NL1012916A1 - Nieuw fotoresistmonomeer met hydroxygroep en carboxylgroep, copolymeer daarvan en fotoresistcompositie waarin dit gebruikt wordt. - Google Patents

Nieuw fotoresistmonomeer met hydroxygroep en carboxylgroep, copolymeer daarvan en fotoresistcompositie waarin dit gebruikt wordt.

Info

Publication number
NL1012916A1
NL1012916A1 NL1012916A NL1012916A NL1012916A1 NL 1012916 A1 NL1012916 A1 NL 1012916A1 NL 1012916 A NL1012916 A NL 1012916A NL 1012916 A NL1012916 A NL 1012916A NL 1012916 A1 NL1012916 A1 NL 1012916A1
Authority
NL
Netherlands
Prior art keywords
copolymer
photoresist
monomer
carboxyl group
hydroxy group
Prior art date
Application number
NL1012916A
Other languages
English (en)
Other versions
NL1012916C2 (nl
Inventor
Geun Su Lee
Cha Won Koh
Jae Chang Jung
Min Ho Jung
Ki Ho Baik
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-1998-0034694A external-priority patent/KR100448860B1/ko
Priority claimed from KR10-1998-0039079A external-priority patent/KR100400292B1/ko
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Publication of NL1012916A1 publication Critical patent/NL1012916A1/nl
Application granted granted Critical
Publication of NL1012916C2 publication Critical patent/NL1012916C2/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/02—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
    • C07D493/08—Bridged systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/74—Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C69/753—Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring of polycyclic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F32/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F32/08—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having two condensed rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
NL1012916A 1998-08-26 1999-08-26 Nieuw fotoresistmonomeer met hydroxygroep en carboxylgroep, copolymeer daarvan en fotoresistcompositie waarin dit gebruikt wordt. NL1012916C2 (nl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR19980034694 1998-08-26
KR10-1998-0034694A KR100448860B1 (ko) 1998-08-26 1998-08-26 포토레지스트단량체,그의공중합체및이를포함하는포토레지스트조성물
KR10-1998-0039079A KR100400292B1 (ko) 1998-09-21 1998-09-21 신규의포토레지스트용모노머,그의공중합체및이를이용한포토레지스트조성물
KR19980039079 1998-09-21

Publications (2)

Publication Number Publication Date
NL1012916A1 true NL1012916A1 (nl) 2000-02-29
NL1012916C2 NL1012916C2 (nl) 2002-12-03

Family

ID=26634051

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1012916A NL1012916C2 (nl) 1998-08-26 1999-08-26 Nieuw fotoresistmonomeer met hydroxygroep en carboxylgroep, copolymeer daarvan en fotoresistcompositie waarin dit gebruikt wordt.

Country Status (9)

