JP5563589B2 - 非線形熱重合を使用した三次元物品 - Google Patents
非線形熱重合を使用した三次元物品 Download PDFInfo
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- JP5563589B2 JP5563589B2 JP2011539549A JP2011539549A JP5563589B2 JP 5563589 B2 JP5563589 B2 JP 5563589B2 JP 2011539549 A JP2011539549 A JP 2011539549A JP 2011539549 A JP2011539549 A JP 2011539549A JP 5563589 B2 JP5563589 B2 JP 5563589B2
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- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- RGBXDEHYFWDBKD-UHFFFAOYSA-N propan-2-yl propan-2-yloxy carbonate Chemical compound CC(C)OOC(=O)OC(C)C RGBXDEHYFWDBKD-UHFFFAOYSA-N 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 230000003362 replicative effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- JACPFCQFVIAGDN-UHFFFAOYSA-M sipc iv Chemical class [OH-].[Si+4].CN(C)CCC[Si](C)(C)[O-].C=1C=CC=C(C(N=C2[N-]C(C3=CC=CC=C32)=N2)=N3)C=1C3=CC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 JACPFCQFVIAGDN-UHFFFAOYSA-M 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- YNHJECZULSZAQK-UHFFFAOYSA-N tetraphenylporphyrin Chemical compound C1=CC(C(=C2C=CC(N2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3N2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 YNHJECZULSZAQK-UHFFFAOYSA-N 0.000 description 1
- 238000012722 thermally initiated polymerization Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/23—Sheet including cover or casing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/23—Sheet including cover or casing
- Y10T428/231—Filled with gas other than air; or under vacuum
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249971—Preformed hollow element-containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
「アルキル」は、飽和炭化水素であるアルカンのラジカルである一価の基を示す。アルキルは、直鎖、分岐、環状、又はそれらの組み合わせであることができ、かつ典型的には、1〜20個の炭素原子を有する。
「アリール」とは、芳香族かつ炭素環式である一価の基を意味する。アリールは、芳香環に結合又は縮合した1〜5個の環を有することができる。その他の環状構造は、芳香族、非芳香族、又はこれらの組み合わせであることができる。
「コートされた基材」とは、少なくとも1つの材料層をその上に有する基材を意味し、基材上へ少なくとも1つの材料層を置くために使用されたプロセス手段に関係しない。
「光熱変換器」とは、化学線の吸収によって主として熱を生じる化合物又は組成物を意味する。
「ヘテロアルキル」とは、炭化水素鎖中の1個以上の炭素原子を置き換えるN、O、及びSなどのヘテロ原子を含有する炭化水素鎖を含むアルキル基を意味する。
「(メタ)アクリレート」とは、アクリル酸及びメタクリル酸の両方から誘導される材料を意味する。
「非線形」とは、化学線の吸収が強度又はフルエンスに依存するプロセスを意味する。
