BR0314971A - Composição fotorreativa e artigo - Google Patents
Composição fotorreativa e artigoInfo
- Publication number
- BR0314971A BR0314971A BR0314971-4A BR0314971A BR0314971A BR 0314971 A BR0314971 A BR 0314971A BR 0314971 A BR0314971 A BR 0314971A BR 0314971 A BR0314971 A BR 0314971A
- Authority
- BR
- Brazil
- Prior art keywords
- photoreactive composition
- article
- quantum dot
- excited state
- semiconductor nanoparticle
- Prior art date
Links
- 230000005281 excited state Effects 0.000 abstract 2
- 239000002105 nanoparticle Substances 0.000 abstract 2
- 239000002096 quantum dot Substances 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Composite Materials (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Luminescent Compositions (AREA)
Abstract
"COMPOSIçãO FOTORREATIVA E ARTIGO". Uma composição fotorreativa compreende (a) pelo menos uma espécie reativa que é capaz de passar por uma reação química iniciada por ácido ou radical e (b) um sistema fotoiniciador que compreende quantidades fotoquimicamente eficazes de (1) pelo menos um tipo de ponto de quantum de nanopartícula semicondutora que tem pelo menos um estado excitado eletrónico que é acessível pela absorção de dois ou mais fótons e (2) uma composição, diferente das ditas espécies reativas, que é capaz de interagir com o estado excitado do ponto de quantum de nanopartícula semicondutora para formar pelo menos uma espécie iniciadora de reação
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/263,116 US7381516B2 (en) | 2002-10-02 | 2002-10-02 | Multiphoton photosensitization system |
PCT/US2003/030281 WO2005000909A2 (en) | 2002-10-02 | 2003-09-26 | Multiphoton photosensitization system |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0314971A true BR0314971A (pt) | 2005-08-02 |
Family
ID=32041936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0314971-4A BR0314971A (pt) | 2002-10-02 | 2003-09-26 | Composição fotorreativa e artigo |
Country Status (11)
Country | Link |
---|---|
US (1) | US7381516B2 (pt) |
EP (1) | EP1546809B1 (pt) |
JP (1) | JP2006514711A (pt) |
KR (1) | KR20050055741A (pt) |
CN (1) | CN100549826C (pt) |
AT (1) | ATE491969T1 (pt) |
AU (1) | AU2003304245A1 (pt) |
BR (1) | BR0314971A (pt) |
CA (1) | CA2500173A1 (pt) |
DE (1) | DE60335390D1 (pt) |
WO (1) | WO2005000909A2 (pt) |
Families Citing this family (74)
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WO2001096959A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multidirectional photoreactive absorption method |
US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
US7381516B2 (en) | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
US7014988B2 (en) * | 2000-06-15 | 2006-03-21 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
EP1292862B1 (en) * | 2000-06-15 | 2009-08-19 | 3M Innovative Properties Company | Multipass multiphoton absorption method and apparatus |
ATE440305T1 (de) * | 2000-06-15 | 2009-09-15 | 3M Innovative Properties Co | Erzeugung eines mehrfarbenbildes mittels eines multiphoton photochemischen verfahren |
US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
WO2001096958A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Process for producing microfluidic articles |
US7005229B2 (en) * | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
WO2001096915A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Microfabrication of organic optical elements |
US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
US7232650B2 (en) * | 2002-10-02 | 2007-06-19 | 3M Innovative Properties Company | Planar inorganic device |
US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
JP4430622B2 (ja) * | 2003-12-05 | 2010-03-10 | スリーエム イノベイティブ プロパティズ カンパニー | フォトニック結晶の製造方法 |
US20050124712A1 (en) * | 2003-12-05 | 2005-06-09 | 3M Innovative Properties Company | Process for producing photonic crystals |
KR100590881B1 (ko) * | 2004-05-14 | 2006-06-19 | 삼성전자주식회사 | 광경화성 수지 조성물 및 그의 패터닝 방법 |
JP2008514737A (ja) * | 2004-09-09 | 2008-05-08 | アプレーラ コーポレイション | エネルギー移動検出系のためのジオキセタンナノ粒子アセンブリ、そのアセンブリを作製する方法、およびバイオアッセイにおいてそのアセンブリを使用する方法 |
US7297374B1 (en) * | 2004-12-29 | 2007-11-20 | 3M Innovative Properties Company | Single- and multi-photon polymerizable pre-ceramic polymeric compositions |
