JP2009177104A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP2009177104A JP2009177104A JP2008028839A JP2008028839A JP2009177104A JP 2009177104 A JP2009177104 A JP 2009177104A JP 2008028839 A JP2008028839 A JP 2008028839A JP 2008028839 A JP2008028839 A JP 2008028839A JP 2009177104 A JP2009177104 A JP 2009177104A
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- Prior art keywords
- layer
- semiconductor device
- wire
- electrode pad
- cual
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
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- H01L24/02—Bonding areas ; Manufacturing methods related thereto
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Abstract
【解決手段】半導体装置100は、半導体チップ102、半導体チップ102に設けられ、Alを主成分としCuをさらに含むAlCuパッド107、および、半導体チップ102の外部に設けられたインナーリード117と半導体チップ102とを接続するとともに、Cuを主として含む接続部材であるCuPワイヤ111を備え、実質的にハロゲンを含まない封止樹脂115により封止されている。AlCuパッド107とCuPワイヤ111の接続領域に、AlとCu組成比が異なる複数の合金層が設けられ、合金層が、CuAl2層と、CuAl2層とCuPワイヤ111との間に設けられるとともにCuAl2層よりもAl組成比が相対的に低い層とを含む。
【選択図】図1
Description
また、同文献には、樹脂封止型半導体装置を200℃以上の高温に放置すると、AuワイヤとAl電極パッドの接合部に剥離が生じ接続不良が生じること、および、同様の現象が、Auワイヤの場合だけでなく、銅(Cu)ワイヤとAl電極との間にも発生することが記載されている。
また、この現象には、熱劣化によって封止樹脂中に発生する遊離性ハロゲン値が関係すること、また、難燃化剤として使用する臭素化エポキシ樹脂を高純度化し、熱分解によって発生する遊離性臭素化合物を低減することにより、改善可能であることが記載されている。
半導体チップと、
前記半導体チップに設けられ、Alを主成分としCuをさらに含む電極パッドと、
前記半導体チップの外部に設けられた接続端子と前記半導体チップとを接続するとともに、Cuを主として含む接続部材と、
を備え、
前記接続部材と前記電極パッドとの接続領域に、AlとCuの組成比が異なる複数のCuおよびAlの合金層が設けられ、
前記CuおよびAlの合金層が、
CuAl2層と、
前記CuAl2層と前記接続部材との間に設けられるとともに前記CuAl2層よりもAl組成比が相対的に低い層と、
を含み、
前記電極パッドと前記接続部材とが、実質的にハロゲンを含まない封止樹脂により封止された、半導体装置が提供される。
また、接続部材の材料をAuとした場合に比べて、電気的特性を向上させ、また、製造コストを大幅に低減することができる。
また、ボンディングワイヤ以外の接続部材を用いた場合にも、接続部材と電極パッドとの接合領域における不良の発生を抑制できる。
また、本明細書において、接続部材がCuを主として含むとは、たとえば接続部材全体に対してCuを50重量%以上含むことをいう。
具体的には、複数の半導体装置200を作製し、175℃で2350時間保存した。保存後、半導体装置200を常温まで冷却して、Alパッド207とCuボール213との接合部分のSEM(走査型電子顕微鏡)観察を行った。また、保存中に、一部の半導体装置200を取り出して常温まで冷却し、接合部分の様子を観察した。
