JP2007535275A5 - - Google Patents

Download PDF

Info

Publication number
JP2007535275A5
JP2007535275A5 JP2007510707A JP2007510707A JP2007535275A5 JP 2007535275 A5 JP2007535275 A5 JP 2007535275A5 JP 2007510707 A JP2007510707 A JP 2007510707A JP 2007510707 A JP2007510707 A JP 2007510707A JP 2007535275 A5 JP2007535275 A5 JP 2007535275A5
Authority
JP
Japan
Prior art keywords
frequency
beam structure
heating current
electrical contact
mems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007510707A
Other languages
English (en)
Other versions
JP4980210B2 (ja
JP2007535275A (ja
Filing date
Publication date
Priority claimed from US10/833,433 external-priority patent/US7102467B2/en
Application filed filed Critical
Publication of JP2007535275A publication Critical patent/JP2007535275A/ja
Publication of JP2007535275A5 publication Critical patent/JP2007535275A5/ja
Application granted granted Critical
Publication of JP4980210B2 publication Critical patent/JP4980210B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (26)

  1. 共振周波数を有する梁構造を備えたマイクロ電気機械共振器と、
    前記梁構造と並置され、複数の電気接点を有する周波数調整構造と
    を備え、
    前記周波数調整構造の材料が、加熱電流により抵抗加熱されることにより、前記周波数調整構造から蒸発して、前記梁構造に蒸着し、前記梁構造の共振周波数を変更するようにした、MEMS装置。
  2. 前記周波数調整構造が一体化されている固定電極を備えた、請求項1に記載のMEMS装置。
  3. 前記周波数調整構造が近接して配置されている固定電極を備えた、請求項1又は請求項2に記載のMEMS装置。
  4. 前記梁構造は、高張力区域を備えており、前記周波数調整構造は、前記高張力区域に近接して配置されている、請求項1から請求項3のいずれか1つに記載のMEMS装置。
  5. 前記周波数調整構造は、単結晶シリコン又は多結晶シリコンからなる、請求項1から請求項4のいずれか1つに記載のMEMS装置。
  6. 前記周波数調整構造は、シリコン材料からなる、請求項1から請求項5のいずれか1つに記載のMEMS装置。
  7. 前記加熱電流は、前記周波数調整構造を、300℃を超えるまで抵抗加熱する、請求項1から請求項6のいずれか1つに記載のMEMS装置。
  8. 前記加熱抵抗は、前記周波数調整構造を、900℃を超えるまで抵抗加熱する、請求項1から請求項6のいずれか1つに記載のMEMS装置。
  9. 前記梁構造は、高張力区域を備えており、前記周波数調整構造の材料は、ほぼ前記高張力区域の上に蒸着する、請求項1から請求項8のいずれか1つに記載のMEMS装置。
  10. 固定電極を備え、
    前記周波数調整構造は、(i)前記固定電極と一体化された第1の構造と、(ii)前記固定電極に近接して配置された第2の構造とを備える、請求項1から請求項9のいずれか1つに記載のMEMS装置。
  11. 前記梁構造は、多梁整調フォーク構造を備え、前記多梁整調フォーク構造内の各梁は、第1基板アンカーによって固定されている第1端部を備える、請求項1から請求項10のいずれか1つに記載のMEMS装置。
  12. MEMS共振器の共振周波数を調整する方法であって、前記MEMS共振器は、第1電気接点と、第2電気接点と、少なくとも1つの基板アンカーに連結された梁構造とを備え、前記MEMS共振器は、第1共振周波数を有している、方法において、
    前記第1電気接点に与える第1加熱電流を、前記第1共振周波数を用いて決定する工程と、
    前記第1加熱電流を前記第1電気接点から前記第2電気接点に流して前記梁構造を抵抗加熱し、これに応じて、前記梁構造の材料が変化して前記MEMS共振器の第2共振周波数を提供する工程と
    を備えた、方法。
  13. 前記MEMS共振器の前記第2共振周波数を測定する工程と、
    第2加熱電流を決定する工程と、
    前記第2加熱電流を前記前記第1電気接点から前記第2電気接点に流して前記梁構造を抵抗加熱し、これに応じて、前記梁構造の材料が変化して前記MEMS共振器の第3共振周波数を提供する工程と
    を備えた、請求項12に記載の方法。
  14. 前記梁構造は高張力区域を備えており、前記高張力区域は、前記第1加熱電流に応じて、前記梁構造の他の部分より相当に高い温度まで加熱される、請求項12又は請求項13に記載の方法。
  15. MEMS共振器の共振周波数を調整する方法であって、前記MEMS共振器は、第1電気接点と、第2電気接点と、基板アンカーを介して基板に固定された梁構造とを備え、前記MEMS共振器は、第1共振周波数を有している、方法において、
    前記第1加熱電流を前記第1電気接点から前記第2電気接点に流して前記梁構造を抵抗加熱し、これに応じて、前記梁構造の材料が蒸発して前記MEMS共振器の第2共振周波数を提供し、前記第1加熱電流は、前記梁構造の少なくとも一部を、900℃を超えるまで抵抗加熱する工程と、
    前記MEMS共振器の前記第2共振周波数を測定する工程と
    を備えた、方法。
  16. 前記MEMS共振器に第2加熱電流を与える工程を備え、
    前記第2加熱電流を与える工程は、前記第2加熱電流を前記第1電気接点から前記第2電気接点に流して前記梁構造を抵抗加熱し、これに応じて、前記梁構造の材料が変化して前記MEMS共振器の第3共振周波数を提供する工程を含む、請求項15に記載の方法。
  17. 測定された前記第2共振周波数を用いて前記第2加熱電流を決定する工程を備えた、請求項15又は請求項16に記載の方法。
  18. 前記梁構造は、高張力区域を備えており、前記高張力区域は、前記第1加熱電流に応じて、前記梁構造の他の部分より相当に高い温度まで加熱される、請求項15から請求項17のいずれか1つに記載の方法。
  19. MEMS共振器の共振周波数を調整する方法であって、前記MEMS共振器は、梁構造と周波数調整構造とを備え、前記周波数調整構造は、第1電気接点及び第2電気接点を備え、前記MEMS共振器は第1共振周波数を有する、方法において、
    前記第1加熱電流を前記第1電気接点から前記第2電気接点に流して前記周波数調整構造を抵抗加熱し、これに応じて、前記周波数調整構造の材料が、前記周波数調整構造から蒸発して、前記梁構造に蒸着し、前記梁構造の第2共振周波数を提供する、方法。
  20. 前記MEMS共振器の前記第2共振周波数を測定する工程を備えた、請求項19に記載の方法。
  21. 前記MEMS共振器の前記第1共振周波数を測定する工程と、
    測定された前記第1共振周波数を用いて前記第1加熱電流を決定する工程と
    を備えた、請求項19又は請求項20に記載の方法。
  22. 第2加熱電流を決定する工程と、
    前記周波数調整構造に第2加熱電流を与える工程と
    を備え、
    前記第2加熱電流を与える工程は、前記第2加熱電流を前記第1電気接点から前記第2電気接点に流して前記周波数調整構造を抵抗加熱し、これに応じて、前記周波数調整構造の材料が、更に前記梁構造の上に蒸着して、前記MEMS共振器の前記第3共振周波数を提供する工程を含む、請求項19から請求項21のいずれか1つに記載の方法。
  23. 前記周波数調整構造は、前記MEMS共振器の固定電極と一体化されている、請求項19から請求項22のいずれか1つに記載の方法。
  24. 前記梁構造は、高張力区域を備えており、前記第1加熱電流に応じて、前記周波数調整構造の材料が、前記高張力区域に蒸着するようにした、請求項19から請求項23のいずれか1つに記載の方法。
  25. 前記梁構造は、複数の高張力区域を備えており、前記第1加熱電流に応じて、前記周波数調整構造の蒸発した材料の相当部分が、前記複数の高張力区域に蒸着するようにした、請求項19から請求項24のいずれか1つに記載の方法。
  26. 前記周波数調整構造は、多結晶シリコン材料からなる、請求項19から請求項25のいずれか1つに記載の方法。
JP2007510707A 2004-04-28 2005-01-11 Mem共振器の周波数を調整するための方法 Active JP4980210B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/833,433 2004-04-28
US10/833,433 US7102467B2 (en) 2004-04-28 2004-04-28 Method for adjusting the frequency of a MEMS resonator
PCT/US2005/000745 WO2005109639A2 (en) 2004-04-28 2005-01-11 Method for adjusting the frequency of a mems resonator

