DE10001832A1 - Benzotriazol-UV-Absorptionsmittel mit erhöhter Stabilität - Google Patents

Benzotriazol-UV-Absorptionsmittel mit erhöhter Stabilität

Info

Publication number
DE10001832A1
DE10001832A1 DE10001832A DE10001832A DE10001832A1 DE 10001832 A1 DE10001832 A1 DE 10001832A1 DE 10001832 A DE10001832 A DE 10001832A DE 10001832 A DE10001832 A DE 10001832A DE 10001832 A1 DE10001832 A1 DE 10001832A1
Authority
DE
Germany
Prior art keywords
carbon atoms
tert
phenyl
alkyl
straight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10001832A
Other languages
German (de)
English (en)
Inventor
Ramanathan Ravichandran
Anthony David Debellis
Revathi Iyengar
Joseph Suhadolnik
Jean-Pierre Wolf
Jun Mervin Gale Wood
Robert Edward Detlefsen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of DE10001832A1 publication Critical patent/DE10001832A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/547Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6515Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having three nitrogen atoms as the only ring hetero atoms
    • C07F9/6518Five-membered rings
    • C07F9/65188Five-membered rings condensed with carbocyclic rings or carbocyclic ring systems
    • EFIXED CONSTRUCTIONS
    • E04BUILDING
    • E04BGENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
    • E04B1/00Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
    • E04B1/38Connections for building structures in general
    • E04B1/41Connecting devices specially adapted for embedding in concrete or masonry
    • E04B1/4114Elements with sockets
    • E04B1/4121Elements with sockets with internal threads or non-adjustable captive nuts
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D249/00Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18Benzotriazoles
    • C07D249/20Benzotriazoles with aryl radicals directly attached in position 2
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • C08K5/3475Five-membered rings condensed with carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/48Stabilisers against degradation by oxygen, light or heat
    • EFIXED CONSTRUCTIONS
    • E04BUILDING
    • E04BGENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
    • E04B1/00Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
    • E04B1/38Connections for building structures in general
    • E04B1/41Connecting devices specially adapted for embedding in concrete or masonry
    • E04B1/4114Elements with sockets
    • E04B1/415Elements with sockets with captive and extendable anchoring parts, e.g. spring-loaded bolts, hanging rings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/124Duplicating or marking methods; Sheet materials for use therein using pressure to make a masked colour visible, e.g. to make a coloured support visible, to create an opaque or transparent pattern, or to form colour by uniting colour-forming components
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • B41M5/337Additives; Binders
    • B41M5/3375Non-macromolecular compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/392Additives, other than colour forming substances, dyes or pigments, e.g. sensitisers, transfer promoting agents
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/132Anti-ultraviolet fading

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Electromagnetism (AREA)
  • Materials Engineering (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Dental Preparations (AREA)
DE10001832A 1999-01-21 2000-01-18 Benzotriazol-UV-Absorptionsmittel mit erhöhter Stabilität Withdrawn DE10001832A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/234,880 US6166218A (en) 1996-11-07 1999-01-21 Benzotriazole UV absorbers having enhanced durability

Publications (1)

Publication Number Publication Date
DE10001832A1 true DE10001832A1 (de) 2000-07-27

Family

ID=22883195

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10001832A Withdrawn DE10001832A1 (de) 1999-01-21 2000-01-18 Benzotriazol-UV-Absorptionsmittel mit erhöhter Stabilität

Country Status (13)