これを高温で保存すると、接合部における相互拡散により、Cuワイヤ211側からAlパッド207側に向かってCuリッチな層からAlリッチな層となる複数の合金層が形成され、Cu側すなわちCuボール213の底部にCu3Al2が生成する(図6(b))。また、封止樹脂215中の臭素化エポキシ樹脂に由来する臭素イオン(Br-)がCuボール213の外周部から接合部に入り込む(図7(a))。Cu3Al2は、入り込んだBr-による腐食を受け、臭化アルミニウムAlBr3が形成される(図7(b))。AlBr3が形成されることにより、合金層中のCuが押し出される結果、AlBr3の内部にCuが孤立して残存する領域が形成される(図8(a))。AlBr3は、高抵抗であるため、この高抵抗層の形成によりオープン不良が生じる原因となる(図8(b))。また、AlBr3は、融点が97.5℃と低いため、常温では体積が減少し、AlBr3層からボイドまたはクラックが生じる原因となる。
そこで、以下、AlBr3の形成反応の進行およびそれに伴う不良の発生が抑制される装置構成の例を説明する。
図1は、本実施形態の半導体装置の構成を示す断面図である。また、図2は、図1の半導体装置100の電極パッドとボンディングワイヤとが接合された領域の周辺の構成を拡大して示す断面図である。
また、CuPワイヤ111中のPの含有量は、たとえば0.03重量%以下とする。こうすることにより、ワイヤの導電性をさらに向上させることができる。CuPのさらに具体的な組成としては、Cu濃度が99.97重量%、P濃度が0.03重量%(300ppm)であるCuPからなる態様が挙げられる。
図2に示したように、断面視において、CuPボール113に、該ボールの中心から外側に向かってボールの厚さが増加する肩部131が設けられている。
肩部131と水平面とのなす角は、たとえば4度以上8度以下である。この角が小さすぎると、接合時に、CuPワイヤ111をキャピラリで支持することが困難になる懸念がある。また、この角が大きすぎると、一つのCuPワイヤ111がボンディングされる2箇所のボンディング箇所のうち、2箇所目をボンディングする際に、キャピラリがCuPワイヤ111にめり込んでしまい、CuPワイヤ111が損傷する懸念がある。
また、AlCuパッド107との接合部において、CuPボール113の底面はたとえば平坦面となっている。
AlCuパッド107全体に対するAlの割合は、たとえば50.0重量%以上99.9重量%以下であり、Cuの割合がたとえば0.1重量%以上10.0重量%以下である。電極パッドの硬さを増し、ワイヤボンディング時の電極パッドの損傷を抑制する観点では、Cuの割合をたとえば0.1重量%以上、好ましくは0.2重量%以上とする。また、膜応力の増加を抑制する観点では、Cuの割合をたとえば10.0重量%以下、好ましくは5.0重量%以下、さらに好ましくは3.0重量%以下とする。
なお、AlCuパッド107がAlおよびCuからなる場合、AlCuパッド107全体に対するAlの割合は、さらに具体的には90.0重量%以上99.9重量%以下である。
また、AlとCuとの合金層の面積が、AlCuパッド107とCuPワイヤ111との接続部分の面積の50%以上を占める。
このように、CuAl合金層105は、たとえばCuとAlの金属間化合物から構成された層であり、たとえばCuAl2層を含む。また、CuAl合金層105が、さらにCuAl層と、Cu9Al4層またはCu3Al2層とを含んでもよい。
また、封止樹脂115中の樹脂は、分子骨格中にハロゲン基を実質的に含まない高分子化合物からなる。たとえば封止樹脂115中の樹脂は、分子骨格中にBr基を実質的に含まない高分子化合物からなる。封止樹脂115は、一種類の樹脂を含んでもよいし、複数種類の樹脂を含んでいてもよい。
さらに、封止樹脂115は、樹脂以外の成分、たとえば難燃剤等の添加剤中にもハロゲン化物を含まない。
樹脂組成物全体に対して溶融球状シリカ等の充填剤をたとえば80重量%以上、好ましくは85重量%以上含む高フィラー充填樹脂組成物;ならびに
フェノール系樹脂、エポキシ樹脂等の難燃性骨格を有する高分子化合物を含む樹脂組成物;
が挙げられる。これらは単独で用いてもよいし、複数組み合わせて用いてもよい。
フェノールビフェニレンアラルキル型樹脂、フェノールフェニレンアラルキル型樹脂、フェノールジフェニルエーテルアラルキル型樹脂等のフェノールアラルキル型樹脂;
ビスフェノールフルオレン含有フェノールノボラック型樹脂;
ビスフェノールS含有フェノールノボラック型樹脂;
ビスフェノールF含有フェノールノボラック型樹脂;
ビスフェノールA含有フェノールノボラック型樹脂;
ナフタレン含有フェノールノボラック型樹脂;
アントラセン含有フェノールノボラック型樹脂;
フルオレン含有フェノールノボラック型樹脂;および
縮合多環芳香族型フェノール系樹脂;
が挙げられる。これらは単独で用いてもよいし、複数組み合わせて用いてもよい。
フェノールビフェニレンアラルキル型エポキシ樹脂、フェノールフェニレンアラルキル型エポキシ樹脂、フェノールジフェニルエーテルアラルキル型エポキシ樹脂等のフェノールアラルキル型エポキシ樹脂;
ビスフェノールフルオレン含有ノボラック型エポキシ樹脂;
ビスフェノールS含有ノボラック型エポキシ樹脂;
ビスフェノールF含有ノボラック型エポキシ樹脂;