Country Link
US (2) US6410670B1 (nl)
JP (1) JP3587743B2 (nl)
CN (1) CN1240666C (nl)
DE (1) DE19940516A1 (nl)
FR (1) FR2782715B1 (nl)
GB (1) GB2340831B (nl)
IT (1) IT1307051B1 (nl)
NL (1) NL1012916C2 (nl)
TW (1) TW535033B (nl)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6569971B2 (en) * 1998-08-27 2003-05-27 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same
KR100634973B1 (ko) 1999-04-09 2006-10-16 센쥬긴소쿠고교가부시키가이샤 솔더볼 및 솔더볼의 피복방법
KR100301063B1 (ko) * 1999-07-29 2001-09-22 윤종용 감광성 중합체 및 이들을 포함하는 화학 증폭형 포토레지스트 조성물
KR100535149B1 (ko) * 1999-08-17 2005-12-07 주식회사 하이닉스반도체 신규의 포토레지스트용 공중합체 및 이를 이용한 포토레지스트조성물
US6306554B1 (en) * 2000-05-09 2001-10-23 Shipley Company, L.L.C. Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
KR100527533B1 (ko) 2000-06-21 2005-11-09 주식회사 하이닉스반도체 Ｔｉｐｓ 공정용 포토레지스트 중합체 및 이를 함유하는포토레지스트 조성물
KR100506882B1 (ko) * 2000-07-13 2005-08-08 주식회사 하이닉스반도체 Ｔｉｐｓ용 포토레지스트 중합체 및 이를 함유하는포토레지스트 조성물
JP2002091003A (ja) * 2000-09-19 2002-03-27 Tokyo Ohka Kogyo Co Ltd 薄膜形成用ポジ型レジスト組成物及びそれを用いた感光材料
US6469220B2 (en) * 2000-12-25 2002-10-22 Shin-Etsu Chemical Co., Ltd. Tertiary alcohol compounds having an alicyclic structure
JP2003020313A (ja) * 2001-07-09 2003-01-24 Shin Etsu Chem Co Ltd 脂環構造を有する新規エポキシ化合物、高分子化合物、レジスト材料、及びパターン形成方法
US20040126695A1 (en) * 2002-05-07 2004-07-01 Honeywell International, Inc. Fluorinated polymers
US7674847B2 (en) * 2003-02-21 2010-03-09 Promerus Llc Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof
JP5756672B2 (ja) * 2010-04-27 2015-07-29 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 光酸発生剤およびこれを含むフォトレジスト
JP6445525B2 (ja) * 2014-03-06 2018-12-26 住友ベークライト株式会社 ポリマー、感光性樹脂組成物および電子装置
KR102084433B1 (ko) * 2017-02-23 2020-03-04 동우 화인켐 주식회사 네가티브형 컬러필터의 제조방법, 이로부터 제조된 네가티브형 컬러필터 및 화상표시장치
CN115785443B (zh) * 2022-12-01 2024-03-19 无锡阿科力科技股份有限公司 一种光学级聚合物及其制备方法和应用
CN117756987A (zh) * 2023-12-27 2024-03-26 福建泓光半导体材料有限公司 一种丙烯酸酯光刻胶成膜树脂和ArF光刻胶及其制备方法与应用