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011124931A Division JP5437316B2 (ja) 2004-04-28 2011-06-03 Mem共振器の周波数を調整するための方法

Publications (3)

Publication Number Publication Date
JP2007535275A JP2007535275A (ja) 2007-11-29
JP2007535275A5 true JP2007535275A5 (ja) 2008-02-28
JP4980210B2 JP4980210B2 (ja) 2012-07-18

Family

ID=35186492

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2007510707A Active JP4980210B2 (ja) 2004-04-28 2005-01-11 Mem共振器の周波数を調整するための方法
JP2011124931A Active JP5437316B2 (ja) 2004-04-28 2011-06-03 Mem共振器の周波数を調整するための方法
JP2013225038A Active JP5748823B2 (ja) 2004-04-28 2013-10-30 Mems共振器の周波数を調整するための装置及び方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2011124931A Active JP5437316B2 (ja) 2004-04-28 2011-06-03 Mem共振器の周波数を調整するための方法
JP2013225038A Active JP5748823B2 (ja) 2004-04-28 2013-10-30 Mems共振器の周波数を調整するための装置及び方法

Country Status (6)

Country Link
US (2) US7102467B2 (ja)
EP (1) EP1743421B1 (ja)
JP (3) JP4980210B2 (ja)
CN (1) CN1977448B (ja)
DE (1) DE602005013660D1 (ja)
WO (1) WO2005109639A2 (ja)

