IT1392736B1 - Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione - Google Patents

Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione

Info

Publication number
IT1392736B1
IT1392736B1 ITTO2008A000916A ITTO20080916A IT1392736B1 IT 1392736 B1 IT1392736 B1 IT 1392736B1 IT TO2008A000916 A ITTO2008A000916 A IT TO2008A000916A IT TO20080916 A ITTO20080916 A IT TO20080916A IT 1392736 B1 IT1392736 B1 IT 1392736B1
Authority
IT
Italy
Prior art keywords
manufacturing process
balance device
mems technology
torsional micro
integrated torsional
Prior art date
Application number
ITTO2008A000916A
Other languages
English (en)
Inventor
Francesco Pieri
Marco Morelli
Pietro Toscano
Original Assignee
St Microelectronics Rousset
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by St Microelectronics Rousset filed Critical St Microelectronics Rousset
Priority to ITTO2008A000916A priority Critical patent/IT1392736B1/it
Priority to US12/634,579 priority patent/US8281660B2/en
Publication of ITTO20080916A1 publication Critical patent/ITTO20080916A1/it
Application granted granted Critical
Publication of IT1392736B1 publication Critical patent/IT1392736B1/it
Priority to US13/619,649 priority patent/US8677824B2/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/84—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
    • G01H13/00—Measuring resonant frequency
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/02—Analysing fluids
    • G01N29/022—Fluid sensors based on microsensors, e.g. quartz crystal-microbalance [QCM], surface acoustic wave [SAW] devices, tuning forks, cantilevers, flexural plate wave [FPW] devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/02—Analysing fluids
    • G01N29/036—Analysing fluids by measuring frequency or resonance of acoustic waves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/22—Details, e.g. general constructional or apparatus details
    • G01N29/24—Probes
    • G01N29/2412—Probes using the magnetostrictive properties of the material to be examined, e.g. electromagnetic acoustic transducers [EMAT]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/02—Indexing codes associated with the analysed material
    • G01N2291/025—Change of phase or condition
    • G01N2291/0255—(Bio)chemical reactions, e.g. on biosensors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/02—Indexing codes associated with the analysed material
    • G01N2291/025—Change of phase or condition
    • G01N2291/0256—Adsorption, desorption, surface mass change, e.g. on biosensors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Acoustics & Sound (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Micromachines (AREA)
ITTO2008A000916A 2008-12-09 2008-12-09 Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione IT1392736B1 (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
ITTO2008A000916A IT1392736B1 (it) 2008-12-09 2008-12-09 Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione
US12/634,579 US8281660B2 (en) 2008-12-09 2009-12-09 Integrated torsional-microbalance device in MEMS technology and fabrication process thereof
US13/619,649 US8677824B2 (en) 2008-12-09 2012-09-14 Integrated torsional-microbalance device in MEMS technology and fabrication process thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITTO2008A000916A IT1392736B1 (it) 2008-12-09 2008-12-09 Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione

Publications (2)

Publication Number Publication Date
ITTO20080916A1 ITTO20080916A1 (it) 2010-06-10
IT1392736B1 true IT1392736B1 (it) 2012-03-16

Family

ID=41258838

Family Applications (1)

Application Number Title Priority Date Filing Date
ITTO2008A000916A IT1392736B1 (it) 2008-12-09 2008-12-09 Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione

Country Status (2)

Country Link
US (2) US8281660B2 (it)
IT (1) IT1392736B1 (it)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1392736B1 (it) * 2008-12-09 2012-03-16 St Microelectronics Rousset Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione
CN103403538B (zh) 2010-10-20 2016-06-01 快速诊断技术公司 利用共振传感器测量结合动力的装置和方法
US8410665B2 (en) 2010-12-23 2013-04-02 Taiwan Semiconductor Manufacturing Company, Ltd. MEMS kinetic energy conversion

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998050773A2 (en) * 1997-05-08 1998-11-12 University Of Minnesota Microcantilever biosensor
JP2000223549A (ja) * 1999-01-29 2000-08-11 Canon Inc 基板搬送装置、基板搬送方法、基板搬送用ハンド機構、灰化処理装置及び灰化処理方法
AU2001285425A1 (en) * 2000-08-09 2002-02-18 California Institute Of Technology Active nems arrays for biochemical analyses
AU2003272195A1 (en) * 2002-04-30 2004-01-06 Hrl Laboratories, Llc Quartz-based nanoresonators and method of fabricating same
US7102467B2 (en) * 2004-04-28 2006-09-05 Robert Bosch Gmbh Method for adjusting the frequency of a MEMS resonator
JP5078873B2 (ja) * 2005-04-06 2012-11-21 バイオスケール・インコーポレーテッド 電気的応答デバイス
US7681433B2 (en) * 2005-05-30 2010-03-23 National Institute Of Advanced Industrial Science And Technology Detection sensor and resonator
US7802356B1 (en) * 2008-02-21 2010-09-28 Hrl Laboratories, Llc Method of fabricating an ultra thin quartz resonator component
US8161803B2 (en) * 2008-07-03 2012-04-24 Hysitron Incorporated Micromachined comb drive for quantitative nanoindentation
IT1392736B1 (it) * 2008-12-09 2012-03-16 St Microelectronics Rousset Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione
US7930923B2 (en) * 2009-04-01 2011-04-26 The University Of North Florida Board Of Trustees Quartz crystal microbalance with nanocrystalline oxide semiconductor thin films and method of detecting vapors and odors including alcoholic beverages, explosive materials and volatilized chemical compounds

Also Published As

Publication number Publication date
ITTO20080916A1 (it) 2010-06-10
US20100154544A1 (en) 2010-06-24
US20130081467A1 (en) 2013-04-04
US8677824B2 (en) 2014-03-25
US8281660B2 (en) 2012-10-09

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