JP2006514709A5 - - Google Patents
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- JP2006514709A5 JP2006514709A5 JP2005500825A JP2005500825A JP2006514709A5 JP 2006514709 A5 JP2006514709 A5 JP 2006514709A5 JP 2005500825 A JP2005500825 A JP 2005500825A JP 2005500825 A JP2005500825 A JP 2005500825A JP 2006514709 A5 JP2006514709 A5 JP 2006514709A5
- Authority
- JP
- Japan
- Prior art keywords
- composition
- present
- semiconductor nanoparticles
- excited state
- photoreactive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 238000000034 method Methods 0.000 claims description 41
- 239000000203 mixture Substances 0.000 claims description 39
- 208000017983 photosensitivity disease Diseases 0.000 claims description 37
- 231100000434 photosensitization Toxicity 0.000 claims description 37
- 239000004065 semiconductor Substances 0.000 claims description 34
- 239000002105 nanoparticle Substances 0.000 claims description 27
- 150000001875 compounds Chemical class 0.000 claims description 21
- 230000005281 excited state Effects 0.000 claims description 17
- 238000010521 absorption reaction Methods 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 6
- 230000001939 inductive effect Effects 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 241000894007 species Species 0.000 description 12
- 150000003839 salts Chemical class 0.000 description 11
- -1 mercapto compounds Chemical class 0.000 description 10
- 239000003504 photosensitizing agent Substances 0.000 description 9
- 239000000975 dye Substances 0.000 description 8
- 150000003254 radicals Chemical class 0.000 description 7
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 4
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 150000003918 triazines Chemical class 0.000 description 3
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 2
- AGIQIOSHSMJYJP-UHFFFAOYSA-N 1,2,4-Trimethoxybenzene Chemical compound COC1=CC=C(OC)C(OC)=C1 AGIQIOSHSMJYJP-UHFFFAOYSA-N 0.000 description 2
- OHBQPCCCRFSCAX-UHFFFAOYSA-N 1,4-Dimethoxybenzene Chemical compound COC1=CC=C(OC)C=C1 OHBQPCCCRFSCAX-UHFFFAOYSA-N 0.000 description 2
- FJPGAMCQJNLTJC-UHFFFAOYSA-N 2,3-Heptanedione Chemical compound CCCCC(=O)C(C)=O FJPGAMCQJNLTJC-UHFFFAOYSA-N 0.000 description 2
- XCBBNTFYSLADTO-UHFFFAOYSA-N 2,3-Octanedione Chemical compound CCCCCC(=O)C(C)=O XCBBNTFYSLADTO-UHFFFAOYSA-N 0.000 description 2
- LBCCPKFTHIBIKU-UHFFFAOYSA-N 3,4-Heptanedione Chemical compound CCCC(=O)C(=O)CC LBCCPKFTHIBIKU-UHFFFAOYSA-N 0.000 description 2
- KVFQMAZOBTXCAZ-UHFFFAOYSA-N 3,4-Hexanedione Chemical compound CCC(=O)C(=O)CC KVFQMAZOBTXCAZ-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical group CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 239000012952 cationic photoinitiator Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 150000001989 diazonium salts Chemical class 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- 239000012949 free radical photoinitiator Substances 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- MWVFCEVNXHTDNF-UHFFFAOYSA-N hexane-2,3-dione Chemical compound CCCC(=O)C(C)=O MWVFCEVNXHTDNF-UHFFFAOYSA-N 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 150000002576 ketones Chemical group 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052752 metalloid Inorganic materials 0.000 description 2
- XYZAPOXYXNIBEU-UHFFFAOYSA-N octane-4,5-dione Chemical compound CCCC(=O)C(=O)CCC XYZAPOXYXNIBEU-UHFFFAOYSA-N 0.000 description 2
