JP2007535275A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2007535275A5 JP2007535275A5 JP2007510707A JP2007510707A JP2007535275A5 JP 2007535275 A5 JP2007535275 A5 JP 2007535275A5 JP 2007510707 A JP2007510707 A JP 2007510707A JP 2007510707 A JP2007510707 A JP 2007510707A JP 2007535275 A5 JP2007535275 A5 JP 2007535275A5
- Authority
- JP
- Japan
- Prior art keywords
- frequency
- beam structure
- heating current
- electrical contact
- mems
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims 23
- 239000000463 material Substances 0.000 claims 10
- 239000000758 substrate Substances 0.000 claims 4
- 238000000151 deposition Methods 0.000 claims 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 2
- 239000002210 silicon-based material Substances 0.000 claims 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims 1
Claims (26)
- 共振周波数を有する梁構造を備えたマイクロ電気機械共振器と、
前記梁構造と並置され、複数の電気接点を有する周波数調整構造と
を備え、
前記周波数調整構造の材料が、加熱電流により抵抗加熱されることにより、前記周波数調整構造から蒸発して、前記梁構造に蒸着し、前記梁構造の共振周波数を変更するようにした、MEMS装置。 - 前記周波数調整構造が一体化されている固定電極を備えた、請求項1に記載のMEMS装置。
- 前記周波数調整構造が近接して配置されている固定電極を備えた、請求項1又は請求項2に記載のMEMS装置。
- 前記梁構造は、高張力区域を備えており、前記周波数調整構造は、前記高張力区域に近接して配置されている、請求項1から請求項3のいずれか1つに記載のMEMS装置。
- 前記周波数調整構造は、単結晶シリコン又は多結晶シリコンからなる、請求項1から請求項4のいずれか1つに記載のMEMS装置。
- 前記周波数調整構造は、シリコン材料からなる、請求項1から請求項5のいずれか1つに記載のMEMS装置。
- 前記加熱電流は、前記周波数調整構造を、300℃を超えるまで抵抗加熱する、請求項1から請求項6のいずれか1つに記載のMEMS装置。
- 前記加熱抵抗は、前記周波数調整構造を、900℃を超えるまで抵抗加熱する、請求項1から請求項6のいずれか1つに記載のMEMS装置。
- 前記梁構造は、高張力区域を備えており、前記周波数調整構造の材料は、ほぼ前記高張力区域の上に蒸着する、請求項1から請求項8のいずれか1つに記載のMEMS装置。
- 固定電極を備え、
前記周波数調整構造は、(i)前記固定電極と一体化された第1の構造と、(ii)前記固定電極に近接して配置された第2の構造とを備える、請求項1から請求項9のいずれか1つに記載のMEMS装置。 - 前記梁構造は、多梁整調フォーク構造を備え、前記多梁整調フォーク構造内の各梁は、第1基板アンカーによって固定されている第1端部を備える、請求項1から請求項10のいずれか1つに記載のMEMS装置。
- MEMS共振器の共振周波数を調整する方法であって、前記MEMS共振器は、第1電気接点と、第2電気接点と、少なくとも1つの基板アンカーに連結された梁構造とを備え、前記MEMS共振器は、第1共振周波数を有している、方法において、
前記第1電気接点に与える第1加熱電流を、前記第1共振周波数を用いて決定する工程と、
前記第1加熱電流を前記第1電気接点から前記第2電気接点に流して前記梁構造を抵抗加熱し、これに応じて、前記梁構造の材料が変化して前記MEMS共振器の第2共振周波数を提供する工程と
を備えた、方法。 - 前記MEMS共振器の前記第2共振周波数を測定する工程と、
第2加熱電流を決定する工程と、
前記第2加熱電流を前記前記第1電気接点から前記第2電気接点に流して前記梁構造を抵抗加熱し、これに応じて、前記梁構造の材料が変化して前記MEMS共振器の第3共振周波数を提供する工程と
を備えた、請求項12に記載の方法。 - 前記梁構造は高張力区域を備えており、前記高張力区域は、前記第1加熱電流に応じて、前記梁構造の他の部分より相当に高い温度まで加熱される、請求項12又は請求項13に記載の方法。
- MEMS共振器の共振周波数を調整する方法であって、前記MEMS共振器は、第1電気接点と、第2電気接点と、基板アンカーを介して基板に固定された梁構造とを備え、前記MEMS共振器は、第1共振周波数を有している、方法において、
前記第1加熱電流を前記第1電気接点から前記第2電気接点に流して前記梁構造を抵抗加熱し、これに応じて、前記梁構造の材料が蒸発して前記MEMS共振器の第2共振周波数を提供し、前記第1加熱電流は、前記梁構造の少なくとも一部を、900℃を超えるまで抵抗加熱する工程と、
前記MEMS共振器の前記第2共振周波数を測定する工程と
を備えた、方法。 - 前記MEMS共振器に第2加熱電流を与える工程を備え、
前記第2加熱電流を与える工程は、前記第2加熱電流を前記第1電気接点から前記第2電気接点に流して前記梁構造を抵抗加熱し、これに応じて、前記梁構造の材料が変化して前記MEMS共振器の第3共振周波数を提供する工程を含む、請求項15に記載の方法。 - 測定された前記第2共振周波数を用いて前記第2加熱電流を決定する工程を備えた、請求項15又は請求項16に記載の方法。
- 前記梁構造は、高張力区域を備えており、前記高張力区域は、前記第1加熱電流に応じて、前記梁構造の他の部分より相当に高い温度まで加熱される、請求項15から請求項17のいずれか1つに記載の方法。
- MEMS共振器の共振周波数を調整する方法であって、前記MEMS共振器は、梁構造と周波数調整構造とを備え、前記周波数調整構造は、第1電気接点及び第2電気接点を備え、前記MEMS共振器は第1共振周波数を有する、方法において、
前記第1加熱電流を前記第1電気接点から前記第2電気接点に流して前記周波数調整構造を抵抗加熱し、これに応じて、前記周波数調整構造の材料が、前記周波数調整構造から蒸発して、前記梁構造に蒸着し、前記梁構造の第2共振周波数を提供する、方法。 - 前記MEMS共振器の前記第2共振周波数を測定する工程を備えた、請求項19に記載の方法。
- 前記MEMS共振器の前記第1共振周波数を測定する工程と、
測定された前記第1共振周波数を用いて前記第1加熱電流を決定する工程と
を備えた、請求項19又は請求項20に記載の方法。 - 第2加熱電流を決定する工程と、
前記周波数調整構造に第2加熱電流を与える工程と
を備え、
前記第2加熱電流を与える工程は、前記第2加熱電流を前記第1電気接点から前記第2電気接点に流して前記周波数調整構造を抵抗加熱し、これに応じて、前記周波数調整構造の材料が、更に前記梁構造の上に蒸着して、前記MEMS共振器の前記第3共振周波数を提供する工程を含む、請求項19から請求項21のいずれか1つに記載の方法。 - 前記周波数調整構造は、前記MEMS共振器の固定電極と一体化されている、請求項19から請求項22のいずれか1つに記載の方法。
- 前記梁構造は、高張力区域を備えており、前記第1加熱電流に応じて、前記周波数調整構造の材料が、前記高張力区域に蒸着するようにした、請求項19から請求項23のいずれか1つに記載の方法。
- 前記梁構造は、複数の高張力区域を備えており、前記第1加熱電流に応じて、前記周波数調整構造の蒸発した材料の相当部分が、前記複数の高張力区域に蒸着するようにした、請求項19から請求項24のいずれか1つに記載の方法。
- 前記周波数調整構造は、多結晶シリコン材料からなる、請求項19から請求項25のいずれか1つに記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/833,433 | 2004-04-28 | ||
US10/833,433 US7102467B2 (en) | 2004-04-28 | 2004-04-28 | Method for adjusting the frequency of a MEMS resonator |
PCT/US2005/000745 WO2005109639A2 (en) | 2004-04-28 | 2005-01-11 | Method for adjusting the frequency of a mems resonator |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011124931A Division JP5437316B2 (ja) | 2004-04-28 | 2011-06-03 | Mem共振器の周波数を調整するための方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007535275A JP2007535275A (ja) | 2007-11-29 |
JP2007535275A5 true JP2007535275A5 (ja) | 2008-02-28 |
JP4980210B2 JP4980210B2 (ja) | 2012-07-18 |
Family
ID=35186492
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007510707A Active JP4980210B2 (ja) | 2004-04-28 | 2005-01-11 | Mem共振器の周波数を調整するための方法 |
JP2011124931A Active JP5437316B2 (ja) | 2004-04-28 | 2011-06-03 | Mem共振器の周波数を調整するための方法 |