Country Link
US (5) US6166218A (cg-RX-API-DMAC7.html)
JP (1) JP2000212170A (cg-RX-API-DMAC7.html)
KR (1) KR20000076503A (cg-RX-API-DMAC7.html)
CN (1) CN1170824C (cg-RX-API-DMAC7.html)
BE (1) BE1013234A3 (cg-RX-API-DMAC7.html)
BR (1) BR0000124A (cg-RX-API-DMAC7.html)
CA (1) CA2296246A1 (cg-RX-API-DMAC7.html)
DE (1) DE10001832A1 (cg-RX-API-DMAC7.html)
ES (1) ES2160086B1 (cg-RX-API-DMAC7.html)
FR (1) FR2789388B1 (cg-RX-API-DMAC7.html)
GB (1) GB2346369B (cg-RX-API-DMAC7.html)
IT (1) IT1317727B1 (cg-RX-API-DMAC7.html)
NL (1) NL1014139C2 (cg-RX-API-DMAC7.html)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001057125A1 (en) * 2000-02-01 2001-08-09 Ciba Specialty Chemicals Holding Inc. Candle wax stabilized with red-shifted benzotriazoles
WO2001057126A1 (en) * 2000-02-01 2001-08-09 Ciba Specialty Chemicals Holding Inc. Candle wax stabilized by a combination of uv absorber plus a selected hindered amine
DE10041616A1 (de) * 2000-08-24 2002-03-14 Se Ma Ges Fuer Innovationen Mb Verfahren zur Herstellung von neuartigen und transparenten UV-Schutzformulierungen für technische Anwendungen
WO2002012202A3 (en) * 2000-08-03 2002-04-11 Ciba Sc Holding Ag Processes for the preparation of benzotriazole uv absorbers
EP2103445B1 (en) * 2008-03-18 2015-05-06 Ricoh Company, Ltd. Heat resistance improver and reversible thermosensitive recording medium
WO2020114936A1 (en) 2018-12-06 2020-06-11 Basf Se Novel procedure for the formation of 2h-benzotriazole bodies and congeners

