JP2002539068A5 - - Google Patents

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Publication number
JP2002539068A5
JP2002539068A5 JP2000605808A JP2000605808A JP2002539068A5 JP 2002539068 A5 JP2002539068 A5 JP 2002539068A5 JP 2000605808 A JP2000605808 A JP 2000605808A JP 2000605808 A JP2000605808 A JP 2000605808A JP 2002539068 A5 JP2002539068 A5 JP 2002539068A5
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JP
Japan
Prior art keywords
crucible
barium
silica
silicon
polysilicon
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000605808A
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English (en)
Japanese (ja)
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JP4560216B2 (ja
JP2002539068A (ja
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Priority claimed from US09/521,288 external-priority patent/US6319313B1/en
Application filed filed Critical
Publication of JP2002539068A publication Critical patent/JP2002539068A/ja
Publication of JP2002539068A5 publication Critical patent/JP2002539068A5/ja
Application granted granted Critical
Publication of JP4560216B2 publication Critical patent/JP4560216B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2000605808A 1999-03-15 2000-03-14 結晶成長工程に使用される溶融シリコンのバリウムドーピング Expired - Lifetime JP4560216B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US12440099P 1999-03-15 1999-03-15
US09/521,288 US6319313B1 (en) 1999-03-15 2000-03-08 Barium doping of molten silicon for use in crystal growing process
US60/124,400 2000-03-08
US09/521,288 2000-03-08
PCT/US2000/006565 WO2000055394A1 (en) 1999-03-15 2000-03-14 Barium doping of molten silicon for use in crystal growing process

Publications (3)

Publication Number Publication Date
JP2002539068A JP2002539068A (ja) 2002-11-19
JP2002539068A5 true JP2002539068A5 (https=) 2006-12-21
JP4560216B2 JP4560216B2 (ja) 2010-10-13

Family

ID=26822543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000605808A Expired - Lifetime JP4560216B2 (ja) 1999-03-15 2000-03-14 結晶成長工程に使用される溶融シリコンのバリウムドーピング

Country Status (8)