JP2013225038A Active JP5748823B2 (ja) | 2004-04-28 | 2013-10-30 | Mems共振器の周波数を調整するための装置及び方法 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011124931A Active JP5437316B2 (ja) | 2004-04-28 | 2011-06-03 | Mem共振器の周波数を調整するための方法 |
JP2013225038A Active JP5748823B2 (ja) | 2004-04-28 | 2013-10-30 | Mems共振器の周波数を調整するための装置及び方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US7102467B2 (ja) |
EP (1) | EP1743421B1 (ja) |
JP (3) | JP4980210B2 (ja) |
CN (1) | CN1977448B (ja) |
DE (1) | DE602005013660D1 (ja) |
WO (1) | WO2005109639A2 (ja) |
Families Citing this family (95)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10017976A1 (de) * | 2000-04-11 | 2001-10-18 | Bosch Gmbh Robert | Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren |
US7763947B2 (en) * | 2002-04-23 | 2010-07-27 | Sharp Laboratories Of America, Inc. | Piezo-diode cantilever MEMS |
ATE510352T1 (de) * | 2003-09-10 | 2011-06-15 | Nxp Bv | Elektromechanischer wandler und elektrische einrichtung |
US7068126B2 (en) * | 2004-03-04 | 2006-06-27 | Discera | Method and apparatus for frequency tuning of a micro-mechanical resonator |
US7102467B2 (en) * | 2004-04-28 | 2006-09-05 | Robert Bosch Gmbh | Method for adjusting the frequency of a MEMS resonator |
US7176770B2 (en) * | 2004-08-24 | 2007-02-13 | Georgia Tech Research Corp. | Capacitive vertical silicon bulk acoustic resonator |
US7273762B2 (en) * | 2004-11-09 | 2007-09-25 | Freescale Semiconductor, Inc. | Microelectromechanical (MEM) device including a spring release bridge and method of making the same |
US7569800B2 (en) * | 2004-11-15 | 2009-08-04 | Yonglai Tian | Method and apparatus for rapid thermal processing and bonding of materials using RF and microwaves |
WO2007149621A2 (en) * | 2006-04-19 | 2007-12-27 | Cornell Research Foundation, Inc. | Methods and systems for object identification and for authentication |
US7578189B1 (en) | 2006-05-10 | 2009-08-25 | Qualtre, Inc. | Three-axis accelerometers |
US7563633B2 (en) * | 2006-08-25 | 2009-07-21 | Robert Bosch Gmbh | Microelectromechanical systems encapsulation process |
JP4822212B2 (ja) * | 2006-09-04 | 2011-11-24 | セイコーインスツル株式会社 | 静電振動子 |
US8314665B2 (en) * | 2006-09-20 | 2012-11-20 | Trustees Of Boston University | Nano electromechanical integrated-circuit filter |
JP4370339B2 (ja) * | 2007-03-23 | 2009-11-25 | Okiセミコンダクタ株式会社 | Mems振動子の製造方法及びmems振動子 |
FR2920754B1 (fr) * | 2007-09-07 | 2010-06-18 | St Microelectronics Sa | Micro systeme comprenant une poutre deformable par flexion et procede de fabrication |
US7907035B2 (en) * | 2007-12-18 | 2011-03-15 | Robert Bosch Gmbh | MEMS resonator array structure and method of operating and using same |
WO2009102639A1 (en) * | 2008-02-11 | 2009-08-20 | Qualcomm Mems Technologies, Inc. | Method and apparatus for sensing, measurement or characterization of display elements integrated with the display drive scheme, and system and applications using the same |
US8274299B2 (en) | 2008-02-11 | 2012-09-25 | Qualcomm Mems Technologies, Inc. | Methods for measurement and characterization of interferometric modulators |
CN102037331B (zh) * | 2008-02-11 | 2014-09-17 | 高通Mems科技公司 | 用于测量和表征干涉式调制器的方法 |
US8466858B2 (en) * | 2008-02-11 | 2013-06-18 | Qualcomm Mems Technologies, Inc. | Sensing to determine pixel state in a passively addressed display array |
US20090201282A1 (en) * | 2008-02-11 | 2009-08-13 | Qualcomm Mems Technologies, Inc | Methods of tuning interferometric modulator displays |
JP2009190150A (ja) * | 2008-02-18 | 2009-08-27 | Sanyo Electric Co Ltd | マイクロエレクトロメカニカルデバイス及びその製造方法。 |
US7990229B2 (en) | 2008-04-01 | 2011-08-02 | Sand9, Inc. | Methods and devices for compensating a signal using resonators |
US8476809B2 (en) | 2008-04-29 | 2013-07-02 | Sand 9, Inc. | Microelectromechanical systems (MEMS) resonators and related apparatus and methods |
US8044737B2 (en) * | 2008-04-29 | 2011-10-25 | Sand9, Inc. | Timing oscillators and related methods |
US8410868B2 (en) | 2009-06-04 | 2013-04-02 | Sand 9, Inc. | Methods and apparatus for temperature control of devices and mechanical resonating structures |
US8044736B2 (en) * | 2008-04-29 | 2011-10-25 | Sand9, Inc. | Timing oscillators and related methods |
US8333112B2 (en) * | 2008-06-10 | 2012-12-18 | The Boeing Company | Frequency tuning of disc resonator gyroscopes via resonator mass perturbation based on an identified model |
US7999635B1 (en) * | 2008-07-29 | 2011-08-16 | Silicon Laboratories Inc. | Out-of plane MEMS resonator with static out-of-plane deflection |
US8111108B2 (en) * | 2008-07-29 | 2012-02-07 | Sand9, Inc. | Micromechanical resonating devices and related methods |
