JP2008106363A5 - - Google Patents
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- Publication number
- JP2008106363A5 JP2008106363A5 JP2007273363A JP2007273363A JP2008106363A5 JP 2008106363 A5 JP2008106363 A5 JP 2008106363A5 JP 2007273363 A JP2007273363 A JP 2007273363A JP 2007273363 A JP2007273363 A JP 2007273363A JP 2008106363 A5 JP2008106363 A5 JP 2008106363A5
- Authority
- JP
- Japan
- Prior art keywords
- aerosol
- substrate surface
- fine particles
- degrees celsius
- yttrium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000443 aerosol Substances 0.000 claims 19
- 239000000758 substrate Substances 0.000 claims 18
- 238000000034 method Methods 0.000 claims 12
- 239000010419 fine particle Substances 0.000 claims 9
- 239000000463 material Substances 0.000 claims 8
- 238000000151 deposition Methods 0.000 claims 7
- 239000012159 carrier gas Substances 0.000 claims 4
- 229910052751 metal Inorganic materials 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 4
- 239000004065 semiconductor Substances 0.000 claims 4
- 229910052727 yttrium Inorganic materials 0.000 claims 4
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical group [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims 4
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims 3
- 229910052761 rare earth metal Inorganic materials 0.000 claims 3
- 150000002910 rare earth metals Chemical class 0.000 claims 3
- 229910045601 alloy Inorganic materials 0.000 claims 2
- 239000000956 alloy Substances 0.000 claims 2
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 239000011777 magnesium Substances 0.000 claims 2
- 239000011859 microparticle Substances 0.000 claims 2
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 claims 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 229910000946 Y alloy Inorganic materials 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/552,013 US7479464B2 (en) | 2006-10-23 | 2006-10-23 | Low temperature aerosol deposition of a plasma resistive layer |
| US11/552,013 | 2006-10-23 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008106363A JP2008106363A (ja) | 2008-05-08 |
| JP2008106363A5 true JP2008106363A5 (enExample) | 2010-12-09 |
| JP5660748B2 JP5660748B2 (ja) | 2015-01-28 |
Family
ID=38896988
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007273363A Active JP5660748B2 (ja) | 2006-10-23 | 2007-10-22 | 低温エアロゾル堆積方法及び物品 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7479464B2 (enExample) |
| EP (1) | EP1918420A1 (enExample) |
| JP (1) | JP5660748B2 (enExample) |
| KR (1) | KR100938474B1 (enExample) |
| CN (1) | CN101168842B (enExample) |
| TW (1) | TWI368937B (enExample) |
Families Citing this family (54)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US7371467B2 (en) * | 2002-01-08 | 2008-05-13 | Applied Materials, Inc. | Process chamber component having electroplated yttrium containing coating |
| US7297247B2 (en) * | 2003-05-06 | 2007-11-20 | Applied Materials, Inc. | Electroformed sputtering target |
| KR100941472B1 (ko) * | 2007-12-14 | 2010-02-11 | 한국기계연구원 | 에어로졸 증착법을 이용하여 제조된 치밀한 상온 전도성후막 및 이의 제조방법 |
| DE102008047955A1 (de) * | 2008-09-18 | 2010-04-01 | Otto Hauser | Verfahren und Vorrichtung zur Erzeugung von Halbleiterschichten |
| KR101108692B1 (ko) * | 2010-09-06 | 2012-01-25 | 한국기계연구원 | 다공성 세라믹 표면을 밀봉하는 치밀한 희토류 금속 산화물 코팅막 및 이의 제조방법 |
| JP6084464B2 (ja) | 2010-12-01 | 2017-02-22 | 株式会社東芝 | プラズマエッチング装置用部品およびプラズマエッチング装置用部品の製造方法 |
| KR101254618B1 (ko) * | 2011-02-22 | 2013-04-15 | 서울대학교산학협력단 | 내식성 부재의 세라믹 코팅 방법 |
| JP2012221979A (ja) * | 2011-04-04 | 2012-11-12 | Toshiba Corp | プラズマ処理装置 |
| FR2983217B1 (fr) | 2011-11-25 | 2015-05-01 | Centre De Transfert De Tech Ceramiques C T T C | Procede et dispositif de formation d'un depot de materiau(x) fragile(s) sur un substrat par projection de poudre |