Families Citing this family (95)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10017976A1 (de) * 2000-04-11 2001-10-18 Bosch Gmbh Robert Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren
US7763947B2 (en) * 2002-04-23 2010-07-27 Sharp Laboratories Of America, Inc. Piezo-diode cantilever MEMS
ATE510352T1 (de) * 2003-09-10 2011-06-15 Nxp Bv Elektromechanischer wandler und elektrische einrichtung
US7068126B2 (en) * 2004-03-04 2006-06-27 Discera Method and apparatus for frequency tuning of a micro-mechanical resonator
US7102467B2 (en) * 2004-04-28 2006-09-05 Robert Bosch Gmbh Method for adjusting the frequency of a MEMS resonator
US7176770B2 (en) * 2004-08-24 2007-02-13 Georgia Tech Research Corp. Capacitive vertical silicon bulk acoustic resonator
US7273762B2 (en) * 2004-11-09 2007-09-25 Freescale Semiconductor, Inc. Microelectromechanical (MEM) device including a spring release bridge and method of making the same
US7569800B2 (en) * 2004-11-15 2009-08-04 Yonglai Tian Method and apparatus for rapid thermal processing and bonding of materials using RF and microwaves
WO2007149621A2 (en) * 2006-04-19 2007-12-27 Cornell Research Foundation, Inc. Methods and systems for object identification and for authentication
US7578189B1 (en) 2006-05-10 2009-08-25 Qualtre, Inc. Three-axis accelerometers
US7563633B2 (en) * 2006-08-25 2009-07-21 Robert Bosch Gmbh Microelectromechanical systems encapsulation process
JP4822212B2 (ja) * 2006-09-04 2011-11-24 セイコーインスツル株式会社 静電振動子
US8314665B2 (en) * 2006-09-20 2012-11-20 Trustees Of Boston University Nano electromechanical integrated-circuit filter
JP4370339B2 (ja) * 2007-03-23 2009-11-25 Okiセミコンダクタ株式会社 Mems振動子の製造方法及びmems振動子
FR2920754B1 (fr) * 2007-09-07 2010-06-18 St Microelectronics Sa Micro systeme comprenant une poutre deformable par flexion et procede de fabrication
US7907035B2 (en) * 2007-12-18 2011-03-15 Robert Bosch Gmbh MEMS resonator array structure and method of operating and using same
WO2009102639A1 (en) * 2008-02-11 2009-08-20 Qualcomm Mems Technologies, Inc. Method and apparatus for sensing, measurement or characterization of display elements integrated with the display drive scheme, and system and applications using the same
US8274299B2 (en) 2008-02-11 2012-09-25 Qualcomm Mems Technologies, Inc. Methods for measurement and characterization of interferometric modulators
CN102037331B (zh) * 2008-02-11 2014-09-17 高通Mems科技公司 用于测量和表征干涉式调制器的方法
US8466858B2 (en) * 2008-02-11 2013-06-18 Qualcomm Mems Technologies, Inc. Sensing to determine pixel state in a passively addressed display array
US20090201282A1 (en) * 2008-02-11 2009-08-13 Qualcomm Mems Technologies, Inc Methods of tuning interferometric modulator displays
JP2009190150A (ja) * 2008-02-18 2009-08-27 Sanyo Electric Co Ltd マイクロエレクトロメカニカルデバイス及びその製造方法。
US7990229B2 (en) 2008-04-01 2011-08-02 Sand9, Inc. Methods and devices for compensating a signal using resonators
US8476809B2 (en) 2008-04-29 2013-07-02 Sand 9, Inc. Microelectromechanical systems (MEMS) resonators and related apparatus and methods
US8044737B2 (en) * 2008-04-29 2011-10-25 Sand9, Inc. Timing oscillators and related methods
US8410868B2 (en) 2009-06-04 2013-04-02 Sand 9, Inc. Methods and apparatus for temperature control of devices and mechanical resonating structures
US8044736B2 (en) * 2008-04-29 2011-10-25 Sand9, Inc. Timing oscillators and related methods
US8333112B2 (en) * 2008-06-10 2012-12-18 The Boeing Company Frequency tuning of disc resonator gyroscopes via resonator mass perturbation based on an identified model
US7999635B1 (en) * 2008-07-29 2011-08-16 Silicon Laboratories Inc. Out-of plane MEMS resonator with static out-of-plane deflection
US8111108B2 (en) * 2008-07-29 2012-02-07 Sand9, Inc. Micromechanical resonating devices and related methods
US7888843B2 (en) * 2008-09-10 2011-02-15 Georgia Tech Research Corporation Thin-film piezoelectric-on-insulator resonators having perforated resonator bodies therein
CN102177654B (zh) * 2008-10-08 2015-11-25 Nxp股份有限公司 振荡器器件
US8327684B2 (en) * 2008-10-21 2012-12-11 Teledyne Scientific & Imaging, Llc Method for adjusting resonance frequencies of a vibrating microelectromechanical device
US8354332B2 (en) * 2008-11-26 2013-01-15 Georgia Tech Research Corporation Methods of forming micro-electromichanical resonators having boron-doped resonator bodies containing eutectic alloys
US8061013B2 (en) * 2008-11-26 2011-11-22 Georgia Tech Research Corporation Micro-electromechanical resonators having electrically-trimmed resonator bodies therein and methods of fabricating same using joule heating
IT1392736B1 (it) * 2008-12-09 2012-03-16 St Microelectronics Rousset Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione
US8689426B2 (en) 2008-12-17 2014-04-08 Sand 9, Inc. Method of manufacturing a resonating structure
JP5848131B2 (ja) 2008-12-17 2016-01-27 アナログ デバイシス, インコーポレイテッド 機械共振構造体を備える機器
US8686614B2 (en) * 2008-12-17 2014-04-01 Sand 9, Inc. Multi-port mechanical resonating devices and related methods
JP2010162629A (ja) * 2009-01-14 2010-07-29 Seiko Epson Corp Memsデバイスの製造方法
JP2010166201A (ja) * 2009-01-14 2010-07-29 Seiko Epson Corp Memsデバイス及びその製造方法
US20100194246A1 (en) * 2009-01-30 2010-08-05 Integrated Device Technology, Inc. Thin-Film Bulk Acoustic Resonators Having Reduced Susceptibility to Process-Induced Material Thickness Variations
US7939990B2 (en) * 2009-01-30 2011-05-10 Integrated Device Technology, Inc. Thin-film bulk acoustic resonators having perforated bodies that provide reduced susceptibility to process-induced lateral dimension variations
US9048811B2 (en) 2009-03-31 2015-06-02 Sand 9, Inc. Integration of piezoelectric materials with substrates
GB2470399B (en) * 2009-05-21 2013-11-27 Ge Infrastructure Sensing Inc A sensor arranged to measure more than one characteristic of a fluid
US8115573B2 (en) 2009-05-29 2012-02-14 Infineon Technologies Ag Resonance frequency tunable MEMS device
US8043891B2 (en) * 2009-06-05 2011-10-25 Shanghai Lexvu Opto Microelectronics Technology Co., Ltd. Method of encapsulating a wafer level microdevice