Families Citing this family (114)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000515141A (ja) * 1996-07-18 2000-11-14 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド Uv吸収剤としての、ポリオキシアルキレン置換及び架橋された、トリアジン、ベンゾトリアゾール及びベンゾフェノン誘導体
ATE329979T1 (de) * 1999-05-03 2006-07-15 Ciba Sc Holding Ag Stabilisierte klebzusammensetzung mit hochlöslichen, rotverschobenen, photostabilen benzotriazolen uv-absorbente und daraus gewonnene laminerte gegenstände
US6380285B1 (en) * 2000-02-01 2002-04-30 Ciba Specialty Chemicals Corporation Bloom-resistant benzotriazole UV absorbers and compositions stabilized therewith
BR0117305B1 (pt) * 2000-02-01 2013-02-05 mÉtodo de proteÇço de conteédos contra os efeitos prejudiciais de radiaÇço ultravioleta.
JP4912561B2 (ja) 2000-08-03 2012-04-11 チバ ホールディング インコーポレーテッド 光に安定なシリル化ベンゾトリアゾールuv吸収剤及びそれにより安定化された組成物
US6451887B1 (en) * 2000-08-03 2002-09-17 Ciba Specialty Chemicals Corporation Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith
US6619329B2 (en) * 2000-10-03 2003-09-16 Tokai Rubber Industries, Ltd. Hose
US6846929B2 (en) 2001-04-02 2005-01-25 Ciba Specialty Chemicals Corporation Benzotriazole/hals molecular combinations and compositions stabilized therewith
WO2002079313A1 (en) * 2001-04-02 2002-10-10 Ciba Specialty Chemicals Holding Inc. Stabilized candle wax
US6562085B1 (en) 2001-06-06 2003-05-13 Ciba Specialty Chemicals Corporation Candle wax compositions stabilized with UV absorber-metal combinations
JP4993421B2 (ja) * 2001-06-07 2012-08-08 株式会社Adeka 合成樹脂組成物
US6930136B2 (en) * 2001-09-28 2005-08-16 National Starch And Chemical Investment Holding Corporation Adhesion promoters containing benzotriazoles
RU2004120783A (ru) * 2001-12-05 2006-01-10 Циба Спешиалти Кемикэлз Холдинг Инк. (Ch) Способ получения 2-(2-нитрофенилазо)фенолов без использования органических растворителей
US20050171253A1 (en) * 2002-02-19 2005-08-04 Andrews Stephen M. Containers or films comprising hydroxyphenlbenzotriazole uv absorbers for protecting contents against the effects of uv radiation
WO2003105538A1 (en) 2002-06-06 2003-12-18 Siba Spelcialty Chemicals Holding Inc. Electroluminescent device
KR100470954B1 (ko) * 2002-07-06 2005-02-21 주식회사 엘지생활건강 자외선 흡수성 정발제
KR101114272B1 (ko) 2003-02-26 2012-03-28 시바 홀딩 인크 수 혼화성의 입체적으로 속박된 하이드록시 치환된 알콕시아민
US20040185269A1 (en) * 2003-03-18 2004-09-23 Loper Scott W. Scratch and mar resistant low VOC coating composition
US6790582B1 (en) * 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
US7153588B2 (en) * 2003-05-30 2006-12-26 3M Innovative Properties Company UV resistant naphthalate polyester articles
US6974850B2 (en) * 2003-05-30 2005-12-13 3M Innovative Properties Company Outdoor weatherable photopolymerizable coatings
JP4163561B2 (ja) * 2003-06-17 2008-10-08 富士フイルム株式会社 色素化合物
US7412338B2 (en) * 2004-03-18 2008-08-12 Power Measurement Ltd. Radio frequency device within an energy sensor system
US7440049B2 (en) 2004-02-09 2008-10-21 Kuraray Co., Ltd. Backlight device for liquid crystal display
US7595011B2 (en) 2004-07-12 2009-09-29 Ciba Specialty Chemicals Corporation Stabilized electrochromic media
JP2006113175A (ja) * 2004-10-13 2006-04-27 Konica Minolta Opto Inc 光学フィルム、偏光板及び表示装置
