JP2007250706A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
- Publication number
- JP2007250706A JP2007250706A JP2006070272A JP2006070272A JP2007250706A JP 2007250706 A JP2007250706 A JP 2007250706A JP 2006070272 A JP2006070272 A JP 2006070272A JP 2006070272 A JP2006070272 A JP 2006070272A JP 2007250706 A JP2007250706 A JP 2007250706A
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- Prior art keywords
- insulating film
- porogen
- semiconductor device
- film
- etching
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Abstract
【解決手段】基板11上に、第1多孔質絶縁膜12Aを形成する工程と、第1多孔質絶縁膜12Aよりも炭素含有率が高くなるように、第1多孔質絶縁膜12A上に、無機材料からなる骨格構造中に炭化水素化合物からなるポロジェンB’を含有してなる第2絶縁膜13を形成する工程と、第1多孔質絶縁膜12Aに達するまで、第2絶縁膜13のエッチングを行う工程とを有することを特徴とする半導体装置の製造方法である。
【選択図】図3
Description
本発明の半導体装置の製造方法に係る実施形態の一例を説明する。まず、半導体装置の製造方法を説明するにあたって、この方法に用いるCVD装置および電子線照射装置について、図1および図2の概略構成断面図を用いて説明する。
また、上記第1実施形態では、第2絶縁膜13にポロジェンB’を含有させることで、第1多孔質絶縁膜12よりも炭素含有率の高い状態とし、第2絶縁膜13のエッチングを行う例について説明したが、第1絶縁膜12にポロジェンA’を含有させることで、第2絶縁膜13よりも炭素含有率の高い状態とし、第2絶縁膜13のエッチングを行ってもよい。
ここで、上記第1実施形態では、図3(c)を用いて説明した工程において、ポロジェンB’が解離しない程度に、RFパワーを調整して成膜することとしたが、ポロジェンB’の解離エネルギーよりも高いエネルギーのプラズマを発生させることで、ポロジェンB’の一部を解離し、解離した炭素が結合したSiOCからなる骨格構造中に、一部が解離した状態のポロジェンB’を含有させて、第2絶縁膜13を形成してもよい。この場合には、例えばRFパワーを800W〜1500Wに制御する。これにより、第2絶縁膜13の骨格構造自体の炭素含有率が高くなる。このため、第2絶縁膜13中のポロジェンB’を分解除去し、第2多孔質絶縁膜13Bとした後に、エッチングにより、第2多孔質絶縁膜13Bに配線溝15を形成したとしても、第1多孔質絶縁膜12Aとのエッチング選択比をとることが可能となる。また、骨格構造中に炭素が結合することで、第2多孔質絶縁膜13Bの強度も高くなる。
図7〜図8は、第2実施形態を説明する断面工程図である。本実施形態においては、エッチングが施された積層構造の多孔質絶縁膜を形成する手順を説明する。
また、第2実施形態の変形例3として、図9(a)に示すように、第1多孔質絶縁膜22A上に第2絶縁膜23を成膜した後に、図9(b)に示すように、例えば300℃、0.5時間の熱処理を行うことによって、ポロジェンC’のみを分解除去し、高分子化したポロジェンB’の一部、例えば中央部が分解除去された状態の空孔B’’が設けられた第2多孔質絶縁膜23B’を形成してもよい。
また、上記第2実施形態では、第2絶縁膜23にポロジェンB’およびポロジェンC’を含有させることで、第1多孔質絶縁膜22Aよりも炭素含有率の高い状態とし、第2絶縁膜23のエッチングを行う例について説明したが、第1実施形態の変形例1を第2実施形態に適用してもよい。
また、上記第2実施形態および変形例3では、第2絶縁膜23を成膜する際に、ポロジェンC’が解離しないように、成膜時のRFパワーを制御する例について説明したが、ポロジェンC’の解離エネルギーよりも高く、ポロジェンB’の解離エネルギーよりも低いエネルギーのプラズマが発生するように、成膜時のRFパワーを制御して、ポロジェンC’のみを解離し、解離した炭素が結合した骨格構造中にポロジェンB’を含有させて、第2絶縁膜23を形成してもよい。次いで、ポロジェンB’を分解除去することで、第2絶縁膜23を複数の空孔Bを設けてなる第2多孔質絶縁膜13Bとする。これにより、解離した炭素が結合することで、骨格構造中の炭素含有率が高くなるため、強度が高く、また、空孔Bが設けられることで、比誘電率の低い第2多孔質絶縁膜13Bを得ることができる。