US7888843B2 (en) * | 2008-09-10 | 2011-02-15 | Georgia Tech Research Corporation | Thin-film piezoelectric-on-insulator resonators having perforated resonator bodies therein |
CN102177654B (zh) * | 2008-10-08 | 2015-11-25 | Nxp股份有限公司 | 振荡器器件 |
US8327684B2 (en) * | 2008-10-21 | 2012-12-11 | Teledyne Scientific & Imaging, Llc | Method for adjusting resonance frequencies of a vibrating microelectromechanical device |
US8354332B2 (en) * | 2008-11-26 | 2013-01-15 | Georgia Tech Research Corporation | Methods of forming micro-electromichanical resonators having boron-doped resonator bodies containing eutectic alloys |
US8061013B2 (en) * | 2008-11-26 | 2011-11-22 | Georgia Tech Research Corporation | Micro-electromechanical resonators having electrically-trimmed resonator bodies therein and methods of fabricating same using joule heating |
IT1392736B1 (it) * | 2008-12-09 | 2012-03-16 | St Microelectronics Rousset | Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione |
US8689426B2 (en) | 2008-12-17 | 2014-04-08 | Sand 9, Inc. | Method of manufacturing a resonating structure |
JP5848131B2 (ja) | 2008-12-17 | 2016-01-27 | アナログ デバイシス, インコーポレイテッド | 機械共振構造体を備える機器 |
US8686614B2 (en) * | 2008-12-17 | 2014-04-01 | Sand 9, Inc. | Multi-port mechanical resonating devices and related methods |
JP2010162629A (ja) * | 2009-01-14 | 2010-07-29 | Seiko Epson Corp | Memsデバイスの製造方法 |
JP2010166201A (ja) * | 2009-01-14 | 2010-07-29 | Seiko Epson Corp | Memsデバイス及びその製造方法 |
US20100194246A1 (en) * | 2009-01-30 | 2010-08-05 | Integrated Device Technology, Inc. | Thin-Film Bulk Acoustic Resonators Having Reduced Susceptibility to Process-Induced Material Thickness Variations |
US7939990B2 (en) * | 2009-01-30 | 2011-05-10 | Integrated Device Technology, Inc. | Thin-film bulk acoustic resonators having perforated bodies that provide reduced susceptibility to process-induced lateral dimension variations |
US9048811B2 (en) | 2009-03-31 | 2015-06-02 | Sand 9, Inc. | Integration of piezoelectric materials with substrates |
GB2470399B (en) * | 2009-05-21 | 2013-11-27 | Ge Infrastructure Sensing Inc | A sensor arranged to measure more than one characteristic of a fluid |
US8115573B2 (en) | 2009-05-29 | 2012-02-14 | Infineon Technologies Ag | Resonance frequency tunable MEMS device |
US8043891B2 (en) * | 2009-06-05 | 2011-10-25 | Shanghai Lexvu Opto Microelectronics Technology Co., Ltd. | Method of encapsulating a wafer level microdevice |
US8381378B2 (en) * | 2009-06-19 | 2013-02-26 | Georgia Tech Research Corporation | Methods of forming micromechanical resonators having high density trench arrays therein that provide passive temperature compensation |
US8106724B1 (en) | 2009-07-23 | 2012-01-31 | Integrated Device Technologies, Inc. | Thin-film bulk acoustic resonators having perforated resonator body supports that enhance quality factor |
US8742854B1 (en) | 2009-08-31 | 2014-06-03 | Integrated Device Technology Inc. | Periodic signal generators having microelectromechanical resonators therein that support generation of high frequency low-TCF difference signals |
US9970764B2 (en) | 2009-08-31 | 2018-05-15 | Georgia Tech Research Corporation | Bulk acoustic wave gyroscope with spoked structure |
WO2011036732A1 (ja) * | 2009-09-28 | 2011-03-31 | 株式会社 東芝 | 共振器および発振器 |
US8736388B2 (en) | 2009-12-23 | 2014-05-27 | Sand 9, Inc. | Oscillators having arbitrary frequencies and related systems and methods |
US20110175492A1 (en) * | 2010-01-21 | 2011-07-21 | Imec | Temperature Compensation Device and Method for MEMS Resonator |
FI124103B (fi) * | 2010-02-22 | 2014-03-14 | Murata Electronics Oy | Parannettu mikromekaaninen resonaattori |
US8661899B2 (en) | 2010-03-01 | 2014-03-04 | Sand9, Inc. | Microelectromechanical gyroscopes and related apparatus and methods |
WO2011133682A1 (en) | 2010-04-20 | 2011-10-27 | Guiti Zolfagharkhani | Microelectromechanical gyroscopes and related apparatus and methods |
EP2395660B1 (en) * | 2010-06-10 | 2013-08-14 | Nxp B.V. | MEMS resonators |
WO2012040043A1 (en) | 2010-09-20 | 2012-03-29 | Sand9, Inc. | Resonant sensing using extensional modes of a plate |
JP2012178711A (ja) * | 2011-02-25 | 2012-09-13 | Sanyo Electric Co Ltd | Mems共振器 |
US8501515B1 (en) | 2011-02-25 | 2013-08-06 | Integrated Device Technology Inc. | Methods of forming micro-electromechanical resonators using passive compensation techniques |
FR2973608A1 (fr) | 2011-03-31 | 2012-10-05 | St Microelectronics Sa | Procede d'ajustement de la frequence de resonance d'un element vibrant micro-usine |
FI123933B (fi) * | 2011-05-13 | 2013-12-31 | Teknologian Tutkimuskeskus Vtt | Mikromekaaninen laite ja menetelmä sen suunnittelemiseksi |
