JP2009144195A - 成膜用マスク及びマスク密着方法 - Google Patents
成膜用マスク及びマスク密着方法 Download PDFInfo
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- JP2009144195A JP2009144195A JP2007322422A JP2007322422A JP2009144195A JP 2009144195 A JP2009144195 A JP 2009144195A JP 2007322422 A JP2007322422 A JP 2007322422A JP 2007322422 A JP2007322422 A JP 2007322422A JP 2009144195 A JP2009144195 A JP 2009144195A
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- 238000000034 method Methods 0.000 title claims abstract description 14
- 230000008021 deposition Effects 0.000 title abstract 7
- 239000000758 substrate Substances 0.000 claims abstract description 77
- 239000000463 material Substances 0.000 claims abstract description 15
- 238000005452 bending Methods 0.000 claims description 39
- 230000015572 biosynthetic process Effects 0.000 claims description 27
- 239000011521 glass Substances 0.000 claims description 9
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 9
- 229910052721 tungsten Inorganic materials 0.000 claims description 9
- 239000010937 tungsten Substances 0.000 claims description 9
- 238000010030 laminating Methods 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 3
- 210000005069 ears Anatomy 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 229910001374 Invar Inorganic materials 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photovoltaic Devices (AREA)
Abstract
【解決手段】成膜材料の通過を許容する開口パターンを有するマスク本体1と、このマスク本体1を保持する保持フレーム2とから成り、前記開口パターンを介して前記成膜材料が付着せしめられる基板6が積層される成膜用マスクであって、前記保持フレーム2は、前記マスク本体1の4辺のうち対向する一対の辺部3に沿って夫々配設されこの一対の辺部3を夫々保持する一対の保持部4を備え、この一対の保持部4によってのみ前記マスク本体1を保持するように構成し、前記一対の保持部4によって保持される前記一対の辺部3間で前記マスク本体1が自重によって撓み且つこの一対の辺部3の対向方向で前記撓み量が変化するようにこの一対の辺部3を前記一対の保持部4に固定する。
【選択図】図4
Description
2 保持フレーム
3 (一対の)辺部
4 保持部
5 成膜用マスク
6 基板
7 棒体
8 重り部材
Claims (9)
- 成膜材料の通過を許容する開口パターンを有するマスク本体と、このマスク本体を保持する保持フレームとから成り、前記開口パターンを介して前記成膜材料が付着せしめられる基板が積層される成膜用マスクであって、前記保持フレームは、前記マスク本体の4辺のうち対向する一対の辺部に沿って夫々配設されこの一対の辺部を夫々保持する一対の保持部を備え、この一対の保持部によってのみ前記マスク本体を保持するように構成し、前記一対の保持部によって保持される前記一対の辺部間で前記マスク本体が自重によって撓み且つこの一対の辺部の対向方向で前記撓み量が変化するようにこの一対の辺部を前記一対の保持部に固定したことを特徴とする成膜用マスク。
- 前記マスク本体の前記一対の辺部を、このマスク本体が自重によって自然に撓んだ状態で前記一対の保持部に夫々固定したことを特徴とする請求項1記載の成膜用マスク。
- 前記一対の保持部を、この保持部によって保持される前記一対の辺部に沿って長さを有する長尺部材として、この一対の辺部を前記一対の保持部に夫々一様に固定し得るように構成したことを特徴とする請求項1,2のいずれか1項に記載の成膜用マスク。
- 前記マスク本体にして前記基板表面と対向する裏面とは反対側の表面側に、前記マスク本体の撓みを補正する撓み補正体を設けたことを特徴とする請求項1〜3のいずれか1項に記載の成膜用マスク。
- 前記撓み補正体は、棒体であり、この棒体を前記保持部に固定される一対の辺部と略平行に設けたことを特徴とする請求項4記載の成膜用マスク。
- 前記撓み補正体は、前記マスク本体にして撓みの最下点部位置に設けたことを特徴とする請求項4,5のいずれか1項に記載の成膜用マスク。
- 請求項1〜6のいずれか1項に記載の成膜用マスクを基板に密着させるマスク密着方法であって、前記成膜用マスク上に基板を積層し、この基板上にシート状の重り部材を積層して、この重り部材により基板を強制的に撓ませて前記成膜用マスクを基板表面に密着せしめることを特徴とするマスク密着方法。
- 前記重り部材としてタングステンシートを採用したことを特徴とする請求項7記載のマスク密着方法。