ビスフェノールA含有ノボラック型エポキシ樹脂;
ナフタレン含有ノボラック型エポキシ樹脂;
アントラセン含有ノボラック型エポキシ樹脂;
フルオレン含有ノボラック型エポキシ樹脂;および
縮合多環芳香族型エポキシ樹脂;
が挙げられる。これらは単独で用いてもよいし、複数組み合わせて用いてもよい。
まず、シリコン基板101上に、配線層および層間絶縁膜等が積層した多層膜103を形成する。次に、多層膜103上の所定の位置にAlCuパッド107をスパッタリング法により形成する。AlCuパッド107の膜厚は、たとえば2.5μm以上とする。つづいて、塗布法により、AlCuパッド107を覆うようにポリイミド膜109を形成する。つづいて、ポリイミド膜109をパターニングして開口部を設け、AlCuパッド107の一部を露出させる。こうして、半導体チップ102が得られる。
ステップ11:CuPワイヤ111の先端に所定の径のCuPボール113を形成する、
ステップ12:CuPボール113をAlCuパッド107上面に対して実質的に垂直に降下させる、
ステップ13:CuPボール113がAlCuパッド107に接触した後、CuPボール113に付加する荷重をステップ12より減らし、超音波振動を与える。
図1および図2に示した半導体装置100においては、AlCuパッド107にCuPワイヤ111が接合され、接合部分に、AlCuパッド107側からCuPボール113側に向かってCuAl2層およびCuAl2層よりもAl組成比が相対的に低い層がこの順に形成されている。このため、接合初期に接合領域に合金層が安定的に形成され、高温動作時の合金層の過度の成長が抑制されるとともに、高温動作時の接続信頼性に優れた構成となっている。この効果は、CuAl合金層105が組成の異なる3つ以上の層を含み、AlCuパッド107側からCuPボール113側に向かってAl組成比が減少するようにこれらの層が配置された構成において顕著に発揮される。
また、半導体装置100は、動作温度が向上した構成となっている。また、半導体装置100においては、高温動作時などに接合領域の一部にクラックが生じた場合にも、クラックの伝播によりオープン不良が生じることを抑制できる。
(第二の実施形態)
第一の実施形態においては、電極パッドとインナーリードとがボンディングワイヤにより接続される構成の場合を例に説明したが、一方が電極パッドに接続されたボンディングワイヤの他端に接続される外部接続用端子の構成は、インナーリードである場合には限られず、他の部材とすることもできる。たとえば、半導体チップの電極パッドからプリント配線基板上に設けられた配線にワイヤボンディングされていてもよい。
また、以上の実施形態において、AlCuパッド107の下層をなすバリア層をさらに設けてもよい。バリア層の具体例としては、TiN層、TiN層(パッド側)/Ti層(基板側)、WSi層、MoSi層、TiSi層が挙げられる。
本実施例では、AlおよびCuを含む電極パッド(AlCuパッド)に、CuおよびPを含むワイヤ(CuPワイヤ)を接合し、高温保存した際の接合部の構造を解析した。電極パッドおよびワイヤの組成、ボンディング条件ならびに高温保存条件を以下に示す。
電極パッド:Al99.5重量%、Cu0.5重量%
ワイヤ:Cu99.9重量%、P0.1重量%、直径50μm
ボンディング条件:200℃、荷重100〜600g
保存条件:175℃、1000時間
A層:AlOx
B層:Cu9Al4またはCu3Al2
C層:CuAl
D層:CuAl2
本実施例では、CuPワイヤとともに用いる電極パッドの材料が接合初期の合金層の形成状態に与える影響を評価した。
ワイヤとして、実施例1で用いた組成のCuPワイヤを用いた。また、電極パッドとして、実施例1で用いた組成のAlCuパッドまたはAlSiパッド(Al99重量%、Si1重量%)を用いた。
図12(a)より、AlSiパッドを用いた試料では、接合直後において、接合領域内に合金層が充分に形成されていない領域が存在する。これに対し、AlCuパッドを用いた試料では、図12(b)より、接合領域全体に合金層が形成されている。
本実施例では、CuPワイヤとともに用いる電極パッドの材料が接合部の構造および高温保存耐性に与える影響を評価した。
ワイヤとして、実施例1で用いた組成のCuPワイヤを用い、電極パッド材料の異なる以下の試料を作製した。
試料1:AlSiCuパッド(Al98.5重量%、Si1重量%、Cu0.5重量%)
試料2:AlCuパッド(Al99.5重量%、Cu0.5重量%)
試料3:AlSiパッド(Al99重量%、Si1重量%)
図15〜図17より、Brを含む樹脂を用いた場合、接合部中にBr腐食層(AlBr3層)が形成されていることがわかる。また、CuとAlの合金からCuが押し出されてAlBr3層中に残存している。
