31 Kabushiki Kaisha Toshiba Template, manufacturing method of the template, and strain measuring method in the template
JP5851442B2 (ja) * 2013-03-25 2016-02-03 株式会社東芝 モールド及びその製造方法
JP6361238B2 (ja) * 2013-04-23 2018-07-25 大日本印刷株式会社 インプリント用モールドおよびインプリント方法
FR3010829B1 (fr) * 2013-09-19 2017-01-27 St Microelectronics Sa Procede de realisation d'un filtre optique au sein d'un circuit integre, et circuit integre correspondant
SG11201604509UA (en) * 2013-12-10 2016-07-28 Canon Nanotechnologies Inc Imprint lithography template and method for zero-gap imprinting
KR102311479B1 (ko) * 2014-04-01 2021-10-13 다이니폰 인사츠 가부시키가이샤 임프린트용 몰드 및 임프린트 방법
JP6448469B2 (ja) * 2015-05-27 2019-01-09 東芝メモリ株式会社 テンプレートおよびパターン形成方法
US10211051B2 (en) 2015-11-13 2019-02-19 Canon Kabushiki Kaisha Method of reverse tone patterning
JP6571028B2 (ja) * 2016-03-08 2019-09-04 東芝メモリ株式会社 パターン形成方法
US10035296B2 (en) 2016-10-13 2018-07-31 Canon Kabushiki Kaisha Methods for controlling spread of imprint material
US10549313B2 (en) 2016-10-31 2020-02-04 Canon Kabushiki Kaisha Edge field imprint lithography
US10627715B2 (en) 2016-10-31 2020-04-21 Canon Kabushiki Kaisha Method for separating a nanoimprint template from a substrate
JP7027099B2 (ja) * 2017-09-29 2022-03-01 キヤノン株式会社 インプリント装置及び物品の製造方法
CN111247623B (zh) 2017-10-17 2024-03-08 佳能株式会社 压印装置和物品制造方法
JP6686090B2 (ja) * 2017-10-23 2020-04-22 キヤノン株式会社 インプリント装置及び物品の製造方法
WO2019078060A1 (ja) * 2017-10-17 2019-04-25 キヤノン株式会社 インプリント装置、及び、物品の製造方法
JP6650980B2 (ja) * 2017-10-17 2020-02-19 キヤノン株式会社 インプリント装置、及び、物品の製造方法
EP4420867B1 (en) 2017-10-17 2026-02-18 Magic Leap, Inc. Method of forming a waveguide
US10663869B2 (en) 2017-12-11 2020-05-26 Canon Kabushiki Kaisha Imprint system and imprinting process with spatially non-uniform illumination
JP7030533B2 (ja) * 2018-01-15 2022-03-07 キオクシア株式会社 インプリント装置、インプリント方法、及び半導体装置の製造方法
US11194247B2 (en) 2018-01-31 2021-12-07 Canon Kabushiki Kaisha Extrusion control by capillary force reduction
US10948818B2 (en) * 2018-03-19 2021-03-16 Applied Materials, Inc. Methods and apparatus for creating a large area imprint without a seam
US10976657B2 (en) * 2018-08-31 2021-04-13 Canon Kabushiki Kaisha System and method for illuminating edges of an imprint field with a gradient dosage
JP6593504B2 (ja) * 2018-09-05 2019-10-23 大日本印刷株式会社 インプリントモールド、インプリントモールド用ブランクス、並びにインプリントモールド用基板の製造方法及びインプリントモールドの製造方法
US11281095B2 (en) * 2018-12-05 2022-03-22 Canon Kabushiki Kaisha Frame curing template and system and method of using the frame curing template
JP2020096138A (ja) * 2018-12-14 2020-06-18 キヤノン株式会社 インプリント装置、情報処理装置及び物品の製造方法
US10901327B2 (en) * 2018-12-20 2021-01-26 Canon Kabushiki Kaisha Automatic defect analyzer for nanoimprint lithography using image analysis
JP7237646B2 (ja) * 2019-02-26 2023-03-13 キヤノン株式会社 インプリント方法、インプリント装置、および物品の製造方法
JP7267801B2 (ja) 2019-03-26 2023-05-02 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP7327973B2 (ja) * 2019-03-29 2023-08-16 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP2020179370A (ja) * 2019-04-26 2020-11-05 キヤノン株式会社 吐出材吐出装置、およびインプリント装置
US11181819B2 (en) 2019-05-31 2021-11-23 Canon Kabushiki Kaisha Frame curing method for extrusion control
US11327409B2 (en) 2019-10-23 2022-05-10 Canon Kabushiki Kaisha Systems and methods for curing an imprinted field
US11429022B2 (en) 2019-10-23 2022-08-30 Canon Kabushiki Kaisha Systems and methods for curing a shaped film
JP7379091B2 (ja) 2019-10-30 2023-11-14 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
US11366384B2 (en) 2019-12-18 2022-06-21 Canon Kabushiki Kaisha Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template
JP7433949B2 (ja) * 2020-02-06 2024-02-20 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
US11747731B2 (en) 2020-11-20 2023-09-05 Canon Kabishiki Kaisha Curing a shaped film using multiple images of a spatial light modulator

Family Cites Families (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2701765B2 (ja) * 1994-12-28 1998-01-21 日本電気株式会社 半導体装置の製造方法
EP1001311A1 (en) 1998-11-16 2000-05-17 International Business Machines Corporation Patterning device
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
SG142150A1 (en) 2000-07-16 2008-05-28 Univ Texas High-resolution overlay alignment systems for imprint lithography
KR100827741B1 (ko) 2000-07-17 2008-05-07 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 임프린트 리소그래피 공정을 위한 자동 유체 분배 방법 및시스템
US20050160011A1 (en) 2004-01-20 2005-07-21 Molecular Imprints, Inc. Method for concurrently employing differing materials to form a layer on a substrate
CN100365507C (zh) * 2000-10-12 2008-01-30 德克萨斯州大学系统董事会 用于室温下低压微刻痕和毫微刻痕光刻的模板
US6653030B2 (en) 2002-01-23 2003-11-25 Hewlett-Packard Development Company, L.P. Optical-mechanical feature fabrication during manufacture of semiconductors and other micro-devices and nano-devices that include micron and sub-micron features