US8381378B2 (en) * 2009-06-19 2013-02-26 Georgia Tech Research Corporation Methods of forming micromechanical resonators having high density trench arrays therein that provide passive temperature compensation
US8106724B1 (en) 2009-07-23 2012-01-31 Integrated Device Technologies, Inc. Thin-film bulk acoustic resonators having perforated resonator body supports that enhance quality factor
US8742854B1 (en) 2009-08-31 2014-06-03 Integrated Device Technology Inc. Periodic signal generators having microelectromechanical resonators therein that support generation of high frequency low-TCF difference signals
US9970764B2 (en) 2009-08-31 2018-05-15 Georgia Tech Research Corporation Bulk acoustic wave gyroscope with spoked structure
WO2011036732A1 (ja) * 2009-09-28 2011-03-31 株式会社 東芝 共振器および発振器
US8736388B2 (en) 2009-12-23 2014-05-27 Sand 9, Inc. Oscillators having arbitrary frequencies and related systems and methods
US20110175492A1 (en) * 2010-01-21 2011-07-21 Imec Temperature Compensation Device and Method for MEMS Resonator
FI124103B (fi) * 2010-02-22 2014-03-14 Murata Electronics Oy Parannettu mikromekaaninen resonaattori
US8661899B2 (en) 2010-03-01 2014-03-04 Sand9, Inc. Microelectromechanical gyroscopes and related apparatus and methods
WO2011133682A1 (en) 2010-04-20 2011-10-27 Guiti Zolfagharkhani Microelectromechanical gyroscopes and related apparatus and methods
EP2395660B1 (en) * 2010-06-10 2013-08-14 Nxp B.V. MEMS resonators
WO2012040043A1 (en) 2010-09-20 2012-03-29 Sand9, Inc. Resonant sensing using extensional modes of a plate
JP2012178711A (ja) * 2011-02-25 2012-09-13 Sanyo Electric Co Ltd Mems共振器
US8501515B1 (en) 2011-02-25 2013-08-06 Integrated Device Technology Inc. Methods of forming micro-electromechanical resonators using passive compensation techniques
FR2973608A1 (fr) 2011-03-31 2012-10-05 St Microelectronics Sa Procede d'ajustement de la frequence de resonance d'un element vibrant micro-usine
FI123933B (fi) * 2011-05-13 2013-12-31 Teknologian Tutkimuskeskus Vtt Mikromekaaninen laite ja menetelmä sen suunnittelemiseksi
US8633635B1 (en) * 2011-06-30 2014-01-21 Integrated Device Technology Inc. Microelectromechanical resonators with thermally-actuated frequency tuning beams
US8907549B2 (en) * 2011-09-05 2014-12-09 Nihon Dempa Kogyo Co., Ltd. Tuning fork configured to generate flexural vibration in reverse phase to the contour vibration of first and second vibrating bodies
US9022644B1 (en) 2011-09-09 2015-05-05 Sitime Corporation Micromachined thermistor and temperature measurement circuitry, and method of manufacturing and operating same
US8610336B1 (en) 2011-09-30 2013-12-17 Integrated Device Technology Inc Microelectromechanical resonators having resistive heating elements therein configured to provide frequency tuning through convective heating of resonator bodies
US9383208B2 (en) 2011-10-13 2016-07-05 Analog Devices, Inc. Electromechanical magnetometer and applications thereof
US9695036B1 (en) 2012-02-02 2017-07-04 Sitime Corporation Temperature insensitive resonant elements and oscillators and methods of designing and manufacturing same
JP5688690B2 (ja) * 2013-01-11 2015-03-25 横河電機株式会社 振動式トランスデューサおよび振動式トランスデューサの製造方法
TWI538396B (zh) 2013-05-20 2016-06-11 國立清華大學 微機電共振器之主動式溫度補償方法及其共振器
CN103354447A (zh) * 2013-07-05 2013-10-16 广东合微集成电路技术有限公司 一种mems谐振器补偿系统
JP6292486B2 (ja) * 2014-01-17 2018-03-14 株式会社村田製作所 Mems素子
TWI558096B (zh) 2014-01-24 2016-11-11 加高電子股份有限公司 溫度補償微機電振盪器
US9712128B2 (en) 2014-02-09 2017-07-18 Sitime Corporation Microelectromechanical resonator
US9705470B1 (en) 2014-02-09 2017-07-11 Sitime Corporation Temperature-engineered MEMS resonator
WO2016114173A1 (ja) 2015-01-13 2016-07-21 株式会社村田製作所 圧電デバイスの製造方法
US9584092B2 (en) 2015-04-14 2017-02-28 International Business Machines Corporation Mechanical resonator with a spring-mass system comprising a phase-change material
EP3829060A1 (en) * 2015-06-19 2021-06-02 SiTime Corporation Microelectromechanical resonator
CN106803744A (zh) * 2015-11-25 2017-06-06 中国科学院上海微系统与信息技术研究所 微蒸发器、振荡器集成微蒸发器结构及其频率修正方法
EP3181938B1 (fr) 2015-12-18 2019-02-20 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Procede de fabrication d'un spiral d'une raideur predeterminee par retrait de matiere
EP3181940B2 (fr) 2015-12-18 2023-07-05 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Procede de fabrication d'un spiral d'une raideur predeterminee par retrait localise de matiere
EP3181939B1 (fr) 2015-12-18 2019-02-20 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Procede de fabrication d'un spiral d'une raideur predeterminee par ajout de matiere
US10676349B1 (en) 2016-08-12 2020-06-09 Sitime Corporation MEMS resonator
US10800649B2 (en) 2016-11-28 2020-10-13 Analog Devices International Unlimited Company Planar processing of suspended microelectromechanical systems (MEMS) devices
US10476476B2 (en) * 2016-12-15 2019-11-12 Murata Manufacturing Co., Ltd. MEMS resonator with suppressed spurious modes
CN110089028B (zh) * 2016-12-27 2023-01-17 株式会社村田制作所 谐振装置
US10418238B2 (en) * 2017-05-12 2019-09-17 Ohio State Innovation Foundation Devices, systems, and methods for light emission and detection using amorphous silicon
IT201700124320A1 (it) * 2017-10-31 2019-05-01 St Microelectronics Srl Sistema di risonatore microelettromeccanico con migliorata stabilita' rispetto a variazioni di temperatura
EP3636588B1 (en) * 2018-09-26 2023-10-25 Murata Manufacturing Co., Ltd. Mems frequency-tuning springs
US10843920B2 (en) 2019-03-08 2020-11-24 Analog Devices International Unlimited Company Suspended microelectromechanical system (MEMS) devices
US11862265B2 (en) 2019-05-27 2024-01-02 University Of Oregon Mechanical memory and tunable nano-electromechanical systems (NEMS) resonator
TR202017251A1 (tr) * 2020-10-28 2022-05-23 Harran Ueniversitesi Mi̇kro/nano ci̇hazlara homojen isitma yapilarinin uygulanmasi i̇le performans ve güvenli̇k katsayilarinin artirilmasina yöneli̇k si̇stem ve yöntem
CN112865740A (zh) * 2020-12-31 2021-05-28 中国科学院半导体研究所 基于模态重分布的mems谐振器及其调节方法
WO2022246749A1 (zh) * 2021-05-27 2022-12-01 天津大学 压电mems谐振器及其形成方法、电子设备