本実施例では、封止樹脂材料の影響を評価した。電極パッドおよびワイヤとして、いずれも実施例1で前述したAlCuパッドおよびCuPワイヤを用いた。ワイヤを電極パッドに接合した後、Br入り樹脂またはBrフリー樹脂で封止して、175℃で700時間保存した。
図18(a)および図18(b)より、Br入り樹脂で封止した試料においては、接合領域中に腐食部が形成されているのに対し、Brフリー樹脂で封止した試料では、腐食が生じていないことがわかる。
101 シリコン基板
102 半導体チップ
103 多層膜
105 CuAl合金層
107 AlCuパッド
109 ポリイミド膜
110 半導体装置
111 CuPワイヤ
113 CuPボール
115 封止樹脂
117 インナーリード
119 リードフレーム
121 リードフレーム
123 プリント配線基板
125 配線
127 バンプ
129 BGA基板
131 肩部
Claims (9)
- 半導体チップと、
前記半導体チップに設けられ、Alを主成分としCuをさらに含む電極パッドと、
前記半導体チップの外部に設けられた接続端子と前記半導体チップとを接続するとともに、Cuを主として含む接続部材と、
を備え、
前記接続部材と前記電極パッドとの接続領域に、AlとCuの組成比が異なる複数のCuおよびAlの合金層が設けられ、
前記CuおよびAlの合金層が、
CuAl2層と、
前記CuAl2層と前記接続部材との間に設けられるとともに前記CuAl2層よりもAl組成比が相対的に低い層と、
を含み、
前記電極パッドと前記接続部材とが、実質的にハロゲンを含まない封止樹脂により封止された、半導体装置。 - 請求項1に記載の半導体装置において、CuAl2層よりもAl組成比の低い前記層が、
CuとAlの組成物が1:1のCuAl層と、
前記CuAl層と前記接続部材との間に設けられるとともに前記CuAl層よりもAl組成比が相対的に低い層と、
を含む、半導体装置。 - 請求項1または2に記載の半導体装置において、前記電極パッド全体に対するAlの割合が50.0重量%以上99.9重量%以下であり、前記電極パッド全体に対するCuの割合が0.1重量%以上5.0重量%以下である、半導体装置。
- 請求項1乃至3いずれかに記載の半導体装置において、前記電極パッドが、構成元素としてさらにSiを含む、半導体装置。
- 請求項1乃至4いずれかに記載の半導体装置において、前記接続部材が、構成元素としてさらにPを含む、半導体装置。
- 請求項1乃至5いずれかに記載の半導体装置において、前記封止樹脂中の樹脂が、分子骨格中にBr基を実質的に含まない高分子化合物からなる、半導体装置。
- 請求項1乃至6いずれかに記載の半導体装置において、前記封止樹脂が、金属水和物を含む、半導体装置。
- 請求項1乃至7いずれかに記載の半導体装置において、前記接続部材が接続された領域における前記電極パッドの厚さが、前記接続部材が接続されていない領域における前記電極パッドの厚さの1/4以上である、半導体装置。
- 請求項1乃至8いずれかに記載の半導体装置において、
前記接続部材がワイヤであって、
前記電極パッドとの接合部において前記ワイヤにボールが形成されており、
断面視において、前記ボールに、該ボールの中心から外側に向かって前記ボールの厚さが増加する肩部が設けられた、半導体装置。
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Cited By (17)
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WO2011043058A1 (ja) * | 2009-10-09 | 2011-04-14 | 住友ベークライト株式会社 | 半導体装置 |
WO2011096487A1 (ja) * | 2010-02-03 | 2011-08-11 | 新日鉄マテリアルズ株式会社 | 半導体用銅ボンディングワイヤとその接合構造 |
WO2012070529A1 (ja) * | 2010-11-24 | 2012-05-31 | 住友ベークライト株式会社 | 半導体封止用エポキシ樹脂組成物及び半導体装置 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7595560B2 (en) * | 2005-02-22 | 2009-09-29 | Nec Electronics Corporation | Semiconductor device |
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US9646950B2 (en) | 2014-12-18 | 2017-05-09 | Texas Instruments Incorporated | Corrosion-resistant copper bonds to aluminum |
