JP2006514711A5 - - Google Patents

Download PDF

Info

Publication number
JP2006514711A5
JP2006514711A5 JP2005503260A JP2005503260A JP2006514711A5 JP 2006514711 A5 JP2006514711 A5 JP 2006514711A5 JP 2005503260 A JP2005503260 A JP 2005503260A JP 2005503260 A JP2005503260 A JP 2005503260A JP 2006514711 A5 JP2006514711 A5 JP 2006514711A5
Authority
JP
Japan
Prior art keywords
composition
semiconductor nanoparticle
present
excited state
quantum dot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005503260A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006514711A (ja
Filing date
Publication date
Priority claimed from US10/263,116 external-priority patent/US7381516B2/en
Application filed filed Critical
Publication of JP2006514711A publication Critical patent/JP2006514711A/ja
Publication of JP2006514711A5 publication Critical patent/JP2006514711A5/ja
Pending legal-status Critical Current

Links

JP2005503260A 2002-10-02 2003-09-26 多光子光増感系 Pending JP2006514711A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/263,116 US7381516B2 (en) 2002-10-02 2002-10-02 Multiphoton photosensitization system
PCT/US2003/030281 WO2005000909A2 (en) 2002-10-02 2003-09-26 Multiphoton photosensitization system

Publications (2)

Publication Number Publication Date
JP2006514711A JP2006514711A (ja) 2006-05-11
JP2006514711A5 true JP2006514711A5 (enExample) 2006-11-16

Family

ID=32041936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005503260A Pending JP2006514711A (ja) 2002-10-02 2003-09-26 多光子光増感系

Country Status (11)

Country Link
US (1) US7381516B2 (enExample)
EP (1) EP1546809B1 (enExample)
JP (1) JP2006514711A (enExample)
KR (1) KR20050055741A (enExample)
CN (1) CN100549826C (enExample)
AT (1) ATE491969T1 (enExample)
AU (1) AU2003304245A1 (enExample)
BR (1) BR0314971A (enExample)
CA (1) CA2500173A1 (enExample)
DE (1) DE60335390D1 (enExample)
WO (1) WO2005000909A2 (enExample)