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical compound CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 2
- 239000001018 xanthene dye Substances 0.000 description 2
- FRYGPXUFBOGTFP-UHFFFAOYSA-M (2e)-3-methyl-2-[(e)-3-(3-methyl-1,3-benzothiazol-3-ium-2-yl)prop-2-enylidene]-1,3-benzothiazole;iodide Chemical compound [I-].S1C2=CC=CC=C2[N+](C)=C1/C=C/C=C1/N(C)C2=CC=CC=C2S1 FRYGPXUFBOGTFP-UHFFFAOYSA-M 0.000 description 1
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 1
- SOLBSNQBVLAREX-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]-2-hydroxy-2-phenylethanone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C(O)C1=CC=CC=C1 SOLBSNQBVLAREX-UHFFFAOYSA-N 0.000 description 1
- CDTPAAZQBPSVGS-UHFFFAOYSA-N 2-[4-(dimethylamino)phenyl]ethanol Chemical compound CN(C)C1=CC=C(CCO)C=C1 CDTPAAZQBPSVGS-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical compound OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- JQPFYXFVUKHERX-UHFFFAOYSA-N 2-hydroxy-2-cyclohexen-1-one Natural products OC1=CCCCC1=O JQPFYXFVUKHERX-UHFFFAOYSA-N 0.000 description 1
- LETDRANQSOEVCX-UHFFFAOYSA-N 2-methyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 LETDRANQSOEVCX-UHFFFAOYSA-N 0.000 description 1
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 1
- AGJRLWIJQUQEDV-UHFFFAOYSA-N 3,3,18,18-tetramethylcyclooctadecane-1,2-dione Chemical compound CC1(C)CCCCCCCCCCCCCCC(C)(C)C(=O)C1=O AGJRLWIJQUQEDV-UHFFFAOYSA-N 0.000 description 1
- DTLUXZSCFRVBER-UHFFFAOYSA-N 3,3,6,6-tetramethylcyclohexane-1,2-dione Chemical compound CC1(C)CCC(C)(C)C(=O)C1=O DTLUXZSCFRVBER-UHFFFAOYSA-N 0.000 description 1
- PAJBOHCBHXDLOU-UHFFFAOYSA-N 3,3,7,7-tetramethylcycloheptane-1,2-dione Chemical compound CC1(C)CCCC(C)(C)C(=O)C1=O PAJBOHCBHXDLOU-UHFFFAOYSA-N 0.000 description 1
- OFUVUDZHGRTQMW-UHFFFAOYSA-N 3,3,8,8-tetramethylcyclooctane-1,2-dione Chemical compound CC1(C)CCCCC(C)(C)C(=O)C1=O OFUVUDZHGRTQMW-UHFFFAOYSA-N 0.000 description 1
- NEGFNJRAUMCZMY-UHFFFAOYSA-N 3-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=CC(C(O)=O)=C1 NEGFNJRAUMCZMY-UHFFFAOYSA-N 0.000 description 1
- BGNGWHSBYQYVRX-UHFFFAOYSA-N 4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C=C1 BGNGWHSBYQYVRX-UHFFFAOYSA-N 0.000 description 1
- YDIYEOMDOWUDTJ-UHFFFAOYSA-N 4-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=C(C(O)=O)C=C1 YDIYEOMDOWUDTJ-UHFFFAOYSA-N 0.000 description 1
- JYMNQRQQBJIMCV-UHFFFAOYSA-N 4-(dimethylamino)benzonitrile Chemical compound CN(C)C1=CC=C(C#N)C=C1 JYMNQRQQBJIMCV-UHFFFAOYSA-N 0.000 description 1
- CDSULTPOCMWJCM-UHFFFAOYSA-N 4h-chromene-2,3-dione Chemical compound C1=CC=C2OC(=O)C(=O)CC2=C1 CDSULTPOCMWJCM-UHFFFAOYSA-N 0.000 description 1
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Natural products OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000999 acridine dye Substances 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 125000005235 azinium group Chemical group 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229930006711 bornane-2,3-dione Natural products 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- DKVNPHBNOWQYFE-UHFFFAOYSA-N carbamodithioic acid Chemical compound NC(S)=S DKVNPHBNOWQYFE-UHFFFAOYSA-N 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- OILAIQUEIWYQPH-UHFFFAOYSA-N cyclohexane-1,2-dione Chemical compound O=C1CCCCC1=O OILAIQUEIWYQPH-UHFFFAOYSA-N 0.000 description 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical class Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
