GB1335095A - Polycondensation copolymers - Google Patents

Polycondensation copolymers

Info

Publication number
GB1335095A
GB1335095A GB1335095DA GB1335095A GB 1335095 A GB1335095 A GB 1335095A GB 1335095D A GB1335095D A GB 1335095DA GB 1335095 A GB1335095 A GB 1335095A
Authority
GB
United Kingdom
Prior art keywords
acid
diamine
copolymers
jan
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Ltd
Original Assignee
Kodak Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Ltd filed Critical Kodak Ltd
Publication of GB1335095A publication Critical patent/GB1335095A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/30—Polysulfonamides; Polysulfonimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyamides (AREA)

Abstract

1335095 Co-poly carbonamide-sulphonamides KODAK Ltd 12 Jan 1972 [14 Jan 1971] 1834/71 Heading C3R [Also in Division G2] Photo-sensitizable copolymers comprise residues of a diamine, an olefinically unsaturated dicarboxylic acid and an aromatic disulphonic acid in the polymer chain. The diamine may be a C 2-6 alkylene diamine or an alicyclic diamine with 6 or 7 ring carbons, e.g. tri- or hexamethylene diamine or 1,4-diaminomethyl cyclohexane. The carboxylic acid may be 1,2- dicarboxy-cis-4-cyclohexene or (2 : 2: 1)-bicyclohexene-2,3-dicarboxylic acid and the sulphonic acid may be m-benzene-disulphonic acid. The copolymers may be prepared by interfacial techniques using the acid chlorides. Solutions of the copolymer and a sensitizer may be used for photo-resists (see Division G2).
GB1335095D 1971-01-14 1971-01-14 Polycondensation copolymers Expired GB1335095A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB183471 1971-01-14

Publications (1)

Publication Number Publication Date
GB1335095A true GB1335095A (en) 1973-10-24

Family

ID=9728821

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1335095D Expired GB1335095A (en) 1971-01-14 1971-01-14 Polycondensation copolymers

Country Status (2)

Country Link
FR (1) FR2122169A5 (en)
GB (1) GB1335095A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4107155A (en) 1977-06-29 1978-08-15 Eastman Kodak Company Polysulfonamides
US4865950A (en) * 1988-01-21 1989-09-12 Eastman Kodak Co. Laminate for the formation of beam leads for IC chip bonding featuring improved positive-working resist
US6045967A (en) * 1997-01-10 2000-04-04 Hyundai Electronics Industries Co., Ltd. Method and device using ArF photoresist
US6291131B1 (en) 1998-08-26 2001-09-18 Hyundai Electronics Industries Co., Ltd. Monomers for photoresist, polymers thereof, and photoresist compositions using the same
US6369181B1 (en) 1997-12-29 2002-04-09 Hyundai Electronics Industries Co., Ltd. Copolymer resin, preparation thereof, and photoresist using the same
US6410670B1 (en) 1998-08-26 2002-06-25 Hyundai Electronics Industries Co., Ltd. Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
US6569971B2 (en) 1998-08-27 2003-05-27 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same
EP2428842A1 (en) * 2010-09-14 2012-03-14 Rohm and Haas Electronic Materials LLC Photoresists comprising multi-amide component
JP2019518981A (en) * 2016-05-12 2019-07-04 ノーロッキー, ダニエル, ジェイ.NAWROCKI, Daniel, J. Polysulfonamide redistribution composition and method of using the same

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4107155A (en) 1977-06-29 1978-08-15 Eastman Kodak Company Polysulfonamides
US4865950A (en) * 1988-01-21 1989-09-12 Eastman Kodak Co. Laminate for the formation of beam leads for IC chip bonding featuring improved positive-working resist
US6045967A (en) * 1997-01-10 2000-04-04 Hyundai Electronics Industries Co., Ltd. Method and device using ArF photoresist
US6608158B2 (en) 1997-12-29 2003-08-19 Hyundai Electronics Industries Co., Ltd. Copolymer resin, preparation thereof, and photoresist using the same
US6369181B1 (en) 1997-12-29 2002-04-09 Hyundai Electronics Industries Co., Ltd. Copolymer resin, preparation thereof, and photoresist using the same
US6291131B1 (en) 1998-08-26 2001-09-18 Hyundai Electronics Industries Co., Ltd. Monomers for photoresist, polymers thereof, and photoresist compositions using the same
US6410670B1 (en) 1998-08-26 2002-06-25 Hyundai Electronics Industries Co., Ltd. Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
US6569971B2 (en) 1998-08-27 2003-05-27 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same
US6987155B2 (en) 1998-08-27 2006-01-17 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same
EP2428842A1 (en) * 2010-09-14 2012-03-14 Rohm and Haas Electronic Materials LLC Photoresists comprising multi-amide component
CN102591145A (en) * 2010-09-14 2012-07-18 罗门哈斯电子材料有限公司 Photoresists comprising multi-amide component
CN102591145B (en) * 2010-09-14 2013-12-04 罗门哈斯电子材料有限公司 Photoresists comprising multi-amide component
JP2019518981A (en) * 2016-05-12 2019-07-04 ノーロッキー, ダニエル, ジェイ.NAWROCKI, Daniel, J. Polysulfonamide redistribution composition and method of using the same

Also Published As

Publication number Publication date
FR2122169A5 (en) 1972-08-25

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees