JP2006024941A5 - - Google Patents

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Publication number
JP2006024941A5
JP2006024941A5 JP2005198439A JP2005198439A JP2006024941A5 JP 2006024941 A5 JP2006024941 A5 JP 2006024941A5 JP 2005198439 A JP2005198439 A JP 2005198439A JP 2005198439 A JP2005198439 A JP 2005198439A JP 2006024941 A5 JP2006024941 A5 JP 2006024941A5
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image
aberration
change
predicted
control signal
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JP2005198439A
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Japanese (ja)
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JP4027382B2 (ja
JP2006024941A (ja
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Priority claimed from US10/886,051 external-priority patent/US7403264B2/en
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JP2005198439A 2004-07-08 2005-07-07 リソグラフィ投影装置及びそのリソグラフィ投影装置を使用するデバイス製造方法 Expired - Fee Related JP4027382B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/886,051 US7403264B2 (en) 2004-07-08 2004-07-08 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus

Publications (3)

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JP2006024941A JP2006024941A (ja) 2006-01-26
JP2006024941A5 true JP2006024941A5 (enExample) 2007-10-18
JP4027382B2 JP4027382B2 (ja) 2007-12-26

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JP2005198439A Expired - Fee Related JP4027382B2 (ja) 2004-07-08 2005-07-07 リソグラフィ投影装置及びそのリソグラフィ投影装置を使用するデバイス製造方法

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US (2) US7403264B2 (enExample)
EP (2) EP1975723A1 (enExample)
JP (1) JP4027382B2 (enExample)
KR (1) KR100795140B1 (enExample)
CN (1) CN100524041C (enExample)
DE (1) DE602005010014D1 (enExample)
TW (1) TWI266358B (enExample)

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JP6730850B2 (ja) * 2016-06-01 2020-07-29 キヤノン株式会社 露光条件の決定方法、プログラム、情報処理装置、露光装置、および物品製造方法
JP2019524221A (ja) * 2016-07-14 2019-09-05 インサイテック リミテッド 前例に基づく超音波フォーカシング
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JP6854914B2 (ja) 2017-04-06 2021-04-07 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ方法及び装置
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CN110502132B (zh) * 2018-05-18 2022-08-12 致伸科技股份有限公司 鼠标装置
JP2019070812A (ja) * 2018-11-29 2019-05-09 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光ツールを作動させる方法
CN113126443B (zh) * 2019-12-31 2021-12-10 上海微电子装备（集团）股份有限公司 解决光刻机像面畸变的工艺方法及装置、掩膜版设计方法
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JP7750876B2 (ja) * 2020-07-01 2025-10-07 エーエスエムエル ネザーランズ ビー．ブイ． 迅速な計測回復のための精密真空ウィンドウビューポート及びペリクル
CN114690593B (zh) * 2020-12-30 2024-06-11 科磊股份有限公司 一种制造集成电路的方法和系统
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JP2024065681A (ja) 2022-10-31 2024-05-15 キヤノン株式会社 露光方法、露光装置及び物品の製造方法
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