US7582685B2 (en) * | 2004-12-29 | 2009-09-01 | 3M Innovative Properties Company | Multi-photon polymerizable pre-ceramic polymeric compositions |
WO2007103310A2 (en) * | 2006-03-07 | 2007-09-13 | Qd Vision, Inc. | An article including semiconductor nanocrystals |
US8718437B2 (en) | 2006-03-07 | 2014-05-06 | Qd Vision, Inc. | Compositions, optical component, system including an optical component, devices, and other products |
US9069256B2 (en) | 2005-10-03 | 2015-06-30 | Carnegie Mellon University | Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control |
WO2007041508A2 (en) * | 2005-10-03 | 2007-04-12 | Carnegie Mellon University | Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control |
US7583444B1 (en) * | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
US9874674B2 (en) | 2006-03-07 | 2018-01-23 | Samsung Electronics Co., Ltd. | Compositions, optical component, system including an optical component, devices, and other products |
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JP2009537870A (ja) * | 2006-05-18 | 2009-10-29 | スリーエム イノベイティブ プロパティズ カンパニー | 抽出構造体を備えた導光体の製造方法及びその方法で製造された導光体 |
US20080001124A1 (en) * | 2006-06-29 | 2008-01-03 | Idemitsu Kosan Co., Ltd. | Fluorescent composition and fluorescence conversion substrate using the same |
US8836212B2 (en) | 2007-01-11 | 2014-09-16 | Qd Vision, Inc. | Light emissive printed article printed with quantum dot ink |
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ATE534500T1 (de) | 2007-09-06 | 2011-12-15 | 3M Innovative Properties Co | Verfahren zum formen von formwerkzeugen und verfahren zum formen von artikeln unter verwendung der formwerkzeuge |
JP2011501209A (ja) | 2007-10-11 | 2011-01-06 | スリーエム イノベイティブ プロパティズ カンパニー | 色共焦点センサ |
JP2011501772A (ja) * | 2007-10-11 | 2011-01-13 | スリーエム イノベイティブ プロパティズ カンパニー | 高機能性多光子硬化性反応種 |
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CL2009000560A1 (es) | 2008-03-11 | 2010-02-19 | Univ Duke | Un metodo para endurecer un medio endurecible por radiacion que comprende colocar una composicion dentro de un objeto para ser endurecido, la aplicacion de al menos uno elegido entre rayos x, rayos gama o haz de electrones a traves del objeto y dentro de la composicion. |
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EP2368919A1 (de) * | 2010-03-25 | 2011-09-28 | Universität des Saarlandes | Nanopartikuläre Photoinitiatoren |
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KR101970987B1 (ko) * | 2012-04-18 | 2019-04-22 | 에스에프씨 주식회사 | 이형고리 화합물 및 이를 포함하는 유기전계발광소자 |
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-
2002
- 2002-10-02 US US10/263,116 patent/US7381516B2/en not_active Expired - Fee Related
-
2003
- 2003-09-26 KR KR1020057005740A patent/KR20050055741A/ko not_active Application Discontinuation
- 2003-09-26 CA CA002500173A patent/CA2500173A1/en not_active Abandoned
- 2003-09-26 DE DE60335390T patent/DE60335390D1/de not_active Expired - Lifetime
- 2003-09-26 AT AT03816301T patent/ATE491969T1/de not_active IP Right Cessation
- 2003-09-26 JP JP2005503260A patent/JP2006514711A/ja active Pending
- 2003-09-26 EP EP03816301A patent/EP1546809B1/en not_active Expired - Lifetime
- 2003-09-26 WO PCT/US2003/030281 patent/WO2005000909A2/en active Search and Examination
- 2003-09-26 AU AU2003304245A patent/AU2003304245A1/en not_active Abandoned
- 2003-09-26 BR BR0314971-4A patent/BR0314971A/pt not_active IP Right Cessation
- 2003-09-26 CN CNB038235390A patent/CN100549826C/zh not_active Expired - Fee Related
Also Published As
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WO2005000909A3 (en) | 2005-03-31 |
ATE491969T1 (de) | 2011-01-15 |
EP1546809A2 (en) | 2005-06-29 |
DE60335390D1 (pt) | 2011-01-27 |
WO2005000909A2 (en) | 2005-01-06 |
EP1546809B1 (en) | 2010-12-15 |
US20040067431A1 (en) | 2004-04-08 |
KR20050055741A (ko) | 2005-06-13 |
CA2500173A1 (en) | 2005-01-06 |
JP2006514711A (ja) | 2006-05-11 |
CN100549826C (zh) | 2009-10-14 |
AU2003304245A1 (en) | 2005-01-13 |
CN1688938A (zh) | 2005-10-26 |
US7381516B2 (en) | 2008-06-03 |
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