JP2000212170A - 増強された耐久性を有するベンゾトリアゾ―ルｕｖ吸収剤 - Google Patents

増強された耐久性を有するベンゾトリアゾ―ルｕｖ吸収剤

Info

Publication number
JP2000212170A
JP2000212170A JP11194A JP2000011194A JP2000212170A JP 2000212170 A JP2000212170 A JP 2000212170A JP 11194 A JP11194 A JP 11194A JP 2000011194 A JP2000011194 A JP 2000011194A JP 2000212170 A JP2000212170 A JP 2000212170A
Authority
JP
Japan
Prior art keywords
carbon atoms
phenyl
alkyl
tert
branched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11194A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000212170A5 (cg-RX-API-DMAC7.html
Inventor
Ramanathan Ravichandran
ラビチャンドラン ラマナサン
Anthony David Debellis
デービッド デベリス アンソニー
Revathi Iyengar
イェンガー レヴァシ
Joseph Suhadolnik
スハドルニク ヨセフ
Jean-Pierre Wolf
ヴォルフ ジャン−ピエール
Jr Mervin Gale Wood
ゲイル ウッド ジュニア マービン
Robert Edward Detlefsen
エドワード デートレフセン ロバート
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of JP2000212170A publication Critical patent/JP2000212170A/ja
Publication of JP2000212170A5 publication Critical patent/JP2000212170A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6515—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having three nitrogen atoms as the only ring hetero atoms
    • C07F9/6518—Five-membered rings
    • C07F9/65188—Five-membered rings condensed with carbocyclic rings or carbocyclic ring systems
    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04B—GENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
    • E04B1/00—Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
    • E04B1/38—Connections for building structures in general
    • E04B1/41—Connecting devices specially adapted for embedding in concrete or masonry
    • E04B1/4114—Elements with sockets
    • E04B1/4121—Elements with sockets with internal threads or non-adjustable captive nuts
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/48—Stabilisers against degradation by oxygen, light or heat
    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04B—GENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
    • E04B1/00—Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
    • E04B1/38—Connections for building structures in general
    • E04B1/41—Connecting devices specially adapted for embedding in concrete or masonry
    • E04B1/4114—Elements with sockets
    • E04B1/415—Elements with sockets with captive and extendable anchoring parts, e.g. spring-loaded bolts, hanging rings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/124—Duplicating or marking methods; Sheet materials for use therein using pressure to make a masked colour visible, e.g. to make a coloured support visible, to create an opaque or transparent pattern, or to form colour by uniting colour-forming components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • B41M5/337—Additives; Binders
    • B41M5/3375—Non-macromolecular compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382—Contact thermal transfer or sublimation processes
    • B41M5/392—Additives, other than colour forming substances, dyes or pigments, e.g. sensitisers, transfer promoting agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/132—Anti-ultraviolet fading

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Electromagnetism (AREA)
  • Materials Engineering (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Dental Preparations (AREA)
JP11194A 1999-01-21 2000-01-20 増強された耐久性を有するベンゾトリアゾ―ルｕｖ吸収剤 Pending JP2000212170A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/234,880 US6166218A (en) 1996-11-07 1999-01-21 Benzotriazole UV absorbers having enhanced durability
US09/234880 1999-01-21

Publications (2)

Publication Number Publication Date
JP2000212170A true JP2000212170A (ja) 2000-08-02
JP2000212170A5 JP2000212170A5 (cg-RX-API-DMAC7.html) 2007-03-01

Family

ID=22883195

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11194A Pending JP2000212170A (ja) 1999-01-21 2000-01-20 増強された耐久性を有するベンゾトリアゾ―ルｕｖ吸収剤

Country Status (13)