Family Cites Families (133)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US53434A (en) * 1866-03-27 Improved balance-beam for boring oil-wells
US20565A (en) * 1858-06-15 Improvement in tanning leather
US61564A (en) * 1867-01-29 Island
JPS6192010A (ja) * 1984-10-11 1986-05-10 Nippon Dempa Kogyo Co Ltd 蒸着マスク
US4674319A (en) 1985-03-20 1987-06-23 The Regents Of The University Of California Integrated circuit sensor
JPS631108A (ja) * 1986-06-19 1988-01-06 Fujitsu Ltd 周波数調整の可能な振動子
GB2198611B (en) 1986-12-13 1990-04-04 Spectrol Reliance Ltd Method of forming a sealed diaphragm on a substrate
US4945769A (en) 1989-03-06 1990-08-07 Delco Electronics Corporation Semiconductive structure useful as a pressure sensor
US4990462A (en) 1989-04-12 1991-02-05 Advanced Micro Devices, Inc. Method for coplanar integration of semiconductor ic devices
US5075253A (en) 1989-04-12 1991-12-24 Advanced Micro Devices, Inc. Method of coplanar integration of semiconductor IC devices
US5156903A (en) 1989-12-21 1992-10-20 Sumitomo Metal Ceramics Inc. Multilayer ceramic substrate and manufacture thereof
US5417111A (en) 1990-08-17 1995-05-23 Analog Devices, Inc. Monolithic chip containing integrated circuitry and suspended microstructure
US5620931A (en) 1990-08-17 1997-04-15 Analog Devices, Inc. Methods for fabricating monolithic device containing circuitry and suspended microstructure
JPH0644008B2 (ja) 1990-08-17 1994-06-08 アナログ・ディバイセス・インコーポレーテッド モノリシック加速度計
US6147756A (en) 1992-01-22 2000-11-14 Northeastern University Microspectrometer with sacrificial layer integrated with integrated circuit on the same substrate
JP3367113B2 (ja) 1992-04-27 2003-01-14 株式会社デンソー 加速度センサ
US5461916A (en) * 1992-08-21 1995-10-31 Nippondenso Co., Ltd. Mechanical force sensing semiconductor device
US5491604A (en) 1992-12-11 1996-02-13 The Regents Of The University Of California Q-controlled microresonators and tunable electronic filters using such resonators
WO1994014240A1 (en) 1992-12-11 1994-06-23 The Regents Of The University Of California Microelectromechanical signal processors
US5369544A (en) 1993-04-05 1994-11-29 Ford Motor Company Silicon-on-insulator capacitive surface micromachined absolute pressure sensor
DE4317274A1 (de) 1993-05-25 1994-12-01 Bosch Gmbh Robert Verfahren zur Herstellung oberflächen-mikromechanischer Strukturen
US6149190A (en) 1993-05-26 2000-11-21 Kionix, Inc. Micromechanical accelerometer for automotive applications
US6199874B1 (en) 1993-05-26 2001-03-13 Cornell Research Foundation Inc. Microelectromechanical accelerometer for automotive applications
US5616514A (en) 1993-06-03 1997-04-01 Robert Bosch Gmbh Method of fabricating a micromechanical sensor
US5587620A (en) * 1993-12-21 1996-12-24 Hewlett-Packard Company Tunable thin film acoustic resonators and method for making the same
KR0155141B1 (ko) 1993-12-24 1998-10-15 손병기 다공질실리콘을 이용한 반도체 장치의 제조방법
US5839062A (en) 1994-03-18 1998-11-17 The Regents Of The University Of California Mixing, modulation and demodulation via electromechanical resonators
DE4419844B4 (de) 1994-06-07 2009-11-19 Robert Bosch Gmbh Beschleunigungssensor
US5613611A (en) 1994-07-29 1997-03-25 Analog Devices, Inc. Carrier for integrated circuit package
US5510156A (en) 1994-08-23 1996-04-23 Analog Devices, Inc. Micromechanical structure with textured surface and method for making same
US5517123A (en) 1994-08-26 1996-05-14 Analog Devices, Inc. High sensitivity integrated micromechanical electrostatic potential sensor
DE4442033C2 (de) 1994-11-25 1997-12-18 Bosch Gmbh Robert Drehratensensor
US5640039A (en) 1994-12-01 1997-06-17 Analog Devices, Inc. Conductive plane beneath suspended microstructure
US5583290A (en) 1994-12-20 1996-12-10 Analog Devices, Inc. Micromechanical apparatus with limited actuation bandwidth
DE19503236B4 (de) 1995-02-02 2006-05-24 Robert Bosch Gmbh Sensor aus einem mehrschichtigen Substrat
FR2732467B1 (fr) 1995-02-10 1999-09-17 Bosch Gmbh Robert Capteur d'acceleration et procede de fabrication d'un tel capteur
DE19509868A1 (de) 1995-03-17 1996-09-19 Siemens Ag Mikromechanisches Halbleiterbauelement
US5504026A (en) 1995-04-14 1996-04-02 Analog Devices, Inc. Methods for planarization and encapsulation of micromechanical devices in semiconductor processes
DE19519488B4 (de) 1995-05-27 2005-03-10 Bosch Gmbh Robert Drehratensensor mit zwei Beschleunigungssensoren
US5922212A (en) 1995-06-08 1999-07-13 Nippondenso Co., Ltd Semiconductor sensor having suspended thin-film structure and method for fabricating thin-film structure body
JP3361916B2 (ja) 1995-06-28 2003-01-07 シャープ株式会社 微小構造の形成方法
DE19526691A1 (de) 1995-07-21 1997-01-23 Bosch Gmbh Robert Verfahren zur Herstellung von Beschleunigungssensoren
DE19526903B4 (de) 1995-07-22 2005-03-10 Bosch Gmbh Robert Drehratensensor
DE19530007C2 (de) 1995-08-16 1998-11-26 Bosch Gmbh Robert Drehratensensor
DE19539049A1 (de) 1995-10-20 1997-04-24 Bosch Gmbh Robert Verfahren zur Herstellung eines Coriolis-Drehratensensors
JPH09115999A (ja) 1995-10-23 1997-05-02 Denso Corp 半導体集積回路装置
JP3430771B2 (ja) 1996-02-05 2003-07-28 株式会社デンソー 半導体力学量センサの製造方法
