JP2002539068A5 - - Google Patents
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- Publication number
- JP2002539068A5 JP2002539068A5 JP2000605808A JP2000605808A JP2002539068A5 JP 2002539068 A5 JP2002539068 A5 JP 2002539068A5 JP 2000605808 A JP2000605808 A JP 2000605808A JP 2000605808 A JP2000605808 A JP 2000605808A JP 2002539068 A5 JP2002539068 A5 JP 2002539068A5
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- barium
- silica
- silicon
- polysilicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12440099P | 1999-03-15 | 1999-03-15 | |
| US09/521,288 US6319313B1 (en) | 1999-03-15 | 2000-03-08 | Barium doping of molten silicon for use in crystal growing process |
| US60/124,400 | 2000-03-08 | ||
| US09/521,288 | 2000-03-08 | ||
| PCT/US2000/006565 WO2000055394A1 (en) | 1999-03-15 | 2000-03-14 | Barium doping of molten silicon for use in crystal growing process |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002539068A JP2002539068A (ja) | 2002-11-19 |
| JP2002539068A5 true JP2002539068A5 (https=) | 2006-12-21 |
| JP4560216B2 JP4560216B2 (ja) | 2010-10-13 |
Family
ID=26822543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000605808A Expired - Lifetime JP4560216B2 (ja) | 1999-03-15 | 2000-03-14 | 結晶成長工程に使用される溶融シリコンのバリウムドーピング |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US6319313B1 (https=) |
| EP (1) | EP1175519B1 (https=) |
| JP (1) | JP4560216B2 (https=) |
| KR (1) | KR100719821B1 (https=) |
| CN (1) | CN1166822C (https=) |
| DE (1) | DE60005659T2 (https=) |
| TW (1) | TWI241365B (https=) |
| WO (1) | WO2000055394A1 (https=) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6319313B1 (en) * | 1999-03-15 | 2001-11-20 | Memc Electronic Materials, Inc. | Barium doping of molten silicon for use in crystal growing process |
| AUPR054000A0 (en) * | 2000-10-04 | 2000-10-26 | Austai Motors Designing Pty Ltd | A planetary gear apparatus |
| US6755049B2 (en) * | 2001-03-08 | 2004-06-29 | Heraeus Quarzglas Gmbh & Co. Kg | Method of producing a quartz glass crucible |
| US7108746B2 (en) * | 2001-05-18 | 2006-09-19 | Integrated Materials, Inc. | Silicon fixture with roughened surface supporting wafers in chemical vapor deposition |
| US6641663B2 (en) | 2001-12-12 | 2003-11-04 | Heracus Shin-Estu America | Silica crucible with inner layer crystallizer and method |
| US7118789B2 (en) * | 2001-07-16 | 2006-10-10 | Heraeus Shin-Etsu America | Silica glass crucible |
| JP2003095678A (ja) * | 2001-07-16 | 2003-04-03 | Heraeus Shin-Etsu America | シリコン単結晶製造用ドープ石英ガラスルツボ及びその製造方法 |
| DE10156137B4 (de) * | 2001-11-15 | 2004-08-19 | Wacker-Chemie Gmbh | Verfahren zur Herstellung eines Kieselglastiegels mit kristallinen Bereichen aus einem porösen Kieselglasgrünkörper |
| US20040187767A1 (en) * | 2002-10-24 | 2004-09-30 | Intel Corporation | Device and method for multicrystalline silicon wafers |
| JP4151474B2 (ja) * | 2003-05-13 | 2008-09-17 | 信越半導体株式会社 | 単結晶の製造方法及び単結晶 |
| DE10327496A1 (de) * | 2003-06-17 | 2005-01-20 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglasbauteils mit hoher thermischer Stabilität |
| US20050120945A1 (en) * | 2003-12-03 | 2005-06-09 | General Electric Company | Quartz crucibles having reduced bubble content and method of making thereof |
| US7164233B2 (en) * | 2004-08-04 | 2007-01-16 | Federal Mogul World Wide, Inc. | Barium-silica glass lamp having thermally balanced lead-in wires |
| US7383696B2 (en) * | 2005-09-08 | 2008-06-10 | Heraeus Shin-Etsu America, Inc. | Silica glass crucible with bubble-free and reduced bubble growth wall |