US20060122293A1 (en) * 2004-12-03 2006-06-08 Rick Wilk Ultraviolet light absorber stabilizer combination
DE602006020839D1 (de) * 2005-02-02 2011-05-05 Basf Se Langwellige verschobene benzotriazol-uv-absorber und deren verwendung
DE102005012056A1 (de) * 2005-03-16 2006-09-28 Basf Coatings Ag Mehrschichtlackierungen, Verfahren zu ihrer Herstellung und deren Verwendung im Automobilbau
US20070238814A1 (en) * 2006-04-10 2007-10-11 Basf Corporation Method of making coating compositions
BRPI0713466A2 (pt) * 2006-06-27 2012-01-24 Ciba Holding Inc Absorvedores de uv benzotriazol deslocados por cumprimento de onda longo e seu uso
ES2397865T3 (es) * 2006-10-13 2013-03-11 Novartis Ag Lentes intraoculares con límite único de azul-violeta y características de transmisión de luz azul
ATE482240T1 (de) * 2006-12-18 2010-10-15 3M Innovative Properties Co (meth)acrylharzzusammensetzung und folien daraus
TW200829637A (en) * 2007-01-03 2008-07-16 Double Bond Chemical Ind Co Ltd Liquid containing 2-(-hydroxyl-3-α-cumylphenyl-5-tertiery-octylphenyl) -2-hydrogen-benzotriazole
JP4988383B2 (ja) * 2007-03-02 2012-08-01 スリーエム イノベイティブ プロパティズ カンパニー (メタ)アクリル系着色フィルム、マーキングフィルム、レセプターシート、及びその製造方法
EP2139871B1 (en) * 2007-04-30 2010-09-01 Alcon, Inc. Uv-absorbers for ophthalmic lens materials
TWI435915B (zh) * 2007-08-09 2014-05-01 Alcon Inc 含有吸收紫外光(uv)及短波長可見光二者的發色團之眼科鏡體材料(一)
TW200916531A (en) * 2007-08-09 2009-04-16 Alcon Inc Ophthalmic lens materials containing chromophores that absorb both UV and short wavelength visible light
JP5307378B2 (ja) * 2007-10-26 2013-10-02 スリーエム イノベイティブ プロパティズ カンパニー (メタ)アクリル系フィルムおよびこれを用いたマーキングフィルム
US7803359B1 (en) 2008-05-06 2010-09-28 Alcon, Inc. UV-absorbers for ophthalmic lens materials
US7884228B1 (en) * 2008-05-06 2011-02-08 Alcon, Inc. UV-absorbers for ophthalmic lens materials
US8043607B2 (en) * 2008-07-15 2011-10-25 Novartis Ag UV-absorbers for ophthalmic lens materials
US7847103B2 (en) * 2008-10-04 2010-12-07 Chia-Hu Chang Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole
US8236053B1 (en) 2008-10-08 2012-08-07 Novartis Ag 2-amino benzophenone UV-absorbers for ophthalmic lens materials
KR20110086097A (ko) * 2008-10-23 2011-07-27 알타 디바이씨즈, 인크. 광전지 장치의 얇은 흡수 층
EP2351097A2 (en) 2008-10-23 2011-08-03 Alta Devices, Inc. Photovoltaic device
US8686284B2 (en) * 2008-10-23 2014-04-01 Alta Devices, Inc. Photovoltaic device with increased light trapping
US20120104460A1 (en) 2010-11-03 2012-05-03 Alta Devices, Inc. Optoelectronic devices including heterojunction
TWI453199B (zh) 2008-11-04 2014-09-21 Alcon Inc 用於眼用鏡片材料之紫外光/可見光吸收劑
JP5631331B2 (ja) 2008-12-22 2014-11-26 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 引掻耐性の向上方法及び関連製品及びその使用
JP6317880B2 (ja) 2009-07-07 2018-04-25 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se カリウム・セシウム・タングステンブロンズ粒子
US9691921B2 (en) 2009-10-14 2017-06-27 Alta Devices, Inc. Textured metallic back reflector
US9768329B1 (en) 2009-10-23 2017-09-19 Alta Devices, Inc. Multi-junction optoelectronic device
US20170141256A1 (en) 2009-10-23 2017-05-18 Alta Devices, Inc. Multi-junction optoelectronic device with group iv semiconductor as a bottom junction
US20150380576A1 (en) 2010-10-13 2015-12-31 Alta Devices, Inc. Optoelectronic device with dielectric layer and method of manufacture