US5761957A (en) 1996-02-08 1998-06-09 Denso Corporation Semiconductor pressure sensor that suppresses non-linear temperature characteristics
US5818227A (en) 1996-02-22 1998-10-06 Analog Devices, Inc. Rotatable micromachined device for sensing magnetic fields
US5880369A (en) 1996-03-15 1999-03-09 Analog Devices, Inc. Micromachined device with enhanced dimensional control
JP3423855B2 (ja) 1996-04-26 2003-07-07 株式会社デンソー 電子部品搭載用構造体および電子部品の実装方法
DE19617666B4 (de) 1996-05-03 2006-04-20 Robert Bosch Gmbh Mikromechanischer Drehratensensor
US6250156B1 (en) * 1996-05-31 2001-06-26 The Regents Of The University Of California Dual-mass micromachined vibratory rate gyroscope
US5992233A (en) 1996-05-31 1999-11-30 The Regents Of The University Of California Micromachined Z-axis vibratory rate gyroscope
US5919364A (en) 1996-06-24 1999-07-06 Regents Of The University Of California Microfabricated filter and shell constructed with a permeable membrane
JPH1047971A (ja) 1996-08-05 1998-02-20 Nippon Soken Inc 角速度センサ
DE19632060B4 (de) 1996-08-09 2012-05-03 Robert Bosch Gmbh Verfahren zur Herstellung eines Drehratensensors
JP3584635B2 (ja) * 1996-10-04 2004-11-04 株式会社デンソー 半導体装置及びその製造方法
US5948991A (en) 1996-12-09 1999-09-07 Denso Corporation Semiconductor physical quantity sensor device having semiconductor sensor chip integrated with semiconductor circuit chip
JP3568749B2 (ja) 1996-12-17 2004-09-22 株式会社デンソー 半導体のドライエッチング方法
DE19700734B4 (de) 1997-01-11 2006-06-01 Robert Bosch Gmbh Verfahren zur Herstellung von Sensoren sowie nicht-vereinzelter Waferstapel
JP3345878B2 (ja) 1997-02-17 2002-11-18 株式会社デンソー 電子回路装置の製造方法
US6146917A (en) 1997-03-03 2000-11-14 Ford Motor Company Fabrication method for encapsulated micromachined structures
US6191007B1 (en) 1997-04-28 2001-02-20 Denso Corporation Method for manufacturing a semiconductor substrate
US5969249A (en) 1997-05-07 1999-10-19 The Regents Of The University Of California Resonant accelerometer with flexural lever leverage system
US6251754B1 (en) * 1997-05-09 2001-06-26 Denso Corporation Semiconductor substrate manufacturing method
US6142358A (en) 1997-05-31 2000-11-07 The Regents Of The University Of California Wafer-to-wafer transfer of microstructures using break-away tethers
US6388279B1 (en) * 1997-06-11 2002-05-14 Denso Corporation Semiconductor substrate manufacturing method, semiconductor pressure sensor and manufacturing method thereof
US5976994A (en) * 1997-06-13 1999-11-02 Regents Of The University Of Michigan Method and system for locally annealing a microstructure formed on a substrate and device formed thereby
JPH112526A (ja) 1997-06-13 1999-01-06 Mitsubishi Electric Corp 振動型角速度センサ
US5914553A (en) 1997-06-16 1999-06-22 Cornell Research Foundation, Inc. Multistable tunable micromechanical resonators
US6199430B1 (en) 1997-06-17 2001-03-13 Denso Corporation Acceleration sensor with ring-shaped movable electrode
US6048774A (en) 1997-06-26 2000-04-11 Denso Corporation Method of manufacturing dynamic amount semiconductor sensor
JP3555388B2 (ja) 1997-06-30 2004-08-18 株式会社デンソー 半導体ヨーレートセンサ
US5928207A (en) 1997-06-30 1999-07-27 The Regents Of The University Of California Microneedle with isotropically etched tip, and method of fabricating such a device
AUPP653898A0 (en) * 1998-10-16 1998-11-05 Silverbrook Research Pty Ltd Micromechanical device and method (ij46F)
US6035714A (en) 1997-09-08 2000-03-14 The Regents Of The University Of Michigan Microelectromechanical capacitive accelerometer and method of making same
US5986316A (en) 1997-11-26 1999-11-16 Denso Corporation Semiconductor type physical quantity sensor
JP3900644B2 (ja) 1998-01-16 2007-04-04 株式会社デンソー 半導体圧力センサの製造方法
DE19903380B4 (de) * 1998-02-02 2007-10-18 Denso Corp., Kariya Halbleitersensoren für eine physikalische Grösse und ihre Herstellungsverfahren
JP4003326B2 (ja) 1998-02-12 2007-11-07 株式会社デンソー 半導体力学量センサおよびその製造方法
US6065341A (en) 1998-02-18 2000-05-23 Denso Corporation Semiconductor physical quantity sensor with stopper portion
DE19808549B4 (de) 1998-02-28 2008-07-10 Robert Bosch Gmbh Mikromechanische Kammstruktur sowie Beschleunigungssensor und Antrieb mit dieser Kammstruktur
DE19817311B4 (de) 1998-04-18 2007-03-22 Robert Bosch Gmbh Herstellungsverfahren für mikromechanisches Bauelement
DE19820816B4 (de) 1998-05-09 2006-05-11 Robert Bosch Gmbh Bondpadstruktur und entsprechendes Herstellungsverfahren
JP3307328B2 (ja) 1998-05-11 2002-07-24 株式会社デンソー 半導体力学量センサ
US6389899B1 (en) * 1998-06-09 2002-05-21 The Board Of Trustees Of The Leland Stanford Junior University In-plane micromachined accelerometer and bridge circuit having same
JP3309808B2 (ja) * 1998-08-04 2002-07-29 株式会社デンソー 圧力検出装置
US6163643A (en) 1998-08-12 2000-12-19 Lucent Technologies Inc. Micro-mechanical variable optical attenuator
US6204085B1 (en) 1998-09-15 2001-03-20 Texas Instruments Incorporated Reduced deformation of micromechanical devices through thermal stabilization
US6156652A (en) 1998-10-09 2000-12-05 The United States Of America As Represented By The Secretary Of The Air Force Post-process metallization interconnects for microelectromechanical systems