「同時」とは、10−14秒以下の時間内に発生する2つの事象を意味する。
「固体」とは、何日か、何週か、あるいは何ヶ月かといった長期間にわたってその形状を保持するのに十分なだけ、流れに対して抵抗できる組成物を意味する。
「熱的活性化可能組成物」とは、加熱すると物理的性質に検出可能な変化が生じ得る組成物を意味する。
「ボクセル」とは、立体内の体素を意味する。
1リットルの三つ口フラスコに、56.4gのPC 1733(ポリカーボネートジオール、分子量998、Stahl USA Inc.、マサチューセッツ州、ピーボディ(Peabody)から入手可能)、19.7gのネオペンチルグリコール、86.2gのAgeflex FA12(ラウリルアクリレート(LA)、Ciba Specialty Chemicals、スイス、バーゼル)から入手可能)、82.5gのイソボルニルアクリレート(IBA、Sartomer Co、ペンシルベニア州、ウォリントン(Warrington)から入手可能)、及び0.03gのIrganox 1010(Ciba Specialty Chemicalsから入手可能)を加えた。混合物を攪拌し、50℃まで加熱して、全成分を溶解させた。溶解後、55.2gのイソホロンジイソシアネート及び0.01gのジブチルスズジラウレートを添加した。反応は、大気雰囲気下にて80℃まで加熱し、その温度に18時間保持した。赤外分光法は、残留イソシアネートが存在しないことを示した。75.0gのヒドロキシプロピルアクリレート(HPA、Dow Chemical Co.、ミシガン州、ミッドランド(Midland)から入手可能)を添加し、反応混合物を、室温まで冷却した。
銅フタロシアニンを除外したことを除いて、実施例1と同一の組成物レシピを比較実施例1で使用した。レーザー描画後、レンズアレイフィルムを剥離し、溶剤を使用して、モノマーを洗浄した。ウエハ上には、描画された構造体は観察されなかった。
以下の溶液を調製した。
溶液A:
30%ポリメチルメタクリレート、120,000分子量(Aldrich(ウィスコンシン州、ミルウォーキー(Milwaukee)))、
35% SR9008三官能性アクリレート(Sartomer、ペンシルベニア州、エクストン(Exton))
35% SR368三官能性アクリレート(Sartomer)を、
45%シクロペンタノンを有する溶液中の、上記組成物の55%固形分として調製した。
20グラムの溶液A
0.11g過酸化ベンゾイル
1.892gの0.5重量%銅フタロシアニン分散体
4.44gのシクロペンタノン
溶液Bを均一になるまで撹拌した後、0.2マイクロメートルの注射器フィルタに通して濾過した。6インチ(15.2cm)シリコンウエハをエタノール中にてトリメトキシシリルプロピルメタクリレートで表面処理し、オーブン内105℃で乾燥させた。処理済みシリコンウエハ上に溶液Bをスピンコーティングによりコーティングして、10μmフィルムを得た。
以下の溶液を調製した:
溶液A:
30%ポリメチルメタクリレート、120,000分子量(アルドリッチ)、
35% SR9008三官能性アクリレート(Sartomer)
35% SR368三官能性アクリレート(Sartomer)を、
45%シクロペンタノンを有する溶液中の、上記組成物の55%固形分として調製した。
20グラムの溶液A
CD1012(ジアリールヨードニウムヘキサフルオロアンチモネート)(Sartomer)
1.892gの0.5%銅フタロシアニン分散体
4.44gのシクロペンタノン
溶液Bを均一になるまで撹拌した後、0.2マイクロメートルの注射器フィルタに通して濾過した。6インチ(15.2cm)シリコンウエハをエタノール中にてトリメトキシシリルプロピルメタクリレートで表面処理し、オーブン内105℃で乾燥させた。処理済みシリコンウエハ上に溶液Bをスピンコーティングによりコーティングして、10μmフィルムを得た。
以下の溶液を調製した:
溶液A:
30%ポリメチルメタクリレート、120,000分子量(Aldrich)、
35% SR9008三官能性アクリレート(Sartomer)
35% SR368三官能性アクリレート(Sartomer)を、
45%シクロペンタノンを有する溶液中の、上記組成物固形分の55%として調製した。
20グラムの溶液A
0.11g CD1012(ジアリールヨードニウムヘキサフルオロアンチモネート)(Sartomer)
0.11g過酸化ベンゾイル
1.892gの0.5%銅フタロシアニン分散体
4.44gのシクロペンタノン
溶液Bは、均一になるまで撹拌した後、0.2マイクロメートルの注射器フィルタに通して濾過した。6インチ(15.2cm)シリコンウエハをエタノール中にてトリメトキシシリルプロピルメタクリレートで表面処理し、オーブン内105℃で乾燥させた。処理済みシリコンウエハ上に溶液Bをスピンコーティングによりコーティングして、10μmフィルムを得た。
