JP2010524257A5 - - Google Patents
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- Publication number
- JP2010524257A5 JP2010524257A5 JP2010503061A JP2010503061A JP2010524257A5 JP 2010524257 A5 JP2010524257 A5 JP 2010524257A5 JP 2010503061 A JP2010503061 A JP 2010503061A JP 2010503061 A JP2010503061 A JP 2010503061A JP 2010524257 A5 JP2010524257 A5 JP 2010524257A5
- Authority
- JP
- Japan
- Prior art keywords
- composition
- mol
- glass frit
- silver powder
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 claims description 28
- 239000011521 glass Substances 0.000 claims description 16
- 239000004065 semiconductor Substances 0.000 claims description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 3
- 238000010304 firing Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 239000000843 powder Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/786,717 US7731868B2 (en) | 2007-04-12 | 2007-04-12 | Thick film conductive composition and process for use in the manufacture of semiconductor device |
| PCT/US2008/004657 WO2008127624A1 (en) | 2007-04-12 | 2008-04-09 | Thick film conductive composition and processes for use in the manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010524257A JP2010524257A (ja) | 2010-07-15 |
| JP2010524257A5 true JP2010524257A5 (enExample) | 2011-05-19 |
Family
ID=39573723
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010503061A Pending JP2010524257A (ja) | 2007-04-12 | 2008-04-09 | 厚膜伝導性組成物、および半導体デバイスの製造における使用方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7731868B2 (enExample) |
| EP (1) | EP2135294B1 (enExample) |
| JP (1) | JP2010524257A (enExample) |
| KR (1) | KR101086183B1 (enExample) |
| CN (1) | CN101641796B (enExample) |
| AT (1) | ATE481737T1 (enExample) |
| DE (1) | DE602008002574D1 (enExample) |
| WO (1) | WO2008127624A1 (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0307547D0 (en) * | 2003-04-01 | 2003-05-07 | Du Pont | Conductor composition V |
| US8383011B2 (en) * | 2008-01-30 | 2013-02-26 | Basf Se | Conductive inks with metallo-organic modifiers |
| DE102008036837A1 (de) | 2008-08-07 | 2010-02-18 | Epcos Ag | Sensorvorrichtung und Verfahren zur Herstellung |
| DE102008037613A1 (de) * | 2008-11-28 | 2010-06-02 | Schott Solar Ag | Verfahren zur Herstellung eines Metallkontakts |
| TW201025622A (en) * | 2008-12-17 | 2010-07-01 | Ind Tech Res Inst | Electrode for solar cell and fabricating method thereof |
| JP5293348B2 (ja) * | 2009-03-31 | 2013-09-18 | 三菱マテリアル株式会社 | 導電性組成物及びそれを用いた太陽電池の製造方法並びに太陽電池 |
| WO2010124161A1 (en) * | 2009-04-23 | 2010-10-28 | E. I. Du Pont De Nemours And Company | Metal pastes and use thereof in the production of positive electrodes on p-type silicon surfaces |