US9502594B2 (en) 2012-01-19 2016-11-22 Alta Devices, Inc. Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from template layer and etching
US11271128B2 (en) 2009-10-23 2022-03-08 Utica Leaseco, Llc Multi-junction optoelectronic device
JP5704530B2 (ja) * 2009-12-16 2015-04-22 東レ・オペロンテックス株式会社 ポリウレタン弾性糸およびその製造方法
EP2523942B1 (en) 2010-01-15 2015-02-25 DSM IP Assets B.V. 2-Phenyl-1,2,3-benzotriazoles for UV radiation absorbance
US11038080B2 (en) 2012-01-19 2021-06-15 Utica Leaseco, Llc Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from etching
EP2912017A4 (en) 2012-10-23 2016-07-20 Basf Se ETHYLENICALLY UNSATURATED OLIGOMERS WITH POLYMER STABILIZATION GROUPS
MX344936B (es) 2012-12-28 2017-01-11 Chromatic Tech Inc Aditivos estabilizadores para pigmentos termocrómicos.
US8669281B1 (en) 2013-03-14 2014-03-11 Alkermes Pharma Ireland Limited Prodrugs of fumarates and their use in treating various diseases
UA116648C2 (uk) 2013-03-14 2018-04-25 Алкермес Фарма Айерленд Лімітед Фумарати як проліки та їх застосування при лікуванні різних захворювань
US9181451B2 (en) * 2013-08-30 2015-11-10 Sdc Technologies, Inc. Formable aminoplast resin-based coating compositions
WO2015044785A2 (en) 2013-09-27 2015-04-02 Basf Se Polyolefin compositions for building materials
CN105102437A (zh) * 2013-11-14 2015-11-25 诺华股份有限公司 用于眼科透镜材料的uv吸收剂
TWI685524B (zh) 2013-12-17 2020-02-21 美商畢克美國股份有限公司 預先脫層之層狀材料
WO2015127450A1 (en) 2014-02-24 2015-08-27 Alkermes Pharma Ireland Limited Sulfonamide and sulfinamide prodrugs of fumarates and their use in treating various diseases
EP3178898B1 (en) 2014-08-05 2023-10-04 Miyoshi Oil & Fat Co., Ltd. Additive for imparting ultraviolet absorptivity and/or high refractive index to matrix, and resin member using same
PL3035345T3 (pl) 2014-12-15 2020-10-19 Borealis Ag Warstwowa struktura z pasywatorem miedzi
US11401400B2 (en) 2015-04-30 2022-08-02 Tokai Optical Co., Ltd. Plastic lens
US20170002177A1 (en) * 2015-06-30 2017-01-05 Sabic Global Technologies B.V. Uv-stabilized polysulfones-v4
AU2016294860B2 (en) 2015-07-20 2021-01-28 Basf Se Flame retardant polyolefin articles
EP3236296B1 (en) * 2016-04-21 2019-03-06 Essilor International Optical material comprising a red-shifted benzotriazole uv absorber
CN110944957B (zh) 2017-06-02 2022-07-08 科思创(荷兰)有限公司 光纤用耐热性可辐射固化涂料
US10752720B2 (en) * 2017-06-26 2020-08-25 Johnson & Johnson Vision Care, Inc. Polymerizable blockers of high energy light
US10723732B2 (en) 2017-06-30 2020-07-28 Johnson & Johnson Vision Care, Inc. Hydroxyphenyl phenanthrolines as polymerizable blockers of high energy light
US10526296B2 (en) 2017-06-30 2020-01-07 Johnson & Johnson Vision Care, Inc. Hydroxyphenyl naphthotriazoles as polymerizable blockers of high energy light
EP3687949B1 (en) 2017-11-03 2024-09-04 Covestro (Netherlands) B.V. Water-blocking systems including fibers coated with liquid radiation curable sap compositions
US11543683B2 (en) 2019-08-30 2023-01-03 Johnson & Johnson Vision Care, Inc. Multifocal contact lens displaying improved vision attributes
US12486348B2 (en) 2019-08-30 2025-12-02 Johnson & Johnson Vision Care, Inc. Contact lens displaying improved vision attributes