Country Link
US (2) US6319313B1 (https=)
EP (1) EP1175519B1 (https=)
JP (1) JP4560216B2 (https=)
KR (1) KR100719821B1 (https=)
CN (1) CN1166822C (https=)
DE (1) DE60005659T2 (https=)
TW (1) TWI241365B (https=)
WO (1) WO2000055394A1 (https=)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6319313B1 (en) * 1999-03-15 2001-11-20 Memc Electronic Materials, Inc. Barium doping of molten silicon for use in crystal growing process
AUPR054000A0 (en) * 2000-10-04 2000-10-26 Austai Motors Designing Pty Ltd A planetary gear apparatus
US6755049B2 (en) * 2001-03-08 2004-06-29 Heraeus Quarzglas Gmbh & Co. Kg Method of producing a quartz glass crucible
US7108746B2 (en) * 2001-05-18 2006-09-19 Integrated Materials, Inc. Silicon fixture with roughened surface supporting wafers in chemical vapor deposition
US6641663B2 (en) 2001-12-12 2003-11-04 Heracus Shin-Estu America Silica crucible with inner layer crystallizer and method
US7118789B2 (en) * 2001-07-16 2006-10-10 Heraeus Shin-Etsu America Silica glass crucible
JP2003095678A (ja) * 2001-07-16 2003-04-03 Heraeus Shin-Etsu America シリコン単結晶製造用ドープ石英ガラスルツボ及びその製造方法
DE10156137B4 (de) * 2001-11-15 2004-08-19 Wacker-Chemie Gmbh Verfahren zur Herstellung eines Kieselglastiegels mit kristallinen Bereichen aus einem porösen Kieselglasgrünkörper
US20040187767A1 (en) * 2002-10-24 2004-09-30 Intel Corporation Device and method for multicrystalline silicon wafers
JP4151474B2 (ja) * 2003-05-13 2008-09-17 信越半導体株式会社 単結晶の製造方法及び単結晶
DE10327496A1 (de) * 2003-06-17 2005-01-20 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Quarzglasbauteils mit hoher thermischer Stabilität
US20050120945A1 (en) * 2003-12-03 2005-06-09 General Electric Company Quartz crucibles having reduced bubble content and method of making thereof
US7164233B2 (en) * 2004-08-04 2007-01-16 Federal Mogul World Wide, Inc. Barium-silica glass lamp having thermally balanced lead-in wires
US7383696B2 (en) * 2005-09-08 2008-06-10 Heraeus Shin-Etsu America, Inc. Silica glass crucible with bubble-free and reduced bubble growth wall
US7427327B2 (en) * 2005-09-08 2008-09-23 Heraeus Shin-Etsu America, Inc. Silica glass crucible with barium-doped inner wall
JP4807130B2 (ja) * 2006-04-04 2011-11-02 株式会社Sumco シリコン単結晶の引上げ方法
JP4788445B2 (ja) * 2006-04-04 2011-10-05 株式会社Sumco シリコン単結晶の引上げ方法
JP4788444B2 (ja) * 2006-04-04 2011-10-05 株式会社Sumco シリコン単結晶の製造方法
US7547908B2 (en) * 2006-12-22 2009-06-16 Philips Lumilieds Lighting Co, Llc III-nitride light emitting devices grown on templates to reduce strain
US20090120353A1 (en) * 2007-11-13 2009-05-14 Memc Electronic Materials, Inc. Reduction of air pockets in silicon crystals by avoiding the introduction of nearly-insoluble gases into the melt
KR100977631B1 (ko) * 2008-01-17 2010-08-23 주식회사 실트론 고저항 실리콘 단결정과 그 제조방법 및 웨이퍼
WO2011009062A2 (en) * 2009-07-16 2011-01-20 Memc Singapore Pte, Ltd. Coated crucibles and methods for preparing and use thereof
JP5500684B2 (ja) * 2010-06-25 2014-05-21 株式会社Sumco シリカガラスルツボ及びその製造方法、シリコンインゴットの製造方法
US9221709B2 (en) * 2011-03-31 2015-12-29 Raytheon Company Apparatus for producing a vitreous inner layer on a fused silica body, and method of operating same
US20120267280A1 (en) * 2011-04-25 2012-10-25 Glen Bennett Cook Vessel for molten semiconducting materials and methods of making the same
US20130247818A1 (en) * 2011-05-25 2013-09-26 Saint-Gobain Research (Shanghai) Co., Ltd. Silica crucible and method for fabricating the same
JP5509188B2 (ja) 2011-12-26 2014-06-04 ジルトロニック アクチエンゲゼルシャフト 単結晶シリコンの製造方法
NO336720B1 (no) * 2013-09-09 2015-10-26 Elkem Solar As Fremgangsmåte for forbedring av effektiviteten av solceller.
NO339608B1 (no) 2013-09-09 2017-01-09 Elkem Solar As Multikrystallinske silisiumingoter, silisiummasterlegering, fremgangsmåte for å øke utbyttet av multikrystallinske silisiumingoter for solceller
JP2019509969A (ja) * 2016-03-23 2019-04-11 モメンティブ パフォーマンス マテリアルズ インコーポレイテッド 石英ガラス坩堝結晶育成法のための失透剤
CN107604429A (zh) * 2016-07-12 2018-01-19 上海新昇半导体科技有限公司 直拉生长单晶硅的方法
CN107604437A (zh) * 2016-07-12 2018-01-19 上海新昇半导体科技有限公司 在石英坩埚中制备硅熔融体的方法
CN109056055B (zh) * 2018-09-28 2020-11-03 包头美科硅能源有限公司 一种单晶硅棒的生产方法
CN109267149A (zh) * 2018-11-29 2019-01-25 内蒙古中环光伏材料有限公司 一种石英坩埚及控制碳酸钡用量的方法
DE102020000701A1 (de) * 2020-02-03 2021-08-05 Siltronic Ag Quarzglastiegel zur Herstellung von Siliciumkristallen und Verfahren zur Herstellung von Quarzglastiegel
CN114368901B (zh) * 2021-12-28 2023-09-26 无锡市尚领石英科技有限公司 高良品率加厚型单晶石英坩埚及其制备工艺

