DE60335390D1 - - Google Patents
Info
- Publication number
- DE60335390D1 DE60335390D1 DE60335390T DE60335390T DE60335390D1 DE 60335390 D1 DE60335390 D1 DE 60335390D1 DE 60335390 T DE60335390 T DE 60335390T DE 60335390 T DE60335390 T DE 60335390T DE 60335390 D1 DE60335390 D1 DE 60335390D1
- Authority
- DE
- Germany
- Prior art keywords
- quantum dot
- excited state
- semiconductor nanoparticle
- reactive species
- nanoparticle quantum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005281 excited state Effects 0.000 abstract 2
- 239000002105 nanoparticle Substances 0.000 abstract 2
- 239000002096 quantum dot Substances 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Composite Materials (AREA)
- Health & Medical Sciences (AREA)
- Mathematical Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Theoretical Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Luminescent Compositions (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/263,116 US7381516B2 (en) | 2002-10-02 | 2002-10-02 | Multiphoton photosensitization system |
PCT/US2003/030281 WO2005000909A2 (en) | 2002-10-02 | 2003-09-26 | Multiphoton photosensitization system |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60335390D1 true DE60335390D1 (de) | 2011-01-27 |
Family
ID=32041936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60335390T Expired - Lifetime DE60335390D1 (de) | 2002-10-02 | 2003-09-26 |
Country Status (11)
Country | Link |
---|---|
US (1) | US7381516B2 (de) |
EP (1) | EP1546809B1 (de) |
JP (1) | JP2006514711A (de) |
KR (1) | KR20050055741A (de) |
CN (1) | CN100549826C (de) |
AT (1) | ATE491969T1 (de) |
AU (1) | AU2003304245A1 (de) |
BR (1) | BR0314971A (de) |
CA (1) | CA2500173A1 (de) |
DE (1) | DE60335390D1 (de) |
WO (1) | WO2005000909A2 (de) |
Families Citing this family (74)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
WO2001096958A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Process for producing microfluidic articles |
EP1303791B1 (de) * | 2000-06-15 | 2009-08-19 | 3M Innovative Properties Company | Erzeugung eines mehrfarbenbildes mittels eines multiphoton photochemischen verfahren |
WO2001096915A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Microfabrication of organic optical elements |
US7005229B2 (en) * | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
US7381516B2 (en) | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
AU2001266919A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multipass multiphoton absorption method and apparatus |
JP2004503928A (ja) * | 2000-06-15 | 2004-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | 多方向光反応吸収方法 |
WO2001096917A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
US7232650B2 (en) * | 2002-10-02 | 2007-06-19 | 3M Innovative Properties Company | Planar inorganic device |
US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
AU2003304694A1 (en) * | 2003-12-05 | 2005-08-12 | 3M Innovative Properties Company | Process for producing photonic crystals and controlled defects therein |
US20050124712A1 (en) * | 2003-12-05 | 2005-06-09 | 3M Innovative Properties Company | Process for producing photonic crystals |
