IT1307051B1 - Monomero fotosensibile avente un gruppo idrossi ed un gruppocarbossi, copolimero a partire da questo e composizione fotosensibile - Google Patents

Monomero fotosensibile avente un gruppo idrossi ed un gruppocarbossi, copolimero a partire da questo e composizione fotosensibile

Info

Publication number
IT1307051B1
IT1307051B1 IT1999TO000725A ITTO990725A IT1307051B1 IT 1307051 B1 IT1307051 B1 IT 1307051B1 IT 1999TO000725 A IT1999TO000725 A IT 1999TO000725A IT TO990725 A ITTO990725 A IT TO990725A IT 1307051 B1 IT1307051 B1 IT 1307051B1
Authority
IT
Italy
Prior art keywords
photosensitive
group
hydroxy group
copolymer starting
monomer
Prior art date
Application number
IT1999TO000725A
Other languages
English (en)
Inventor
Geun Su Lee
Cha Won Koh
Jae Chang Jung
Min Ho Jung
Ki Ho Baik
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-1998-0034694A external-priority patent/KR100448860B1/ko
Priority claimed from KR10-1998-0039079A external-priority patent/KR100400292B1/ko
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Publication of ITTO990725A1 publication Critical patent/ITTO990725A1/it
Application granted granted Critical
Publication of IT1307051B1 publication Critical patent/IT1307051B1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/02—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
    • C07D493/08—Bridged systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/74—Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C69/753—Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring of polycyclic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F32/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F32/08—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having two condensed rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
IT1999TO000725A 1998-08-26 1999-08-26 Monomero fotosensibile avente un gruppo idrossi ed un gruppocarbossi, copolimero a partire da questo e composizione fotosensibile IT1307051B1 (it)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-1998-0034694A KR100448860B1 (ko) 1998-08-26 1998-08-26 포토레지스트단량체,그의공중합체및이를포함하는포토레지스트조성물
KR10-1998-0039079A KR100400292B1 (ko) 1998-09-21 1998-09-21 신규의포토레지스트용모노머,그의공중합체및이를이용한포토레지스트조성물

Publications (2)

Publication Number Publication Date
ITTO990725A1 ITTO990725A1 (it) 2001-02-26
IT1307051B1 true IT1307051B1 (it) 2001-10-23

Family

ID=26634051

Family Applications (1)

Application Number Title Priority Date Filing Date
IT1999TO000725A IT1307051B1 (it) 1998-08-26 1999-08-26 Monomero fotosensibile avente un gruppo idrossi ed un gruppocarbossi, copolimero a partire da questo e composizione fotosensibile

Country Status (9)

Country Link
US (2) US6410670B1 (it)
JP (1) JP3587743B2 (it)
CN (1) CN1240666C (it)
DE (1) DE19940516A1 (it)
FR (1) FR2782715B1 (it)
GB (1) GB2340831B (it)
IT (1) IT1307051B1 (it)
NL (1) NL1012916C2 (it)
TW (1) TW535033B (it)

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KR100301063B1 (ko) * 1999-07-29 2001-09-22 윤종용 감광성 중합체 및 이들을 포함하는 화학 증폭형 포토레지스트 조성물
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JP5756672B2 (ja) 2010-04-27 2015-07-29 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 光酸発生剤およびこれを含むフォトレジスト
KR102289175B1 (ko) * 2014-03-06 2021-08-17 스미또모 베이크라이트 가부시키가이샤 폴리머, 감광성 수지 조성물 및 전자 장치
KR102084433B1 (ko) * 2017-02-23 2020-03-04 동우 화인켐 주식회사 네가티브형 컬러필터의 제조방법, 이로부터 제조된 네가티브형 컬러필터 및 화상표시장치
CN115785443B (zh) * 2022-12-01 2024-03-19 无锡阿科力科技股份有限公司 一种光学级聚合物及其制备方法和应用

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KR100403325B1 (ko) 1998-07-27 2004-03-24 주식회사 하이닉스반도체 포토레지스트중합체및이를이용한포토레지스트조성물
KR20000015014A (ko) 1998-08-26 2000-03-15 김영환 신규의 포토레지스트용 단량체, 중합체 및 이를 이용한 포토레지스트 조성물

Also Published As

Publication number Publication date
JP3587743B2 (ja) 2004-11-10
NL1012916A1 (nl) 2000-02-29
GB2340831B (en) 2004-05-12
US6410670B1 (en) 2002-06-25
FR2782715B1 (fr) 2004-09-10
NL1012916C2 (nl) 2002-12-03
FR2782715A1 (fr) 2000-03-03
US20020091216A1 (en) 2002-07-11
GB2340831A (en) 2000-03-01
ITTO990725A1 (it) 2001-02-26
TW535033B (en) 2003-06-01
CN1247858A (zh) 2000-03-22
CN1240666C (zh) 2006-02-08
US6586619B2 (en) 2003-07-01
JP2000086726A (ja) 2000-03-28
DE19940516A1 (de) 2000-03-09
GB9920124D0 (en) 1999-10-27

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