Families Citing this family (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1303791B1 (en) * 2000-06-15 2009-08-19 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
KR100810547B1 (ko) * 2000-06-15 2008-03-18 쓰리엠 이노베이티브 프로퍼티즈 캄파니 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법
WO2001096958A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Process for producing microfluidic articles
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
AU2001266918A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Multidirectional photoreactive absorption method
JP4965052B2 (ja) * 2000-06-15 2012-07-04 スリーエム イノベイティブ プロパティズ カンパニー 3次元光学素子の加工方法
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
WO2001096961A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Multipass multiphoton absorption method and apparatus
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US7232650B2 (en) * 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
EP1723455B1 (en) * 2003-12-05 2009-08-12 3M Innovative Properties Company Process for producing photonic crystals
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
KR100590881B1 (ko) * 2004-05-14 2006-06-19 삼성전자주식회사 광경화성 수지 조성물 및 그의 패터닝 방법
US20060216768A1 (en) * 2004-09-09 2006-09-28 Alison Sparks Dioxetane-nanoparticle assemblies for energy transfer detection systems, methods of making the assemblies, and methods of using the assemblies in bioassays
US7297374B1 (en) * 2004-12-29 2007-11-20 3M Innovative Properties Company Single- and multi-photon polymerizable pre-ceramic polymeric compositions
DE602005008774D1 (de) * 2004-12-29 2008-09-18 3M Innovative Properties Co Multiphoton-polymerisierbare vorkeramische polymerzusammensetzungen
US8718437B2 (en) 2006-03-07 2014-05-06 Qd Vision, Inc. Compositions, optical component, system including an optical component, devices, and other products
US8192922B2 (en) * 2005-10-03 2012-06-05 Carnegie Mellon University Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control
US9069256B2 (en) 2005-10-03 2015-06-30 Carnegie Mellon University Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control
US7583444B1 (en) * 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
EP2041478B1 (en) * 2006-03-07 2014-08-06 QD Vision, Inc. An article including semiconductor nanocrystals
US9874674B2 (en) 2006-03-07 2018-01-23 Samsung Electronics Co., Ltd. Compositions, optical component, system including an optical component, devices, and other products
WO2007117668A2 (en) 2006-04-07 2007-10-18 Qd Vision, Inc. Methods and articles including nanomaterial
WO2007137102A2 (en) 2006-05-18 2007-11-29 3M Innovative Properties Company Process for making light guides with extraction structures and light guides produced thereby
US20080001124A1 (en) * 2006-06-29 2008-01-03 Idemitsu Kosan Co., Ltd. Fluorescent composition and fluorescence conversion substrate using the same
US8836212B2 (en) 2007-01-11 2014-09-16 Qd Vision, Inc. Light emissive printed article printed with quantum dot ink
US8376013B2 (en) 2008-03-11 2013-02-19 Duke University Plasmonic assisted systems and methods for interior energy-activation from an exterior source
KR100757754B1 (ko) * 2007-05-23 2007-09-11 유니챌(주) 심볼과 특수기호 및 문자에 대한 정보제공 시스템 및정보제공 서비스 방법
US20100308497A1 (en) * 2007-09-06 2010-12-09 David Moses M Tool for making microstructured articles
ATE534500T1 (de) 2007-09-06 2011-12-15 3M Innovative Properties Co Verfahren zum formen von formwerkzeugen und verfahren zum formen von artikeln unter verwendung der formwerkzeuge
US8322874B2 (en) * 2007-09-06 2012-12-04 3M Innovative Properties Company Lightguides having light extraction structures providing regional control of light output
EP2208100B8 (en) 2007-10-11 2017-08-16 3M Innovative Properties Company Chromatic confocal sensor
WO2009048705A1 (en) * 2007-10-11 2009-04-16 3M Innovative Properties Company Highly functional multiphoton curable reactive species
JP5524856B2 (ja) * 2007-12-12 2014-06-18 スリーエム イノベイティブ プロパティズ カンパニー エッジ明瞭性が向上した構造の製造方法
WO2009108543A2 (en) 2008-02-26 2009-09-03 3M Innovative Properties Company Multi-photon exposure system