| TW201043359A (en) * | 2009-05-01 | 2010-12-16 | Du Pont | Silver particles and a process for making them |
| TW201100185A (en) * | 2009-05-01 | 2011-01-01 | Du Pont | Silver particles and a process for making them |
| EP2432839A1 (en) * | 2009-05-20 | 2012-03-28 | E. I. Du Pont De Nemours And Company | Phase change ink composition |
| KR101144810B1 (ko) * | 2009-07-06 | 2012-05-11 | 엘지전자 주식회사 | 태양전지용 전극 페이스트, 이를 이용한 태양전지, 및 태양전지의 제조방법 |
| WO2011016594A1 (ko) * | 2009-08-07 | 2011-02-10 | 주식회사 엘지화학 | 실리콘 태양전지 제조용 납 프리 유리 프릿 분말 및 그 제조방법과 이를 포함하는 금속 페이스트 조성물 및 실리콘 태양전지 |
| US20110048527A1 (en) * | 2009-08-25 | 2011-03-03 | E.I. Du Pont De Nemours And Company | Silver thick film paste compositions and their use in conductors for photovoltaic cells |
| JP2011144726A (ja) | 2010-01-13 | 2011-07-28 | Suzuki Motor Corp | 内燃機関の制御装置 |
| JP4868079B1 (ja) * | 2010-01-25 | 2012-02-01 | 日立化成工業株式会社 | ｎ型拡散層形成組成物、ｎ型拡散層の製造方法、及び太陽電池セルの製造方法 |
| JP5540811B2 (ja) * | 2010-03-24 | 2014-07-02 | 三菱マテリアル株式会社 | 導電性組成物及びそれを用いた太陽電池の製造方法並びに太陽電池 |
| JP5540810B2 (ja) * | 2010-03-24 | 2014-07-02 | 三菱マテリアル株式会社 | 導電性組成物及びそれを用いた太陽電池の製造方法並びに太陽電池 |
| TWI498308B (zh) * | 2010-05-04 | 2015-09-01 | 杜邦股份有限公司 | 含有鉛-碲-鋰-鈦-氧化物之厚膜膏及其在半導體裝置之製造中的用途 |
| US8366799B2 (en) | 2010-08-30 | 2013-02-05 | E I Du Pont De Nemours And Company | Silver particles and a process for making them |
| KR101199194B1 (ko) | 2010-10-28 | 2012-11-07 | 엘지이노텍 주식회사 | 태양 전지의 전면 전극용 페이스트 조성물 및 태양 전지 |
| KR101428131B1 (ko) * | 2010-10-28 | 2014-08-07 | 엘지이노텍 주식회사 | 전도성 페이스트 조성물 |
| US8574338B2 (en) | 2010-11-17 | 2013-11-05 | E I Du Pont De Nemours And Company | Reactor and continuous process for producing silver powders |
| US9039942B2 (en) | 2011-12-21 | 2015-05-26 | E I Du Pont De Nemours And Company | Lead-free conductive paste composition and semiconductor devices made therewith |
| EP2607327A1 (en) * | 2011-12-23 | 2013-06-26 | Heraeus Precious Metals GmbH & Co. KG | Thick-film composition containing antimony oxides and their use in the manufacture of semi-conductor devices |
| US9240515B2 (en) | 2013-11-25 | 2016-01-19 | E I Du Pont De Nemours And Company | Method of manufacturing a solar cell |
| CN105321594B (zh) * | 2015-02-26 | 2017-04-26 | 深圳市春仰科技有限公司 | 一种硅太阳能电池正面银浆及其制备方法 |
| US10056508B2 (en) | 2015-03-27 | 2018-08-21 | Heraeus Deutschland GmbH & Co. KG | Electro-conductive pastes comprising a metal compound |
| CN107408418A (zh) | 2015-03-27 | 2017-11-28 | 贺利氏德国有限责任两合公司 | 包含氧化物添加剂的导电浆料 |
| JP6624930B2 (ja) | 2015-12-26 | 2019-12-25 | 日亜化学工業株式会社 | 発光素子及びその製造方法 |
| JP6683003B2 (ja) | 2016-05-11 | 2020-04-15 | 日亜化学工業株式会社 | 半導体素子、半導体装置及び半導体素子の製造方法 |
| JP6720747B2 (ja) | 2016-07-19 | 2020-07-08 | 日亜化学工業株式会社 | 半導体装置、基台及びそれらの製造方法 |
| CN107068238A (zh) * | 2016-12-09 | 2017-08-18 | 东莞珂洛赫慕电子材料科技有限公司 | 一种铝合金基板用厚膜电路中温烧结全银电极浆料及其制备方法 |