次に、本発明をデュアルダマシン工程に適用した第3実施形態を、図11〜図14の断面工程図に基づいて説明する。尚、本第3実施形態は、図3、4を用いて説明した第1実施形態の応用例である。
1と第3マスク形成層203とは、例えばシリコン源としてモノシラン(SiH4)を用い、酸化剤として一酸化二窒素(N2O)ガスを用いたPE−CVD法により成膜される。また、SiCNからなる第2マスク形成層202は、PE−CVD法により成膜される。次いで、上記第3マスク形成層203上に、配線溝パターンを有するレジストマスク301を形成する。
のエッチング装置が用いられる。このエッチング条件の一例としては、例えばエッチングガスとして、NH3およびO2を用い、ガス流量比をNH3:O2=30:1、バイアスパワーを400W、基板温度を0℃に設定する。
Claims (8)
- 基板上に、無機材料からなる骨格構造を有する2層の絶縁膜を備えた積層膜を形成する第1工程と、下層の絶縁膜に達するまで、上層の絶縁膜のエッチングを行う第2工程とを有する半導体装置の製造方法において、
前記第1工程では、前記積層膜を構成する一方の絶縁膜の炭素含有率が他方の絶縁膜よりも高くなるように、前記骨格構造中に炭化水素化合物からなる空孔形成材料を含有させて、前記一方の絶縁膜を形成する
ことを特徴とする半導体装置の製造方法。 - 請求項1記載の半導体装置の製造方法において、
前記第2工程の後に、前記一方の絶縁膜中の空孔形成材料を分解除去し、当該絶縁膜に空孔を形成して多孔質化する工程を行う
ことを特徴とする半導体装置の製造方法。 - 請求項1記載の半導体装置の製造方法において、
前記無機材料は炭素含有酸化シリコンである
ことを特徴とする半導体装置の製造方法。 - 請求項1記載の半導体装置の製造方法において、
前記第1工程では、前記空孔形成材料の一部を解離し、解離した炭素が結合した前記骨格構造中に当該空孔形成材料を含有させて、前記一方の絶縁膜を形成する
ことを特徴とする半導体装置の製造方法。 - 請求項1記載の半導体装置の製造方法において、
前記第1工程では、前記骨格構造中に、前記空孔形成材料と、当該空孔形成材料よりも低分子の炭化水素化合物からなる微小空孔形成材料とを含有させて、前記一方の絶縁膜を形成する
ことを特徴とする半導体装置の製造方法。 - 請求項5記載の半導体装置の製造方法において、
前記第1工程と前記第2工程の間に、前記一方の絶縁膜中の前記微小空孔形成材料を分解除去するとともに、前記空孔形成材料の一部を分解除去し、当該絶縁膜にそれぞれ空孔を形成して多孔質化する工程を行い、
前記第2工程の後に、残存した前記空孔形成材料を分解除去する
ことを特徴とする半導体装置の製造方法。 - 請求項5記載の半導体装置の製造方法において、
前記第1工程では、前記微小空孔形成材料を解離し、解離した炭素が結合した前記骨格構造中に前記空孔形成材料を含有させて、前記一方の絶縁膜を形成する
ことを特徴とする半導体装置の製造方法。 - 請求項1記載の半導体装置の製造方法において、
前記第2工程では、前記下層の絶縁膜をストッパーにしたパターンエッチングによって、前記上層の絶縁膜に配線溝を形成するととともに、前記配線溝の底部に露出する前記下層の絶縁膜をパターンエッチングすることにより、当該下層の絶縁膜に接続孔を形成する
ことを特徴とする半導体装置の製造方法。
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Also Published As
Publication number | Publication date |
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CN100485882C (zh) | 2009-05-06 |
TW200810013A (en) | 2008-02-16 |
TWI338347B (en) | 2011-03-01 |
KR101354413B1 (ko) | 2014-01-22 |
KR20070093920A (ko) | 2007-09-19 |
US20080254631A1 (en) | 2008-10-16 |
US8759222B2 (en) | 2014-06-24 |
CN101038873A (zh) | 2007-09-19 |
JP4788415B2 (ja) | 2011-10-05 |
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