US10935695B2 (en) 2018-03-02 2021-03-02 Johnson & Johnson Vision Care, Inc. Polymerizable absorbers of UV and high energy visible light
US11993037B1 (en) 2018-03-02 2024-05-28 Johnson & Johnson Vision Care, Inc. Contact lens displaying improved vision attributes
US12486403B2 (en) 2018-03-02 2025-12-02 Johnson & Johnson Vision Care, Inc. Polymerizable absorbers of UV and high energy visible light
JP7218385B2 (ja) 2018-06-01 2023-02-06 コベストロ (ネザーランズ) ビー.ヴィー. 交互オリゴマーを介して光ファイバーをコーティングするための放射線硬化性組成物とそれから生成されたコーティング
CN110563661B (zh) * 2018-06-05 2021-08-27 台湾永光化学工业股份有限公司 具红移效应的苯并三唑紫外线吸收剂及其用途
US10889901B2 (en) 2018-07-25 2021-01-12 International Business Machines Corporation Ultraviolet-stabilized corrosion inhibitors
CN112771108B (zh) 2018-08-22 2023-05-05 巴斯夫欧洲公司 稳定的滚塑聚烯烃
EP3820827A1 (en) 2018-08-30 2021-05-19 DSM IP Assets B.V. Radiation curable compositions for coating optical fiber
JP2022509797A (ja) 2018-12-03 2022-01-24 コベストロ (ネザーランズ) ビー.ヴィー. 光ファイバーをコーティングするための充填放射線硬化性組成物およびそれから製造されるコーティング
CN109749432A (zh) * 2018-12-25 2019-05-14 浙江普利特新材料有限公司 一种高耐候、高外观表现、高性能用于汽车的玻纤增强尼龙材料及其制备方法
CN111384438B (zh) * 2018-12-29 2022-10-18 深圳新宙邦科技股份有限公司 一种锂离子电池非水电解液及锂离子电池
CN113490710B (zh) * 2019-02-26 2023-05-05 帝人株式会社 聚碳酸酯树脂组合物
US20230220239A1 (en) 2019-03-18 2023-07-13 Basf Se Uv curable compositions for dirt pick-up resistance
KR102797624B1 (ko) * 2019-04-26 2025-04-21 미요시 유시 가부시끼가이샤 내열성과 장파장 흡수가 우수한 자외선 흡수제
WO2020239563A1 (en) 2019-05-24 2020-12-03 Dsm Ip Assets B.V. Radiation curable compositions for coating optical fiber with enhanced high-speed processability
US10894858B2 (en) 2019-05-24 2021-01-19 Dsm Ip Assets B.V. Radiation curable compositions for coating optical fiber with enhanced high-speed processability
WO2020243747A1 (en) 2019-05-31 2020-12-03 The Procter & Gamble Company Method of making a deflection member
US11958824B2 (en) 2019-06-28 2024-04-16 Johnson & Johnson Vision Care, Inc. Photostable mimics of macular pigment
US20220282064A1 (en) 2019-07-30 2022-09-08 Basf Se Stabilizer composition
JP7712261B2 (ja) 2019-07-31 2025-07-23 コベストロ (ネザーランズ) ビー.ブイ. 光ファイバーを被覆するための多官能性長アームオリゴマーを含む放射線硬化性組成物
WO2021202623A1 (en) 2020-04-03 2021-10-07 Dsm Ip Assets B.V. Self-healing optical fibers and the compositions used to create the same
US12491704B2 (en) 2020-04-03 2025-12-09 Covestro (Netherlands) B.V. Multi-layered optical devices
KR102866440B1 (ko) 2020-07-28 2025-10-01 삼성디스플레이 주식회사 표시 장치 및 표시 장치용 광 흡수제
KR102795440B1 (ko) * 2020-11-03 2025-04-16 한국화학연구원 자외선 흡수성 및 고분산성을 가지는 고분자 바인더 및 이를 포함하는 도료 조성물
JP7635919B2 (ja) * 2021-01-28 2025-02-26 御国色素株式会社 紫外線吸収剤水性組成物
JP7679006B2 (ja) * 2021-01-28 2025-05-19 御国色素株式会社 紫外線吸収剤水性組成物
KR20220125824A (ko) 2021-03-03 2022-09-15 삼성디스플레이 주식회사 수지 조성물 및 이를 포함하는 표시 장치
WO2023205223A1 (en) 2022-04-21 2023-10-26 Covestro (Netherlands) B.V. Radiation curable compositions for coating optical fibers
CN119403875A (zh) 2022-04-29 2025-02-07 英力士苯领集团股份公司 抗紫外线性能改进的丙烯腈苯乙烯丙烯酸酯共聚物组合物
KR20250004002A (ko) 2022-04-29 2025-01-07 이네오스 스티롤루션 그룹 게엠베하 감소된 uv 흡수제 함량으로 우수한 uv 저항성을 갖는 아크릴로니트릴 스티렌 아크릴레이트(asa) 공중합체 조성물
USD1085320S1 (en) * 2022-08-17 2025-07-22 Bushnell Inc. Rangefinder display screen
CN115521315A (zh) * 2022-08-19 2022-12-27 古道尔工程塑胶(深圳)有限公司 光稳定剂及其制备方法和应用的艳红色耐候性复合材料