1. 三次元物品の製造方法であって、複数のボクセルを含む組成物を提供すること、そこでの該組成物が、重合性混合物、熱重合開始剤、及び非線形光熱変換材料を更に含み、前記組成物の第1ボクセル内にレーザービームを集束させること、並びに前記第1ボクセル内の前記組成物の重合を開始させること、を含み、前記レーザービームの少なくとも一部が前記第1ボクセル内の前記非線形光熱変換材料に吸収される、製造方法。
2. 前記重合性混合物が、(メタ)アクリレートモノマー、エポキシモノマー、又はこれらの組み合わせを含む、態様1に記載の方法。
3. 前記重合開始剤が、ペルオキシド、アゾ化合物、又はこれらの組み合わせを含む、態様2に記載の方法。
4. 前記重合開始剤が、カチオン生成材料を含む、態様1に記載の方法。
5. 前記非線形光熱変換材料が、逆可飽和吸収染料を含む、態様1に記載の方法。
6. 前記逆可飽和染料が、メタロフタロシアニン、フラーレン、及びメチン、並びにこれらの組み合わせから選択される、態様5に記載の方法。
7. 前記非線形光熱変換材料が、メタロフタロシアニンを含む、態様6に記載の方法。
8. 第2ボクセルを露光するために、前記集束レーザービームの場所を変更することを更に含む、態様1に記載の方法。
9. 前記第2ボクセルの場所が、前記第1ボクセルに隣接している、態様8に記載の方法。
10. 態様1に記載の方法によって製造された三次元物品。
11. 態様10に記載の物品から製造されたレプリカ。
12. 三次元物品の製造方法であって、基材を提供すること、該基材上に組成物をコーティングしてコートされた基材を形成すること、そこでは該コートされた基材上の該組成物は複数のボクセルを含み、該組成物が、重合性混合物、熱重合開始剤、及び非線形光熱変換材料を含み、前記コートされた基材近傍にマイクロレンズアレイを配置すること、前記マイクロレンズアレイをレーザービームにさらして、前記コートされた基材の1個以上のボクセルを露光する1つ以上の集束レーザービームを生成すること、並びに1個以上の露光した前記ボクセル内で、前記コートされた基材の重合を開始させることを含み、前記コートされた基材の1個以上のボクセル内にて、前記レーザービームの少なくとも一部が前記非線形光熱変換材料に吸収される、製造方法。
13. 前記基材が、シリコンウエハを含む、態様12に記載の方法。
14. 前記組成物内部のボクセルの異なるセットを露光するために、1つ以上の集束レーザービームの場所を変更することを更に含む、態様12に記載の方法。
15. 態様12に記載の方法によって製造された三次元物品。
16. 重合性組成物であって、重合性混合物、熱重合開始剤、及び非線形光熱変換材料を含み、前記重合性混合物は、重合性又は架橋性エチレン系不飽和種から本質的になる、組成物。
17. 前記エチレン系不飽和種が、モノ−、ジ−、及びポリ−アクリレート及びメタクリレート、不飽和アミド、ビニル化合物、並びにこれらの混合物から選択される、態様16に記載の組成物。
18. 前記エチレン系不飽和種が、アクリレートモノマーを含む、態様17に記載の組成物。
19. 前記開始剤が、ペルオキシド、アゾ化合物、又はこれらの組み合わせを含む、態様16に記載の組成物。
20. 前記開始剤が、約100℃未満の分解温度を有する、態様19に記載の組成物。
21. 前記非線形光熱変換材料が、逆可飽和吸収染料を含む、態様16に記載の組成物。
22. 前記逆可飽和吸収染料が、フタロシアニン、フラーレン、及びメチンから選択される、態様21に記載の組成物。
本発明の範囲及び趣旨から逸脱しない本発明の様々な変更や改変は、当業者には明らかとなるであろう。本発明は、本明細書で述べる例示的な実施形態及び実施例によって不当に限定されるものではないこと、またこうした実施例及び実施形態は、本明細書において以下に記述する「特許請求の範囲」によってのみ限定されると意図する本発明の範囲に関する例示のためにのみ提示されることを理解すべきである。引用された全ての文献は、その全体が、本明細書に参考として組み込まれる。
Claims (2)
- 三次元物品の製造方法であって、
複数のボクセルを含む組成物を提供すること、そこでの該組成物が、
重合性混合物、
熱重合開始剤、及び
非線形光熱変換材料を更に含み、
前記組成物の第1ボクセル内にレーザービームを集束させること、並びに
前記第1ボクセル内の前記組成物の重合を開始させること
を含み、前記レーザービームの少なくとも一部が前記第1ボクセル内の前記非線形光熱変換材料に吸収される、製造方法。 - 三次元物品の製造方法であって、
基材を提供すること、
該基材上に組成物をコーティングしてコートされた基材を形成すること、そこでは該コートされた基材上の該組成物は複数のボクセルを含み、該組成物が、
重合性混合物、
熱重合開始剤、及び
非線形光熱変換材料を含み、
前記コートされた基材近傍にマイクロレンズアレイを配置すること、
前記マイクロレンズアレイをレーザービームにさらして、前記コートされた基材の1個以上のボクセルを露光する1つ以上の集束レーザービームを生成すること、並びに