US9207385B2 (en) 2008-05-06 2015-12-08 Qd Vision, Inc. Lighting systems and devices including same
WO2009137053A1 (en) 2008-05-06 2009-11-12 Qd Vision, Inc. Optical components, systems including an optical component, and devices
IL196690A0 (en) * 2008-05-29 2011-08-01 Plasan Sasa Ltd Interchangeable door
US20110021653A1 (en) * 2009-07-22 2011-01-27 Lixin Zheng Hydrogel compatible two-photon initiation system
TWI572389B (zh) * 2009-11-10 2017-03-01 伊穆諾萊特公司 用於產生介質中之改變之儀器組及系統、用於產生光或固化之系統、輻射固化或可固化物品、微波或rf接受器及用於治療或診斷之系統
EP2368919A1 (de) * 2010-03-25 2011-09-28 Universität des Saarlandes Nanopartikuläre Photoinitiatoren
DE102011102421A1 (de) * 2011-05-24 2012-11-29 Heidelberger Druckmaschinen Ag Verfahren zum Verdrucken von durch Polymerisation härtenden Farben in Flachdruckmaschinen
EP2718766A1 (en) 2011-06-08 2014-04-16 3M Innovative Properties Company Photoresists containing polymer-tethered nanoparticles
KR101970987B1 (ko) * 2012-04-18 2019-04-22 에스에프씨 주식회사 이형고리 화합물 및 이를 포함하는 유기전계발광소자
JP6379671B2 (ja) * 2013-06-24 2018-08-29 Jsr株式会社 硬化性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法
WO2015084735A2 (en) 2013-12-06 2015-06-11 3M Innovative Properties Company Liquid photoreactive composition and method of fabricating structures
JP6427876B2 (ja) * 2013-12-27 2018-11-28 Jsr株式会社 感放射線性樹脂組成物、硬化膜、発光素子および発光層の形成方法
CN103728837B (zh) * 2013-12-30 2016-08-31 京东方科技集团股份有限公司 感光树脂组合物及用感光树脂组合物制备量子点图案的方法
US9728668B2 (en) 2014-02-04 2017-08-08 Raytheon Company Integrated photosensitive film and thin LED display
US9639001B2 (en) * 2014-02-04 2017-05-02 Raytheon Company Optically transitioned metal-insulator surface
JP6243872B2 (ja) * 2014-05-19 2017-12-06 富士フイルム株式会社 量子ドット含有積層体の製造方法、量子ドット含有積層体、バックライトユニット、液晶表示装置および量子ドット含有組成物
JPWO2015186521A1 (ja) * 2014-06-02 2017-04-20 昭和電工株式会社 半導体ナノ粒子含有硬化性組成物、硬化物、光学材料および電子材料
EP3154771A1 (en) * 2014-06-16 2017-04-19 SABIC Global Technologies B.V. Crosslinkable polycarbonates for material extrusion additive manufacturing processes
JP6666843B2 (ja) * 2014-09-05 2020-03-18 住友化学株式会社 硬化性組成物
KR102342178B1 (ko) * 2014-09-05 2021-12-23 스미또모 가가꾸 가부시키가이샤 경화성 조성물
EP4468081A3 (en) 2014-12-23 2025-07-09 Bridgestone Americas Tire Operations, LLC Process for producing a cured polymeric product, kit for use with the process and tire
KR101995930B1 (ko) * 2015-02-25 2019-07-03 동우 화인켐 주식회사 양자점을 포함하는 경화 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
US9776242B2 (en) * 2015-03-18 2017-10-03 California Institute Of Technology Multiphoton induced direct aggregate scribing
EP3317371A4 (en) * 2015-07-02 2019-04-03 The Regents of The University of California HYBRID MOLECULE NANOCRYSTALL PHOTO ENERGY TRANSFORMATION VIA THE VISIBLE LIGHT AND NEAR-FROSTED LIGHT
KR102377521B1 (ko) * 2015-09-11 2022-03-22 삼성디스플레이 주식회사 감광성 수지 조성물 및 이를 이용한 표시 장치
US10246634B2 (en) 2015-10-26 2019-04-02 Samsung Electronics Co., Ltd. Quantum dot having polymeric outer layer, photosensitive compositions including the same, and quantum dot polymer composite pattern produced therefrom
KR102054430B1 (ko) * 2015-12-03 2019-12-10 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
US11097531B2 (en) 2015-12-17 2021-08-24 Bridgestone Americas Tire Operations, Llc Additive manufacturing cartridges and processes for producing cured polymeric products by additive manufacturing
KR20170101005A (ko) 2016-02-26 2017-09-05 삼성에스디아이 주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터
FR3056593B1 (fr) * 2016-09-28 2020-06-26 Ecole Centrale De Marseille Procede pour la realisation d’un objet tridimensionnel par un processus de photo-polymerisation multi-photonique et dispositif associe
US11453161B2 (en) 2016-10-27 2022-09-27 Bridgestone Americas Tire Operations, Llc Processes for producing cured polymeric products by additive manufacturing
CN108659991A (zh) * 2018-05-29 2018-10-16 点铂医疗科技(常州)有限公司 一种过氧化物复合材料及其制备方法
JP7124511B2 (ja) * 2018-07-20 2022-08-24 株式会社リコー 活性エネルギー線硬化型インク
KR102416294B1 (ko) * 2020-12-14 2022-07-05 한국전자기술연구원 3d 프린팅용 광경화성 조성물 및 이를 이용한 3차원 인쇄물 제조방법
TWI797846B (zh) * 2021-11-24 2023-04-01 財團法人工業技術研究院 色彩轉換單元、應用其之色彩轉換結構及應用其之發光二極體顯示器
CN114634746B (zh) * 2022-02-14 2022-10-25 烟台大学 荧光自示警和缓蚀自修复纳米防腐涂层及制备方法