| US7427327B2 (en) * | 2005-09-08 | 2008-09-23 | Heraeus Shin-Etsu America, Inc. | Silica glass crucible with barium-doped inner wall |
| JP4807130B2 (ja) * | 2006-04-04 | 2011-11-02 | 株式会社Sumco | シリコン単結晶の引上げ方法 |
| JP4788445B2 (ja) * | 2006-04-04 | 2011-10-05 | 株式会社Sumco | シリコン単結晶の引上げ方法 |
| JP4788444B2 (ja) * | 2006-04-04 | 2011-10-05 | 株式会社Sumco | シリコン単結晶の製造方法 |
| US7547908B2 (en) * | 2006-12-22 | 2009-06-16 | Philips Lumilieds Lighting Co, Llc | III-nitride light emitting devices grown on templates to reduce strain |
| US20090120353A1 (en) * | 2007-11-13 | 2009-05-14 | Memc Electronic Materials, Inc. | Reduction of air pockets in silicon crystals by avoiding the introduction of nearly-insoluble gases into the melt |
| KR100977631B1 (ko) * | 2008-01-17 | 2010-08-23 | 주식회사 실트론 | 고저항 실리콘 단결정과 그 제조방법 및 웨이퍼 |
| WO2011009062A2 (en) * | 2009-07-16 | 2011-01-20 | Memc Singapore Pte, Ltd. | Coated crucibles and methods for preparing and use thereof |
| JP5500684B2 (ja) * | 2010-06-25 | 2014-05-21 | 株式会社Sumco | シリカガラスルツボ及びその製造方法、シリコンインゴットの製造方法 |
| US9221709B2 (en) * | 2011-03-31 | 2015-12-29 | Raytheon Company | Apparatus for producing a vitreous inner layer on a fused silica body, and method of operating same |
| US20120267280A1 (en) * | 2011-04-25 | 2012-10-25 | Glen Bennett Cook | Vessel for molten semiconducting materials and methods of making the same |
| US20130247818A1 (en) * | 2011-05-25 | 2013-09-26 | Saint-Gobain Research (Shanghai) Co., Ltd. | Silica crucible and method for fabricating the same |
| JP5509188B2 (ja) | 2011-12-26 | 2014-06-04 | ジルトロニック アクチエンゲゼルシャフト | 単結晶シリコンの製造方法 |
| NO336720B1 (no) * | 2013-09-09 | 2015-10-26 | Elkem Solar As | Fremgangsmåte for forbedring av effektiviteten av solceller. |
| NO339608B1 (no) | 2013-09-09 | 2017-01-09 | Elkem Solar As | Multikrystallinske silisiumingoter, silisiummasterlegering, fremgangsmåte for å øke utbyttet av multikrystallinske silisiumingoter for solceller |
| JP2019509969A (ja) * | 2016-03-23 | 2019-04-11 | モメンティブ パフォーマンス マテリアルズ インコーポレイテッド | 石英ガラス坩堝結晶育成法のための失透剤 |
| CN107604429A (zh) * | 2016-07-12 | 2018-01-19 | 上海新昇半导体科技有限公司 | 直拉生长单晶硅的方法 |
| CN107604437A (zh) * | 2016-07-12 | 2018-01-19 | 上海新昇半导体科技有限公司 | 在石英坩埚中制备硅熔融体的方法 |
| CN109056055B (zh) * | 2018-09-28 | 2020-11-03 | 包头美科硅能源有限公司 | 一种单晶硅棒的生产方法 |
| CN109267149A (zh) * | 2018-11-29 | 2019-01-25 | 内蒙古中环光伏材料有限公司 | 一种石英坩埚及控制碳酸钡用量的方法 |
| DE102020000701A1 (de) * | 2020-02-03 | 2021-08-05 | Siltronic Ag | Quarzglastiegel zur Herstellung von Siliciumkristallen und Verfahren zur Herstellung von Quarzglastiegel |
| CN114368901B (zh) * | 2021-12-28 | 2023-09-26 | 无锡市尚领石英科技有限公司 | 高良品率加厚型单晶石英坩埚及其制备工艺 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2872299A (en) | 1954-11-30 | 1959-02-03 | Rca Corp | Preparation of reactive materials in a molten non-reactive lined crucible |
| US3240568A (en) * | 1961-12-20 | 1966-03-15 | Monsanto Co | Process and apparatus for the production of single crystal compounds |
| US3508894A (en) * | 1966-09-29 | 1970-04-28 | Owens Illinois Inc | Method for metailizing a glass surface |
| DE1771305C3 (de) * | 1968-05-03 | 1974-07-04 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Reinigen eines für die Halbleiterherstellung dienenden Behandlungsgefäßes aus Quarz |
| US3926770A (en) * | 1972-06-08 | 1975-12-16 | Ppg Industries Inc | Electrolytic cell having silicon bipolar electrodes |