1個以上の露光した前記ボクセル内で、前記コートされた基材の重合を開始させることを含み、前記コートされた基材の1個以上のボクセル内にて、前記レーザービームの少なくとも一部が前記非線形光熱変換材料に吸収される、製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12006808P | 2008-12-05 | 2008-12-05 | |
US61/120,068 | 2008-12-05 | ||
PCT/US2009/063954 WO2010065247A2 (en) | 2008-12-05 | 2009-11-11 | Three-dimensional articles using nonlinear thermal polymerization |
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KR20140035454A (ko) | 2011-05-31 | 2014-03-21 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 불연속 형상을 갖는 미세구조화 공구의 제조 방법, 및 그로부터 제조된 용품 |
US9523919B2 (en) | 2011-05-31 | 2016-12-20 | 3M Innovative Properties Company | Methods for making differentially pattern cured microstructured articles |
CN103608726B (zh) | 2011-06-08 | 2016-11-09 | 3M创新有限公司 | 包含聚合物系留的纳米颗粒的光致抗蚀剂 |
US10133174B2 (en) | 2013-12-06 | 2018-11-20 | 3M Innovative Properties Company | Liquid photoreactive composition and method of fabricating structures |
CN103864964B (zh) * | 2014-02-26 | 2016-01-13 | 天津大学 | 一种水溶性双光子聚合引发剂及组装方法及用途 |
DE102016214606B3 (de) | 2016-08-05 | 2017-08-31 | Karlsruher Institut für Technologie | Verfahren und Vorrichtung zur lithographischen Erzeugung einer Zielstruktur an einer nicht-planaren Ausgangsstruktur |
JP7109438B2 (ja) * | 2016-12-05 | 2022-07-29 | アーケマ・インコーポレイテッド | 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む3dプリンティングに有用な光硬化性組成物 |
JP7136815B2 (ja) * | 2017-06-30 | 2022-09-13 | 株式会社ニコン | 重合された材料で作られる物品を製造する方法 |
FR3069862B1 (fr) | 2017-08-02 | 2019-11-01 | Ecole Normale Superieure De Lyon | Composition photopolymerisable, materiau obtenu par polymerisation d'une telle composition et procede d'impression 3d utilisant une telle composition |
EP3501837A1 (en) * | 2017-12-21 | 2019-06-26 | Université de Haute Alsace | Thermal amplification of free radical polymerization induced by red to near-infrared irradiation |
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EP2368155B1 (en) | 2013-07-10 |
CN102301277B (zh) | 2013-07-17 |
JP2012511082A (ja) | 2012-05-17 |
WO2010065247A3 (en) | 2011-03-10 |
WO2010065247A2 (en) | 2010-06-10 |
CN102301277A (zh) | 2011-12-28 |
EP2368155A2 (en) | 2011-09-28 |
US20110269865A1 (en) | 2011-11-03 |
US8846160B2 (en) | 2014-09-30 |
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