US8633635B1 (en) * | 2011-06-30 | 2014-01-21 | Integrated Device Technology Inc. | Microelectromechanical resonators with thermally-actuated frequency tuning beams |
US8907549B2 (en) * | 2011-09-05 | 2014-12-09 | Nihon Dempa Kogyo Co., Ltd. | Tuning fork configured to generate flexural vibration in reverse phase to the contour vibration of first and second vibrating bodies |
US9022644B1 (en) | 2011-09-09 | 2015-05-05 | Sitime Corporation | Micromachined thermistor and temperature measurement circuitry, and method of manufacturing and operating same |
US8610336B1 (en) | 2011-09-30 | 2013-12-17 | Integrated Device Technology Inc | Microelectromechanical resonators having resistive heating elements therein configured to provide frequency tuning through convective heating of resonator bodies |
US9383208B2 (en) | 2011-10-13 | 2016-07-05 | Analog Devices, Inc. | Electromechanical magnetometer and applications thereof |
US9695036B1 (en) | 2012-02-02 | 2017-07-04 | Sitime Corporation | Temperature insensitive resonant elements and oscillators and methods of designing and manufacturing same |
JP5688690B2 (ja) * | 2013-01-11 | 2015-03-25 | 横河電機株式会社 | 振動式トランスデューサおよび振動式トランスデューサの製造方法 |
TWI538396B (zh) | 2013-05-20 | 2016-06-11 | 國立清華大學 | 微機電共振器之主動式溫度補償方法及其共振器 |
CN103354447A (zh) * | 2013-07-05 | 2013-10-16 | 广东合微集成电路技术有限公司 | 一种mems谐振器补偿系统 |
JP6292486B2 (ja) * | 2014-01-17 | 2018-03-14 | 株式会社村田製作所 | Mems素子 |
TWI558096B (zh) | 2014-01-24 | 2016-11-11 | 加高電子股份有限公司 | 溫度補償微機電振盪器 |
US9712128B2 (en) | 2014-02-09 | 2017-07-18 | Sitime Corporation | Microelectromechanical resonator |
US9705470B1 (en) | 2014-02-09 | 2017-07-11 | Sitime Corporation | Temperature-engineered MEMS resonator |
WO2016114173A1 (ja) | 2015-01-13 | 2016-07-21 | 株式会社村田製作所 | 圧電デバイスの製造方法 |
US9584092B2 (en) | 2015-04-14 | 2017-02-28 | International Business Machines Corporation | Mechanical resonator with a spring-mass system comprising a phase-change material |
EP3829060A1 (en) * | 2015-06-19 | 2021-06-02 | SiTime Corporation | Microelectromechanical resonator |
CN106803744A (zh) * | 2015-11-25 | 2017-06-06 | 中国科学院上海微系统与信息技术研究所 | 微蒸发器、振荡器集成微蒸发器结构及其频率修正方法 |
EP3181938B1 (fr) | 2015-12-18 | 2019-02-20 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Procede de fabrication d'un spiral d'une raideur predeterminee par retrait de matiere |
EP3181940B2 (fr) | 2015-12-18 | 2023-07-05 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Procede de fabrication d'un spiral d'une raideur predeterminee par retrait localise de matiere |
EP3181939B1 (fr) | 2015-12-18 | 2019-02-20 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Procede de fabrication d'un spiral d'une raideur predeterminee par ajout de matiere |
US10676349B1 (en) | 2016-08-12 | 2020-06-09 | Sitime Corporation | MEMS resonator |
US10800649B2 (en) | 2016-11-28 | 2020-10-13 | Analog Devices International Unlimited Company | Planar processing of suspended microelectromechanical systems (MEMS) devices |
US10476476B2 (en) * | 2016-12-15 | 2019-11-12 | Murata Manufacturing Co., Ltd. | MEMS resonator with suppressed spurious modes |
CN110089028B (zh) * | 2016-12-27 | 2023-01-17 | 株式会社村田制作所 | 谐振装置 |
US10418238B2 (en) * | 2017-05-12 | 2019-09-17 | Ohio State Innovation Foundation | Devices, systems, and methods for light emission and detection using amorphous silicon |
IT201700124320A1 (it) * | 2017-10-31 | 2019-05-01 | St Microelectronics Srl | Sistema di risonatore microelettromeccanico con migliorata stabilita' rispetto a variazioni di temperatura |
EP3636588B1 (en) * | 2018-09-26 | 2023-10-25 | Murata Manufacturing Co., Ltd. | Mems frequency-tuning springs |
US10843920B2 (en) | 2019-03-08 | 2020-11-24 | Analog Devices International Unlimited Company | Suspended microelectromechanical system (MEMS) devices |
US11862265B2 (en) | 2019-05-27 | 2024-01-02 | University Of Oregon | Mechanical memory and tunable nano-electromechanical systems (NEMS) resonator |
TR202017251A1 (tr) * | 2020-10-28 | 2022-05-23 | Harran Ueniversitesi | Mi̇kro/nano ci̇hazlara homojen isitma yapilarinin uygulanmasi i̇le performans ve güvenli̇k katsayilarinin artirilmasina yöneli̇k si̇stem ve yöntem |
CN112865740A (zh) * | 2020-12-31 | 2021-05-28 | 中国科学院半导体研究所 | 基于模态重分布的mems谐振器及其调节方法 |
WO2022246749A1 (zh) * | 2021-05-27 | 2022-12-01 | 天津大学 | 压电mems谐振器及其形成方法、电子设备 |
Family Cites Families (133)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US53434A (en) * | 1866-03-27 | Improved balance-beam for boring oil-wells | ||
US20565A (en) * | 1858-06-15 | Improvement in tanning leather | ||
US61564A (en) * | 1867-01-29 | Island | ||
JPS6192010A (ja) * | 1984-10-11 | 1986-05-10 | Nippon Dempa Kogyo Co Ltd | 蒸着マスク |