Family Cites Families (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018262A (en) 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
NL298323A (enExample) 1959-12-24
US3502520A (en) 1965-12-30 1970-03-24 Ibm Process of making patterned unitary solid bodies from finely divided discrete particles
US3583931A (en) 1969-11-26 1971-06-08 Du Pont Oxides of cubic crystal structure containing bismuth and at least one of ruthenium and iridium
US3954475A (en) 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3729313A (en) 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3808006A (en) 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3779778A (en) 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4250053A (en) 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4257915A (en) 1979-07-23 1981-03-24 E. I. Du Pont De Nemours And Company Photopolymer initiator system containing a semiconductor, a reducing agent and an oxidizing agent
US4279717A (en) 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4642126A (en) 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
JPH0786627B2 (ja) * 1987-03-06 1995-09-20 日本電信電話株式会社 光導波路
CA1323949C (en) 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4735632A (en) 1987-04-02 1988-04-05 Minnesota Mining And Manufacturing Company Coated abrasive binder containing ternary photoinitiator system
US4889792A (en) 1987-12-09 1989-12-26 Minnesota Mining And Manufacturing Company Ternary photoinitiator system for addition polymerization
CN1014362B (zh) * 1988-03-07 1991-10-16 北京工业学院 彩色全息记录介质
US4859572A (en) 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
JPH0288615A (ja) 1988-09-27 1990-03-28 Mitsubishi Rayon Co Ltd 難燃性液状感光性樹脂組成物
US4954416A (en) 1988-12-21 1990-09-04 Minnesota Mining And Manufacturing Company Tethered sulfonium salt photoinitiators for free radical polymerization
US4963471A (en) 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
US5032490A (en) 1989-08-21 1991-07-16 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable copper conductor composition
US5032478A (en) 1989-08-21 1991-07-16 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable gold conductor composition
US5047313A (en) 1989-08-21 1991-09-10 E. I. Du Pont De Nemours And Company Photosensitive semi-aqueous developable copper conductor composition
DE69019486T2 (de) 1989-11-22 1995-10-12 Johnson Matthey Plc Verbesserte Pastenzusammensetzungen.
US5238744A (en) 1990-08-16 1993-08-24 Minnesota Mining And Manufacturing Company Tough polymeric mixtures
US5235015A (en) 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
DE4116957A1 (de) 1991-05-24 1992-11-26 Ruetgerswerke Ag Durch strahlung vernetzbare beschichtungsmittel und ihre verwendung
TW268969B (enExample) 1992-10-02 1996-01-21 Minnesota Mining & Mfg
US5624782A (en) 1994-04-14 1997-04-29 E. I. Du Pont De Nemours And Company Method of manufacturing thick-film resistor elements
US5856373A (en) 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
JPH10186426A (ja) * 1996-10-24 1998-07-14 Mitsui Chem Inc 光重合性樹脂組成物
US6267913B1 (en) 1996-11-12 2001-07-31 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
WO1998021521A1 (en) 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
JP3766165B2 (ja) 1997-03-07 2006-04-12 株式会社ニコン 画像形成方法及び感光材料
US6054007A (en) 1997-04-09 2000-04-25 3M Innovative Properties Company Method of forming shaped adhesives
US5998495A (en) * 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US6025406A (en) 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
JP3281298B2 (ja) 1997-09-22 2002-05-13 シャープ株式会社 液晶表示素子の駆動装置
US6322901B1 (en) 1997-11-13 2001-11-27 Massachusetts Institute Of Technology Highly luminescent color-selective nano-crystalline materials
US6005707A (en) 1997-11-21 1999-12-21 Lucent Technologies Inc. Optical devices comprising polymer-dispersed crystalline materials
US5990479A (en) 1997-11-25 1999-11-23 Regents Of The University Of California Organo Luminescent semiconductor nanocrystal probes for biological applications and process for making and using such probes
JPH11279213A (ja) * 1998-03-30 1999-10-12 Nippon Soda Co Ltd オニウム塩化合物およびそれを含有する光硬化性組成物
US6501091B1 (en) 1998-04-01 2002-12-31 Massachusetts Institute Of Technology Quantum dot white and colored light emitting diodes
JP4564655B2 (ja) 1998-04-21 2010-10-20 ユニバーシティ オブ コネチカット 多光子励起を用いたフリーフォームナノ製作
DE19823732A1 (de) 1998-05-27 1999-12-02 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung optischer Mehrschichtsysteme
US6426513B1 (en) 1998-09-18 2002-07-30 Massachusetts Institute Of Technology Water-soluble thiol-capped nanocrystals
JP4425470B2 (ja) 1998-09-18 2010-03-03 マサチューセッツ インスティテュート オブ テクノロジー 半導体ナノ結晶の生物学的用途
US6512606B1 (en) 1999-07-29 2003-01-28 Siros Technologies, Inc. Optical storage media and method for optical data storage via local changes in reflectivity of a format grating
JP2003522962A (ja) 2000-02-16 2003-07-29 クァンタム・ドット・コーポレイション 半導体ナノクリスタルを使用するマイクロアレイ法
US6783914B1 (en) * 2000-02-25 2004-08-31 Massachusetts Institute Of Technology Encapsulated inorganic resists
US6624915B1 (en) 2000-03-16 2003-09-23 Science Applications International Corporation Holographic recording and micro/nanofabrication via ultrafast holographic two-photon induced photopolymerization (H-TPIP)
JP4148635B2 (ja) * 2000-06-12 2008-09-10 国立大学法人 奈良先端科学技術大学院大学 ナノサイズの希土類酸化物、及びその光化学反応を用いた製法
AU2001266918A1 (en) 2000-06-15 2001-12-24 3M Innovative Properties Company Multidirectional photoreactive absorption method
KR100811018B1 (ko) 2000-06-15 2008-03-14 쓰리엠 이노베이티브 프로퍼티즈 캄파니 물품에 구조를 형성 또는 추가하는 방법
EP1303791B1 (en) 2000-06-15 2009-08-19 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
EP1297021B1 (en) * 2000-06-15 2009-03-18 3M Innovative Properties Company Multiphoton photosensitization system
US7265161B2 (en) 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
WO2001096958A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Process for producing microfluidic articles
US6852766B1 (en) 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
KR100810547B1 (ko) 2000-06-15 2008-03-18 쓰리엠 이노베이티브 프로퍼티즈 캄파니 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법
JP2004503832A (ja) 2000-06-15 2004-02-05 スリーエム イノベイティブ プロパティズ カンパニー パターン化された光を用いる多光子吸収法
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
JP4965052B2 (ja) 2000-06-15 2012-07-04 スリーエム イノベイティブ プロパティズ カンパニー 3次元光学素子の加工方法
US7118845B2 (en) * 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
WO2001096961A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Multipass multiphoton absorption method and apparatus
US6686106B2 (en) 2000-06-26 2004-02-03 Ube Industries, Ltd. Photosensitive resin compositions, insulating films, and processes for formation of the films
AU2002239581B2 (en) 2000-12-15 2006-09-28 The Arizona Board Of Regents On Behalf Of The University Of Arizona Method for patterning metal using nanoparticle containing precursors
US7008749B2 (en) 2001-03-12 2006-03-07 The University Of North Carolina At Charlotte High resolution resists for next generation lithographies
EP2236488A1 (en) 2001-03-30 2010-10-06 The Arizona Board of Regents on behalf of the University of Arizona Materials, methods and uses for photochemical generation of acids and/or radical species
US6774300B2 (en) * 2001-04-27 2004-08-10 Adrena, Inc. Apparatus and method for photovoltaic energy production based on internal charge emission in a solid-state heterostructure
US6593392B2 (en) 2001-06-22 2003-07-15 Corning Incorporated Curable halogenated compositions
US6656990B2 (en) 2001-07-11 2003-12-02 Corning Incorporated Curable high refractive index compositions
DE10149780B4 (de) 2001-10-09 2019-09-05 Byk Gardner Gmbh Einrichtung zur Beleuchtung einer Messfläche und Vorrichtung und Verfahren zur Bestimmung der visuellen Eigenschaften von Körpern
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US6682872B2 (en) 2002-01-22 2004-01-27 International Business Machines Corporation UV-curable compositions and method of use thereof in microelectronics
JP3676770B2 (ja) 2002-09-20 2005-07-27 パイオニア株式会社 情報送信装置及び情報送信方法
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device