- 前記基板として、ガラス、プラスチック若しくは金属製のものを採用したことを特徴とする請求項7,8のいずれか1項に記載のマスク密着方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007322422A JP5258278B2 (ja) | 2007-12-13 | 2007-12-13 | 成膜用マスク及びマスク密着方法 |
PCT/JP2008/070815 WO2009075163A1 (ja) | 2007-12-13 | 2008-11-14 | 成膜用マスク及びマスク密着方法 |
US12/808,026 US20100260938A1 (en) | 2007-12-13 | 2008-11-14 | Mask for film formation and mask-affixing method |
KR1020107015382A KR101493119B1 (ko) | 2007-12-13 | 2008-11-14 | 성막용 마스크 및 마스크 밀착방법 |
CN2008801205571A CN101896635B (zh) | 2007-12-13 | 2008-11-14 | 成膜用掩模和掩模密合方法 |
TW097146980A TW200938642A (en) | 2007-12-13 | 2008-12-03 | Film forming mask and mask adhesion method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007322422A JP5258278B2 (ja) | 2007-12-13 | 2007-12-13 | 成膜用マスク及びマスク密着方法 |
Publications (2)
Publication Number | Publication Date |
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JP2009144195A true JP2009144195A (ja) | 2009-07-02 |
JP5258278B2 JP5258278B2 (ja) | 2013-08-07 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2007322422A Active JP5258278B2 (ja) | 2007-12-13 | 2007-12-13 | 成膜用マスク及びマスク密着方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20100260938A1 (ja) |
JP (1) | JP5258278B2 (ja) |
KR (1) | KR101493119B1 (ja) |
CN (1) | CN101896635B (ja) |
TW (1) | TW200938642A (ja) |
WO (1) | WO2009075163A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010180476A (ja) * | 2009-02-05 | 2010-08-19 | Samsung Mobile Display Co Ltd | マスク組立体及びこれを利用した平板表示装置用蒸着装置 |
JP2019516867A (ja) * | 2016-05-24 | 2019-06-20 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 耐プラズマコーティングを有するシャドウマスク |
JP2021080567A (ja) * | 2021-01-28 | 2021-05-27 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 耐プラズマコーティングを有するシャドウマスク |
JP7487481B2 (ja) | 2019-02-06 | 2024-05-21 | 大日本印刷株式会社 | 蒸着マスク装置、マスク支持機構及び蒸着マスク装置の製造方法 |
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CN102268636A (zh) * | 2010-06-01 | 2011-12-07 | 勤友企业股份有限公司 | 镀膜工艺中的图案形成方法及应用此方法的基板承载设备 |
WO2014132831A1 (ja) * | 2013-02-26 | 2014-09-04 | 東レエンジニアリング株式会社 | 基板処理装置、マスクのセット方法、膜形成装置および膜形成方法 |
US9656290B1 (en) * | 2013-07-05 | 2017-05-23 | Massachusetts Institute Of Technology | Stencil masks for making conformable electromagnetic device structures |
TWI480399B (zh) * | 2013-07-09 | 2015-04-11 | 金屬遮罩 | |
CN104749902B (zh) * | 2013-12-31 | 2017-02-15 | 上海微电子装备有限公司 | 掩模板面型整形装置 |
CN103834921B (zh) * | 2014-02-28 | 2016-05-18 | 上海和辉光电有限公司 | 一种蒸发源挡板结构 |
CN104561895B (zh) * | 2014-12-25 | 2017-03-22 | 昆山国显光电有限公司 | 一种复合掩膜板及其制作方法 |
TWI579640B (zh) * | 2015-10-15 | 2017-04-21 | 許銘案 | 薄膜光罩、貼合輔具、貼合與曝光輔助裝置及將一薄膜光罩貼合於一曲面基板的方法 |
US10934614B2 (en) * | 2016-03-23 | 2021-03-02 | Hon Hai Precision Industry Co., Ltd. | Vapor deposition mask, vapor deposition mask production method, and organic semiconductor element production method |