- ZOOODBUHSVUZEM-UHFFFAOYSA-N ethoxymethanedithioic acid Chemical compound CCOC(S)=S ZOOODBUHSVUZEM-UHFFFAOYSA-N 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000006289 hydroxybenzyl group Chemical group 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- TYQCGQRIZGCHNB-JLAZNSOCSA-N l-ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(O)=C(O)C1=O TYQCGQRIZGCHNB-JLAZNSOCSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 229920013730 reactive polymer Polymers 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- AZJPTIGZZTZIDR-UHFFFAOYSA-L rose bengal Chemical group [K+].[K+].[O-]C(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 AZJPTIGZZTZIDR-UHFFFAOYSA-L 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 239000001016 thiazine dye Substances 0.000 description 1
- 239000001017 thiazole dye Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000012991 xanthate Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/263,013 US7005229B2 (en) | 2002-10-02 | 2002-10-02 | Multiphoton photosensitization method |
| PCT/US2003/030291 WO2004110607A2 (en) | 2002-10-02 | 2003-09-26 | Multiphoton photosensitization method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006514709A JP2006514709A (ja) | 2006-05-11 |
| JP2006514709A5 true JP2006514709A5 (enExample) | 2006-11-16 |
Family
ID=32041917
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005500825A Pending JP2006514709A (ja) | 2002-10-02 | 2003-09-26 | 多光子光増感方法 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US7005229B2 (enExample) |
| EP (1) | EP1552345B1 (enExample) |
| JP (1) | JP2006514709A (enExample) |
| KR (1) | KR20050048670A (enExample) |
| CN (1) | CN100549823C (enExample) |
| AT (1) | ATE381727T1 (enExample) |
| AU (1) | AU2003304202A1 (enExample) |
| BR (1) | BR0314995A (enExample) |
| CA (1) | CA2500176A1 (enExample) |
| DE (1) | DE60318230T2 (enExample) |
| WO (1) | WO2004110607A2 (enExample) |
Families Citing this family (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
| US7381516B2 (en) * | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| US7232650B2 (en) * | 2002-10-02 | 2007-06-19 | 3M Innovative Properties Company | Planar inorganic device |
| US7112616B2 (en) * | 2003-03-25 | 2006-09-26 | Fuji Photo Film Co., Ltd. | Two-photon absorbing polymerizable composition and polymerization process thereof |
| EP1723455B1 (en) * | 2003-12-05 | 2009-08-12 | 3M Innovative Properties Company | Process for producing photonic crystals |
| US20050124712A1 (en) * | 2003-12-05 | 2005-06-09 | 3M Innovative Properties Company | Process for producing photonic crystals |
| US7897296B2 (en) * | 2004-09-30 | 2011-03-01 | General Electric Company | Method for holographic storage |
| US20060078802A1 (en) * | 2004-10-13 | 2006-04-13 | Chan Kwok P | Holographic storage medium |
| US7297374B1 (en) * | 2004-12-29 | 2007-11-20 | 3M Innovative Properties Company | Single- and multi-photon polymerizable pre-ceramic polymeric compositions |
| US7541131B2 (en) * | 2005-02-18 | 2009-06-02 | Fujifilm Corporation | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition |
| US20100075393A1 (en) * | 2005-05-23 | 2010-03-25 | Board Of Regents,The University Of Texas System | Aqueous microfabrication of functional bioelectronic architectures |
| WO2007050984A2 (en) * | 2005-10-27 | 2007-05-03 | Clemson University | Fluorescent carbon nanoparticles |
| US7583444B1 (en) * | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
| DE112006003494T5 (de) * | 2005-12-21 | 2008-10-30 | 3M Innovative Properties Co., Saint Paul | Verfahren und Vorrichtung zur Verarbeitung von mehrphotonen-aushärtbaren photoreaktiven Zusammensetzungen |