| CN107274959A (zh) * | 2017-05-03 | 2017-10-20 | 陶志斌 | 无机导电端头膜及其制备方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4256513A (en) | 1978-10-19 | 1981-03-17 | Matsushita Electric Industrial Co., Ltd. | Photoelectric conversion device |
| JPS6249676A (ja) | 1985-08-29 | 1987-03-04 | Sharp Corp | 太陽電池 |
| EP0234338A1 (de) * | 1986-02-13 | 1987-09-02 | W.C. Heraeus GmbH | Ein Antrag gemäss Regel 88 EPÜ auf Berichtigung der Beschreibungsseite 22, Zeile 3 liegt vor. Über diesen Antrag wird im Laufe des Verfahrens von der Prüfungsabteilung eine Entscheidung getroffen werden |
| JP3152065B2 (ja) * | 1994-06-20 | 2001-04-03 | 株式会社村田製作所 | 導電性ペーストおよび積層セラミックコンデンサ |
| JP3209089B2 (ja) * | 1996-05-09 | 2001-09-17 | 昭栄化学工業株式会社 | 導電性ペースト |
| JP2001118425A (ja) * | 1999-10-21 | 2001-04-27 | Murata Mfg Co Ltd | 導電性ペースト |
| JP2001243836A (ja) | 1999-12-21 | 2001-09-07 | Murata Mfg Co Ltd | 導電性ペースト及びそれを用いた印刷配線板 |
| JP2001313400A (ja) * | 2000-04-28 | 2001-11-09 | Kyocera Corp | 太陽電池素子の形成方法 |
| JP2003077336A (ja) * | 2001-08-30 | 2003-03-14 | Kyocera Corp | 導電性ペースト及びこれを用いた積層セラミックコンデンサ |
| JP4103672B2 (ja) * | 2003-04-28 | 2008-06-18 | 株式会社村田製作所 | 導電性ペーストおよびガラス回路構造物 |
| JP2005019185A (ja) * | 2003-06-26 | 2005-01-20 | Murata Mfg Co Ltd | 銅導電性ペーストおよび積層セラミック電子部品 |
| JP4432604B2 (ja) * | 2004-04-30 | 2010-03-17 | 昭栄化学工業株式会社 | 導電性ペースト |
| JP5060722B2 (ja) * | 2004-11-10 | 2012-10-31 | 日立粉末冶金株式会社 | 電子放出源形成用組成物及び電子放出源用被膜の形成方法 |
| CN1881482A (zh) * | 2005-03-09 | 2006-12-20 | E.I.内穆尔杜邦公司 | 黑导电厚膜组合物,黑电极及其制造方法 |
| US7435361B2 (en) * | 2005-04-14 | 2008-10-14 | E.I. Du Pont De Nemours And Company | Conductive compositions and processes for use in the manufacture of semiconductor devices |
| US7326367B2 (en) | 2005-04-25 | 2008-02-05 | E.I. Du Pont De Nemours And Company | Thick film conductor paste compositions for LTCC tape in microwave applications |
| US8093491B2 (en) | 2005-06-03 | 2012-01-10 | Ferro Corporation | Lead free solar cell contacts |
| EP1993144A4 (en) * | 2006-03-07 | 2011-05-11 | Murata Manufacturing Co | CONDUCTIVE PASTE AND SOLAR CELL |
-
2007
- 2007-04-12 US US11/786,717 patent/US7731868B2/en not_active Expired - Fee Related
-
2008
- 2008-04-09 KR KR1020097023499A patent/KR101086183B1/ko not_active Expired - Fee Related
- 2008-04-09 JP JP2010503061A patent/JP2010524257A/ja active Pending
- 2008-04-09 EP EP08742744A patent/EP2135294B1/en not_active Not-in-force
- 2008-04-09 AT AT08742744T patent/ATE481737T1/de not_active IP Right Cessation
- 2008-04-09 DE DE602008002574T patent/DE602008002574D1/de active Active
- 2008-04-09 CN CN2008800093140A patent/CN101641796B/zh not_active Expired - Fee Related
- 2008-04-09 WO PCT/US2008/004657 patent/WO2008127624A1/en not_active Ceased
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