JP2005333009A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2005333009A JP2005333009A JP2004150726A JP2004150726A JP2005333009A JP 2005333009 A JP2005333009 A JP 2005333009A JP 2004150726 A JP2004150726 A JP 2004150726A JP 2004150726 A JP2004150726 A JP 2004150726A JP 2005333009 A JP2005333009 A JP 2005333009A
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Abstract
【解決手段】 絶縁樹脂層105と接触する面における半田ボール108の端部とビア104の上部周縁との間の距離をaとし、UBM膜107の端部とビア104の上部周縁との間の距離をbとしたとき、0<a/b≦2を満たすようにする。
【選択図】 図8
Description
図1は、第一の実施形態に係る半導体装置の要部を示す図である。
a:絶縁樹脂層105と接触する面における半田ボール108の端部とビア104の上部周縁との間の距離
b:ビア104の深さ(キャップ層102上面から絶縁樹脂層105上面までの距離)
c:UBM膜107の端部とビア104の上部周縁との間の距離
d:絶縁樹脂層105の厚み
0<a/b≦2
0<c/b≦1.3
dが、約7μmである。
TiW膜113:100〜500nm
Ti膜112:10〜200nm
本実施形態では、TiW膜113を200nm、Ti膜112を30nmとした。
また、図7に示したように、半田ボール108は、UBM膜107を含むパッド全体を覆うように形成され、UBM膜107、Cu膜111およびバリアメタル膜106の端面が半田ボール108により被覆される。上記工程で、マスクの開口を、パッドより広く設定することでこのような構造が実現される。
本実施形態では、第一の実施の形態と異なるプロセスによりバンプ構造を形成する例を示す。
TiW膜113:100〜500nm
Ti膜112:10〜200nm
Cu膜111:100〜500nm
Ni膜115:2〜5μm
Cu膜114:200〜500nm
また、上記実施の形態では、半田ボール108が合金層110を覆う構成としたが、図21に示すように、合金層110が半田ボール108に覆われず外部に露出する構成としてもよい。
半田材料:Sn、Ag、Cuを含む鉛フリー半田
リフロー条件:
ピーク温度を260℃、ピーク温度保持時間を1分、入炉から出炉までの時間を15分とした。
なお、ピーク温度は220〜260℃、入炉から出炉までの時間は10〜15分の範囲から適宜選択することができる。
a:絶縁樹脂層105と接触する面における半田ボール108の端部とビア104の上部周縁との間の距離
b:ビア104の深さ(キャップ層102上面から絶縁樹脂層105上面までの距離)
c:UBM膜107の端部とビア104の上部周縁との間の距離
d:絶縁樹脂層105の厚み
0<a/b≦2、
0<c/b≦1.3
を満たすとき、良好な結果が得られることが明らかになった。
103 パッシベーション膜
104 ビア
105 絶縁樹脂層
106 バリアメタル膜
107 UBM膜
108 半田ボール
110 合金層
111 Cu膜
112 Ti膜
113 TiW膜
114 Cu膜
115 Ni膜
Claims (9)
- 配線と、
該配線上に設けられ、前記配線に到達する孔の設けられた絶縁膜と、
前記孔の底部において前記配線に接するとともに前記孔の底部から前記孔の外部にわたって形成された導電膜と、
前記導電膜および前記絶縁膜に接して設けられた半田ボールと、
を備え、
前記絶縁膜と接触する面における半田ボールの端部と前記孔の上部周縁との間の距離をaとし、前記孔の深さをbとしたとき、a/bの値が2以下であることを特徴とする半導体装置。 - 配線と、
該配線上に設けられた保護層と該保護膜上に設けられた応力緩和樹脂層とがこの順で積層してなり、前記配線に到達する孔の設けられた絶縁層と、
前記配線に接するとともに前記絶縁層上において前記孔の外部に延出する導電膜と、
前記導電膜および前記応力緩和樹脂層に接して設けられた半田ボールと、
を備え、
前記導電膜は、前記半田ボールと接するボール下地金属膜と、前記配線と前記ボール下地金属膜との間に設けられたバリアメタル膜とを含み、
前記ボール下地金属膜の端部と前記孔の上部周縁との間の距離をcとし、前記孔の深さをbとしたとき、c/bの値が1.3以下であることを特徴とする半導体装置。 - 請求項1または2に記載の半導体装置において、
前記半田ボールと前記導電膜との間に、前記半田ボールに含まれる第一の金属元素と前記導電膜に含まれる第二の金属元素とを含む合金層を有することを特徴とする半導体装置。 - 請求項1乃至3いずれかに記載の半導体装置において、
前記絶縁膜は、前記配線上に設けられた保護膜と、該保護膜の上に設けられた応力緩和樹脂層とを含み、前記応力緩和樹脂層の弾性率が、1GPa以上5GPa以下であることを特徴とする半導体装置。 - 請求項4に記載の半導体装置において、
前記応力緩和樹脂層が、ポリイミドまたはポリベンゾオキサゾールであることを特徴とする半導体装置。 - 請求項4または5に記載の半導体装置において、
前記応力緩和樹脂層の厚みが、1μm以上10μm以下であることを特徴とする半導体装置。 - 請求項1乃至6いずれかに記載の半導体装置において、
前記半田ボールがSnを含む鉛フリー半田からなることを特徴とする半導体装置。 - 請求項1乃至7いずれかに記載の半導体装置において、
前記導電膜の表面部分は、銅またはニッケルを含むことを特徴とする半導体装置。 - 請求項1乃至8いずれかに記載の半導体装置において、
前記半田ボールが、前記導電膜を覆うように形成されることを特徴とする半導体装置。
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TW094115814A TWI278901B (en) | 2004-05-20 | 2005-05-16 | Semiconductor device |
KR1020050041643A KR100687274B1 (ko) | 2004-05-20 | 2005-05-18 | 반도체장치 |
CNB200510072745XA CN100438003C (zh) | 2004-05-20 | 2005-05-19 | 半导体器件 |
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JP (1) | JP4327657B2 (ja) |
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JP2009532917A (ja) * | 2006-04-04 | 2009-09-10 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 半導体デバイス内のアルミニウム端子パッド材料を除去する方法及び構造体 |
JP2019147353A (ja) * | 2018-02-28 | 2019-09-05 | キヤノン株式会社 | 液体吐出ヘッド用基板の製造方法 |
US10882318B2 (en) | 2018-02-28 | 2021-01-05 | Canon Kabushiki Kaisha | Method of manufacturing semiconductor substrate and method of manufacturing substrate for liquid ejection head |
JP2020047775A (ja) * | 2018-09-19 | 2020-03-26 | 住友電工デバイス・イノベーション株式会社 | 半導体装置の製造方法および半導体装置 |
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CN100438003C (zh) | 2008-11-26 |
TWI278901B (en) | 2007-04-11 |
US20050258539A1 (en) | 2005-11-24 |
TW200540946A (en) | 2005-12-16 |
CN1700460A (zh) | 2005-11-23 |
US7221054B2 (en) | 2007-05-22 |
JP4327657B2 (ja) | 2009-09-09 |
KR20060046089A (ko) | 2006-05-17 |
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