US6153839A (en) 1998-10-22 2000-11-28 Northeastern University Micromechanical switching devices
US6534340B1 (en) * 1998-11-18 2003-03-18 Analog Devices, Inc. Cover cap for semiconductor wafer devices
JP2000223446A (ja) 1998-11-27 2000-08-11 Denso Corp 半導体装置およびその製造方法
US6249073B1 (en) 1999-01-14 2001-06-19 The Regents Of The University Of Michigan Device including a micromechanical resonator having an operating frequency and method of extending same
WO2000042231A2 (en) 1999-01-15 2000-07-20 The Regents Of The University Of California Polycrystalline silicon germanium films for forming micro-electromechanical systems
US6507044B1 (en) * 1999-03-25 2003-01-14 Advanced Micro Devices, Inc. Position-selective and material-selective silicon etching to form measurement structures for semiconductor fabrication
JP4389326B2 (ja) * 1999-05-06 2009-12-24 株式会社デンソー 圧力センサ
JP2001044787A (ja) * 1999-07-30 2001-02-16 Kyocera Corp 弾性表面波装置
US6230567B1 (en) 1999-08-03 2001-05-15 The Charles Stark Draper Laboratory, Inc. Low thermal strain flexure support for a micromechanical device
US6238946B1 (en) * 1999-08-17 2001-05-29 International Business Machines Corporation Process for fabricating single crystal resonant devices that are compatible with integrated circuit processing
US6386032B1 (en) * 1999-08-26 2002-05-14 Analog Devices Imi, Inc. Micro-machined accelerometer with improved transfer characteristics
DE69938658D1 (de) * 1999-09-10 2008-06-19 St Microelectronics Srl Gegen mechanische Spannungen unempfindliche mikroelektromechanische Struktur
US6512255B2 (en) * 1999-09-17 2003-01-28 Denso Corporation Semiconductor pressure sensor device having sensor chip covered with protective member
US6524890B2 (en) * 1999-11-17 2003-02-25 Denso Corporation Method for manufacturing semiconductor device having element isolation structure
JP2001148617A (ja) * 1999-11-18 2001-05-29 Minebea Co Ltd Sawフィルターの製造方法
KR100327596B1 (ko) * 1999-12-31 2002-03-15 박종섭 Seg 공정을 이용한 반도체소자의 콘택 플러그 제조방법
US6352935B1 (en) * 2000-01-18 2002-03-05 Analog Devices, Inc. Method of forming a cover cap for semiconductor wafer devices
US6507082B2 (en) * 2000-02-22 2003-01-14 Texas Instruments Incorporated Flip-chip assembly of protected micromechanical devices
US6392144B1 (en) * 2000-03-01 2002-05-21 Sandia Corporation Micromechanical die attachment surcharge
DE10017976A1 (de) * 2000-04-11 2001-10-18 Bosch Gmbh Robert Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren
US6373007B1 (en) * 2000-04-19 2002-04-16 The United States Of America As Represented By The Secretary Of The Air Force Series and shunt mems RF switch
JP2001326367A (ja) * 2000-05-12 2001-11-22 Denso Corp センサおよびその製造方法
US6396711B1 (en) * 2000-06-06 2002-05-28 Agere Systems Guardian Corp. Interconnecting micromechanical devices
JP2002016477A (ja) * 2000-06-30 2002-01-18 Kyocera Corp 弾性表面波装置
US6508126B2 (en) * 2000-07-21 2003-01-21 Denso Corporation Dynamic quantity sensor having movable and fixed electrodes with high rigidity
US6521965B1 (en) * 2000-09-12 2003-02-18 Robert Bosch Gmbh Integrated pressure sensor
US6946326B2 (en) * 2000-12-05 2005-09-20 Analog Devices, Inc. Method and device for protecting micro electromechanical systems structures during dicing of a wafer
JP3964184B2 (ja) * 2000-12-28 2007-08-22 株式会社デンソー 積層型圧電アクチュエータ
US6555904B1 (en) * 2001-03-05 2003-04-29 Analog Devices, Inc. Electrically shielded glass lid for a packaged device
US6531767B2 (en) * 2001-04-09 2003-03-11 Analog Devices Inc. Critically aligned optical MEMS dies for large packaged substrate arrays and method of manufacture
US6552404B1 (en) * 2001-04-17 2003-04-22 Analog Devices, Inc. Integratable transducer structure
US6570468B2 (en) * 2001-06-29 2003-05-27 Intel Corporation Resonator frequency correction by modifying support structures
US20030020565A1 (en) * 2001-07-24 2003-01-30 Motorola, Inc. MEMS resonators and methods for manufacturing MEMS resonators
US6958566B2 (en) * 2001-08-16 2005-10-25 The Regents Of The University Of Michigan Mechanical resonator device having phenomena-dependent electrical stiffness
US6930364B2 (en) * 2001-09-13 2005-08-16 Silicon Light Machines Corporation Microelectronic mechanical system and methods
US6508561B1 (en) * 2001-10-17 2003-01-21 Analog Devices, Inc. Optical mirror coatings for high-temperature diffusion barriers and mirror shaping
FR2835981B1 (fr) * 2002-02-13 2005-04-29 Commissariat Energie Atomique Microresonateur mems a ondes acoustiques de volume accordable
US6707351B2 (en) * 2002-03-27 2004-03-16 Motorola, Inc. Tunable MEMS resonator and method for tuning
JP4172627B2 (ja) * 2002-08-01 2008-10-29 株式会社リコー 振動ミラー、光書込装置及び画像形成装置
US6861914B2 (en) * 2002-09-30 2005-03-01 The United States Of America As Represented By The Secretary Of The Navy Monolithic vibration isolation and an ultra-high Q mechanical resonator
US6922118B2 (en) * 2002-11-01 2005-07-26 Hrl Laboratories, Llc Micro electrical mechanical system (MEMS) tuning using focused ion beams
US7102467B2 (en) * 2004-04-28 2006-09-05 Robert Bosch Gmbh Method for adjusting the frequency of a MEMS resonator

Similar Documents

Publication Publication Date Title
JP2007535275A5 (ja)
JP2011211741A5 (ja)
JP5748823B2 (ja) Mems共振器の周波数を調整するための装置及び方法
US8310320B2 (en) Magnetic nano-resonator
US5344492A (en) Vapor growth apparatus for semiconductor devices
Southworth et al. Stress and silicon nitride: A crack in the universal dissipation of glasses
Viswanath et al. Thermoelastic switching with controlled actuation in VO2 thin films
CN1872657B (zh) 微结构及其制造方法
JP2002518913A5 (ja)
Van Den Hurk et al. Preparation and characterization of GeSx thin-films for resistive switching memories
DeMiguel-Ramos et al. Optimized tilted c-axis AlN films for improved operation of shear mode resonators
WO2015131504A1 (zh) 一种坩埚
JP2015519848A5 (ja)
CN106119782B (zh) 一种蒸发源、蒸镀设备及oled显示器生产设备
US20210176828A1 (en) High-temperature infrared radiator element and methods
CN111034039A (zh) 频率基准振荡器设备和稳定频率基准信号的方法
He et al. A thermal sensor and switch based on a plasma polymer/ZnO suspended nanobelt bimorph structure
KR101065280B1 (ko) 탄소나노튜브를 이용한 유연소자 및 그 제조방법
Larsen et al. Fabrication and characterization of SRN/SU-8 bimorph cantilevers for temperature sensing
JP2004200843A (ja) 圧電共振素子およびその製造方法ならびに電子機器
FI128032B (en) Oven-controlled frequency reference oscillator and method for its manufacture
Gablech et al. Stress-free deposition of [001] preferentially oriented titanium thin film by Kaufman ion-beam source
WO1990007789A1 (en) Thin film of intermetallic compound semiconductor and process for its production
JP3883906B2 (ja) 膜応力可変薄膜及びこれを利用した薄膜ガスセンサ
Li et al. RF nano switch based on single crystalline graphene