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE116230C (cg-RX-API-DMAC7.html) *
JPS4715210B1 (cg-RX-API-DMAC7.html) * 1967-06-29 1972-05-08
DE1670951A1 (de) * 1967-11-21 1971-02-18 Bayer Ag Alkylen-bis-(benztriazolyl-phenole)
GB1287770A (en) * 1969-12-24 1972-09-06 Konishiroku Photo Ind Benzotriazole derivatives as ultra-violet ray absorbing agents
CA956178A (en) * 1971-01-04 1974-10-15 Alan F. Blake Duplicating stencils
JPS516540B2 (cg-RX-API-DMAC7.html) * 1973-12-03 1976-02-28
JPS6021187B2 (ja) * 1976-10-12 1985-05-25 旭化成株式会社 安定化されたポリウレタン組成物
US4082679A (en) * 1977-03-10 1978-04-04 Witco Chemical Corporation Light stabilized textile mineral oil
US4278589A (en) * 1978-06-26 1981-07-14 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole and stabilized compositions
US4275004A (en) * 1978-06-26 1981-06-23 Ciba-Geigy Corporation High caustic coupling process for preparing substituted 2-nitro-2'-hydroxyazobenzenes
US4226763A (en) * 1978-06-26 1980-10-07 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(.alpha.,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions
US4315848A (en) * 1979-05-10 1982-02-16 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions
US4347180A (en) * 1979-05-16 1982-08-31 Ciba-Geigy Corporation High caustic coupling process for preparing substituted 2-nitro-2'-hydroxyazobenzenes
JPS61113667A (ja) * 1984-11-07 1986-05-31 Adeka Argus Chem Co Ltd 耐光性の改善された熱硬化性合成樹脂塗料組成物
JPS61113649A (ja) * 1984-11-07 1986-05-31 Adeka Argus Chem Co Ltd 耐光性の改善された高分子材料組成物
JPH0670163B2 (ja) * 1985-01-14 1994-09-07 旭電化工業株式会社 ポリアセタ−ル樹脂組成物
US4868246A (en) * 1987-08-12 1989-09-19 Pennwalt Corporation Polymer bound UV stabilizers
DE3739765A1 (de) * 1987-11-24 1989-06-08 Bayer Ag Beschichtete formkoerper und ein verfahren zu ihrer herstellung
JPH0357690A (ja) * 1989-07-26 1991-03-13 Fuji Photo Film Co Ltd 記録材料用顕色剤シート
ES2081458T3 (es) * 1990-03-30 1996-03-16 Ciba Geigy Ag Composicion de pintura.
US5166355A (en) * 1991-02-04 1992-11-24 Fairmount Chemical Co., Inc. Process for preparing substituted 2,2'-methylene-bis-[6-(2H-benzotriazol-2-yl)-4-hydrocarbyl-phenols]
US5278314A (en) * 1991-02-12 1994-01-11 Ciba-Geigy Corporation 5-thio-substituted benzotriazole UV-absorbers
US5280124A (en) * 1991-02-12 1994-01-18 Ciba-Geigy Corporation 5-sulfonyl-substituted benzotriazole UV-absorbers
US5250698A (en) * 1992-08-05 1993-10-05 Ciba-Geigy Corporation 2-(2-hydroxy-3-perfluoroalkyl thiomethyl-5-alkylphenyl)2H-benzotriazoles and stabilized compositions thereof
CA2099154A1 (en) * 1992-09-24 1994-03-25 Ronald E. Mac Leay N-[2-hydroxy-3-(2h-benzotriazol-2-yl)benzyl]oxamides
US5292890A (en) * 1993-05-05 1994-03-08 Fairmount Chemical Company, Inc. Asymmetrical benzotriazolylphenols
FR2712287B1 (fr) * 1993-11-10 1996-01-19 Oreal Nouveaux filtres solaires fluorés hydrocarbonés, leur procédé de préparation et leur utilisation dans des compositions cosmétiques.
EP0698637A3 (en) * 1994-08-22 1996-07-10 Ciba Geigy Ag Polyurethanes stabilized with selected UV absorbers of 5-substituted benzotriazole
US5646088A (en) * 1995-02-16 1997-07-08 Ricoh Co., Ltd. Thermosensitive recording material and production process thereof
GB2311143B (en) * 1995-04-19 1997-11-05 Ciba Geigy Ag Recording materials stabilized with benzotriazole uv absorbers
US5574166A (en) * 1995-04-19 1996-11-12 Ciba-Geigy Corporation Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole
EP0750224A3 (en) * 1995-06-19 1997-01-08 Eastman Kodak Company 2'-Hydroxyphenyl benzotriazole based UV absorbing polymers with particular substituents and photographic elements containing them
JP3277820B2 (ja) * 1996-08-29 2002-04-22 王子製紙株式会社 感熱記録体
DE19748658B4 (de) 1996-11-07 2015-08-20 Ciba Holding Inc. Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit
IT1295933B1 (it) * 1997-10-30 1999-05-28 Great Lakes Chemical Italia 2-(2'-idrossifenil)benzotriazoli e procedimento per la loro preparazione
CN1132821C (zh) * 1998-01-27 2003-12-31 美国3M公司 氟化物苯并三唑
JP4149068B2 (ja) * 1999-03-02 2008-09-10 株式会社メニコン 眼用レンズ材料
US6344505B1 (en) * 1999-11-11 2002-02-05 Cytec Industries Inc. Mono- and bis-benzotriazolyldihydroxybiaryl UV absorbers

