BR0314995A - Método de fotossensibilização de fóton múltiplo, composição, e, artigo - Google Patents

Método de fotossensibilização de fóton múltiplo, composição, e, artigo

Info

Publication number
BR0314995A
BR0314995A BR0314995-1A BR0314995A BR0314995A BR 0314995 A BR0314995 A BR 0314995A BR 0314995 A BR0314995 A BR 0314995A BR 0314995 A BR0314995 A BR 0314995A
Authority
BR
Brazil
Prior art keywords
article
composition
multiple photon
photosensitization method
photosensitization
Prior art date
Application number
BR0314995-1A
Other languages
English (en)
Portuguese (pt)
Inventor
Manoj Nirmal
Catherine A Leatherdale
David S Arney
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of BR0314995A publication Critical patent/BR0314995A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Light Receiving Elements (AREA)
  • Luminescent Compositions (AREA)
BR0314995-1A 2002-10-02 2003-09-26 Método de fotossensibilização de fóton múltiplo, composição, e, artigo BR0314995A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/263,013 US7005229B2 (en) 2002-10-02 2002-10-02 Multiphoton photosensitization method
PCT/US2003/030291 WO2004110607A2 (en) 2002-10-02 2003-09-26 Multiphoton photosensitization method

Publications (1)

Publication Number Publication Date
BR0314995A true BR0314995A (pt) 2005-08-09

Family

ID=32041917

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0314995-1A BR0314995A (pt) 2002-10-02 2003-09-26 Método de fotossensibilização de fóton múltiplo, composição, e, artigo

Country Status (11)

Country Link
US (1) US7005229B2 (enExample)
EP (1) EP1552345B1 (enExample)
JP (1) JP2006514709A (enExample)
KR (1) KR20050048670A (enExample)
CN (1) CN100549823C (enExample)
AT (1) ATE381727T1 (enExample)
AU (1) AU2003304202A1 (enExample)
BR (1) BR0314995A (enExample)
CA (1) CA2500176A1 (enExample)
DE (1) DE60318230T2 (enExample)
WO (1) WO2004110607A2 (enExample)