DE102015110437B4 (de) | 2015-06-29 | 2020-10-08 | Infineon Technologies Ag | Halbleitervorrichtung mit einer Metallstruktur, die mit einer leitfähigen Struktur elektrisch verbunden ist und Verfahren zur Herstellung |
JP2020072169A (ja) * | 2018-10-31 | 2020-05-07 | ルネサスエレクトロニクス株式会社 | 半導体装置及び半導体装置の製造方法 |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6352452A (ja) * | 1986-08-22 | 1988-03-05 | Hitachi Ltd | 電子装置 |
JPH0817189B2 (ja) * | 1989-01-13 | 1996-02-21 | 三菱電機株式会社 | 半導体装置の製造方法 |
JP2006270075A (ja) * | 2005-02-22 | 2006-10-05 | Nec Electronics Corp | 半導体装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0648710B2 (ja) | 1987-08-03 | 1994-06-22 | 株式会社日立製作所 | 樹脂封止型半導体装置 |
JPH0614474Y2 (ja) | 1987-08-31 | 1994-04-13 | 日本精工株式会社 | 露光装置における被露光部材保持装置 |
JPH01187832A (ja) | 1988-01-22 | 1989-07-27 | Hitachi Ltd | 半導体デバイスおよび半導体チップ |
US5229646A (en) * | 1989-01-13 | 1993-07-20 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device with a copper wires ball bonded to aluminum electrodes |
GB8918879D0 (en) | 1989-08-18 | 1989-09-27 | Danbiosyst Uk | Pharmaceutical compositions |
JPH08171892A (ja) | 1994-12-16 | 1996-07-02 | Meidensha Corp | 亜鉛−臭素電池用セパレータ及びその製造方法 |
US5844318A (en) * | 1997-02-18 | 1998-12-01 | Micron Technology, Inc. | Aluminum film for semiconductive devices |
US6350667B1 (en) * | 1999-11-01 | 2002-02-26 | Taiwan Semiconductor Manufacturing Company | Method of improving pad metal adhesion |
JP3752949B2 (ja) * | 2000-02-28 | 2006-03-08 | 日立化成工業株式会社 | 配線基板及び半導体装置 |
KR100843849B1 (ko) * | 2000-12-04 | 2008-07-03 | 제너럴 일렉트릭 캄파니 | 난연성 수지 조성물 및 이들의 성형품 |
JP2004064033A (ja) | 2001-10-23 | 2004-02-26 | Sumitomo Electric Wintec Inc | ボンディングワイヤー |
JP2005162826A (ja) | 2003-12-01 | 2005-06-23 | Kyocera Chemical Corp | 封止用樹脂組成物および樹脂封止型半導体装置 |
US20060170114A1 (en) * | 2005-01-31 | 2006-08-03 | Chao-Yuan Su | Novel method for copper wafer wire bonding |
US7595560B2 (en) | 2005-02-22 | 2009-09-29 | Nec Electronics Corporation | Semiconductor device |
-
2008
- 2008-02-04 US US12/068,191 patent/US7791198B2/en active Active