| US9034199B2 (en) | 2012-02-21 | 2015-05-19 | Applied Materials, Inc. | Ceramic article with reduced surface defect density and process for producing a ceramic article |
| US9212099B2 (en) | 2012-02-22 | 2015-12-15 | Applied Materials, Inc. | Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics |
| US9090046B2 (en) | 2012-04-16 | 2015-07-28 | Applied Materials, Inc. | Ceramic coated article and process for applying ceramic coating |
| US9394615B2 (en) | 2012-04-27 | 2016-07-19 | Applied Materials, Inc. | Plasma resistant ceramic coated conductive article |
| DE102012106078A1 (de) * | 2012-07-06 | 2014-05-08 | Reinhausen Plasma Gmbh | Beschichtungsvorrichtung und Verfahren zur Beschichtung eines Substrats |
| US9604249B2 (en) | 2012-07-26 | 2017-03-28 | Applied Materials, Inc. | Innovative top-coat approach for advanced device on-wafer particle performance |
| US9343289B2 (en) | 2012-07-27 | 2016-05-17 | Applied Materials, Inc. | Chemistry compatible coating material for advanced device on-wafer particle performance |
| JP5578383B2 (ja) | 2012-12-28 | 2014-08-27 | Ｔｏｔｏ株式会社 | 耐プラズマ性部材 |
| JP6358492B2 (ja) * | 2012-12-28 | 2018-07-18 | Toto株式会社 | 耐プラズマ性部材 |
| US9708713B2 (en) * | 2013-05-24 | 2017-07-18 | Applied Materials, Inc. | Aerosol deposition coating for semiconductor chamber components |
| US9865434B2 (en) | 2013-06-05 | 2018-01-09 | Applied Materials, Inc. | Rare-earth oxide based erosion resistant coatings for semiconductor application |
| US9850568B2 (en) | 2013-06-20 | 2017-12-26 | Applied Materials, Inc. | Plasma erosion resistant rare-earth oxide based thin film coatings |
| US9711334B2 (en) | 2013-07-19 | 2017-07-18 | Applied Materials, Inc. | Ion assisted deposition for rare-earth oxide based thin film coatings on process rings |
| US9583369B2 (en) * | 2013-07-20 | 2017-02-28 | Applied Materials, Inc. | Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles |
| US10468235B2 (en) | 2013-09-18 | 2019-11-05 | Applied Materials, Inc. | Plasma spray coating enhancement using plasma flame heat treatment |
| US9440886B2 (en) | 2013-11-12 | 2016-09-13 | Applied Materials, Inc. | Rare-earth oxide based monolithic chamber material |
| US9725799B2 (en) | 2013-12-06 | 2017-08-08 | Applied Materials, Inc. | Ion beam sputtering with ion assisted deposition for coatings on chamber components |
| WO2015108276A1 (ko) * | 2014-01-17 | 2015-07-23 | 아이원스 주식회사 | 복합 피막 입자 입경을 갖는 피막의 형성 방법 및 이에 따른 피막 |
| JP2015140484A (ja) * | 2014-01-30 | 2015-08-03 | セイコーエプソン株式会社 | 時計用外装部品、時計用外装部品の製造方法および時計 |
| US9869013B2 (en) * | 2014-04-25 | 2018-01-16 | Applied Materials, Inc. | Ion assisted deposition top coat of rare-earth oxide |
| US9976211B2 (en) | 2014-04-25 | 2018-05-22 | Applied Materials, Inc. | Plasma erosion resistant thin film coating for high temperature application |
| US10730798B2 (en) | 2014-05-07 | 2020-08-04 | Applied Materials, Inc. | Slurry plasma spray of plasma resistant ceramic coating |
| US10196728B2 (en) | 2014-05-16 | 2019-02-05 | Applied Materials, Inc. | Plasma spray coating design using phase and stress control |
| US9460898B2 (en) | 2014-08-08 | 2016-10-04 | Applied Materials, Inc. | Plasma generation chamber with smooth plasma resistant coating |
| CN105986245A (zh) * | 2015-02-16 | 2016-10-05 | 中微半导体设备(上海)有限公司 | 改善mocvd反应工艺的部件及改善方法 |
| US10975469B2 (en) | 2017-03-17 | 2021-04-13 | Applied Materials, Inc. | Plasma resistant coating of porous body by atomic layer deposition |
| TWI733815B (zh) * | 2017-05-25 | 2021-07-21 | 南韓商Ｋｏｍｉｃｏ有限公司 | 耐電漿塗層的氣膠沉積塗佈法 |
| KR102089949B1 (ko) * | 2017-10-20 | 2020-03-19 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 장치의 부품 |
| WO2019104074A1 (en) | 2017-11-21 | 2019-05-31 | New Mexico Tech University Research Park Corporation | Aerosol method for coating |
