JP2009522405A5 - - Google Patents

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JP2009522405A5
JP2009522405A5 JP2008548584A JP2008548584A JP2009522405A5 JP 2009522405 A5 JP2009522405 A5 JP 2009522405A5 JP 2008548584 A JP2008548584 A JP 2008548584A JP 2008548584 A JP2008548584 A JP 2008548584A JP 2009522405 A5 JP2009522405 A5 JP 2009522405A5
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group
porous base
base substrate
substrate
solution
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JP2008548584A
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JP2009522405A (ja
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Priority claimed from PCT/US2006/047992 external-priority patent/WO2007078880A1/en
Publication of JP2009522405A publication Critical patent/JP2009522405A/ja
Publication of JP2009522405A5 publication Critical patent/JP2009522405A5/ja
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Claims (2)

  1. 官能化基材を作製する方法であって、
    間隙及び外側表面を有する多孔質ベース基材を提供する工程と、
    前記多孔質ベース基材が第一溶液を吸収し、吸収多孔質ベース基材を形成する工程であって、前記第一溶液が、（ａ）フリーラジカル重合性基及び（ｂ）エチレン性不飽和基、エポキシ基、アズラクトン基、イオン基、アルキレンオキシド基又はその組合せを含む追加の官能基を有する少なくとも１個のグラフト化モノマーを含む工程と、
    前記多孔質ベース基材の表面に結合されるグラフト種を含む第一官能化基材を形成するように前記吸収多孔質ベース基材を調整された量の電子ビーム照射に曝露する工程であって、前記グラフト種の少なくとも１つが前記追加の官能基を有する工程とを含む方法。
  2. 官能化基材を作製する方法であって、
    間隙及び外側表面を有する多孔質ベース基材を提供する工程と、
    前記多孔質ベース基材が第一溶液を吸収し、吸収多孔質ベース基材を形成する工程であって、前記第一溶液が、（ａ）フリーラジカル重合性基及び（ｂ）エチレン性不飽和基、エポキシ基、アズラクトン基、イオン基、アルキレンオキシド基又はその組合せを含む追加の官能基を有する少なくとも１つのグラフト化モノマーを含む工程と、
    前記吸収多孔質ベース基材を、取り除き可能なキャリヤー層と取り除き可能なカバー層の間に位置決めし、多層構造体を形成する工程と、
    前記取り除き可能なキャリヤー層と前記取り除き可能なカバー層の間に位置決めされる官能化基材を形成するように前記多層構造体を調整された量の電子ビーム照射に暴露する工程であって、前記官能化基材が、前記多孔質ベース基材の表面に結合されるグラフト種を含み、前記グラフト種の少なくとも１個が、前記追加の基を含む工程と、
    前記キャリヤー層と前記カバー層を前記多層構造体から取り除く工程とを含む方法。
JP2008548584A 2005-12-30 2006-12-15 官能化基材を作製する方法 Withdrawn JP2009522405A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US75524405P 2005-12-30 2005-12-30
US75526705P 2005-12-30 2005-12-30
PCT/US2006/047992 WO2007078880A1 (en) 2005-12-30 2006-12-15 Method of making functionalized substrates

Publications (2)

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JP2009522405A JP2009522405A (ja) 2009-06-11
JP2009522405A5 true JP2009522405A5 (ja) 2009-11-26

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JP2008548583A Expired - Fee Related JP5290767B2 (ja) 2005-12-30 2006-12-15 官能化基材
JP2008548584A Withdrawn JP2009522405A (ja) 2005-12-30 2006-12-15 官能化基材を作製する方法

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JP2008548583A Expired - Fee Related JP5290767B2 (ja) 2005-12-30 2006-12-15 官能化基材

Country Status (7)

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US (3) US7553417B2 (ja)
EP (2) EP1968792B1 (ja)
JP (2) JP5290767B2 (ja)
KR (2) KR20080078860A (ja)
CN (2) CN101351338B (ja)
BR (2) BRPI0620798A2 (ja)
WO (2) WO2007078880A1 (ja)

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