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2872299A (en) 1954-11-30 1959-02-03 Rca Corp Preparation of reactive materials in a molten non-reactive lined crucible
US3240568A (en) * 1961-12-20 1966-03-15 Monsanto Co Process and apparatus for the production of single crystal compounds
US3508894A (en) * 1966-09-29 1970-04-28 Owens Illinois Inc Method for metailizing a glass surface
DE1771305C3 (de) * 1968-05-03 1974-07-04 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Reinigen eines für die Halbleiterherstellung dienenden Behandlungsgefäßes aus Quarz
US3926770A (en) * 1972-06-08 1975-12-16 Ppg Industries Inc Electrolytic cell having silicon bipolar electrodes
US3961969A (en) * 1974-01-07 1976-06-08 Owens-Illinois, Inc. Glass-ceramics for semiconductor doping
US3998667A (en) * 1974-12-20 1976-12-21 Owens-Illinois, Inc. Barium aluminoborosilicate glass-ceramics for semiconductor doping
US4160672A (en) * 1974-12-23 1979-07-10 Owens-Illinois, Inc. Glass-ceramics for semiconductor doping
US4200621A (en) * 1978-07-18 1980-04-29 Motorola, Inc. Sequential purification and crystal growth
JP2561105B2 (ja) * 1987-12-15 1996-12-04 東芝セラミックス株式会社 石英ガラスルツボの製造方法
JP2559604B2 (ja) * 1987-12-15 1996-12-04 東芝セラミックス株式会社 石英ガラスルツボの製造方法
US5225031A (en) * 1991-04-10 1993-07-06 Martin Marietta Energy Systems, Inc. Process for depositing an oxide epitaxially onto a silicon substrate and structures prepared with the process
JPH0748885A (ja) * 1993-08-09 1995-02-21 Natl House Ind Co Ltd 耐火壁体の構造
JPH0753605A (ja) * 1993-08-17 1995-02-28 Toppan Printing Co Ltd シクロデキストリン誘導体の製造方法
JP3100836B2 (ja) 1994-06-20 2000-10-23 信越石英株式会社 石英ガラスルツボとその製造方法
DE69508473T2 (de) 1994-07-06 1999-10-28 Shin-Etsu Handotai Co., Ltd. Verfahren zur Herstellung von Silizium-Einkristall und Tiegel aus geschmolzenem Silika dafür
JPH08217592A (ja) 1995-02-17 1996-08-27 Toshiba Ceramics Co Ltd シリコン単結晶製造用石英ルツボ
JPH08239231A (ja) 1995-03-02 1996-09-17 Shin Etsu Chem Co Ltd 石英ルツボの製造方法
JP2811290B2 (ja) 1995-04-04 1998-10-15 信越石英株式会社 シリコン単結晶引き上げ用石英ガラスルツボ
JP2830990B2 (ja) 1995-05-31 1998-12-02 信越石英株式会社 石英製二重ルツボの製造方法
US5980629A (en) * 1995-06-14 1999-11-09 Memc Electronic Materials, Inc. Methods for improving zero dislocation yield of single crystals
US5976247A (en) 1995-06-14 1999-11-02 Memc Electronic Materials, Inc. Surface-treated crucibles for improved zero dislocation performance
JPH0920586A (ja) * 1995-06-30 1997-01-21 Toshiba Ceramics Co Ltd シリコン単結晶引上げ用石英ガラスルツボの製造方法
JP4237280B2 (ja) 1997-07-02 2009-03-11 信越半導体株式会社 シリコン単結晶の製造方法
JP3957374B2 (ja) 1997-10-20 2007-08-15 東京エレクトロン株式会社 マイクロ波プラズマ処理装置
US5913975A (en) * 1998-02-03 1999-06-22 Memc Electronic Materials, Inc. Crucible and method of preparation thereof
US6319313B1 (en) * 1999-03-15 2001-11-20 Memc Electronic Materials, Inc. Barium doping of molten silicon for use in crystal growing process
KR100748885B1 (ko) * 2005-12-01 2007-08-13 현대자동차주식회사 자동변속기의 오버드라이브 유성기어 셋트
KR100753605B1 (ko) * 2006-08-11 2007-08-30 에쓰메딕 (주) 휴대용 초음파 피부 미용장치의 출력 향상을 위한 실링구조
JP5609682B2 (ja) * 2011-01-31 2014-10-22 ブラザー工業株式会社 画像読取装置及びそのプログラム

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