TWI368937B - Low temperature aerosol deposition of a plasma resistive layer - Google Patents

Low temperature aerosol deposition of a plasma resistive layer

Info

Publication number
TWI368937B
TWI368937B TW096138024A TW96138024A TWI368937B TW I368937 B TWI368937 B TW I368937B TW 096138024 A TW096138024 A TW 096138024A TW 96138024 A TW96138024 A TW 96138024A TW I368937 B TWI368937 B TW I368937B
Authority
TW
Taiwan
Prior art keywords
low temperature
resistive layer
aerosol deposition
temperature aerosol
plasma resistive
Prior art date
Application number
TW096138024A
Other languages
English (en)
Chinese (zh)
Other versions
TW200820325A (en
Inventor
Jennifer Y Sun
Elmira Ryabova
Senh Thach
Xi Zhu
Semyon L Kats
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW200820325A publication Critical patent/TW200820325A/zh
Application granted granted Critical
Publication of TWI368937B publication Critical patent/TWI368937B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
TW096138024A 2006-10-23 2007-10-11 Low temperature aerosol deposition of a plasma resistive layer TWI368937B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/552,013 US7479464B2 (en) 2006-10-23 2006-10-23 Low temperature aerosol deposition of a plasma resistive layer

Publications (2)

Publication Number Publication Date
TW200820325A TW200820325A (en) 2008-05-01
TWI368937B true TWI368937B (en) 2012-07-21

Family

ID=38896988

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096138024A TWI368937B (en) 2006-10-23 2007-10-11 Low temperature aerosol deposition of a plasma resistive layer

Country Status (6)

Country Link
US (1) US7479464B2 (enExample)
EP (1) EP1918420A1 (enExample)
JP (1) JP5660748B2 (enExample)
KR (1) KR100938474B1 (enExample)
CN (1) CN101168842B (enExample)
TW (1) TWI368937B (enExample)

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TWI656572B (zh) * 2013-07-20 2019-04-11 應用材料股份有限公司 用於腔室蓋與噴嘴上之稀土氧化物系塗層的離子輔助沉積