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) * 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US7112616B2 (en) * 2003-03-25 2006-09-26 Fuji Photo Film Co., Ltd. Two-photon absorbing polymerizable composition and polymerization process thereof
EP1723455B1 (en) * 2003-12-05 2009-08-12 3M Innovative Properties Company Process for producing photonic crystals
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
US7897296B2 (en) * 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
US7297374B1 (en) * 2004-12-29 2007-11-20 3M Innovative Properties Company Single- and multi-photon polymerizable pre-ceramic polymeric compositions
US7541131B2 (en) * 2005-02-18 2009-06-02 Fujifilm Corporation Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
US20100075393A1 (en) * 2005-05-23 2010-03-25 Board Of Regents,The University Of Texas System Aqueous microfabrication of functional bioelectronic architectures
WO2007050984A2 (en) * 2005-10-27 2007-05-03 Clemson University Fluorescent carbon nanoparticles
US7583444B1 (en) * 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
DE112006003494T5 (de) * 2005-12-21 2008-10-30 3M Innovative Properties Co., Saint Paul Verfahren und Vorrichtung zur Verarbeitung von mehrphotonen-aushärtbaren photoreaktiven Zusammensetzungen
WO2007137102A2 (en) * 2006-05-18 2007-11-29 3M Innovative Properties Company Process for making light guides with extraction structures and light guides produced thereby
US7491287B2 (en) * 2006-06-09 2009-02-17 3M Innovative Properties Company Bonding method with flowable adhesive composition
US20090035576A1 (en) * 2006-09-08 2009-02-05 Prasad Paras N Nanoparticles for two-photon activated photodynamic therapy and imaging
US20080233051A1 (en) * 2006-09-08 2008-09-25 Prasad Paras N Nanoparticles for two-photon activated photodynamic therapy and imaging
US8376013B2 (en) 2008-03-11 2013-02-19 Duke University Plasmonic assisted systems and methods for interior energy-activation from an exterior source
US20110189702A1 (en) * 2007-07-11 2011-08-04 Ya-Ping Sun Photoluminescent materials for multiphoton imaging
US7989153B2 (en) * 2007-07-11 2011-08-02 Qd Vision, Inc. Method and apparatus for selectively patterning free standing quantum DOT (FSQDT) polymer composites
US20090092746A1 (en) * 2007-10-02 2009-04-09 Nitto Denko Corporation Photorefractive compositions with nanoparticles
IL196690A0 (en) * 2008-05-29 2011-08-01 Plasan Sasa Ltd Interchangeable door
KR20100052948A (ko) * 2008-11-11 2010-05-20 삼성전자주식회사 라디칼 중합용 조성물 및 이를 이용한 패턴 형성 방법
US20110021653A1 (en) * 2009-07-22 2011-01-27 Lixin Zheng Hydrogel compatible two-photon initiation system
US8216767B2 (en) * 2009-09-08 2012-07-10 Taiwan Semiconductor Manufacturing Company, Ltd. Patterning process and chemical amplified photoresist with a photodegradable base
US8956806B2 (en) * 2009-09-18 2015-02-17 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist and patterning process
US8512939B2 (en) * 2009-09-25 2013-08-20 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist stripping technique
TWI572389B (zh) * 2009-11-10 2017-03-01 伊穆諾萊特公司 用於產生介質中之改變之儀器組及系統、用於產生光或固化之系統、輻射固化或可固化物品、微波或rf接受器及用於治療或診斷之系統
US20120097521A1 (en) * 2010-10-25 2012-04-26 University Of Massachusetts Nanostructured apparatus and methods for producing carbon-containing molecules as a renewable energy resource
DE102011102421A1 (de) * 2011-05-24 2012-11-29 Heidelberger Druckmaschinen Ag Verfahren zum Verdrucken von durch Polymerisation härtenden Farben in Flachdruckmaschinen
EP2718766A1 (en) 2011-06-08 2014-04-16 3M Innovative Properties Company Photoresists containing polymer-tethered nanoparticles
JP6065665B2 (ja) * 2013-03-11 2017-01-25 Jsr株式会社 感放射線性樹脂組成物、硬化膜、発光表示素子および発光層の形成方法
JP6094406B2 (ja) * 2013-07-11 2017-03-15 Jsr株式会社 感放射線性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法
GB201317421D0 (en) * 2013-10-02 2013-11-13 Pb Clermont Sa Nitrocellulose based propellant composition stabilized with a trialkoxy benzene stabilizer
WO2015084735A2 (en) 2013-12-06 2015-06-11 3M Innovative Properties Company Liquid photoreactive composition and method of fabricating structures
JP6171927B2 (ja) * 2013-12-25 2017-08-02 Jsr株式会社 感放射線性樹脂組成物、硬化膜、発光素子および発光層の形成方法
JP6427876B2 (ja) * 2013-12-27 2018-11-28 Jsr株式会社 感放射線性樹脂組成物、硬化膜、発光素子および発光層の形成方法
JP6171923B2 (ja) * 2013-12-24 2017-08-02 Jsr株式会社 硬化性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法
JP2015128105A (ja) * 2013-12-27 2015-07-09 ソニー株式会社 半導体ナノ粒子分散体、光電変換素子および撮像装置
JP6243872B2 (ja) * 2014-05-19 2017-12-06 富士フイルム株式会社 量子ドット含有積層体の製造方法、量子ドット含有積層体、バックライトユニット、液晶表示装置および量子ドット含有組成物
KR101995930B1 (ko) * 2015-02-25 2019-07-03 동우 화인켐 주식회사 양자점을 포함하는 경화 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
US9776242B2 (en) * 2015-03-18 2017-10-03 California Institute Of Technology Multiphoton induced direct aggregate scribing
KR102377521B1 (ko) * 2015-09-11 2022-03-22 삼성디스플레이 주식회사 감광성 수지 조성물 및 이를 이용한 표시 장치
KR102054430B1 (ko) * 2015-12-03 2019-12-10 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
US11254779B1 (en) 2015-12-18 2022-02-22 Hrl Laboratories, Llc Reworkable ionomers
US10240065B2 (en) 2015-12-18 2019-03-26 Hrl Laboratories, Llc Reversible, chemically or environmentally responsive polymers, and coatings containing such polymers
US10683400B1 (en) 2015-12-18 2020-06-16 Hrl Laboratories, Llc Chemically or environmentally responsive polymers with reversible mechanical properties
CN108602983B (zh) * 2015-12-28 2020-05-12 Hrl实验室有限责任公司 可逆的化学或环境响应性聚合物、以及含有此类聚合物的涂层
US11085018B2 (en) 2017-03-10 2021-08-10 Prellis Biologics, Inc. Three-dimensional printed organs, devices, and matrices
US10933579B2 (en) * 2017-03-10 2021-03-02 Prellis Biologics, Inc. Methods and systems for printing biological material
CN111032687A (zh) 2017-05-25 2020-04-17 普瑞利思生物制品公司 三维打印的器官、设备和基质
EP3750008A1 (en) * 2018-02-06 2020-12-16 Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd Nanoparticles and formulations for printing
WO2020028436A1 (en) 2018-07-31 2020-02-06 Prellis Biologics, Inc. Optically-induced auto-encapsulation
CN114456336B (zh) * 2022-03-22 2023-12-01 重庆大学 一种紫外光可降解的聚合物材料的制备方法及其应用
CN114779591B (zh) * 2022-06-23 2022-10-21 之江实验室 一种基于双色双步吸收效应的超分辨光刻方法

