JP2007165665A - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims description 97
- 238000004519 manufacturing process Methods 0.000 title claims description 45
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims abstract description 179
- 239000012535 impurity Substances 0.000 claims abstract description 63
- 230000005669 field effect Effects 0.000 claims abstract description 41
- 238000009792 diffusion process Methods 0.000 claims abstract description 31
- 239000000758 substrate Substances 0.000 claims description 69
- 238000000034 method Methods 0.000 claims description 34
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 23
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 23
- 239000013078 crystal Substances 0.000 claims description 13
- 229910021332 silicide Inorganic materials 0.000 claims description 13
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 13
- 230000007423 decrease Effects 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims 1
- 239000010410 layer Substances 0.000 description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 19
- 229910052814 silicon oxide Inorganic materials 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 17
- 230000035882 stress Effects 0.000 description 15
- 235000012431 wafers Nutrition 0.000 description 13
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 12
- 125000001475 halogen functional group Chemical group 0.000 description 9
- 238000002955 isolation Methods 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 6
- 230000005684 electric field Effects 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 238000001039 wet etching Methods 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000006355 external stress Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
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- 229910052785 arsenic Inorganic materials 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910005705 Ge—B Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910006990 Si1-xGex Inorganic materials 0.000 description 1
- 229910007020 Si1−xGex Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004471 energy level splitting Methods 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
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Abstract
【解決手段】pMIS1pのソース・ドレインを主として構成するp型拡散領域5cをp型不純物が導入されたp+−SiGe/p−SiGe:C/p−−SiGeにより形成し、p+−SiGeに相対的に高濃度のp型不純物を導入し、p−−SiGeに相対的に低濃度のp型不純物を導入する。p+−SiGeにはコンタクト抵抗を低減するために相対的に高濃度のp型不純物を導入する必要があるが、p−SiGe:Cによりその拡散が抑えられてp型拡散領域5cの深さを浅く維持する。
【選択図】図1
Description
H. Horstmann et al., "Advanced Transistor Structures for High Performance Microprocessors," in Proc. 2004 Int. Conf. Integrated Circuit Design and Technology, 2004, pp.65-67. T. Ghani et al., "A 90nm High Volume Manufacturing Logic Technology Featuring Novel 45nm Gate Length Strained Silicon CMOS Transistors," in IEDM Tech. Dig., 2003, pp.978-980 K. Mistry et al., "Delaying Forever: Uniaxial Strained Silicon Transistors in a 90nm CMOS Technology," in Symp. VLSI Tech. Dig., 2004, pp.50-51 S. E. Thompson et al., "A 90-nm Logic Technology Featuring Strained-Silicon," IEEE Trans. Electron Devices, 2004, pp.1790-1797 H. J. Huang et al., "Improved Low Temperature Characteristics of P-Channel MOSFETs with Si1-xGex Raised Source and Drain," IEEE Trans. Electron Devices, 2001, pp.1627-1632 A. Shimizu et al., "Local Mechanical-Stress Control(LMC) : A New Technique for CMOS-Performance Enhancement," in IEDM Tech Dig., 2001, pp.433-436 T. Mizuno et al., "(110) Strained-SOI n-MOSFETs With High Electron Mobility," IEEE Electron Device Lett., 2003, pp.266-268 R. ranade et al., "A Novel Elevated Source/Drain PMOSFET Formed by Ge-B/Si Intermixing," IEEE Electron Device Lett., 2002, pp.218-220