JP7037768B2 (ja) * | 2016-11-18 | 2022-03-17 | 大日本印刷株式会社 | 蒸着マスク |
KR101963982B1 (ko) * | 2017-12-27 | 2019-03-29 | 캐논 톡키 가부시키가이샤 | 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법 |
JP6852018B2 (ja) * | 2018-05-31 | 2021-03-31 | キヤノントッキ株式会社 | 蒸着方法,電子デバイスの製造方法及び蒸着装置 |
US11326246B2 (en) | 2020-07-27 | 2022-05-10 | Rockwell Collins, Inc. | Controlled warping of shadow mask tooling for improved reliability and miniturization via thin film deposition |
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KR101969955B1 (ko) * | 2012-10-25 | 2019-04-18 | 삼성디스플레이 주식회사 | 평판표시장치용 증착 마스크 조립체 제조장치 |
KR102000718B1 (ko) * | 2012-11-15 | 2019-07-19 | 삼성디스플레이 주식회사 | 박막 증착용 마스크 조립체 및 이의 제조 방법 |
KR102002494B1 (ko) * | 2012-11-30 | 2019-07-23 | 삼성디스플레이 주식회사 | 박막 증착용 마스크 프레임 어셈블리 |
KR20140117206A (ko) * | 2013-03-26 | 2014-10-07 | 삼성디스플레이 주식회사 | 증착장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법 및 유기발광 디스플레이 장치 |
KR102086553B1 (ko) * | 2013-05-31 | 2020-03-10 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR102130546B1 (ko) * | 2013-10-11 | 2020-07-07 | 삼성디스플레이 주식회사 | 마스크 조립체 및 이를 이용한 평판표시장치용 증착 장치 |
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2007
- 2007-12-13 JP JP2007322422A patent/JP5258278B2/ja active Active
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2008
- 2008-11-14 CN CN2008801205571A patent/CN101896635B/zh active Active
- 2008-11-14 WO PCT/JP2008/070815 patent/WO2009075163A1/ja active Application Filing
- 2008-11-14 KR KR1020107015382A patent/KR101493119B1/ko active IP Right Grant
- 2008-11-14 US US12/808,026 patent/US20100260938A1/en not_active Abandoned
- 2008-12-03 TW TW097146980A patent/TW200938642A/zh unknown
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JP2010180476A (ja) * | 2009-02-05 | 2010-08-19 | Samsung Mobile Display Co Ltd | マスク組立体及びこれを利用した平板表示装置用蒸着装置 |
JP2019516867A (ja) * | 2016-05-24 | 2019-06-20 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 耐プラズマコーティングを有するシャドウマスク |
US11566322B2 (en) | 2016-05-24 | 2023-01-31 | Applied Materials, Inc. | Shadow mask with plasma resistant coating |
JP7487481B2 (ja) | 2019-02-06 | 2024-05-21 | 大日本印刷株式会社 | 蒸着マスク装置、マスク支持機構及び蒸着マスク装置の製造方法 |
JP2021080567A (ja) * | 2021-01-28 | 2021-05-27 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 耐プラズマコーティングを有するシャドウマスク |
Also Published As
Publication number | Publication date |
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KR101493119B1 (ko) | 2015-02-12 |
JP5258278B2 (ja) | 2013-08-07 |
WO2009075163A1 (ja) | 2009-06-18 |
KR20100114883A (ko) | 2010-10-26 |
CN101896635A (zh) | 2010-11-24 |
TW200938642A (en) | 2009-09-16 |
CN101896635B (zh) | 2013-07-31 |
US20100260938A1 (en) | 2010-10-14 |
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