Family Cites Families (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018262A (en) 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
NL298323A (enExample) 1959-12-24
US3502520A (en) 1965-12-30 1970-03-24 Ibm Process of making patterned unitary solid bodies from finely divided discrete particles
US3954475A (en) 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3729313A (en) 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3808006A (en) 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3779778A (en) 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4250053A (en) 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4257915A (en) 1979-07-23 1981-03-24 E. I. Du Pont De Nemours And Company Photopolymer initiator system containing a semiconductor, a reducing agent and an oxidizing agent
US4279717A (en) 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4642126A (en) 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
JPH0786627B2 (ja) * 1987-03-06 1995-09-20 日本電信電話株式会社 光導波路
CA1323949C (en) 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4735632A (en) 1987-04-02 1988-04-05 Minnesota Mining And Manufacturing Company Coated abrasive binder containing ternary photoinitiator system
US4889792A (en) 1987-12-09 1989-12-26 Minnesota Mining And Manufacturing Company Ternary photoinitiator system for addition polymerization
US4859572A (en) 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
JPH0288615A (ja) 1988-09-27 1990-03-28 Mitsubishi Rayon Co Ltd 難燃性液状感光性樹脂組成物
US4954416A (en) 1988-12-21 1990-09-04 Minnesota Mining And Manufacturing Company Tethered sulfonium salt photoinitiators for free radical polymerization
US4963471A (en) 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
US5032478A (en) 1989-08-21 1991-07-16 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable gold conductor composition
US5047313A (en) 1989-08-21 1991-09-10 E. I. Du Pont De Nemours And Company Photosensitive semi-aqueous developable copper conductor composition
US5032490A (en) 1989-08-21 1991-07-16 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable copper conductor composition
DE69019486T2 (de) 1989-11-22 1995-10-12 Johnson Matthey Plc Verbesserte Pastenzusammensetzungen.
US5238744A (en) 1990-08-16 1993-08-24 Minnesota Mining And Manufacturing Company Tough polymeric mixtures
US5235015A (en) 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
DE4116957A1 (de) 1991-05-24 1992-11-26 Ruetgerswerke Ag Durch strahlung vernetzbare beschichtungsmittel und ihre verwendung
TW268969B (enExample) 1992-10-02 1996-01-21 Minnesota Mining & Mfg
US5856373A (en) 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
JPH10186426A (ja) * 1996-10-24 1998-07-14 Mitsui Chem Inc 光重合性樹脂組成物
WO1998021521A1 (en) 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
JP3766165B2 (ja) 1997-03-07 2006-04-12 株式会社ニコン 画像形成方法及び感光材料
US6054007A (en) 1997-04-09 2000-04-25 3M Innovative Properties Company Method of forming shaped adhesives
US5998495A (en) 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US6025406A (en) 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
JP3281298B2 (ja) 1997-09-22 2002-05-13 シャープ株式会社 液晶表示素子の駆動装置
US6322901B1 (en) 1997-11-13 2001-11-27 Massachusetts Institute Of Technology Highly luminescent color-selective nano-crystalline materials
US6005707A (en) 1997-11-21 1999-12-21 Lucent Technologies Inc. Optical devices comprising polymer-dispersed crystalline materials
US5990479A (en) 1997-11-25 1999-11-23 Regents Of The University Of California Organo Luminescent semiconductor nanocrystal probes for biological applications and process for making and using such probes
