CN1166822C - 在晶体生长过程中使用的硅熔体的钡掺杂 - Google Patents

在晶体生长过程中使用的硅熔体的钡掺杂 Download PDF

Info

Publication number
CN1166822C
CN1166822C CNB008050473A CN00805047A CN1166822C CN 1166822 C CN1166822 C CN 1166822C CN B008050473 A CNB008050473 A CN B008050473A CN 00805047 A CN00805047 A CN 00805047A CN 1166822 C CN1166822 C CN 1166822C
Authority
CN
China
Prior art keywords
crucible
barium
silicon
melt
tungsten
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB008050473A
Other languages
English (en)
Chinese (zh)
Other versions
CN1343265A (zh
Inventor
Rj
R·J·飞利普斯
S·J·克勒特尼尔
���յ¶�
J·D·赫德尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SunEdison Inc
Original Assignee
SunEdison Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SunEdison Inc filed Critical SunEdison Inc
Publication of CN1343265A publication Critical patent/CN1343265A/zh
Application granted granted Critical
Publication of CN1166822C publication Critical patent/CN1166822C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
CNB008050473A 1999-03-15 2000-03-14 在晶体生长过程中使用的硅熔体的钡掺杂 Expired - Fee Related CN1166822C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US12440099P 1999-03-15 1999-03-15
US09/521,288 US6319313B1 (en) 1999-03-15 2000-03-08 Barium doping of molten silicon for use in crystal growing process
US60/124,400 2000-03-08
US09/521,288 2000-03-08

Publications (2)

Publication Number Publication Date
CN1343265A CN1343265A (zh) 2002-04-03
CN1166822C true CN1166822C (zh) 2004-09-15

Family

ID=26822543

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB008050473A Expired - Fee Related CN1166822C (zh) 1999-03-15 2000-03-14 在晶体生长过程中使用的硅熔体的钡掺杂

Country Status (8)