1p pMIS
2 半導体基板
3 素子分離
3a 溝
3b 絶縁膜
4 n型ウエル
5 ソース・ドレイン
5a p型拡張領域
5b n型ハロー領域
5c p型拡散領域
6 シリサイド膜
7n,7p ゲート電極
9 溝
10 ゲート絶縁膜
11 サイドウォール
12 p型ウエル
13 ソース・ドレイン
13a n型拡張領域
13b p型ハロー領域
13c n型拡散領域
14 窒化シリコン膜
15 層間絶縁膜
16 接続孔
17 プラグ
18 配線
19 酸化シリコン膜
20 窒化シリコン膜
21 レジストパターン
22 レジストパターン
23 多結晶シリコン膜
24 レジストパターン
25 レジストパターン
26 レジストパターン
27 酸化シリコン膜
28 窒化シリコン膜
29 レジストパターン
30 酸化シリコン膜
31 レジストパターン
32 レジストパターン
33 レジストパターン
34 支持基板
35 絶縁膜
36 シリコン層
Claims (22)
- 半導体基板の主面に形成されたpチャネル型電界効果トランジスタを有する半導体装置であって、
前記pチャネル型電界効果トランジスタのソース・ドレインにSiGeを用いており、前記SiGeにp型不純物が導入され、前記SiGeの一部分に、前記半導体基板の深さ方向への前記p型不純物の拡散を防止するCを含むSiGeが形成されていることを特徴とする半導体装置。 - 請求項1記載の半導体装置において、前記SiGeを用いて形成されたソース・ドレインは、上層SiGeと、Cを含むSiGeと、下層SiGeとの積層膜からなり、前記上層SiGeに導入されたp型不純物の濃度が前記下層SiGeに導入されたp型不純物の濃度よりも高く、前記Cを含むSiGeおよび前記下層SiGeが前記pチャネル型電界効果トランジスタのチャネル方向にも形成されていることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記SiGeを用いて形成されたソース・ドレインは、上層SiGeと、Cを含むSiGeとの積層膜からなり、前記Cを含むSiGeが前記pチャネル型電界効果トランジスタのチャネル方向にも形成されていることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記SiGeを用いて形成されたソース・ドレインは、上層SiGeと、Cを含むSiGeと、下層SiGeとの積層膜からなり、前記上層SiGeに導入されたp型不純物の濃度が前記下層SiGeに導入されたp型不純物の濃度よりも高く、前記Cを含むSiGeおよび前記下層SiGeが前記pチャネル型電界効果トランジスタのチャネル方向には形成されていないことを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記Cを含むSiGeの厚さは1〜5nmであることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記Cを含むSiGeのC混晶比は0.1〜0.3%であることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記p型不純物はBであることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記半導体基板の表面から深くなるに従い、前記p型不純物の濃度が階段型または傾斜型の勾配を持って低減することを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記SiGeを用いて形成されたソース・ドレインは、前記半導体基板の初期表面よりも持ち上がっていることを特徴とする半導体装置。
- 請求項9記載の半導体装置において、前記SiGeを用いて形成されたソース・ドレインの表面にシリサイド膜が形成されていることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、さらに前記半導体基板の主面に形成されたnチャネル型電界効果トランジスタを有し、
前記nチャネル型電界効果トランジスタのソース・ドレインは、前記半導体基板にn型不純物が導入された領域からなり、前記nチャネル型電界効果トランジスタのゲート電極および前記ソース・ドレインの上層に窒化シリコン膜が形成されていることを特徴とする半導体装置。 - 請求項1記載の半導体装置において、さらに前記半導体基板の主面に形成されたnチャネル型電界効果トランジスタを有し、
前記nチャネル型電界効果トランジスタのソース・ドレインは、前記半導体基板にn型不純物が導入された領域からなり、前記nチャネル型電界効果トランジスタのゲート電極および前記ソース・ドレインおよび前記pチャネル型電界効果トランジスタのゲート電極および前記ソース・ドレインの上層に窒化シリコン膜が形成されており、前記pチャネル型電界効果トランジスタの前記ゲート電極および前記ソース・ドレインの上層に形成された前記窒化シリコン膜にはGeが導入されていることを特徴とする半導体装置。 - 請求項1、12または13記載の半導体装置において、前記半導体基板は(100)面のウエハであることを特徴とする半導体装置。
- 請求項1、12または13記載の半導体装置において、前記半導体基板は(110)面のウエハであることを特徴とする半導体装置。
- 請求項1、12または13記載の半導体装置において、前記半導体基板はSOIであることを特徴とする半導体装置。
- 請求項1、12または13記載の半導体装置において、前記pチャネル型電界効果トランジスタのチャネルには圧縮応力が加わることを特徴とする半導体装置。
- 請求項12または13記載の半導体装置において、前記pチャネル型電界効果トランジスタのチャネルには圧縮応力が加わり、前記nチャネル型電界効果トランジスタのチャネルには引張応力が加わることを特徴とする半導体装置。
- 半導体基板の主面にpチャネル型電界効果トランジスタを形成する半導体装置の製造方法であって、以下の工程を含むことを特徴とする半導体装置の製造方法:
(a)前記半導体基板の主面上にゲート絶縁膜およびゲート電極を形成する工程;
(b)前記ゲート電極の側壁に絶縁膜からなるサイドウォールを形成する工程;
(c)前記ゲート電極の両側の前記半導体基板の活性領域に所定の深さの溝を形成する工程;
(d)エピタキシャル成長法により前記溝の内部に、前記pチャネル型電界効果トランジスタのソース・ドレインに用いられるp型不純物が導入されたSiGeを形成する工程、
さらに前記工程(d)は、以下の下位工程を含む:
(d1)前記SiGeの一部分に、前記半導体基板の深さ方向への前記p型不純物の拡散を防止するCを含むSiGeを形成する工程。 - 請求項18記載の半導体装置の製造方法において、前記工程(d1)では、下層SiGe、Cを含むSiGeおよび上層SiGeを順次形成し、前記上層SiGeに導入されたp型不純物の濃度が前記下層SiGeに導入されたp型不純物の濃度よりも高く、前記Cを含むSiGeおよび前記下層SiGeが前記pチャネル型電界効果トランジスタのチャネル方向にも形成されることを特徴とする半導体装置の製造方法。
- 請求項18記載の半導体装置の製造方法において、前記工程(d1)では、Cを含むSiGeおよび上層SiGeを順次形成し、前記Cを含むSiGeが前記pチャネル型電界効果トランジスタのチャネル方向にも形成されることを特徴とする半導体装置の製造方法。
- 請求項18記載の半導体装置の製造方法において、前記工程(d1)では、下層SiGe、Cを含むSiGeおよび上層SiGeを順次形成し、前記上層SiGeに導入されたp型不純物の濃度が前記下層SiGeに導入されたp型不純物の濃度よりも高く、前記Cを含むSiGeおよび前記下層SiGeが前記pチャネル型電界効果トランジスタのチャネル方向には形成されないことを特徴とする半導体装置の製造方法。
- 請求項18記載の半導体装置の製造方法において、前記工程(d1)では、前記p型不純物の濃度を階段型または傾斜型の勾配を持って増加させながら前記SiGeを形成することを特徴とする半導体装置の製造方法。
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