Similar Documents

Publication Publication Date Title
JP2006514711A5 (enExample)
JP2006514709A5 (enExample)
Fouassier et al. Three-component photoinitiating systems: towards innovative tailor made high performance combinations
JP2929858B2 (ja) 重合性組成物および重合方法
EP1124159B1 (en) Photocurable composition
JPH09176112A (ja) 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物および硬化性組成物
JP2005514658A (ja) 多光子光増感システム
JPH05506465A (ja) エネルギー硬化性のカチオンおよびラジカル重合性感圧組成物
JP2006514711A (ja) 多光子光増感系
JP2006514709A (ja) 多光子光増感方法
JPH09509437A (ja) カチオン重合
JPS63273602A (ja) 三元光開始剤系を含む付加重合性組成物
US7166008B2 (en) Method of curing using an electroluminescent light
Petko et al. 3D-VAT printing of nanocomposites by photopolymerisation processes using amino-meta-terphenyls as visible light-absorbing photoinitiators
JP2009013314A (ja) 光硬化型インキ
JP2009019142A (ja) 光硬化型インキ
Crivello Design and synthesis of photoacid generating systems
Lalevée et al. Recent advances in photoinduced polymerization reactions under 400–700 nm light
Toba The design of photoinitiator systems
Kabatc et al. The application of halomethyl 1, 3, 5-triazine as a photoinitiator or co-initiator for acrylate monomer polymerization
JP3870462B2 (ja) カラーフィルター用レジスト材料
JP3412199B2 (ja) 重合性組成物およびその硬化物の製造方法
JPH09328506A (ja) 重合開始剤、重合開始剤組成物、重合性組成物およびその硬化物
JPH09227854A (ja) 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物
Durmaz et al. Light induced processes for the synthesis of polymers with complex structures