US4674319A (en) | 1985-03-20 | 1987-06-23 | The Regents Of The University Of California | Integrated circuit sensor |
JPS631108A (ja) * | 1986-06-19 | 1988-01-06 | Fujitsu Ltd | 周波数調整の可能な振動子 |
GB2198611B (en) | 1986-12-13 | 1990-04-04 | Spectrol Reliance Ltd | Method of forming a sealed diaphragm on a substrate |
US4945769A (en) | 1989-03-06 | 1990-08-07 | Delco Electronics Corporation | Semiconductive structure useful as a pressure sensor |
US4990462A (en) | 1989-04-12 | 1991-02-05 | Advanced Micro Devices, Inc. | Method for coplanar integration of semiconductor ic devices |
US5075253A (en) | 1989-04-12 | 1991-12-24 | Advanced Micro Devices, Inc. | Method of coplanar integration of semiconductor IC devices |
US5156903A (en) | 1989-12-21 | 1992-10-20 | Sumitomo Metal Ceramics Inc. | Multilayer ceramic substrate and manufacture thereof |
US5417111A (en) | 1990-08-17 | 1995-05-23 | Analog Devices, Inc. | Monolithic chip containing integrated circuitry and suspended microstructure |
US5620931A (en) | 1990-08-17 | 1997-04-15 | Analog Devices, Inc. | Methods for fabricating monolithic device containing circuitry and suspended microstructure |
JPH0644008B2 (ja) | 1990-08-17 | 1994-06-08 | アナログ・ディバイセス・インコーポレーテッド | モノリシック加速度計 |
US6147756A (en) | 1992-01-22 | 2000-11-14 | Northeastern University | Microspectrometer with sacrificial layer integrated with integrated circuit on the same substrate |
JP3367113B2 (ja) | 1992-04-27 | 2003-01-14 | 株式会社デンソー | 加速度センサ |
US5461916A (en) * | 1992-08-21 | 1995-10-31 | Nippondenso Co., Ltd. | Mechanical force sensing semiconductor device |
US5491604A (en) | 1992-12-11 | 1996-02-13 | The Regents Of The University Of California | Q-controlled microresonators and tunable electronic filters using such resonators |
WO1994014240A1 (en) | 1992-12-11 | 1994-06-23 | The Regents Of The University Of California | Microelectromechanical signal processors |
US5369544A (en) | 1993-04-05 | 1994-11-29 | Ford Motor Company | Silicon-on-insulator capacitive surface micromachined absolute pressure sensor |
DE4317274A1 (de) | 1993-05-25 | 1994-12-01 | Bosch Gmbh Robert | Verfahren zur Herstellung oberflächen-mikromechanischer Strukturen |
US6149190A (en) | 1993-05-26 | 2000-11-21 | Kionix, Inc. | Micromechanical accelerometer for automotive applications |
US6199874B1 (en) | 1993-05-26 | 2001-03-13 | Cornell Research Foundation Inc. | Microelectromechanical accelerometer for automotive applications |
US5616514A (en) | 1993-06-03 | 1997-04-01 | Robert Bosch Gmbh | Method of fabricating a micromechanical sensor |
US5587620A (en) * | 1993-12-21 | 1996-12-24 | Hewlett-Packard Company | Tunable thin film acoustic resonators and method for making the same |
KR0155141B1 (ko) | 1993-12-24 | 1998-10-15 | 손병기 | 다공질실리콘을 이용한 반도체 장치의 제조방법 |
US5839062A (en) | 1994-03-18 | 1998-11-17 | The Regents Of The University Of California | Mixing, modulation and demodulation via electromechanical resonators |
DE4419844B4 (de) | 1994-06-07 | 2009-11-19 | Robert Bosch Gmbh | Beschleunigungssensor |
US5613611A (en) | 1994-07-29 | 1997-03-25 | Analog Devices, Inc. | Carrier for integrated circuit package |
US5510156A (en) | 1994-08-23 | 1996-04-23 | Analog Devices, Inc. | Micromechanical structure with textured surface and method for making same |
US5517123A (en) | 1994-08-26 | 1996-05-14 | Analog Devices, Inc. | High sensitivity integrated micromechanical electrostatic potential sensor |
DE4442033C2 (de) | 1994-11-25 | 1997-12-18 | Bosch Gmbh Robert | Drehratensensor |
US5640039A (en) | 1994-12-01 | 1997-06-17 | Analog Devices, Inc. | Conductive plane beneath suspended microstructure |
US5583290A (en) | 1994-12-20 | 1996-12-10 | Analog Devices, Inc. | Micromechanical apparatus with limited actuation bandwidth |
DE19503236B4 (de) | 1995-02-02 | 2006-05-24 | Robert Bosch Gmbh | Sensor aus einem mehrschichtigen Substrat |
FR2732467B1 (fr) | 1995-02-10 | 1999-09-17 | Bosch Gmbh Robert | Capteur d'acceleration et procede de fabrication d'un tel capteur |
DE19509868A1 (de) | 1995-03-17 | 1996-09-19 | Siemens Ag | Mikromechanisches Halbleiterbauelement |
US5504026A (en) | 1995-04-14 | 1996-04-02 | Analog Devices, Inc. | Methods for planarization and encapsulation of micromechanical devices in semiconductor processes |
DE19519488B4 (de) | 1995-05-27 | 2005-03-10 | Bosch Gmbh Robert | Drehratensensor mit zwei Beschleunigungssensoren |
US5922212A (en) | 1995-06-08 | 1999-07-13 | Nippondenso Co., Ltd | Semiconductor sensor having suspended thin-film structure and method for fabricating thin-film structure body |
JP3361916B2 (ja) | 1995-06-28 | 2003-01-07 | シャープ株式会社 | 微小構造の形成方法 |
