JP2010535696A5 - - Google Patents

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JP2010535696A5
JP2010535696A5 JP2010520197A JP2010520197A JP2010535696A5 JP 2010535696 A5 JP2010535696 A5 JP 2010535696A5 JP 2010520197 A JP2010520197 A JP 2010520197A JP 2010520197 A JP2010520197 A JP 2010520197A JP 2010535696 A5 JP2010535696 A5 JP 2010535696A5
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porosity
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Priority claimed from PCT/US2008/071793 external-priority patent/WO2009020835A2/en
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図6は、典型的な実施形態の概略図である。図6は、離散的な粒子を有する多孔質体が包装によって実質的に収容されている装置600を示している。種々の実施形態において、離散的な粒子は、アッシュ粒子を含んでおり、物体が、10%、30%、70%、あるいは90%を超えるアッシュ粒子を含み得る。物体610は、流体602が入り口620から出口640へと(あるいは、反対の方向に)物体610を通過できるような粒子サイズ分布を有するアッシュ粒子を含んでいる。典型的には、物体610が、物体610を収容するための充分な強度および流体602の通過を可能にする充分な浸透性の両方を有する層を備えている包装650によって収容されている。いくつかの態様においては、流体602が、重力によって物体610を通って流れる。別の態様においては、流体602を、圧力を加えることによって駆動して物体610を通過させてよい。
物体610は、1種類または数種類の粒子を含んでよい。特定の場合においては、物体610を、異なる粒子の層が(流体の流れの方向に関して)異なる地点に配置されるように、層状としてもよい。特定の場合においては、層が、入り口620から出口640へと、粗い層から細かい層へと形成される。典型的な粗い粒子は、100ミクロン超、500ミクロン超、1mm超、あるいは1cm超であってよく、典型的な細かい粒子は、100ミクロン未満、50ミクロン未満、10ミクロン未満、1ミクロン未満、あるいは100nm未満であってよい。特定の態様は、複数(2つ、3つ、5つ、あるいは10)の離散的な粒子サイズ分布を提供し、いくつかの場合においては、各々の分布を構成する層を、大きいものから小さいものへと並べることができる。特定の実施形態は、サイズが0.2〜5mmの範囲のアッシュ粒子を使用することが可能である。

Claims (22)

  1. 第1の流体を物体と反応させるためのシステムであって、
    入り口および出口を有する容器と、
    物体であって、前記第1の流体が前記入口から前記出口へ通過する間に前記物体と反応するように、30%を超えるアッシュを含み、20%を超える多孔率を有し、かつ前記容易器内に配置された物体と、を備えるシステム。
  2. 前記物体は、前記入口に流体的に連通する上流チャネルと、前記出口に流体的に連通する下流チャネルと、前記上流及び下流チャネルを隔てる壁とを含み、当該壁は50ミクロンと1000ミクロンの間の厚さを有し、40%を超える多孔率を有する、請求項1に記載のシステム。
  3. 前記多孔率は、孔サイズ中央値が2ミクロンと30ミクロンの間である孔径の分布によって特徴付けられている、請求項1又は2に記載のシステム。
  4. 前記物体は、少なくとも1kPaの剪断強さを有する、請求項1ないし3の何れかに記載のシステム。
  5. 前記多孔率は60%を超える、請求項1ないし4の何れかに記載のシステム。
  6. 前記物体は、1グラム当たり100,000平方インチを超える表面積を有する、請求項1ないし5の何れかに記載のシステム。
  7. 前記物体は、70%を超えるアッシュを含む、請求項1ないし6の何れかに記載のシステム。
  8. 前記物体は、異なる多孔率を有する2以上の領域を含んでいる、請求項1ないし7の何れかに記載のシステム。
  9. 多孔質体を製造する方法であって、
    1以上のアッシュ源と1以上の一過性相とを選択することと、
    選択された前記1以上のアッシュ源と前記1以上の一過性相とを形成物体へ形成することと、
    前記形成物体から前記1以上の一過性相を除去することにより、30%を超える前記1以上のアッシュ源を含み、40%を超える多孔率を有する最終物体を得ることと、を備える、製造方法。
  10. 前記形成物体へ形成することは、前記物体内にセメント質の結合を形成することを含み、前記1以上の一過性相を除去することは、前記形成物体を800度Cを超える温度で焼成することを含む、請求項9に記載の製造方法。
  11. 前記1以上の一過性相は、氷を含む請求項9又は10に記載の製造方法。
  12. 前記選択することは、前記1以上のアッシュ源を作り出した燃焼過程に伴う残留の炭素質の種を含む一過性相を含む少なくとも1つのアッシュ源を選択することを含み、
    前記除去することは、前記形成物体を焼成することにより前記炭素質の種を焼損させることを含む、請求項9ないし11の何れかに記載の製造方法。
  13. 前記選択することは、第1の平均粒子サイズを有する第1のアッシュ源と、第2の平均粒子サイズを有する第2のアッシュ源と、を選択することを含み、前記第2の平均粒子サイズは、前記第1の平均粒子サイズの5%と25%の間にあり、前記物体は、前記第1及び第2アッシュ源を含む、請求項9ないし12の何れかに記載の製造方法。
  14. 前記1以上のアッシュ源の少なくとも1つは、4.6ミクロン以下であるD90によって特徴付けられている、請求項9ないし13の何れかに記載の製造方法。
  15. 前記1以上のアッシュ源の少なくとも1つは、10%を超える強熱減量(LOI)によって特徴付けられている、請求項9ないし14の何れかに記載の製造方法。
  16. 前記1以上のアッシュ源の少なくとも1つは、30%を超える強熱減量(LOI)によって特徴付けられている、請求項9ないし15の何れかに記載の製造方法。
  17. 第1の流体中の物質を反応させる方法であって、
    入口および出口を有する容器と、
    前記入口と前記出口の間に配置された物体であって、前記物質が前記入口から前記出口へ通過する間に前記物体と反応するように、30%を超えるアッシュ含み、20%を超える多孔率を有する物体と、を含むシステムを準備することと、
    前記物質が前記物体と反応する流量で、前記入口から前記物体を経由して前記出口へ前記第1の流体を流すことと、を備える方法。
  18. 前記第1の流体が通過する間に、当該第1の流体に電気化学的勾配を印可することを、さらに備える請求項17に記載の方法。
  19. 前記容器は、アッシュの不連続な粒子を収容するように構成されており、
    前記物体は、不連続な粒子を含んでおり、
    前記物体は、70%を超えるアッシュ粒子を含んでおり、
    前記アッシュ粒子は、98ミクロン以下であるD90によって特徴付けられている、請求項17又は18に記載の方法。
  20. 前記入口は前記容器の底にあり、
    前記物体は、前記第1の流体が前記入口から前記出口を通過するときに、流動床として振る舞う、請求項17ないし19の何れかに記載の方法。
  21. 前記物体の少なくとも一部は、複数の層を成す、請求項17ないし20の何れかに記載の方法。
  22. 前記第1の流体は水を含み、前記物質は炭素の酸化物を含み、前記物体は、1グラム当たり10,000平方インチを超える表面積を有する、請求項17ないし21の何れかに記載の方法。
JP2010520197A 2007-08-03 2008-07-31 多孔質体および方法 Pending JP2010535696A (ja)

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US96308807P 2007-08-03 2007-08-03
PCT/US2008/071793 WO2009020835A2 (en) 2007-08-03 2008-07-31 Porous bodies and methods

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EP (1) EP2180933A4 (ja)
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CN (1) CN101827638B (ja)
AU (1) AU2008284107B2 (ja)
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