JPH11279213A (ja) * 1998-03-30 1999-10-12 Nippon Soda Co Ltd オニウム塩化合物およびそれを含有する光硬化性組成物
US6501091B1 (en) 1998-04-01 2002-12-31 Massachusetts Institute Of Technology Quantum dot white and colored light emitting diodes
JP4564655B2 (ja) 1998-04-21 2010-10-20 ユニバーシティ オブ コネチカット 多光子励起を用いたフリーフォームナノ製作
DE19823732A1 (de) 1998-05-27 1999-12-02 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung optischer Mehrschichtsysteme
US6426513B1 (en) 1998-09-18 2002-07-30 Massachusetts Institute Of Technology Water-soluble thiol-capped nanocrystals
JP4425470B2 (ja) 1998-09-18 2010-03-03 マサチューセッツ インスティテュート オブ テクノロジー 半導体ナノ結晶の生物学的用途
US6512606B1 (en) 1999-07-29 2003-01-28 Siros Technologies, Inc. Optical storage media and method for optical data storage via local changes in reflectivity of a format grating
JP2003522962A (ja) 2000-02-16 2003-07-29 クァンタム・ドット・コーポレイション 半導体ナノクリスタルを使用するマイクロアレイ法
US6624915B1 (en) 2000-03-16 2003-09-23 Science Applications International Corporation Holographic recording and micro/nanofabrication via ultrafast holographic two-photon induced photopolymerization (H-TPIP)
JP4148635B2 (ja) * 2000-06-12 2008-09-10 国立大学法人 奈良先端科学技術大学院大学 ナノサイズの希土類酸化物、及びその光化学反応を用いた製法
WO2001096961A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Multipass multiphoton absorption method and apparatus
WO2001096958A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Process for producing microfluidic articles
JP2004503832A (ja) 2000-06-15 2004-02-05 スリーエム　イノベイティブ　プロパティズ　カンパニー パターン化された光を用いる多光子吸収法
EP1297021B1 (en) * 2000-06-15 2009-03-18 3M Innovative Properties Company Multiphoton photosensitization system
EP1303791B1 (en) 2000-06-15 2009-08-19 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
AU2001266918A1 (en) 2000-06-15 2001-12-24 3M Innovative Properties Company Multidirectional photoreactive absorption method
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
KR100810547B1 (ko) 2000-06-15 2008-03-18 쓰리엠 이노베이티브 프로퍼티즈 캄파니 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
KR100811018B1 (ko) 2000-06-15 2008-03-14 쓰리엠 이노베이티브 프로퍼티즈 캄파니 물품에 구조를 형성 또는 추가하는 방법
JP4965052B2 (ja) 2000-06-15 2012-07-04 スリーエム イノベイティブ プロパティズ カンパニー ３次元光学素子の加工方法
US6686106B2 (en) 2000-06-26 2004-02-03 Ube Industries, Ltd. Photosensitive resin compositions, insulating films, and processes for formation of the films
AU2002239581B2 (en) 2000-12-15 2006-09-28 The Arizona Board Of Regents On Behalf Of The University Of Arizona Method for patterning metal using nanoparticle containing precursors
EP2236488A1 (en) 2001-03-30 2010-10-06 The Arizona Board of Regents on behalf of the University of Arizona Materials, methods and uses for photochemical generation of acids and/or radical species
US6774300B2 (en) * 2001-04-27 2004-08-10 Adrena, Inc. Apparatus and method for photovoltaic energy production based on internal charge emission in a solid-state heterostructure
US6593392B2 (en) 2001-06-22 2003-07-15 Corning Incorporated Curable halogenated compositions
US6656990B2 (en) 2001-07-11 2003-12-02 Corning Incorporated Curable high refractive index compositions
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system

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DE60318230D1 (de) 2008-01-31
EP1552345A2 (en) 2005-07-13
EP1552345B1 (en) 2007-12-19
CN1692313A (zh) 2005-11-02
CA2500176A1 (en) 2004-12-23
JP2006514709A (ja) 2006-05-11
AU2003304202A1 (en) 2005-01-04
CN100549823C (zh) 2009-10-14
US20040067433A1 (en) 2004-04-08
US7005229B2 (en) 2006-02-28
WO2004110607A2 (en) 2004-12-23
KR20050048670A (ko) 2005-05-24
ATE381727T1 (de) 2008-01-15
WO2004110607A3 (en) 2005-04-21
DE60318230T2 (de) 2009-01-22

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