DE19526691A1 (de) | 1995-07-21 | 1997-01-23 | Bosch Gmbh Robert | Verfahren zur Herstellung von Beschleunigungssensoren |
DE19526903B4 (de) | 1995-07-22 | 2005-03-10 | Bosch Gmbh Robert | Drehratensensor |
DE19530007C2 (de) | 1995-08-16 | 1998-11-26 | Bosch Gmbh Robert | Drehratensensor |
DE19539049A1 (de) | 1995-10-20 | 1997-04-24 | Bosch Gmbh Robert | Verfahren zur Herstellung eines Coriolis-Drehratensensors |
JPH09115999A (ja) | 1995-10-23 | 1997-05-02 | Denso Corp | 半導体集積回路装置 |
JP3430771B2 (ja) | 1996-02-05 | 2003-07-28 | 株式会社デンソー | 半導体力学量センサの製造方法 |
US5761957A (en) | 1996-02-08 | 1998-06-09 | Denso Corporation | Semiconductor pressure sensor that suppresses non-linear temperature characteristics |
US5818227A (en) | 1996-02-22 | 1998-10-06 | Analog Devices, Inc. | Rotatable micromachined device for sensing magnetic fields |
US5880369A (en) | 1996-03-15 | 1999-03-09 | Analog Devices, Inc. | Micromachined device with enhanced dimensional control |
JP3423855B2 (ja) | 1996-04-26 | 2003-07-07 | 株式会社デンソー | 電子部品搭載用構造体および電子部品の実装方法 |
DE19617666B4 (de) | 1996-05-03 | 2006-04-20 | Robert Bosch Gmbh | Mikromechanischer Drehratensensor |
US6250156B1 (en) * | 1996-05-31 | 2001-06-26 | The Regents Of The University Of California | Dual-mass micromachined vibratory rate gyroscope |
US5992233A (en) | 1996-05-31 | 1999-11-30 | The Regents Of The University Of California | Micromachined Z-axis vibratory rate gyroscope |
US5919364A (en) | 1996-06-24 | 1999-07-06 | Regents Of The University Of California | Microfabricated filter and shell constructed with a permeable membrane |
JPH1047971A (ja) | 1996-08-05 | 1998-02-20 | Nippon Soken Inc | 角速度センサ |
DE19632060B4 (de) | 1996-08-09 | 2012-05-03 | Robert Bosch Gmbh | Verfahren zur Herstellung eines Drehratensensors |
JP3584635B2 (ja) * | 1996-10-04 | 2004-11-04 | 株式会社デンソー | 半導体装置及びその製造方法 |
US5948991A (en) | 1996-12-09 | 1999-09-07 | Denso Corporation | Semiconductor physical quantity sensor device having semiconductor sensor chip integrated with semiconductor circuit chip |
JP3568749B2 (ja) | 1996-12-17 | 2004-09-22 | 株式会社デンソー | 半導体のドライエッチング方法 |
DE19700734B4 (de) | 1997-01-11 | 2006-06-01 | Robert Bosch Gmbh | Verfahren zur Herstellung von Sensoren sowie nicht-vereinzelter Waferstapel |
JP3345878B2 (ja) | 1997-02-17 | 2002-11-18 | 株式会社デンソー | 電子回路装置の製造方法 |
US6146917A (en) | 1997-03-03 | 2000-11-14 | Ford Motor Company | Fabrication method for encapsulated micromachined structures |
US6191007B1 (en) | 1997-04-28 | 2001-02-20 | Denso Corporation | Method for manufacturing a semiconductor substrate |
US5969249A (en) | 1997-05-07 | 1999-10-19 | The Regents Of The University Of California | Resonant accelerometer with flexural lever leverage system |
US6251754B1 (en) * | 1997-05-09 | 2001-06-26 | Denso Corporation | Semiconductor substrate manufacturing method |
US6142358A (en) | 1997-05-31 | 2000-11-07 | The Regents Of The University Of California | Wafer-to-wafer transfer of microstructures using break-away tethers |
US6388279B1 (en) * | 1997-06-11 | 2002-05-14 | Denso Corporation | Semiconductor substrate manufacturing method, semiconductor pressure sensor and manufacturing method thereof |
US5976994A (en) * | 1997-06-13 | 1999-11-02 | Regents Of The University Of Michigan | Method and system for locally annealing a microstructure formed on a substrate and device formed thereby |
JPH112526A (ja) | 1997-06-13 | 1999-01-06 | Mitsubishi Electric Corp | 振動型角速度センサ |
US5914553A (en) | 1997-06-16 | 1999-06-22 | Cornell Research Foundation, Inc. | Multistable tunable micromechanical resonators |
US6199430B1 (en) | 1997-06-17 | 2001-03-13 | Denso Corporation | Acceleration sensor with ring-shaped movable electrode |
US6048774A (en) | 1997-06-26 | 2000-04-11 | Denso Corporation | Method of manufacturing dynamic amount semiconductor sensor |
JP3555388B2 (ja) | 1997-06-30 | 2004-08-18 | 株式会社デンソー | 半導体ヨーレートセンサ |
US5928207A (en) | 1997-06-30 | 1999-07-27 | The Regents Of The University Of California | Microneedle with isotropically etched tip, and method of fabricating such a device |
AUPP653898A0 (en) * | 1998-10-16 | 1998-11-05 | Silverbrook Research Pty Ltd | Micromechanical device and method (ij46F) |
US6035714A (en) | 1997-09-08 | 2000-03-14 | The Regents Of The University Of Michigan | Microelectromechanical capacitive accelerometer and method of making same |
US5986316A (en) | 1997-11-26 | 1999-11-16 | Denso Corporation | Semiconductor type physical quantity sensor |
JP3900644B2 (ja) | 1998-01-16 | 2007-04-04 | 株式会社デンソー | 半導体圧力センサの製造方法 |
DE19903380B4 (de) * | 1998-02-02 | 2007-10-18 | Denso Corp., Kariya | Halbleitersensoren für eine physikalische Grösse und ihre Herstellungsverfahren |