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US7297247B2 (en) * 2003-05-06 2007-11-20 Applied Materials, Inc. Electroformed sputtering target
KR100941472B1 (ko) * 2007-12-14 2010-02-11 한국기계연구원 에어로졸 증착법을 이용하여 제조된 치밀한 상온 전도성후막 및 이의 제조방법
DE102008047955A1 (de) * 2008-09-18 2010-04-01 Otto Hauser Verfahren und Vorrichtung zur Erzeugung von Halbleiterschichten
KR101108692B1 (ko) * 2010-09-06 2012-01-25 한국기계연구원 다공성 세라믹 표면을 밀봉하는 치밀한 희토류 금속 산화물 코팅막 및 이의 제조방법
CN103348454B (zh) * 2010-12-01 2016-04-06 株式会社东芝 等离子体蚀刻装置部件及其制造方法
KR101254618B1 (ko) * 2011-02-22 2013-04-15 서울대학교산학협력단 내식성 부재의 세라믹 코팅 방법
JP2012221979A (ja) * 2011-04-04 2012-11-12 Toshiba Corp プラズマ処理装置
FR2983217B1 (fr) 2011-11-25 2015-05-01 Centre De Transfert De Tech Ceramiques C T T C Procede et dispositif de formation d'un depot de materiau(x) fragile(s) sur un substrat par projection de poudre
US9034199B2 (en) 2012-02-21 2015-05-19 Applied Materials, Inc. Ceramic article with reduced surface defect density and process for producing a ceramic article
US9212099B2 (en) 2012-02-22 2015-12-15 Applied Materials, Inc. Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics
US9090046B2 (en) 2012-04-16 2015-07-28 Applied Materials, Inc. Ceramic coated article and process for applying ceramic coating
US9394615B2 (en) 2012-04-27 2016-07-19 Applied Materials, Inc. Plasma resistant ceramic coated conductive article
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US9604249B2 (en) 2012-07-26 2017-03-28 Applied Materials, Inc. Innovative top-coat approach for advanced device on-wafer particle performance
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US9708713B2 (en) * 2013-05-24 2017-07-18 Applied Materials, Inc. Aerosol deposition coating for semiconductor chamber components
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US9850568B2 (en) 2013-06-20 2017-12-26 Applied Materials, Inc. Plasma erosion resistant rare-earth oxide based thin film coatings
US9711334B2 (en) 2013-07-19 2017-07-18 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based thin film coatings on process rings
US10468235B2 (en) 2013-09-18 2019-11-05 Applied Materials, Inc. Plasma spray coating enhancement using plasma flame heat treatment
US9440886B2 (en) 2013-11-12 2016-09-13 Applied Materials, Inc. Rare-earth oxide based monolithic chamber material
US9725799B2 (en) 2013-12-06 2017-08-08 Applied Materials, Inc. Ion beam sputtering with ion assisted deposition for coatings on chamber components
JP6058821B2 (ja) * 2014-01-17 2017-01-11 イオンズ カンパニー リミテッド 複合被膜粒子粒径を有する被膜の形成方法およびこれによる被膜
JP2015140484A (ja) 2014-01-30 2015-08-03 セイコーエプソン株式会社 時計用外装部品、時計用外装部品の製造方法および時計
US9976211B2 (en) 2014-04-25 2018-05-22 Applied Materials, Inc. Plasma erosion resistant thin film coating for high temperature application
US9869013B2 (en) * 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
US10730798B2 (en) 2014-05-07 2020-08-04 Applied Materials, Inc. Slurry plasma spray of plasma resistant ceramic coating
US10196728B2 (en) 2014-05-16 2019-02-05 Applied Materials, Inc. Plasma spray coating design using phase and stress control
US9460898B2 (en) 2014-08-08 2016-10-04 Applied Materials, Inc. Plasma generation chamber with smooth plasma resistant coating
CN105986245A (zh) * 2015-02-16 2016-10-05 中微半导体设备(上海)有限公司 改善mocvd反应工艺的部件及改善方法
US10975469B2 (en) 2017-03-17 2021-04-13 Applied Materials, Inc. Plasma resistant coating of porous body by atomic layer deposition
TWI733815B (zh) * 2017-05-25 2021-07-21 南韓商Ｋｏｍｉｃｏ有限公司 耐電漿塗層的氣膠沉積塗佈法
KR102089949B1 (ko) * 2017-10-20 2020-03-19 세메스 주식회사 기판 처리 장치 및 기판 처리 장치의 부품
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CN108355855B (zh) * 2018-03-23 2020-05-29 德淮半导体有限公司 增粘剂涂布装置
US11239058B2 (en) * 2018-07-11 2022-02-01 Applied Materials, Inc. Protective layers for processing chamber components
US11795547B2 (en) 2018-07-17 2023-10-24 Komico Ltd. Method of aerosol deposition coating for plasma resistant coating
CN113383405B (zh) * 2019-02-12 2024-08-30 应用材料公司 用于制造腔室部件的方法
CN113454761B (zh) * 2019-03-01 2024-11-08 日本发条株式会社 载物台以及载物台的制造方法
JP2022522752A (ja) * 2019-03-05 2022-04-20 ラム リサーチ コーポレーション プラズマ処理チャンバ用アルミニウム構成部品のための積層エアロゾル堆積被膜
WO2021150757A1 (en) * 2020-01-23 2021-07-29 Lam Research Corporation Yttrium aluminum coating for plasma processing chamber components
JP7115582B2 (ja) * 2020-04-30 2022-08-09 Toto株式会社 複合構造物および複合構造物を備えた半導体製造装置
TW202302910A (zh) * 2020-04-30 2023-01-16 日商Ｔｏｔｏ股份有限公司 複合結構物及具備複合結構物之半導體製造裝置
WO2023042977A1 (ko) * 2021-09-17 2023-03-23 아이원스 주식회사 플라즈마 분말 증착 장치 및 그를 이용한 증착 방법
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CN115325753B (zh) * 2022-03-25 2023-05-16 北京航天试验技术研究所 一种基于氦循环的双预冷低温浆体制备装置及其方法
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI656572B (zh) * 2013-07-20 2019-04-11 應用材料股份有限公司 用於腔室蓋與噴嘴上之稀土氧化物系塗層的離子輔助沉積

Also Published As

Publication number Publication date
JP5660748B2 (ja) 2015-01-28
US20080108225A1 (en) 2008-05-08
KR20080036530A (ko) 2008-04-28
JP2008106363A (ja) 2008-05-08
KR100938474B1 (ko) 2010-01-25
CN101168842A (zh) 2008-04-30
US7479464B2 (en) 2009-01-20
EP1918420A1 (en) 2008-05-07
TW200820325A (en) 2008-05-01
CN101168842B (zh) 2010-08-25

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