| US11047035B2 (en) | 2018-02-23 | 2021-06-29 | Applied Materials, Inc. | Protective yttria coating for semiconductor equipment parts |
| CN108355855B (zh) * | 2018-03-23 | 2020-05-29 | 德淮半导体有限公司 | 增粘剂涂布装置 |
| US11239058B2 (en) | 2018-07-11 | 2022-02-01 | Applied Materials, Inc. | Protective layers for processing chamber components |
| WO2020017671A1 (ko) | 2018-07-17 | 2020-01-23 | (주)코미코 | 내 플라즈마 코팅을 위한 에어로졸 증착 코팅방법 |
| KR102616691B1 (ko) * | 2019-02-12 | 2023-12-20 | 어플라이드 머티어리얼스, 인코포레이티드 | 챔버 부품들을 제조하기 위한 방법 |
| KR102698715B1 (ko) * | 2019-03-01 | 2024-08-26 | 닛폰 하츠죠 가부시키가이샤 | 스테이지 및 스테이지 제작 방법 |
| WO2020180853A1 (en) * | 2019-03-05 | 2020-09-10 | Lam Research Corporation | Laminated aerosol deposition coating for aluminum components for plasma processing chambers |
| KR20220131949A (ko) * | 2020-01-23 | 2022-09-29 | 램 리써치 코포레이션 | 플라즈마 프로세싱 챔버 컴포넌트들을 위한 이트륨 알루미늄 코팅 |
| JP7115582B2 (ja) * | 2020-04-30 | 2022-08-09 | Toto株式会社 | 複合構造物および複合構造物を備えた半導体製造装置 |
| TW202302910A (zh) * | 2020-04-30 | 2023-01-16 | 日商Ｔｏｔｏ股份有限公司 | 複合結構物及具備複合結構物之半導體製造裝置 |
| WO2023042977A1 (ko) * | 2021-09-17 | 2023-03-23 | 아이원스 주식회사 | 플라즈마 분말 증착 장치 및 그를 이용한 증착 방법 |
| KR102522277B1 (ko) | 2022-03-24 | 2023-04-17 | 주식회사 펨빅스 | 내플라즈마 2층 코팅막 구조물 및 이의 제조 방법 |
| CN115325753B (zh) * | 2022-03-25 | 2023-05-16 | 北京航天试验技术研究所 | 一种基于氦循环的双预冷低温浆体制备装置及其方法 |
| WO2023202793A1 (en) * | 2022-04-22 | 2023-10-26 | Oerlikon Surface Solutions Ag, Pfäffikon | Coating system and method for semiconductor equipment components |
| TWI834553B (zh) * | 2023-05-12 | 2024-03-01 | 國立清華大學 | 氣溶膠沉積設備 |
| US20250114819A1 (en) * | 2023-10-10 | 2025-04-10 | Applied Materials, Inc. | Resistant coatings including polymer sealant and resistant particles |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6409839B1 (en) | 1997-06-02 | 2002-06-25 | Msp Corporation | Method and apparatus for vapor generation and film deposition |
| AU7684900A (en) | 1999-10-12 | 2001-04-23 | Japan As Represented By Secretary Of Agency Of Industrial Science And Technology, Ministry Of International Trade And Industry | Composite structured material and method for preparation thereof and apparatus for preparation thereof |
| TW503449B (en) | 2000-04-18 | 2002-09-21 | Ngk Insulators Ltd | Halogen gas plasma-resistive members and method for producing the same, laminates, and corrosion-resistant members |
| US20040126814A1 (en) | 2000-08-21 | 2004-07-01 | Singh Waheguru Pal | Sensor having molecularly imprinted polymers |
| CN1227388C (zh) | 2000-10-23 | 2005-11-16 | 独立行政法人产业技术综合研究所 | 复合构成物及其制作方法 |
| CN1225570C (zh) * | 2000-10-23 | 2005-11-02 | 独立行政法人产业技术综合研究所 | 复合构成物及其制作方法和制作装置 |
| JP3897623B2 (ja) * | 2001-10-11 | 2007-03-28 | 独立行政法人産業技術総合研究所 | 複合構造物作製方法 |
| JP3894313B2 (ja) * | 2002-12-19 | 2007-03-22 | 信越化学工業株式会社 | フッ化物含有膜、被覆部材及びフッ化物含有膜の形成方法 |
| US7579251B2 (en) | 2003-05-15 | 2009-08-25 | Fujitsu Limited | Aerosol deposition process |
| JP3864958B2 (ja) * | 2004-02-02 | 2007-01-10 | 東陶機器株式会社 | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
| JP2005217350A (ja) * | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
| US20070079936A1 (en) * | 2005-09-29 | 2007-04-12 | Applied Materials, Inc. | Bonded multi-layer RF window |
| US7968205B2 (en) | 2005-10-21 | 2011-06-28 | Shin-Etsu Chemical Co., Ltd. | Corrosion resistant multilayer member |
| JP2007115973A (ja) | 2005-10-21 | 2007-05-10 | Shin Etsu Chem Co Ltd | 耐食性部材 |
-
2006
- 2006-10-23 US US11/552,013 patent/US7479464B2/en active Active
-
2007
- 2007-09-30 CN CN2007101638433A patent/CN101168842B/zh active Active
- 2007-10-11 TW TW096138024A patent/TWI368937B/zh active
- 2007-10-12 EP EP07020054A patent/EP1918420A1/en not_active Withdrawn
- 2007-10-22 KR KR1020070106078A patent/KR100938474B1/ko active Active
- 2007-10-22 JP JP2007273363A patent/JP5660748B2/ja active Active
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