JP2009094256A5 - - Google Patents
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- Publication number
- JP2009094256A5 JP2009094256A5 JP2007262759A JP2007262759A JP2009094256A5 JP 2009094256 A5 JP2009094256 A5 JP 2009094256A5 JP 2007262759 A JP2007262759 A JP 2007262759A JP 2007262759 A JP2007262759 A JP 2007262759A JP 2009094256 A5 JP2009094256 A5 JP 2009094256A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- exposure
- exposed
- exposure method
- surface position
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 13
- 238000000034 method Methods 0.000 claims 5
- 238000005259 measurement Methods 0.000 claims 3
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007262759A JP5084432B2 (ja) | 2007-10-05 | 2007-10-05 | 露光方法、露光装置およびデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007262759A JP5084432B2 (ja) | 2007-10-05 | 2007-10-05 | 露光方法、露光装置およびデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009094256A JP2009094256A (ja) | 2009-04-30 |
| JP2009094256A5 true JP2009094256A5 (enExample) | 2010-11-18 |
| JP5084432B2 JP5084432B2 (ja) | 2012-11-28 |
Family
ID=40665954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007262759A Expired - Fee Related JP5084432B2 (ja) | 2007-10-05 | 2007-10-05 | 露光方法、露光装置およびデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5084432B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011035333A (ja) * | 2009-08-05 | 2011-02-17 | Renesas Electronics Corp | 走査型露光装置、走査型露光方法、半導体装置の製造方法およびプログラム |
| US9268231B2 (en) * | 2012-04-10 | 2016-02-23 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
| JP6267530B2 (ja) * | 2014-02-04 | 2018-01-24 | キヤノン株式会社 | 露光装置、および物品の製造方法 |
| JP6436856B2 (ja) * | 2015-05-26 | 2018-12-12 | キヤノン株式会社 | 露光装置、露光方法、および物品の製造方法 |
| US10312121B2 (en) * | 2016-03-29 | 2019-06-04 | Lam Research Corporation | Systems and methods for aligning measurement device in substrate processing systems |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4078683B2 (ja) * | 1996-11-28 | 2008-04-23 | 株式会社ニコン | 投影露光装置及び投影露光方法並びに走査露光方法 |
| JPH10284393A (ja) * | 1997-04-04 | 1998-10-23 | Canon Inc | 露光装置およびデバイス製造方法 |
| JP2000114161A (ja) * | 1998-10-09 | 2000-04-21 | Canon Inc | 露光装置およびデバイス製造方法 |
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2007
- 2007-10-05 JP JP2007262759A patent/JP5084432B2/ja not_active Expired - Fee Related