JP2010518645A5 - - Google Patents

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JP2010518645A5
JP2010518645A5 JP2009549656A JP2009549656A JP2010518645A5 JP 2010518645 A5 JP2010518645 A5 JP 2010518645A5 JP 2009549656 A JP2009549656 A JP 2009549656A JP 2009549656 A JP2009549656 A JP 2009549656A JP 2010518645 A5 JP2010518645 A5 JP 2010518645A5
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Japan
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atomic layer
strontium
layer deposition
titanium
oxide atomic
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JP2009549656A
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JP2010518645A (ja
JP5029927B2 (ja
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Priority claimed from US11/705,992 external-priority patent/US7892964B2/en
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JP2009549656A 2007-02-14 2008-01-25 基板上に金属含有層を形成するための蒸着法 Active JP5029927B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/705,992 2007-02-14
US11/705,992 US7892964B2 (en) 2007-02-14 2007-02-14 Vapor deposition methods for forming a metal-containing layer on a substrate
PCT/US2008/052035 WO2008100691A2 (en) 2007-02-14 2008-01-25 Vapor deposition methods for forming a metal- containing layer on a substrate

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JP2010518645A JP2010518645A (ja) 2010-05-27
JP2010518645A5 true JP2010518645A5 (enExample) 2011-03-10
JP5029927B2 JP5029927B2 (ja) 2012-09-19

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JP2009549656A Active JP5029927B2 (ja) 2007-02-14 2008-01-25 基板上に金属含有層を形成するための蒸着法

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US (2) US7892964B2 (enExample)
JP (1) JP5029927B2 (enExample)
KR (1) KR101179774B1 (enExample)
CN (1) CN101595244B (enExample)
TW (1) TWI410519B (enExample)
WO (1) WO2008100691A2 (enExample)

Families Citing this family (259)

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