JP4003326B2 (ja) | 1998-02-12 | 2007-11-07 | 株式会社デンソー | 半導体力学量センサおよびその製造方法 |
US6065341A (en) | 1998-02-18 | 2000-05-23 | Denso Corporation | Semiconductor physical quantity sensor with stopper portion |
DE19808549B4 (de) | 1998-02-28 | 2008-07-10 | Robert Bosch Gmbh | Mikromechanische Kammstruktur sowie Beschleunigungssensor und Antrieb mit dieser Kammstruktur |
DE19817311B4 (de) | 1998-04-18 | 2007-03-22 | Robert Bosch Gmbh | Herstellungsverfahren für mikromechanisches Bauelement |
DE19820816B4 (de) | 1998-05-09 | 2006-05-11 | Robert Bosch Gmbh | Bondpadstruktur und entsprechendes Herstellungsverfahren |
JP3307328B2 (ja) | 1998-05-11 | 2002-07-24 | 株式会社デンソー | 半導体力学量センサ |
US6389899B1 (en) * | 1998-06-09 | 2002-05-21 | The Board Of Trustees Of The Leland Stanford Junior University | In-plane micromachined accelerometer and bridge circuit having same |
JP3309808B2 (ja) * | 1998-08-04 | 2002-07-29 | 株式会社デンソー | 圧力検出装置 |
US6163643A (en) | 1998-08-12 | 2000-12-19 | Lucent Technologies Inc. | Micro-mechanical variable optical attenuator |
US6204085B1 (en) | 1998-09-15 | 2001-03-20 | Texas Instruments Incorporated | Reduced deformation of micromechanical devices through thermal stabilization |
US6156652A (en) | 1998-10-09 | 2000-12-05 | The United States Of America As Represented By The Secretary Of The Air Force | Post-process metallization interconnects for microelectromechanical systems |
US6153839A (en) | 1998-10-22 | 2000-11-28 | Northeastern University | Micromechanical switching devices |
US6534340B1 (en) * | 1998-11-18 | 2003-03-18 | Analog Devices, Inc. | Cover cap for semiconductor wafer devices |
JP2000223446A (ja) | 1998-11-27 | 2000-08-11 | Denso Corp | 半導体装置およびその製造方法 |
US6249073B1 (en) | 1999-01-14 | 2001-06-19 | The Regents Of The University Of Michigan | Device including a micromechanical resonator having an operating frequency and method of extending same |
WO2000042231A2 (en) | 1999-01-15 | 2000-07-20 | The Regents Of The University Of California | Polycrystalline silicon germanium films for forming micro-electromechanical systems |
US6507044B1 (en) * | 1999-03-25 | 2003-01-14 | Advanced Micro Devices, Inc. | Position-selective and material-selective silicon etching to form measurement structures for semiconductor fabrication |
JP4389326B2 (ja) * | 1999-05-06 | 2009-12-24 | 株式会社デンソー | 圧力センサ |
JP2001044787A (ja) * | 1999-07-30 | 2001-02-16 | Kyocera Corp | 弾性表面波装置 |
US6230567B1 (en) | 1999-08-03 | 2001-05-15 | The Charles Stark Draper Laboratory, Inc. | Low thermal strain flexure support for a micromechanical device |
US6238946B1 (en) * | 1999-08-17 | 2001-05-29 | International Business Machines Corporation | Process for fabricating single crystal resonant devices that are compatible with integrated circuit processing |
US6386032B1 (en) * | 1999-08-26 | 2002-05-14 | Analog Devices Imi, Inc. | Micro-machined accelerometer with improved transfer characteristics |
DE69938658D1 (de) * | 1999-09-10 | 2008-06-19 | St Microelectronics Srl | Gegen mechanische Spannungen unempfindliche mikroelektromechanische Struktur |
US6512255B2 (en) * | 1999-09-17 | 2003-01-28 | Denso Corporation | Semiconductor pressure sensor device having sensor chip covered with protective member |
US6524890B2 (en) * | 1999-11-17 | 2003-02-25 | Denso Corporation | Method for manufacturing semiconductor device having element isolation structure |
JP2001148617A (ja) * | 1999-11-18 | 2001-05-29 | Minebea Co Ltd | Sawフィルターの製造方法 |
KR100327596B1 (ko) * | 1999-12-31 | 2002-03-15 | 박종섭 | Seg 공정을 이용한 반도체소자의 콘택 플러그 제조방법 |
US6352935B1 (en) * | 2000-01-18 | 2002-03-05 | Analog Devices, Inc. | Method of forming a cover cap for semiconductor wafer devices |
US6507082B2 (en) * | 2000-02-22 | 2003-01-14 | Texas Instruments Incorporated | Flip-chip assembly of protected micromechanical devices |
US6392144B1 (en) * | 2000-03-01 | 2002-05-21 | Sandia Corporation | Micromechanical die attachment surcharge |
DE10017976A1 (de) * | 2000-04-11 | 2001-10-18 | Bosch Gmbh Robert | Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren |
US6373007B1 (en) * | 2000-04-19 | 2002-04-16 | The United States Of America As Represented By The Secretary Of The Air Force | Series and shunt mems RF switch |
JP2001326367A (ja) * | 2000-05-12 | 2001-11-22 | Denso Corp | センサおよびその製造方法 |
US6396711B1 (en) * | 2000-06-06 | 2002-05-28 | Agere Systems Guardian Corp. | Interconnecting micromechanical devices |
JP2002016477A (ja) * | 2000-06-30 | 2002-01-18 | Kyocera Corp | 弾性表面波装置 |
US6508126B2 (en) * | 2000-07-21 | 2003-01-21 | Denso Corporation | Dynamic quantity sensor having movable and fixed electrodes with high rigidity |
