JP2000036451A5 - - Google Patents

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Publication number
JP2000036451A5
JP2000036451A5 JP1998203497A JP20349798A JP2000036451A5 JP 2000036451 A5 JP2000036451 A5 JP 2000036451A5 JP 1998203497 A JP1998203497 A JP 1998203497A JP 20349798 A JP20349798 A JP 20349798A JP 2000036451 A5 JP2000036451 A5 JP 2000036451A5
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JP
Japan
Prior art keywords
exposure
projection
distortion
sensitive substrate
projection exposure
Prior art date
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Application number
JP1998203497A
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English (en)
Japanese (ja)
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JP2000036451A (ja
JP4200550B2 (ja
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Priority to JP20349798A priority Critical patent/JP4200550B2/ja
Priority claimed from JP20349798A external-priority patent/JP4200550B2/ja
Publication of JP2000036451A publication Critical patent/JP2000036451A/ja
Publication of JP2000036451A5 publication Critical patent/JP2000036451A5/ja
Application granted granted Critical
Publication of JP4200550B2 publication Critical patent/JP4200550B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP20349798A 1998-07-17 1998-07-17 露光方法及びリソグラフィシステム Expired - Fee Related JP4200550B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20349798A JP4200550B2 (ja) 1998-07-17 1998-07-17 露光方法及びリソグラフィシステム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20349798A JP4200550B2 (ja) 1998-07-17 1998-07-17 露光方法及びリソグラフィシステム

Publications (3)

Publication Number Publication Date
JP2000036451A JP2000036451A (ja) 2000-02-02
JP2000036451A5 true JP2000036451A5 (enExample) 2005-10-20
JP4200550B2 JP4200550B2 (ja) 2008-12-24

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ID=16475144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20349798A Expired - Fee Related JP4200550B2 (ja) 1998-07-17 1998-07-17 露光方法及びリソグラフィシステム

Country Status (1)

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JP (1) JP4200550B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002222760A (ja) * 2001-01-29 2002-08-09 Canon Inc 露光方法及び露光装置並びにデバイスの製造方法
JP2003084189A (ja) * 2001-09-07 2003-03-19 Canon Inc オートフォーカス検出方法および投影露光装置
US7728953B2 (en) 2004-03-01 2010-06-01 Nikon Corporation Exposure method, exposure system, and substrate processing apparatus
US7126669B2 (en) * 2004-12-27 2006-10-24 Asml Netherlands B.V. Method and system for automated process correction using model parameters, and lithographic apparatus using such method and system
WO2006126569A1 (ja) * 2005-05-25 2006-11-30 Nikon Corporation 露光方法及びリソグラフィシステム
JP4984038B2 (ja) * 2006-07-27 2012-07-25 株式会社ニコン 管理方法
US7352439B2 (en) * 2006-08-02 2008-04-01 Asml Netherlands B.V. Lithography system, control system and device manufacturing method
US7683351B2 (en) * 2006-12-01 2010-03-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248579B2 (en) 2006-12-01 2012-08-21 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device for correcting overlay errors between overlapping patterns
US8237914B2 (en) 2006-12-01 2012-08-07 Asml Netherlands B.V. Process, apparatus, and device for determining intra-field correction to correct overlay errors between overlapping patterns
JP5554906B2 (ja) * 2008-07-31 2014-07-23 ラピスセミコンダクタ株式会社 露光装置のアライメント方法
JP2014026041A (ja) * 2012-07-25 2014-02-06 Ulvac Japan Ltd 露光装置及び露光方法
JP5945211B2 (ja) * 2012-10-26 2016-07-05 株式会社アルバック 露光装置
JP6198805B2 (ja) * 2015-02-16 2017-09-20 キヤノン株式会社 リソグラフィ装置、リソグラフィ方法、プログラム、リソグラフィシステムおよび物品製造方法
US9927725B2 (en) 2015-02-16 2018-03-27 Canon Kabushiki Kaisha Lithography apparatus, lithography method, program, lithography system, and article manufacturing method

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