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001057125A1 (en) * 2000-02-01 2001-08-09 Ciba Specialty Chemicals Holding Inc. Candle wax stabilized with red-shifted benzotriazoles
WO2001057126A1 (en) * 2000-02-01 2001-08-09 Ciba Specialty Chemicals Holding Inc. Candle wax stabilized by a combination of uv absorber plus a selected hindered amine
WO2002012202A3 (en) * 2000-08-03 2002-04-11 Ciba Sc Holding Ag Processes for the preparation of benzotriazole uv absorbers
DE10041616A1 (de) * 2000-08-24 2002-03-14 Se Ma Ges Fuer Innovationen Mb Verfahren zur Herstellung von neuartigen und transparenten UV-Schutzformulierungen für technische Anwendungen
EP2103445B1 (en) * 2008-03-18 2015-05-06 Ricoh Company, Ltd. Heat resistance improver and reversible thermosensitive recording medium
WO2020114936A1 (en) 2018-12-06 2020-06-11 Basf Se Novel procedure for the formation of 2h-benzotriazole bodies and congeners
US12384785B2 (en) 2018-12-06 2025-08-12 Basf Se Procedure for the formation of 2H-benzotriazole bodies and congeners

Also Published As

Publication number Publication date
US6166218A (en) 2000-12-26
GB0000610D0 (en) 2000-03-01
US20020099221A1 (en) 2002-07-25
GB2346369B (en) 2002-04-17
ITMI20000046A1 (it) 2001-07-17
NL1014139A1 (nl) 2000-07-24
IT1317727B1 (it) 2003-07-15
US6515051B2 (en) 2003-02-04
KR20000076503A (ko) 2000-12-26
CA2296246A1 (en) 2000-07-21
US20010007886A1 (en) 2001-07-12
JP2000212170A (ja) 2000-08-02
ES2160086B1 (es) 2002-06-16
GB2346369A (en) 2000-08-09
US20020065341A1 (en) 2002-05-30
CN1265395A (zh) 2000-09-06
BE1013234A3 (fr) 2001-11-06
BR0000124A (pt) 2000-09-26
FR2789388B1 (fr) 2005-11-18
CN1170824C (zh) 2004-10-13
FR2789388A1 (fr) 2000-08-11
US6458872B1 (en) 2002-10-01
US6262151B1 (en) 2001-07-17
ES2160086A1 (es) 2001-10-16
NL1014139C2 (nl) 2001-05-15
ITMI20000046A0 (it) 2000-01-17

Similar Documents

Publication Publication Date Title
DE10001832A1 (de) Benzotriazol-UV-Absorptionsmittel mit erhöhter Stabilität
DE19748658B4 (de) Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit
US5977219A (en) Benzotriazole UV absorbers having enhanced durability
AU706957B2 (en) Coatings and recording materials stabilized with benzotriazole UV absorbers
DE60107874T2 (de) Substituierte 5-aryl- und 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazolderivate als uv-absorbierende substanzen
DE60028755T2 (de) Stabilisierte klebzusammensetzung mit hochlöslichen, rotverschobenen, photostabilen benzotriazolen uv-absorbente und daraus gewonnene laminerte gegenstände
DE60120178T2 (de) Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden
US7419513B2 (en) Benzotriazole/HALS molecular combinations and compositions stabilized therewith
US6245915B1 (en) Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety
DE69602902T2 (de) S-Triazin-Lichtstabilisatorhybride, substituiert mit Benzotriazol- oder Benzophenon-Einheiten und damit stabilisierte Zusammensetzungen
MXPA97008572A (en) High durabili uv benzotriazolicos absorbers
MXPA00000732A (en) Benzotriazole uv absorbers having enhanced durability

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8127 New person/name/address of the applicant

Owner name: CIBA HOLDING INC., BASEL, CH

8128 New person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20110802