Country Link
US (5) US6166218A (cg-RX-API-DMAC7.html)
JP (1) JP2000212170A (cg-RX-API-DMAC7.html)
KR (1) KR20000076503A (cg-RX-API-DMAC7.html)
CN (1) CN1170824C (cg-RX-API-DMAC7.html)
BE (1) BE1013234A3 (cg-RX-API-DMAC7.html)
BR (1) BR0000124A (cg-RX-API-DMAC7.html)
CA (1) CA2296246A1 (cg-RX-API-DMAC7.html)
DE (1) DE10001832A1 (cg-RX-API-DMAC7.html)
ES (1) ES2160086B1 (cg-RX-API-DMAC7.html)
FR (1) FR2789388B1 (cg-RX-API-DMAC7.html)
GB (1) GB2346369B (cg-RX-API-DMAC7.html)
IT (1) IT1317727B1 (cg-RX-API-DMAC7.html)
NL (1) NL1014139C2 (cg-RX-API-DMAC7.html)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003522242A (ja) * 2000-02-01 2003-07-22 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 耐久性紫外線吸収剤による内容物の保護方法
JP2005511705A (ja) * 2001-12-05 2005-04-28 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド ２−（２−ニトロフェニルアゾ）フェノール類の製造のための無有機溶媒法
JP2008528657A (ja) * 2005-02-02 2008-07-31 チバ ホールディング インコーポレーテッド 長波シフトしたベンゾトリアゾールｕｖ吸収剤及びそれらの使用
JP2009255551A (ja) * 2008-03-18 2009-11-05 Ricoh Co Ltd 耐熱性向上剤及び可逆性感熱記録媒体
JP2011051994A (ja) * 1999-05-03 2011-03-17 Ciba Holding Inc 高度に溶解性で、レッド−シフトされた、光安定なベンゾトリアゾール紫外線吸収剤を含む安定化された接着剤組成物及びそれから誘導された積層物品
JP2020525865A (ja) * 2017-06-26 2020-08-27 ジョンソン・アンド・ジョンソン・ビジョン・ケア・インコーポレイテッドＪｏｈｎｓｏｎ ＆ Ｊｏｈｎｓｏｎ Ｖｉｓｉｏｎ Ｃａｒｅ， Ｉｎｃ． 高エネルギー光の重合性遮断剤
JP2022115764A (ja) * 2021-01-28 2022-08-09 御国色素株式会社 紫外線吸収剤水性組成物
JP2022115765A (ja) * 2021-01-28 2022-08-09 御国色素株式会社 紫外線吸収剤水性組成物

Families Citing this family (112)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000515141A (ja) * 1996-07-18 2000-11-14 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド Ｕｖ吸収剤としての、ポリオキシアルキレン置換及び架橋された、トリアジン、ベンゾトリアゾール及びベンゾフェノン誘導体
US6380285B1 (en) * 2000-02-01 2002-04-30 Ciba Specialty Chemicals Corporation Bloom-resistant benzotriazole UV absorbers and compositions stabilized therewith
US6221115B1 (en) * 2000-02-01 2001-04-24 Ciba Specialty Chemicals Corporation Candle wax stabilized by a combination of UV absorber plus a selected hindered amine
US6296674B1 (en) * 2000-02-01 2001-10-02 Ciba Specialty Chemicals Corporation Candle wax stabilized with red-shift benzotriazoles
JP4912561B2 (ja) 2000-08-03 2012-04-11 チバ ホールディング インコーポレーテッド 光に安定なシリル化ベンゾトリアゾールｕｖ吸収剤及びそれにより安定化された組成物
US6566507B2 (en) 2000-08-03 2003-05-20 Ciba Specialty Chemicals Corporation Processes for the preparation of benzotriazole UV absorbers
US6451887B1 (en) * 2000-08-03 2002-09-17 Ciba Specialty Chemicals Corporation Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith
DE10041616A1 (de) * 2000-08-24 2002-03-14 Se Ma Ges Fuer Innovationen Mb Verfahren zur Herstellung von neuartigen und transparenten UV-Schutzformulierungen für technische Anwendungen
US6619329B2 (en) * 2000-10-03 2003-09-16 Tokai Rubber Industries, Ltd. Hose
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