- 2008-02-08 JP JP2008028839A patent/JP5149028B2/ja active Active
- 2008-02-19 EP EP08003051A patent/EP1962343A2/en not_active Withdrawn
- 2008-02-20 CN CN2008100812348A patent/CN101256993B/zh active Active
-
2010
- 2010-08-03 US US12/805,511 patent/US7944052B2/en active Active
-
2011
- 2011-04-04 US US13/064,611 patent/US8334596B2/en active Active
-
2012
- 2012-06-22 US US13/530,383 patent/US8395261B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6352452A (ja) * | 1986-08-22 | 1988-03-05 | Hitachi Ltd | 電子装置 |
JPH0817189B2 (ja) * | 1989-01-13 | 1996-02-21 | 三菱電機株式会社 | 半導体装置の製造方法 |
JP2006270075A (ja) * | 2005-02-22 | 2006-10-05 | Nec Electronics Corp | 半導体装置 |
Cited By (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011043058A1 (ja) * | 2009-10-09 | 2011-04-14 | 住友ベークライト株式会社 | 半導体装置 |
JPWO2011043058A1 (ja) * | 2009-10-09 | 2013-03-04 | 住友ベークライト株式会社 | 半導体装置 |
US9082708B2 (en) | 2009-10-09 | 2015-07-14 | Sumitomo Bakelite Co., Ltd. | Semiconductor device |
WO2011096487A1 (ja) * | 2010-02-03 | 2011-08-11 | 新日鉄マテリアルズ株式会社 | 半導体用銅ボンディングワイヤとその接合構造 |
JP2011159894A (ja) * | 2010-02-03 | 2011-08-18 | Nippon Steel Materials Co Ltd | 半導体用銅ボンディングワイヤとその接合構造 |
US8653668B2 (en) | 2010-02-03 | 2014-02-18 | Nippon Steel & Sumikin Materials Co., Ltd. | Copper bonding wire for semiconductor device and bonding structure thereof |
WO2012070529A1 (ja) * | 2010-11-24 | 2012-05-31 | 住友ベークライト株式会社 | 半導体封止用エポキシ樹脂組成物及び半導体装置 |
JPWO2012070529A1 (ja) * | 2010-11-24 | 2014-05-19 | 住友ベークライト株式会社 | 半導体封止用エポキシ樹脂組成物及び半導体装置 |
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Publication number | Publication date |
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EP1962343A2 (en) | 2008-08-27 |
US20110241204A1 (en) | 2011-10-06 |
US20120306077A1 (en) | 2012-12-06 |
JP5149028B2 (ja) | 2013-02-20 |
CN101256993A (zh) | 2008-09-03 |
US7791198B2 (en) | 2010-09-07 |
US7944052B2 (en) | 2011-05-17 |
US8395261B2 (en) | 2013-03-12 |
US20080203568A1 (en) | 2008-08-28 |
US8334596B2 (en) | 2012-12-18 |
US20110062585A1 (en) | 2011-03-17 |
CN101256993B (zh) | 2010-04-21 |
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