KR100590881B1 (ko) * | 2004-05-14 | 2006-06-19 | 삼성전자주식회사 | 광경화성 수지 조성물 및 그의 패터닝 방법 |
EP1787365A4 (de) * | 2004-09-09 | 2009-10-21 | Applera Corp | Dioxetannanopartikel-anordnungen für energieübertragungsdetektionssysteme, verfahren zur herstellung der anordnungen und verfahren zur verwendung der anordnungen bei biotests |
DE602005008774D1 (de) * | 2004-12-29 | 2008-09-18 | 3M Innovative Properties Co | Multiphoton-polymerisierbare vorkeramische polymerzusammensetzungen |
US7297374B1 (en) * | 2004-12-29 | 2007-11-20 | 3M Innovative Properties Company | Single- and multi-photon polymerizable pre-ceramic polymeric compositions |
US8718437B2 (en) | 2006-03-07 | 2014-05-06 | Qd Vision, Inc. | Compositions, optical component, system including an optical component, devices, and other products |
US9069256B2 (en) | 2005-10-03 | 2015-06-30 | Carnegie Mellon University | Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control |
US8192922B2 (en) * | 2005-10-03 | 2012-06-05 | Carnegie Mellon University | Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control |
US7583444B1 (en) | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
US9874674B2 (en) | 2006-03-07 | 2018-01-23 | Samsung Electronics Co., Ltd. | Compositions, optical component, system including an optical component, devices, and other products |
EP2041478B1 (de) * | 2006-03-07 | 2014-08-06 | QD Vision, Inc. | Halbleiternanokristalle enthaltender artikel |
WO2007117698A2 (en) | 2006-04-07 | 2007-10-18 | Qd Vision, Inc. | Composition including material, methods of depositing material, articles including same and systems for depositing material |
WO2007137102A2 (en) * | 2006-05-18 | 2007-11-29 | 3M Innovative Properties Company | Process for making light guides with extraction structures and light guides produced thereby |
US20080001124A1 (en) * | 2006-06-29 | 2008-01-03 | Idemitsu Kosan Co., Ltd. | Fluorescent composition and fluorescence conversion substrate using the same |
US8836212B2 (en) | 2007-01-11 | 2014-09-16 | Qd Vision, Inc. | Light emissive printed article printed with quantum dot ink |
KR100757754B1 (ko) * | 2007-05-23 | 2007-09-11 | 유니챌(주) | 심볼과 특수기호 및 문자에 대한 정보제공 시스템 및정보제공 서비스 방법 |
JP2010537867A (ja) | 2007-09-06 | 2010-12-09 | スリーエム イノベイティブ プロパティズ カンパニー | 型を形成する方法及びかかる型を使用して物品を成形する方法 |
JP2010537843A (ja) * | 2007-09-06 | 2010-12-09 | スリーエム イノベイティブ プロパティズ カンパニー | 微細構造物品を作製するための工具 |
WO2009032813A2 (en) | 2007-09-06 | 2009-03-12 | 3M Innovative Properties Company | Lightguides having light extraction structures providing regional control of light output |
WO2009048808A1 (en) | 2007-10-11 | 2009-04-16 | 3M Innovative Properties Company | Chromatic confocal sensor |
EP2207820A4 (de) * | 2007-10-11 | 2011-10-26 | 3M Innovative Properties Co | Hochfunktionelle multiphotonenhärtbare reaktive spezies |
JP5524856B2 (ja) * | 2007-12-12 | 2014-06-18 | スリーエム イノベイティブ プロパティズ カンパニー | エッジ明瞭性が向上した構造の製造方法 |
US8605256B2 (en) | 2008-02-26 | 2013-12-10 | 3M Innovative Properties Company | Multi-photon exposure system |