US6926929B2 (en) 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6900881B2 (en) 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7442336B2 (en) 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6916584B2 (en) * 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7027156B2 (en) * 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7019656B2 (en) * 2002-08-06 2006-03-28 Kendro Laboratory Products, Inc. Empty gas supply tank pending warning
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
WO2004022338A2 (en) * 2002-09-09 2004-03-18 International Business Machines Corporation Printing method using rubber stamp
US20040065252A1 (en) 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
WO2004086471A1 (en) * 2003-03-27 2004-10-07 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization
US6777147B1 (en) * 2003-05-21 2004-08-17 International Business Machines Corporation Method for evaluating the effects of multiple exposure processes in lithography
TWI228638B (en) * 2003-06-10 2005-03-01 Ind Tech Res Inst Method for and apparatus for bonding patterned imprint to a substrate by adhering means
US7136150B2 (en) * 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US7090716B2 (en) 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US8211214B2 (en) 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US20050084804A1 (en) 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US20050098534A1 (en) 2003-11-12 2005-05-12 Molecular Imprints, Inc. Formation of conductive templates employing indium tin oxide
US20050106321A1 (en) 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
US20050189676A1 (en) 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
JP4481698B2 (ja) * 2004-03-29 2010-06-16 キヤノン株式会社 加工装置
JP2005294468A (ja) 2004-03-31 2005-10-20 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
US7140861B2 (en) 2004-04-27 2006-11-28 Molecular Imprints, Inc. Compliant hard template for UV imprinting
US20050276919A1 (en) 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method for dispensing a fluid on a substrate
DE602005022874D1 (de) 2004-06-03 2010-09-23 Molecular Imprints Inc Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
US20050270516A1 (en) 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US20070228593A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Residual Layer Thickness Measurement and Correction
US7309225B2 (en) * 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
US7547504B2 (en) 2004-09-21 2009-06-16 Molecular Imprints, Inc. Pattern reversal employing thick residual layers
US20060062922A1 (en) 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US7244386B2 (en) 2004-09-27 2007-07-17 Molecular Imprints, Inc. Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
KR20070086766A (ko) 2004-12-01 2007-08-27 몰레큘러 임프린츠 인코퍼레이티드 임프린트 리소그래피 공정용 열관리를 위한 노출 방법
US7281919B2 (en) 2004-12-07 2007-10-16 Molecular Imprints, Inc. System for controlling a volume of material on a mold
US20060177535A1 (en) 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography template to facilitate control of liquid movement
US20060177532A1 (en) 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
US7762186B2 (en) * 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US20070228608A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Preserving Filled Features when Vacuum Wiping
US20060266916A1 (en) 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy
JP4290177B2 (ja) * 2005-06-08 2009-07-01 キヤノン株式会社 モールド、アライメント方法、パターン形成装置、パターン転写装置、及びチップの製造方法
JP2007027361A (ja) * 2005-07-15 2007-02-01 Toppan Printing Co Ltd インプリント用モールド
US7316554B2 (en) 2005-09-21 2008-01-08 Molecular Imprints, Inc. System to control an atmosphere between a body and a substrate
JP2007109986A (ja) * 2005-10-14 2007-04-26 Victor Co Of Japan Ltd 微細パターンの形成方法
US7906058B2 (en) 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
US7517211B2 (en) * 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US7780893B2 (en) 2006-04-03 2010-08-24 Molecular Imprints, Inc. Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks
CN101405087A (zh) 2006-04-03 2009-04-08 分子制模股份有限公司 光刻印刷系统
US8850980B2 (en) 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography
US8142850B2 (en) 2006-04-03 2012-03-27 Molecular Imprints, Inc. Patterning a plurality of fields on a substrate to compensate for differing evaporation times
US20080303187A1 (en) 2006-12-29 2008-12-11 Molecular Imprints, Inc. Imprint Fluid Control
US20090014917A1 (en) 2007-07-10 2009-01-15 Molecular Imprints, Inc. Drop Pattern Generation for Imprint Lithography
US20090053535A1 (en) 2007-08-24 2009-02-26 Molecular Imprints, Inc. Reduced Residual Formation in Etched Multi-Layer Stacks

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