| US3961969A (en) * | 1974-01-07 | 1976-06-08 | Owens-Illinois, Inc. | Glass-ceramics for semiconductor doping |
| US3998667A (en) * | 1974-12-20 | 1976-12-21 | Owens-Illinois, Inc. | Barium aluminoborosilicate glass-ceramics for semiconductor doping |
| US4160672A (en) * | 1974-12-23 | 1979-07-10 | Owens-Illinois, Inc. | Glass-ceramics for semiconductor doping |
| US4200621A (en) * | 1978-07-18 | 1980-04-29 | Motorola, Inc. | Sequential purification and crystal growth |
| JP2561105B2 (ja) * | 1987-12-15 | 1996-12-04 | 東芝セラミックス株式会社 | 石英ガラスルツボの製造方法 |
| JP2559604B2 (ja) * | 1987-12-15 | 1996-12-04 | 東芝セラミックス株式会社 | 石英ガラスルツボの製造方法 |
| US5225031A (en) * | 1991-04-10 | 1993-07-06 | Martin Marietta Energy Systems, Inc. | Process for depositing an oxide epitaxially onto a silicon substrate and structures prepared with the process |
| JPH0748885A (ja) * | 1993-08-09 | 1995-02-21 | Natl House Ind Co Ltd | 耐火壁体の構造 |
| JPH0753605A (ja) * | 1993-08-17 | 1995-02-28 | Toppan Printing Co Ltd | シクロデキストリン誘導体の製造方法 |
| JP3100836B2 (ja) | 1994-06-20 | 2000-10-23 | 信越石英株式会社 | 石英ガラスルツボとその製造方法 |
| DE69508473T2 (de) | 1994-07-06 | 1999-10-28 | Shin-Etsu Handotai Co., Ltd. | Verfahren zur Herstellung von Silizium-Einkristall und Tiegel aus geschmolzenem Silika dafür |
| JPH08217592A (ja) | 1995-02-17 | 1996-08-27 | Toshiba Ceramics Co Ltd | シリコン単結晶製造用石英ルツボ |
| JPH08239231A (ja) | 1995-03-02 | 1996-09-17 | Shin Etsu Chem Co Ltd | 石英ルツボの製造方法 |
| JP2811290B2 (ja) | 1995-04-04 | 1998-10-15 | 信越石英株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ |
| JP2830990B2 (ja) | 1995-05-31 | 1998-12-02 | 信越石英株式会社 | 石英製二重ルツボの製造方法 |
| US5980629A (en) * | 1995-06-14 | 1999-11-09 | Memc Electronic Materials, Inc. | Methods for improving zero dislocation yield of single crystals |
| US5976247A (en) | 1995-06-14 | 1999-11-02 | Memc Electronic Materials, Inc. | Surface-treated crucibles for improved zero dislocation performance |
| JPH0920586A (ja) * | 1995-06-30 | 1997-01-21 | Toshiba Ceramics Co Ltd | シリコン単結晶引上げ用石英ガラスルツボの製造方法 |
| JP4237280B2 (ja) | 1997-07-02 | 2009-03-11 | 信越半導体株式会社 | シリコン単結晶の製造方法 |
| JP3957374B2 (ja) | 1997-10-20 | 2007-08-15 | 東京エレクトロン株式会社 | マイクロ波プラズマ処理装置 |
| US5913975A (en) * | 1998-02-03 | 1999-06-22 | Memc Electronic Materials, Inc. | Crucible and method of preparation thereof |
| US6319313B1 (en) * | 1999-03-15 | 2001-11-20 | Memc Electronic Materials, Inc. | Barium doping of molten silicon for use in crystal growing process |
| KR100748885B1 (ko) * | 2005-12-01 | 2007-08-13 | 현대자동차주식회사 | 자동변속기의 오버드라이브 유성기어 셋트 |
| KR100753605B1 (ko) * | 2006-08-11 | 2007-08-30 | 에쓰메딕 (주) | 휴대용 초음파 피부 미용장치의 출력 향상을 위한 실링구조 |
| JP5609682B2 (ja) * | 2011-01-31 | 2014-10-22 | ブラザー工業株式会社 | 画像読取装置及びそのプログラム |
-
2000
- 2000-03-08 US US09/521,288 patent/US6319313B1/en not_active Expired - Lifetime
- 2000-03-14 EP EP00914953A patent/EP1175519B1/en not_active Expired - Lifetime
- 2000-03-14 WO PCT/US2000/006565 patent/WO2000055394A1/en not_active Ceased
- 2000-03-14 JP JP2000605808A patent/JP4560216B2/ja not_active Expired - Lifetime
- 2000-03-14 CN CNB008050473A patent/CN1166822C/zh not_active Expired - Fee Related
- 2000-03-14 KR KR1020017011680A patent/KR100719821B1/ko not_active Expired - Fee Related
- 2000-03-14 DE DE60005659T patent/DE60005659T2/de not_active Expired - Lifetime
- 2000-03-15 TW TW089104584A patent/TWI241365B/zh not_active IP Right Cessation
-
2001
- 2001-05-17 US US09/859,826 patent/US6461427B2/en not_active Expired - Fee Related
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