CL2009000560A1 (es) | 2008-03-11 | 2010-02-19 | Univ Duke | Un metodo para endurecer un medio endurecible por radiacion que comprende colocar una composicion dentro de un objeto para ser endurecido, la aplicacion de al menos uno elegido entre rayos x, rayos gama o haz de electrones a traves del objeto y dentro de la composicion. |
US9207385B2 (en) | 2008-05-06 | 2015-12-08 | Qd Vision, Inc. | Lighting systems and devices including same |
WO2009137053A1 (en) | 2008-05-06 | 2009-11-12 | Qd Vision, Inc. | Optical components, systems including an optical component, and devices |
IL196690A0 (en) * | 2008-05-29 | 2011-08-01 | Plasan Sasa Ltd | Interchangeable door |
US20110021653A1 (en) * | 2009-07-22 | 2011-01-27 | Lixin Zheng | Hydrogel compatible two-photon initiation system |
CN102870235B (zh) * | 2009-11-10 | 2016-11-23 | 免疫之光有限责任公司 | 用于从包括用于上变频的射频、微波能量和磁感应源的各种能量源产生发射光的上下变频系统 |
EP2368919A1 (de) * | 2010-03-25 | 2011-09-28 | Universität des Saarlandes | Nanopartikuläre Photoinitiatoren |
DE102011102421A1 (de) * | 2011-05-24 | 2012-11-29 | Heidelberger Druckmaschinen Ag | Verfahren zum Verdrucken von durch Polymerisation härtenden Farben in Flachdruckmaschinen |
EP2718766A1 (de) | 2011-06-08 | 2014-04-16 | 3M Innovative Properties Company | Fotolacke mit polymergebundenen nanopartikeln |
KR101970987B1 (ko) * | 2012-04-18 | 2019-04-22 | 에스에프씨 주식회사 | 이형고리 화합물 및 이를 포함하는 유기전계발광소자 |
JP6379671B2 (ja) * | 2013-06-24 | 2018-08-29 | Jsr株式会社 | 硬化性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法 |
JP6566952B2 (ja) | 2013-12-06 | 2019-08-28 | スリーエム イノベイティブ プロパティズ カンパニー | 光反応性液体組成物及び構造体の作製方法 |
JP6427876B2 (ja) * | 2013-12-27 | 2018-11-28 | Jsr株式会社 | 感放射線性樹脂組成物、硬化膜、発光素子および発光層の形成方法 |
CN103728837B (zh) * | 2013-12-30 | 2016-08-31 | 京东方科技集团股份有限公司 | 感光树脂组合物及用感光树脂组合物制备量子点图案的方法 |
US9728668B2 (en) | 2014-02-04 | 2017-08-08 | Raytheon Company | Integrated photosensitive film and thin LED display |
US9639001B2 (en) * | 2014-02-04 | 2017-05-02 | Raytheon Company | Optically transitioned metal-insulator surface |
JP6243872B2 (ja) * | 2014-05-19 | 2017-12-06 | 富士フイルム株式会社 | 量子ドット含有積層体の製造方法、量子ドット含有積層体、バックライトユニット、液晶表示装置および量子ドット含有組成物 |
KR101813432B1 (ko) * | 2014-06-02 | 2017-12-28 | 쇼와 덴코 가부시키가이샤 | 반도체 나노 입자 함유 경화성 조성물, 경화물, 광학 재료 및 전자 재료 |
US20170113407A1 (en) * | 2014-06-16 | 2017-04-27 | Sabic Global Technologies B.V. | Crosslinkable polycarbonates for material extrusion additive manufacturing processes |
CN106604937B (zh) * | 2014-09-05 | 2020-01-07 | 住友化学株式会社 | 固化性组合物 |
WO2016035603A1 (ja) * | 2014-09-05 | 2016-03-10 | 住友化学株式会社 | 硬化性組成物 |
JP6568218B2 (ja) * | 2014-12-23 | 2019-08-28 | ブリヂストン アメリカズ タイヤ オペレーションズ、 エルエルシー | 化学線硬化型高分子混合物、硬化高分子混合物、及び関連するプロセス |
KR101995930B1 (ko) * | 2015-02-25 | 2019-07-03 | 동우 화인켐 주식회사 | 양자점을 포함하는 경화 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 |
US9776242B2 (en) * | 2015-03-18 | 2017-10-03 | California Institute Of Technology | Multiphoton induced direct aggregate scribing |
WO2017058326A2 (en) * | 2015-07-02 | 2017-04-06 | The Regents Of The University Of California | Hybrid molecule-nanocrystal photon upconversion across the visible and near-infrared |
