JP2005518636A - 放出ディスプレイの陰極構造 - Google Patents
放出ディスプレイの陰極構造 Download PDFInfo
- Publication number
- JP2005518636A JP2005518636A JP2003570380A JP2003570380A JP2005518636A JP 2005518636 A JP2005518636 A JP 2005518636A JP 2003570380 A JP2003570380 A JP 2003570380A JP 2003570380 A JP2003570380 A JP 2003570380A JP 2005518636 A JP2005518636 A JP 2005518636A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- cathode
- cathode structure
- electron emission
- slit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims abstract description 33
- 230000005684 electric field Effects 0.000 claims description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 239000002041 carbon nanotube Substances 0.000 claims description 6
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 82
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229910052758 niobium Inorganic materials 0.000 description 4
- 239000010955 niobium Substances 0.000 description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000005136 cathodoluminescence Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000012777 electrically insulating material Substances 0.000 description 2
- 239000002071 nanotube Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
- H01J3/022—Electron guns using a field emission, photo emission, or secondary emission electron source with microengineered cathode, e.g. Spindt-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/304—Field emission cathodes
- H01J2201/30446—Field emission cathodes characterised by the emitter material
- H01J2201/30453—Carbon types
- H01J2201/30469—Carbon nanotubes (CNTs)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0202075A FR2836279B1 (fr) | 2002-02-19 | 2002-02-19 | Structure de cathode pour ecran emissif |
| PCT/FR2003/000530 WO2003071571A1 (fr) | 2002-02-19 | 2003-02-18 | Structure de cathode pour ecran emissif |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010282102A Division JP5425753B2 (ja) | 2002-02-19 | 2010-12-17 | 放出ディスプレイの陰極構造 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2005518636A true JP2005518636A (ja) | 2005-06-23 |
Family
ID=27636301
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003570380A Pending JP2005518636A (ja) | 2002-02-19 | 2003-02-18 | 放出ディスプレイの陰極構造 |
| JP2010282102A Expired - Fee Related JP5425753B2 (ja) | 2002-02-19 | 2010-12-17 | 放出ディスプレイの陰極構造 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010282102A Expired - Fee Related JP5425753B2 (ja) | 2002-02-19 | 2010-12-17 | 放出ディスプレイの陰極構造 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7759851B2 (enExample) |
| EP (1) | EP1476888B1 (enExample) |
| JP (2) | JP2005518636A (enExample) |
| KR (1) | KR100944731B1 (enExample) |
| CN (1) | CN1316533C (enExample) |
| AT (1) | ATE472820T1 (enExample) |
| DE (1) | DE60333168D1 (enExample) |
| FR (1) | FR2836279B1 (enExample) |
| WO (1) | WO2003071571A1 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007149594A (ja) * | 2005-11-30 | 2007-06-14 | Kokusai Kiban Zairyo Kenkyusho:Kk | 冷陰極電界電子放出素子及び冷陰極電界電子放出素子の製造方法 |
| JP2007227380A (ja) * | 2006-02-22 | 2007-09-06 | Commiss Energ Atom | 放射スクリーン用のナノチューブを有するカソード構造 |
| JP2009245672A (ja) * | 2008-03-31 | 2009-10-22 | Univ Of Tokyo | フィールドエミッション装置、ならびに、その製造方法 |
| US7652419B2 (en) | 2006-02-20 | 2010-01-26 | Samsung Sdi Co., Ltd. | Electron emission device and electron emission display using the same |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2562388Y2 (ja) | 1991-08-05 | 1998-02-10 | 株式会社石井製作所 | 集塵機 |
| FR2873852B1 (fr) * | 2004-07-28 | 2011-06-24 | Commissariat Energie Atomique | Structure de cathode a haute resolution |
| FR2886284B1 (fr) | 2005-05-30 | 2007-06-29 | Commissariat Energie Atomique | Procede de realisation de nanostructures |