US6521965B1 (en) * | 2000-09-12 | 2003-02-18 | Robert Bosch Gmbh | Integrated pressure sensor |
US6946326B2 (en) * | 2000-12-05 | 2005-09-20 | Analog Devices, Inc. | Method and device for protecting micro electromechanical systems structures during dicing of a wafer |
JP3964184B2 (ja) * | 2000-12-28 | 2007-08-22 | 株式会社デンソー | 積層型圧電アクチュエータ |
US6555904B1 (en) * | 2001-03-05 | 2003-04-29 | Analog Devices, Inc. | Electrically shielded glass lid for a packaged device |
US6531767B2 (en) * | 2001-04-09 | 2003-03-11 | Analog Devices Inc. | Critically aligned optical MEMS dies for large packaged substrate arrays and method of manufacture |
US6552404B1 (en) * | 2001-04-17 | 2003-04-22 | Analog Devices, Inc. | Integratable transducer structure |
US6570468B2 (en) * | 2001-06-29 | 2003-05-27 | Intel Corporation | Resonator frequency correction by modifying support structures |
US20030020565A1 (en) * | 2001-07-24 | 2003-01-30 | Motorola, Inc. | MEMS resonators and methods for manufacturing MEMS resonators |
US6958566B2 (en) * | 2001-08-16 | 2005-10-25 | The Regents Of The University Of Michigan | Mechanical resonator device having phenomena-dependent electrical stiffness |
US6930364B2 (en) * | 2001-09-13 | 2005-08-16 | Silicon Light Machines Corporation | Microelectronic mechanical system and methods |
US6508561B1 (en) * | 2001-10-17 | 2003-01-21 | Analog Devices, Inc. | Optical mirror coatings for high-temperature diffusion barriers and mirror shaping |
FR2835981B1 (fr) * | 2002-02-13 | 2005-04-29 | Commissariat Energie Atomique | Microresonateur mems a ondes acoustiques de volume accordable |
US6707351B2 (en) * | 2002-03-27 | 2004-03-16 | Motorola, Inc. | Tunable MEMS resonator and method for tuning |
JP4172627B2 (ja) * | 2002-08-01 | 2008-10-29 | 株式会社リコー | 振動ミラー、光書込装置及び画像形成装置 |
US6861914B2 (en) * | 2002-09-30 | 2005-03-01 | The United States Of America As Represented By The Secretary Of The Navy | Monolithic vibration isolation and an ultra-high Q mechanical resonator |
US6922118B2 (en) * | 2002-11-01 | 2005-07-26 | Hrl Laboratories, Llc | Micro electrical mechanical system (MEMS) tuning using focused ion beams |
US7102467B2 (en) * | 2004-04-28 | 2006-09-05 | Robert Bosch Gmbh | Method for adjusting the frequency of a MEMS resonator |
-
2004
- 2004-04-28 US US10/833,433 patent/US7102467B2/en active Active
-
2005
- 2005-01-11 DE DE602005013660T patent/DE602005013660D1/de active Active
- 2005-01-11 CN CN2005800212767A patent/CN1977448B/zh active Active
- 2005-01-11 JP JP2007510707A patent/JP4980210B2/ja active Active
- 2005-01-11 WO PCT/US2005/000745 patent/WO2005109639A2/en active Application Filing
- 2005-01-11 EP EP05711332A patent/EP1743421B1/en active Active
-
2006
- 2006-07-21 US US11/490,823 patent/US7221241B2/en not_active Expired - Lifetime
-
2011
- 2011-06-03 JP JP2011124931A patent/JP5437316B2/ja active Active
-
2013
- 2013-10-30 JP JP2013225038A patent/JP5748823B2/ja active Active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2007535275A5 (ja) | ||
JP2011211741A5 (ja) | ||
JP5748823B2 (ja) | Mems共振器の周波数を調整するための装置及び方法 | |
US8310320B2 (en) | Magnetic nano-resonator | |
US5344492A (en) | Vapor growth apparatus for semiconductor devices | |
Southworth et al. | Stress and silicon nitride: A crack in the universal dissipation of glasses | |
Viswanath et al. | Thermoelastic switching with controlled actuation in VO2 thin films | |
CN1872657B (zh) | 微结构及其制造方法 | |
JP2002518913A5 (ja) | ||
Van Den Hurk et al. | Preparation and characterization of GeSx thin-films for resistive switching memories | |
DeMiguel-Ramos et al. | Optimized tilted c-axis AlN films for improved operation of shear mode resonators | |
WO2015131504A1 (zh) | 一种坩埚 | |
JP2015519848A5 (ja) | ||
CN106119782B (zh) | 一种蒸发源、蒸镀设备及oled显示器生产设备 | |
US20210176828A1 (en) | High-temperature infrared radiator element and methods | |
CN111034039A (zh) | 频率基准振荡器设备和稳定频率基准信号的方法 | |
He et al. | A thermal sensor and switch based on a plasma polymer/ZnO suspended nanobelt bimorph structure | |
KR101065280B1 (ko) | 탄소나노튜브를 이용한 유연소자 및 그 제조방법 | |
Larsen et al. | Fabrication and characterization of SRN/SU-8 bimorph cantilevers for temperature sensing | |
JP2004200843A (ja) | 圧電共振素子およびその製造方法ならびに電子機器 | |
FI128032B (en) | Oven-controlled frequency reference oscillator and method for its manufacture | |
Gablech et al. | Stress-free deposition of [001] preferentially oriented titanium thin film by Kaufman ion-beam source | |
WO1990007789A1 (en) | Thin film of intermetallic compound semiconductor and process for its production | |
JP3883906B2 (ja) | 膜応力可変薄膜及びこれを利用した薄膜ガスセンサ | |
Li et al. | RF nano switch based on single crystalline graphene |