KR102377521B1 (ko) * | 2015-09-11 | 2022-03-22 | 삼성디스플레이 주식회사 | 감광성 수지 조성물 및 이를 이용한 표시 장치 |
EP3163372B1 (de) | 2015-10-26 | 2020-04-29 | Samsung Electronics Co., Ltd. | Quantenpunkt mit polymerer aussenschicht, lichtempfindliche zusammensetzungen damit und daraus hergestelltes quantenpunktpolymerverbundmuster |
KR102054430B1 (ko) * | 2015-12-03 | 2019-12-10 | 동우 화인켐 주식회사 | 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 |
US11097531B2 (en) | 2015-12-17 | 2021-08-24 | Bridgestone Americas Tire Operations, Llc | Additive manufacturing cartridges and processes for producing cured polymeric products by additive manufacturing |
KR20170101005A (ko) | 2016-02-26 | 2017-09-05 | 삼성에스디아이 주식회사 | 감광성 수지 조성물 및 이를 이용한 컬러필터 |
FR3056593B1 (fr) * | 2016-09-28 | 2020-06-26 | Ecole Centrale De Marseille | Procede pour la realisation d’un objet tridimensionnel par un processus de photo-polymerisation multi-photonique et dispositif associe |
EP3532267B1 (de) | 2016-10-27 | 2023-03-01 | Bridgestone Americas Tire Operations, LLC | Verfahren zur herstellung gehärteter polymerprodukte durch generative fertigung |
CN108659991A (zh) * | 2018-05-29 | 2018-10-16 | 点铂医疗科技(常州)有限公司 | 一种过氧化物复合材料及其制备方法 |
JP7124511B2 (ja) * | 2018-07-20 | 2022-08-24 | 株式会社リコー | 活性エネルギー線硬化型インク |
KR102416294B1 (ko) * | 2020-12-14 | 2022-07-05 | 한국전자기술연구원 | 3d 프린팅용 광경화성 조성물 및 이를 이용한 3차원 인쇄물 제조방법 |
TWI797846B (zh) * | 2021-11-24 | 2023-04-01 | 財團法人工業技術研究院 | 色彩轉換單元、應用其之色彩轉換結構及應用其之發光二極體顯示器 |
CN114634746B (zh) * | 2022-02-14 | 2022-10-25 | 烟台大学 | 荧光自示警和缓蚀自修复纳米防腐涂层及制备方法 |
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-
2002
- 2002-10-02 US US10/263,116 patent/US7381516B2/en not_active Expired - Fee Related
-
2003
- 2003-09-26 AU AU2003304245A patent/AU2003304245A1/en not_active Abandoned
- 2003-09-26 CA CA002500173A patent/CA2500173A1/en not_active Abandoned
- 2003-09-26 EP EP03816301A patent/EP1546809B1/de not_active Expired - Lifetime
- 2003-09-26 WO PCT/US2003/030281 patent/WO2005000909A2/en active Search and Examination
- 2003-09-26 DE DE60335390T patent/DE60335390D1/de not_active Expired - Lifetime
- 2003-09-26 BR BR0314971-4A patent/BR0314971A/pt not_active IP Right Cessation
- 2003-09-26 JP JP2005503260A patent/JP2006514711A/ja active Pending
- 2003-09-26 CN CNB038235390A patent/CN100549826C/zh not_active Expired - Fee Related
- 2003-09-26 KR KR1020057005740A patent/KR20050055741A/ko not_active Application Discontinuation
- 2003-09-26 AT AT03816301T patent/ATE491969T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US20040067431A1 (en) | 2004-04-08 |
EP1546809B1 (de) | 2010-12-15 |
CA2500173A1 (en) | 2005-01-06 |
BR0314971A (pt) | 2005-08-02 |
KR20050055741A (ko) | 2005-06-13 |
WO2005000909A3 (en) | 2005-03-31 |
CN100549826C (zh) | 2009-10-14 |
JP2006514711A (ja) | 2006-05-11 |
US7381516B2 (en) | 2008-06-03 |
ATE491969T1 (de) | 2011-01-15 |
EP1546809A2 (de) | 2005-06-29 |
WO2005000909A2 (en) | 2005-01-06 |
AU2003304245A1 (en) | 2005-01-13 |
CN1688938A (zh) | 2005-10-26 |
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