| KR20070041983A (ko) * | 2005-10-17 | 2007-04-20 | 삼성에스디아이 주식회사 | 전자 방출 표시 디바이스 |
| KR20070083113A (ko) * | 2006-02-20 | 2007-08-23 | 삼성에스디아이 주식회사 | 전자 방출 디바이스 및 이를 이용한 전자 방출 표시디바이스 |
| FR2912254B1 (fr) | 2007-02-06 | 2009-10-16 | Commissariat Energie Atomique | Structure emettrice d'electrons par effet de champ, a focalisation de l'emission |
| CN104299988B (zh) * | 2014-09-26 | 2017-08-25 | 中国科学院半导体研究所 | 一种具有平面型发射阴极的纳米真空三极管及其制作方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1031954A (ja) * | 1996-07-12 | 1998-02-03 | Futaba Corp | 電界放出素子およびその製造方法 |
| JP2000243218A (ja) * | 1999-02-17 | 2000-09-08 | Nec Corp | 電子放出装置及びその駆動方法 |
| JP2000251614A (ja) * | 1999-02-24 | 2000-09-14 | Futaba Corp | 電界放出素子及びその製造方法 |
| JP2000340098A (ja) * | 1999-05-26 | 2000-12-08 | Nec Corp | 電界放出型冷陰極とその製造方法および平面ディスプレイの製造方法 |
Family Cites Families (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5150648A (enExample) * | 1974-10-30 | 1976-05-04 | Hitachi Ltd | |
| JP3526462B2 (ja) * | 1991-03-20 | 2004-05-17 | ソニー株式会社 | 電界放出型陰極装置 |
| DE69211581T2 (de) * | 1991-03-13 | 1997-02-06 | Sony Corp | Anordnung von Feldemissionskathoden |
| US5679043A (en) * | 1992-03-16 | 1997-10-21 | Microelectronics And Computer Technology Corporation | Method of making a field emitter |
| US5763997A (en) * | 1992-03-16 | 1998-06-09 | Si Diamond Technology, Inc. | Field emission display device |
| JP2669749B2 (ja) * | 1992-03-27 | 1997-10-29 | 工業技術院長 | 電界放出素子 |
| JPH08505259A (ja) * | 1992-12-23 | 1996-06-04 | エスアイ ダイアモンド テクノロジー,インコーポレイテッド | フラットな電界放出カソードを用いたトライオード構造のフラットパネルディスプレイ |
| US5717285A (en) | 1993-03-17 | 1998-02-10 | Commissariat A L 'energie Atomique | Microtip display device having a current limiting layer and a charge avoiding layer |
| FR2702869B1 (fr) * | 1993-03-17 | 1995-04-21 | Commissariat Energie Atomique | Dispositif d'affichage à micropointes et procédé de fabrication de ce dispositif. |
| JP2892587B2 (ja) | 1994-03-09 | 1999-05-17 | 双葉電子工業株式会社 | 電界放出素子及びその製造方法 |
| JP2809129B2 (ja) * | 1995-04-20 | 1998-10-08 | 日本電気株式会社 | 電界放射冷陰極とこれを用いた表示装置 |
| JP2900837B2 (ja) * | 1995-05-31 | 1999-06-02 | 日本電気株式会社 | 電界放射型冷陰極装置及びその製造方法 |
| GB2304989B (en) | 1995-08-04 | 1997-09-03 | Richard Allan Tuck | Field electron emission materials and devices |
| EP0789382A1 (en) * | 1996-02-09 | 1997-08-13 | International Business Machines Corporation | Structure and method for fabricating of a field emission device |
| US5837331A (en) * | 1996-03-13 | 1998-11-17 | Motorola, Inc. | Amorphous multi-layered structure and method of making the same |
| US5757138A (en) * | 1996-05-01 | 1998-05-26 | Industrial Technology Research Institute | Linear response field emission device |
| JPH1092294A (ja) * | 1996-09-13 | 1998-04-10 | Sony Corp | 電子放出源およびその製造方法ならびにこの電子放出源を用いたディスプレイ装置 |
| TW353758B (en) * | 1996-09-30 | 1999-03-01 | Motorola Inc | Electron emissive film and method |
| JPH10289650A (ja) * | 1997-04-11 | 1998-10-27 | Sony Corp | 電界電子放出素子及びその製造方法並びに電界電子放出型ディスプレイ装置 |
| FR2779271B1 (fr) * | 1998-05-26 | 2000-07-07 | Commissariat Energie Atomique | Procede de fabrication d'une source d'electrons a micropointes, a grille de focalisation auto-alignee |
| FR2780808B1 (fr) * | 1998-07-03 | 2001-08-10 | Thomson Csf | Dispositif a emission de champ et procedes de fabrication |
| US6323587B1 (en) * | 1998-08-06 | 2001-11-27 | Micron Technology, Inc. | Titanium silicide nitride emitters and method |
| US6486609B1 (en) * | 1999-03-17 | 2002-11-26 | Matsushita Electric Industries, Inc. | Electron-emitting element and image display device using the same |
| JP2000268705A (ja) | 1999-03-18 | 2000-09-29 | Futaba Corp | 電子放出素子 |
| JP2000268706A (ja) * | 1999-03-18 | 2000-09-29 | Matsushita Electric Ind Co Ltd | 電子放出素子及びそれを用いた画像描画装置 |
