JP2003536258A5 - - Google Patents

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Publication number
JP2003536258A5
JP2003536258A5 JP2002502824A JP2002502824A JP2003536258A5 JP 2003536258 A5 JP2003536258 A5 JP 2003536258A5 JP 2002502824 A JP2002502824 A JP 2002502824A JP 2002502824 A JP2002502824 A JP 2002502824A JP 2003536258 A5 JP2003536258 A5 JP 2003536258A5
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JP
Japan
Prior art keywords
cleaning
weight
solution
cleaning liquid
ascorbic acid
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JP2002502824A
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English (en)
Japanese (ja)
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JP2003536258A (ja
JP4942275B2 (ja
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Priority claimed from US09/587,883 external-priority patent/US6492308B1/en
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Publication of JP2003536258A publication Critical patent/JP2003536258A/ja
Publication of JP2003536258A5 publication Critical patent/JP2003536258A5/ja
Application granted granted Critical
Publication of JP4942275B2 publication Critical patent/JP4942275B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002502824A 2000-06-06 2001-06-06 化学的機械的平坦化（ｃｍｐ）後の清浄化組成物 Expired - Fee Related JP4942275B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/587,883 2000-06-06
US09/587,883 US6492308B1 (en) 1999-11-16 2000-06-06 Post chemical-mechanical planarization (CMP) cleaning composition
PCT/US2001/018402 WO2001095381A2 (en) 2000-06-06 2001-06-06 Post chemical-mechanical planarization (cmp) cleaning composition

Publications (3)

Publication Number Publication Date
JP2003536258A JP2003536258A (ja) 2003-12-02
JP2003536258A5 true JP2003536258A5 (enExample) 2008-08-28
JP4942275B2 JP4942275B2 (ja) 2012-05-30

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JP2002502824A Expired - Fee Related JP4942275B2 (ja) 2000-06-06 2001-06-06 化学的機械的平坦化（ｃｍｐ）後の清浄化組成物

Country Status (9)

Country Link
US (1) US6492308B1 (enExample)
EP (1) EP1287550B1 (enExample)
JP (1) JP4942275B2 (enExample)
KR (2) KR100831180B1 (enExample)
CN (1) CN1205655C (enExample)
AT (1) ATE462198T1 (enExample)
DE (1) DE60141629D1 (enExample)
TW (1) TW574369B (enExample)
WO (1) WO2001095381A2 (enExample)

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