Country Link
US (2) US6319313B1 (https=)
EP (1) EP1175519B1 (https=)
JP (1) JP4560216B2 (https=)
KR (1) KR100719821B1 (https=)
CN (1) CN1166822C (https=)
DE (1) DE60005659T2 (https=)
TW (1) TWI241365B (https=)
WO (1) WO2000055394A1 (https=)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6319313B1 (en) * 1999-03-15 2001-11-20 Memc Electronic Materials, Inc. Barium doping of molten silicon for use in crystal growing process
AUPR054000A0 (en) * 2000-10-04 2000-10-26 Austai Motors Designing Pty Ltd A planetary gear apparatus
US6755049B2 (en) * 2001-03-08 2004-06-29 Heraeus Quarzglas Gmbh & Co. Kg Method of producing a quartz glass crucible
US7108746B2 (en) * 2001-05-18 2006-09-19 Integrated Materials, Inc. Silicon fixture with roughened surface supporting wafers in chemical vapor deposition
US6641663B2 (en) 2001-12-12 2003-11-04 Heracus Shin-Estu America Silica crucible with inner layer crystallizer and method
US7118789B2 (en) * 2001-07-16 2006-10-10 Heraeus Shin-Etsu America Silica glass crucible
JP2003095678A (ja) * 2001-07-16 2003-04-03 Heraeus Shin-Etsu America シリコン単結晶製造用ドープ石英ガラスルツボ及びその製造方法
DE10156137B4 (de) * 2001-11-15 2004-08-19 Wacker-Chemie Gmbh Verfahren zur Herstellung eines Kieselglastiegels mit kristallinen Bereichen aus einem porösen Kieselglasgrünkörper
US20040187767A1 (en) * 2002-10-24 2004-09-30 Intel Corporation Device and method for multicrystalline silicon wafers
JP4151474B2 (ja) * 2003-05-13 2008-09-17 信越半導体株式会社 単結晶の製造方法及び単結晶
DE10327496A1 (de) * 2003-06-17 2005-01-20 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Quarzglasbauteils mit hoher thermischer Stabilität
US20050120945A1 (en) * 2003-12-03 2005-06-09 General Electric Company Quartz crucibles having reduced bubble content and method of making thereof
US7164233B2 (en) * 2004-08-04 2007-01-16 Federal Mogul World Wide, Inc. Barium-silica glass lamp having thermally balanced lead-in wires
US7383696B2 (en) * 2005-09-08 2008-06-10 Heraeus Shin-Etsu America, Inc. Silica glass crucible with bubble-free and reduced bubble growth wall
US7427327B2 (en) * 2005-09-08 2008-09-23 Heraeus Shin-Etsu America, Inc. Silica glass crucible with barium-doped inner wall
JP4807130B2 (ja) * 2006-04-04 2011-11-02 株式会社Sumco シリコン単結晶の引上げ方法
JP4788445B2 (ja) * 2006-04-04 2011-10-05 株式会社Sumco シリコン単結晶の引上げ方法
JP4788444B2 (ja) * 2006-04-04 2011-10-05 株式会社Sumco シリコン単結晶の製造方法
US7547908B2 (en) * 2006-12-22 2009-06-16 Philips Lumilieds Lighting Co, Llc III-nitride light emitting devices grown on templates to reduce strain
US20090120353A1 (en) * 2007-11-13 2009-05-14 Memc Electronic Materials, Inc. Reduction of air pockets in silicon crystals by avoiding the introduction of nearly-insoluble gases into the melt
KR100977631B1 (ko) * 2008-01-17 2010-08-23 주식회사 실트론 고저항 실리콘 단결정과 그 제조방법 및 웨이퍼
WO2011009062A2 (en) * 2009-07-16 2011-01-20 Memc Singapore Pte, Ltd. Coated crucibles and methods for preparing and use thereof
JP5500684B2 (ja) * 2010-06-25 2014-05-21 株式会社Sumco シリカガラスルツボ及びその製造方法、シリコンインゴットの製造方法
US9221709B2 (en) * 2011-03-31 2015-12-29 Raytheon Company Apparatus for producing a vitreous inner layer on a fused silica body, and method of operating same
US20120267280A1 (en) * 2011-04-25 2012-10-25 Glen Bennett Cook Vessel for molten semiconducting materials and methods of making the same
US20130247818A1 (en) * 2011-05-25 2013-09-26 Saint-Gobain Research (Shanghai) Co., Ltd. Silica crucible and method for fabricating the same
JP5509188B2 (ja) 2011-12-26 2014-06-04 ジルトロニック アクチエンゲゼルシャフト 単結晶シリコンの製造方法
NO336720B1 (no) * 2013-09-09 2015-10-26 Elkem Solar As Fremgangsmåte for forbedring av effektiviteten av solceller.
NO339608B1 (no) 2013-09-09 2017-01-09 Elkem Solar As Multikrystallinske silisiumingoter, silisiummasterlegering, fremgangsmåte for å øke utbyttet av multikrystallinske silisiumingoter for solceller
JP2019509969A (ja) * 2016-03-23 2019-04-11 モメンティブ パフォーマンス マテリアルズ インコーポレイテッド 石英ガラス坩堝結晶育成法のための失透剤
CN107604429A (zh) * 2016-07-12 2018-01-19 上海新昇半导体科技有限公司 直拉生长单晶硅的方法
CN107604437A (zh) * 2016-07-12 2018-01-19 上海新昇半导体科技有限公司 在石英坩埚中制备硅熔融体的方法
CN109056055B (zh) * 2018-09-28 2020-11-03 包头美科硅能源有限公司 一种单晶硅棒的生产方法
CN109267149A (zh) * 2018-11-29 2019-01-25 内蒙古中环光伏材料有限公司 一种石英坩埚及控制碳酸钡用量的方法
DE102020000701A1 (de) * 2020-02-03 2021-08-05 Siltronic Ag Quarzglastiegel zur Herstellung von Siliciumkristallen und Verfahren zur Herstellung von Quarzglastiegel
CN114368901B (zh) * 2021-12-28 2023-09-26 无锡市尚领石英科技有限公司 高良品率加厚型单晶石英坩埚及其制备工艺