| JP2000285795A (ja) * | 1999-03-31 | 2000-10-13 | Sony Corp | 電子放出源およびその製造方法ならびにディスプレイ装置 |
| JP2001023506A (ja) * | 1999-07-07 | 2001-01-26 | Sony Corp | 電子放出源およびその製造方法ならびにディスプレイ装置 |
| KR20010011136A (ko) * | 1999-07-26 | 2001-02-15 | 정선종 | 나노구조를 에미터로 사용한 삼극형 전계 방출 에미터의 구조및 그 제조방법 |
| JP3600126B2 (ja) | 1999-07-29 | 2004-12-08 | シャープ株式会社 | 電子源アレイ及び電子源アレイの駆動方法 |
| JP4043153B2 (ja) | 1999-07-30 | 2008-02-06 | 双葉電子工業株式会社 | 電子放出源の製造方法、エミッタ基板の製造方法、電子放出源及び蛍光発光型表示器 |
| US6062931A (en) * | 1999-09-01 | 2000-05-16 | Industrial Technology Research Institute | Carbon nanotube emitter with triode structure |
| JP2001101977A (ja) * | 1999-09-30 | 2001-04-13 | Toshiba Corp | 真空マイクロ素子 |
| JP2001126609A (ja) * | 1999-10-26 | 2001-05-11 | Futaba Corp | 電子放出素子及び蛍光発光型表示器 |
| KR100477739B1 (ko) * | 1999-12-30 | 2005-03-18 | 삼성에스디아이 주식회사 | 전계 방출 소자 및 그 구동 방법 |
| KR100464314B1 (ko) * | 2000-01-05 | 2004-12-31 | 삼성에스디아이 주식회사 | 전계방출소자 및 그 제조방법 |
| JP2002083555A (ja) * | 2000-07-17 | 2002-03-22 | Hewlett Packard Co <Hp> | セルフアライメント型電子源デバイス |
| JP3984548B2 (ja) * | 2001-02-01 | 2007-10-03 | シャープ株式会社 | 電子放出装置及びフィールドエミッションディスプレイ |
| JP2002334673A (ja) * | 2001-05-09 | 2002-11-22 | Hitachi Ltd | 表示装置 |
| TW511108B (en) * | 2001-08-13 | 2002-11-21 | Delta Optoelectronics Inc | Carbon nanotube field emission display technology |
-
2002
- 2002-02-19 FR FR0202075A patent/FR2836279B1/fr not_active Expired - Fee Related
-
2003
- 2003-02-18 DE DE60333168T patent/DE60333168D1/de not_active Expired - Lifetime
- 2003-02-18 US US10/485,669 patent/US7759851B2/en not_active Expired - Fee Related
- 2003-02-18 CN CNB038009846A patent/CN1316533C/zh not_active Expired - Fee Related
- 2003-02-18 AT AT03717409T patent/ATE472820T1/de not_active IP Right Cessation
- 2003-02-18 KR KR1020047002418A patent/KR100944731B1/ko not_active Expired - Fee Related
- 2003-02-18 EP EP03717409A patent/EP1476888B1/fr not_active Expired - Lifetime
- 2003-02-18 WO PCT/FR2003/000530 patent/WO2003071571A1/fr not_active Ceased
- 2003-02-18 JP JP2003570380A patent/JP2005518636A/ja active Pending
-
2010
- 2010-12-17 JP JP2010282102A patent/JP5425753B2/ja not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1031954A (ja) * | 1996-07-12 | 1998-02-03 | Futaba Corp | 電界放出素子およびその製造方法 |
| JP2000243218A (ja) * | 1999-02-17 | 2000-09-08 | Nec Corp | 電子放出装置及びその駆動方法 |
| JP2000251614A (ja) * | 1999-02-24 | 2000-09-14 | Futaba Corp | 電界放出素子及びその製造方法 |
| JP2000340098A (ja) * | 1999-05-26 | 2000-12-08 | Nec Corp | 電界放出型冷陰極とその製造方法および平面ディスプレイの製造方法 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007149594A (ja) * | 2005-11-30 | 2007-06-14 | Kokusai Kiban Zairyo Kenkyusho:Kk | 冷陰極電界電子放出素子及び冷陰極電界電子放出素子の製造方法 |
| US7652419B2 (en) | 2006-02-20 | 2010-01-26 | Samsung Sdi Co., Ltd. | Electron emission device and electron emission display using the same |
| JP2007227380A (ja) * | 2006-02-22 | 2007-09-06 | Commiss Energ Atom | 放射スクリーン用のナノチューブを有するカソード構造 |
| JP2009245672A (ja) * | 2008-03-31 | 2009-10-22 | Univ Of Tokyo | フィールドエミッション装置、ならびに、その製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1476888B1 (fr) | 2010-06-30 |
| KR20040079404A (ko) | 2004-09-14 |
| EP1476888A1 (fr) | 2004-11-17 |
| ATE472820T1 (de) | 2010-07-15 |
| US20040256969A1 (en) | 2004-12-23 |
| CN1316533C (zh) | 2007-05-16 |
| FR2836279B1 (fr) | 2004-09-24 |
| DE60333168D1 (de) | 2010-08-12 |
| KR100944731B1 (ko) | 2010-03-03 |
| JP5425753B2 (ja) | 2014-02-26 |
| US7759851B2 (en) | 2010-07-20 |
| JP2011103303A (ja) | 2011-05-26 |
| WO2003071571A8 (fr) | 2004-04-29 |
| CN1552084A (zh) | 2004-12-01 |
| WO2003071571A1 (fr) | 2003-08-28 |
| FR2836279A1 (fr) | 2003-08-22 |
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