| WO2007137102A2 (en) * | 2006-05-18 | 2007-11-29 | 3M Innovative Properties Company | Process for making light guides with extraction structures and light guides produced thereby |
| US7491287B2 (en) * | 2006-06-09 | 2009-02-17 | 3M Innovative Properties Company | Bonding method with flowable adhesive composition |
| US20090035576A1 (en) * | 2006-09-08 | 2009-02-05 | Prasad Paras N | Nanoparticles for two-photon activated photodynamic therapy and imaging |
| US20080233051A1 (en) * | 2006-09-08 | 2008-09-25 | Prasad Paras N | Nanoparticles for two-photon activated photodynamic therapy and imaging |
| US8376013B2 (en) | 2008-03-11 | 2013-02-19 | Duke University | Plasmonic assisted systems and methods for interior energy-activation from an exterior source |
| US20110189702A1 (en) * | 2007-07-11 | 2011-08-04 | Ya-Ping Sun | Photoluminescent materials for multiphoton imaging |
| US7989153B2 (en) * | 2007-07-11 | 2011-08-02 | Qd Vision, Inc. | Method and apparatus for selectively patterning free standing quantum DOT (FSQDT) polymer composites |
| US20090092746A1 (en) * | 2007-10-02 | 2009-04-09 | Nitto Denko Corporation | Photorefractive compositions with nanoparticles |
| IL196690A0 (en) * | 2008-05-29 | 2011-08-01 | Plasan Sasa Ltd | Interchangeable door |
| KR20100052948A (ko) * | 2008-11-11 | 2010-05-20 | 삼성전자주식회사 | 라디칼 중합용 조성물 및 이를 이용한 패턴 형성 방법 |
| US20110021653A1 (en) * | 2009-07-22 | 2011-01-27 | Lixin Zheng | Hydrogel compatible two-photon initiation system |
| US8216767B2 (en) * | 2009-09-08 | 2012-07-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Patterning process and chemical amplified photoresist with a photodegradable base |
| US8956806B2 (en) * | 2009-09-18 | 2015-02-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and patterning process |
| US8512939B2 (en) * | 2009-09-25 | 2013-08-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist stripping technique |
| TWI572389B (zh) * | 2009-11-10 | 2017-03-01 | 伊穆諾萊特公司 | 用於產生介質中之改變之儀器組及系統、用於產生光或固化之系統、輻射固化或可固化物品、微波或rf接受器及用於治療或診斷之系統 |
| US20120097521A1 (en) * | 2010-10-25 | 2012-04-26 | University Of Massachusetts | Nanostructured apparatus and methods for producing carbon-containing molecules as a renewable energy resource |
| DE102011102421A1 (de) * | 2011-05-24 | 2012-11-29 | Heidelberger Druckmaschinen Ag | Verfahren zum Verdrucken von durch Polymerisation härtenden Farben in Flachdruckmaschinen |
| EP2718766A1 (en) | 2011-06-08 | 2014-04-16 | 3M Innovative Properties Company | Photoresists containing polymer-tethered nanoparticles |
| JP6065665B2 (ja) * | 2013-03-11 | 2017-01-25 | Jsr株式会社 | 感放射線性樹脂組成物、硬化膜、発光表示素子および発光層の形成方法 |
| JP6094406B2 (ja) * | 2013-07-11 | 2017-03-15 | Jsr株式会社 | 感放射線性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法 |
| GB201317421D0 (en) * | 2013-10-02 | 2013-11-13 | Pb Clermont Sa | Nitrocellulose based propellant composition stabilized with a trialkoxy benzene stabilizer |
| WO2015084735A2 (en) | 2013-12-06 | 2015-06-11 | 3M Innovative Properties Company | Liquid photoreactive composition and method of fabricating structures |
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| JP6427876B2 (ja) * | 2013-12-27 | 2018-11-28 | Jsr株式会社 | 感放射線性樹脂組成物、硬化膜、発光素子および発光層の形成方法 |
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- 2003-09-26 CN CNB038235374A patent/CN100549823C/zh not_active Expired - Fee Related
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