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2872299A (en) 1954-11-30 1959-02-03 Rca Corp Preparation of reactive materials in a molten non-reactive lined crucible
US3240568A (en) * 1961-12-20 1966-03-15 Monsanto Co Process and apparatus for the production of single crystal compounds
US3508894A (en) * 1966-09-29 1970-04-28 Owens Illinois Inc Method for metailizing a glass surface
DE1771305C3 (de) * 1968-05-03 1974-07-04 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Reinigen eines für die Halbleiterherstellung dienenden Behandlungsgefäßes aus Quarz
US3926770A (en) * 1972-06-08 1975-12-16 Ppg Industries Inc Electrolytic cell having silicon bipolar electrodes
US3961969A (en) * 1974-01-07 1976-06-08 Owens-Illinois, Inc. Glass-ceramics for semiconductor doping
US3998667A (en) * 1974-12-20 1976-12-21 Owens-Illinois, Inc. Barium aluminoborosilicate glass-ceramics for semiconductor doping
US4160672A (en) * 1974-12-23 1979-07-10 Owens-Illinois, Inc. Glass-ceramics for semiconductor doping
US4200621A (en) * 1978-07-18 1980-04-29 Motorola, Inc. Sequential purification and crystal growth
JP2561105B2 (ja) * 1987-12-15 1996-12-04 東芝セラミックス株式会社 石英ガラスルツボの製造方法
JP2559604B2 (ja) * 1987-12-15 1996-12-04 東芝セラミックス株式会社 石英ガラスルツボの製造方法
US5225031A (en) * 1991-04-10 1993-07-06 Martin Marietta Energy Systems, Inc. Process for depositing an oxide epitaxially onto a silicon substrate and structures prepared with the process
JPH0748885A (ja) * 1993-08-09 1995-02-21 Natl House Ind Co Ltd 耐火壁体の構造
JPH0753605A (ja) * 1993-08-17 1995-02-28 Toppan Printing Co Ltd シクロデキストリン誘導体の製造方法
JP3100836B2 (ja) 1994-06-20 2000-10-23 信越石英株式会社 石英ガラスルツボとその製造方法
DE69508473T2 (de) 1994-07-06 1999-10-28 Shin-Etsu Handotai Co., Ltd. Verfahren zur Herstellung von Silizium-Einkristall und Tiegel aus geschmolzenem Silika dafür
JPH08217592A (ja) 1995-02-17 1996-08-27 Toshiba Ceramics Co Ltd シリコン単結晶製造用石英ルツボ
JPH08239231A (ja) 1995-03-02 1996-09-17 Shin Etsu Chem Co Ltd 石英ルツボの製造方法
JP2811290B2 (ja) 1995-04-04 1998-10-15 信越石英株式会社 シリコン単結晶引き上げ用石英ガラスルツボ
JP2830990B2 (ja) 1995-05-31 1998-12-02 信越石英株式会社 石英製二重ルツボの製造方法
US5980629A (en) * 1995-06-14 1999-11-09 Memc Electronic Materials, Inc. Methods for improving zero dislocation yield of single crystals
US5976247A (en) 1995-06-14 1999-11-02 Memc Electronic Materials, Inc. Surface-treated crucibles for improved zero dislocation performance
JPH0920586A (ja) * 1995-06-30 1997-01-21 Toshiba Ceramics Co Ltd シリコン単結晶引上げ用石英ガラスルツボの製造方法
JP4237280B2 (ja) 1997-07-02 2009-03-11 信越半導体株式会社 シリコン単結晶の製造方法
JP3957374B2 (ja) 1997-10-20 2007-08-15 東京エレクトロン株式会社 マイクロ波プラズマ処理装置
US5913975A (en) * 1998-02-03 1999-06-22 Memc Electronic Materials, Inc. Crucible and method of preparation thereof
US6319313B1 (en) * 1999-03-15 2001-11-20 Memc Electronic Materials, Inc. Barium doping of molten silicon for use in crystal growing process
KR100748885B1 (ko) * 2005-12-01 2007-08-13 현대자동차주식회사 자동변속기의 오버드라이브 유성기어 셋트
KR100753605B1 (ko) * 2006-08-11 2007-08-30 에쓰메딕 (주) 휴대용 초음파 피부 미용장치의 출력 향상을 위한 실링구조
JP5609682B2 (ja) * 2011-01-31 2014-10-22 ブラザー工業株式会社 画像読取装置及びそのプログラム

Also Published As

Publication number Publication date
KR20010113746A (ko) 2001-12-28
EP1175519A1 (en) 2002-01-30
TWI241365B (en) 2005-10-11
WO2000055394A8 (en) 2001-02-08
WO2000055394A1 (en) 2000-09-21
JP4560216B2 (ja) 2010-10-13
US20010032580A1 (en) 2001-10-25
EP1175519B1 (en) 2003-10-01
US6319313B1 (en) 2001-11-20
KR100719821B1 (ko) 2007-05-18
CN1343265A (zh) 2002-04-03
DE60005659T2 (de) 2004-08-12
US6461427B2 (en) 2002-10-08
JP2002539068A (ja) 2002-11-19
DE60005659D1 (de) 2003-11-06

Similar Documents

Publication Publication Date Title
CN1166822C (zh) 在晶体生长过程中使用的硅熔体的钡掺杂
EP1153161B1 (en) Tungsten doped crucible and method for preparing same
CN1166821C (zh) 在晶体生长过程中使用的硅熔体的锶掺杂
US6946030B2 (en) Method for the production of a silica glass crucible with crystalline regions from a porous silica glass green body
JP2019509969A (ja) 石英ガラス坩堝結晶育成法のための失透剤
KR102243264B1 (ko) 실리카 유리 도가니 및 그의 제조 방법
RU2370568C1 (ru) Способ изготовления кварцевых контейнеров
KR102898437B1 (ko) 석영 유리 도가니 및 그 제조 방법 및 실리콘 단결정의 제조 방법
US20240035198A1 (en) Systems and methods for forming single crystal silicon ingots with crucibles having a synthetic liner
JP2007277026A (ja) シリコン単結晶の引上げ方法
KR20250033293A (ko) 실리콘 단결정 인상용 석영 유리 도가니 및 이를 이용한 실리콘 단결정의 제조 방법

Legal Events

Date Code Title Description
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C06 Publication
PB01 Publication
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20040915

Termination date: 20150314

EXPY Termination of patent right or utility model