Family Cites Families (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB768813A (en) 1954-05-07 1957-02-20 Geigy Ag J R Substituted 1.2-diphenyl-3.5-dioxo-pyrazolidines and processes for the production thereof
US3370047A (en) 1964-09-03 1968-02-20 Union Carbide Corp Pour point depressants and lubricating compositions thereof
NL6914466A (nl) 1969-09-24 1971-03-26
US3715330A (en) 1970-05-20 1973-02-06 Asahi Chemical Ind Self-thermoset unsaturated polyesters and method for preparation thereof
US3672025A (en) 1970-12-04 1972-06-27 Artos Engineering Co Terminal applicator
GB1335095A (en) 1971-01-14 1973-10-24 Kodak Ltd Polycondensation copolymers
JPS5818369B2 (ja) 1973-09-05 1983-04-12 ジェイエスアール株式会社 ノルボルネンカルボンサンアミドオヨビ ／ マタハイミドルイノ （ キヨウ ） ジユウゴウタイノセイゾウホウホウ
US4106943A (en) 1973-09-27 1978-08-15 Japan Synthetic Rubber Co., Ltd. Photosensitive cross-linkable azide containing polymeric composition
JPS5628257B2 (nl) 1973-09-27 1981-06-30
US4202955A (en) 1975-12-16 1980-05-13 Borg-Warner Corporation Copolymers of cyclic conjugated dienes and maleic anhydride
US4126738A (en) 1976-02-17 1978-11-21 Borg-Warner Corporation Copolymers of 5-norbornene 2,3-dicarboxylic anhydride and maleic anhydride
JPS57165420A (en) * 1981-04-07 1982-10-12 Seiko Kagaku Kogyo Co Ltd Production of water-dispersed urethane polymer
US4440850A (en) 1981-07-23 1984-04-03 Ciba-Geigy Corporation Photopolymerisation process with two exposures of a single layer
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4857435A (en) 1983-11-01 1989-08-15 Hoechst Celanese Corporation Positive photoresist thermally stable compositions and elements having deep UV response with maleimide copolymer
JPH0717740B2 (ja) 1986-10-01 1995-03-01 帝人株式会社 架橋重合体成型物の製造方法
US4948856A (en) 1987-05-22 1990-08-14 B. F. Goodrich Company Homogeneous addition copolymers of ethylene and cycloolefin monomers and method for producing same
US4986648A (en) 1987-06-18 1991-01-22 Hitachi Chemical Company, Ltd. Lens and optical disc base plate obtained from copolymer of norbornyl (meth)acrylate
DE3721741A1 (de) 1987-07-01 1989-01-12 Basf Ag Strahlungsempfindliches gemisch fuer lichtempfindliche beschichtungsmaterialien
KR900700923A (ko) 1988-02-17 1990-08-17 야마구찌 도시아끼 포토레지스트 조성물
JPH0251511A (ja) 1988-08-15 1990-02-21 Mitsui Petrochem Ind Ltd 極性基含有環状オレフイン系共重合体およびその製法
DE3922546A1 (de) 1989-07-08 1991-01-17 Hoechst Ag Verfahren zur herstellung von cycloolefinpolymeren
US5252427A (en) 1990-04-10 1993-10-12 E. I. Du Pont De Nemours And Company Positive photoresist compositions
EP0485631B1 (en) 1990-06-06 1995-11-15 Mitsui Petrochemical Industries, Ltd. Polyolefin resin composition
JP3000745B2 (ja) 1991-09-19 2000-01-17 富士通株式会社 レジスト組成物とレジストパターンの形成方法
TW304235B (nl) 1992-04-29 1997-05-01 Ocg Microelectronic Materials
JP2715881B2 (ja) 1993-12-28 1998-02-18 日本電気株式会社 感光性樹脂組成物およびパターン形成方法
US5849808A (en) 1995-04-21 1998-12-15 Olin Microelectronic Chemicals, Inc. Organic solvent soluble photoresists which are developable in aqueous alkaline solutions
US5705503A (en) 1995-05-25 1998-01-06 Goodall; Brian Leslie Addition polymers of polycycloolefins containing functional substituents
WO1997006216A1 (fr) 1995-08-10 1997-02-20 Mitsubishi Rayon Co., Ltd. Composition de revetement durcissable a chaud
JP3804138B2 (ja) 1996-02-09 2006-08-02 Ｊｓｒ株式会社 ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物
US6232417B1 (en) 1996-03-07 2001-05-15 The B. F. Goodrich Company Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
ATE297562T1 (de) 1996-03-07 2005-06-15 Sumitomo Bakelite Co Photoresist zusammensetzungen mit polycyclischen polymeren mit säurelabilen gruppen am ende
US5843624A (en) 1996-03-08 1998-12-01 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
CA2199567C (en) * 1996-03-20 2003-01-14 Volker Rheinberger Functionalized and polymerizable polymer
US5763556A (en) 1996-05-21 1998-06-09 Exxon Chemical Patents Inc. Copolymers of ethylene and geminally disubstituted olefins
US6034150A (en) 1996-08-23 2000-03-07 University Of Southern Mississippi Polymerization processes using aliphatic maleimides
JP3880151B2 (ja) * 1996-10-11 2007-02-14 キヤノン株式会社 水溶性付加重合体、それを用いた水系インク、該水系インクを用いたインクジェット記録方法及びインクジェット捺染方法
KR100261022B1 (ko) 1996-10-11 2000-09-01 윤종용 화학증폭형 레지스트 조성물
KR100211548B1 (ko) 1996-12-20 1999-08-02 김영환 원자외선용 감광막 공중합체 및 그 제조방법
KR100265597B1 (ko) 1996-12-30 2000-09-15 김영환 Arf 감광막 수지 및 그 제조방법
KR100220953B1 (ko) 1996-12-31 1999-10-01 김영환 아미드 또는 이미드를 도입한 ArF 감광막 수지
KR100225956B1 (ko) 1997-01-10 1999-10-15 김영환 아민을 도입한 에이알에프 감광막 수지
KR100195583B1 (ko) 1997-04-08 1999-06-15 박찬구 양성 포토레지스트 제조용 공중합체 및 이를 함유하는 화학증폭형 양성 포토레지스트 조성물
EP0878738B1 (en) 1997-05-12 2002-01-09 Fuji Photo Film Co., Ltd. Positive resist composition
KR100252546B1 (ko) 1997-11-01 2000-04-15 김영환 공중합체 수지와 포토레지스트 및 그 제조방법
KR100254472B1 (ko) 1997-11-01 2000-05-01 김영환 신규한 말레이미드계 또는 지방족 환형 올레핀계 단량체와 이들 단량체들의 공중합체수지 및 이수지를 이용한 포토레지스트
KR100321080B1 (ko) 1997-12-29 2002-11-22 주식회사 하이닉스반도체 공중합체수지와이의제조방법및이수지를이용한포토레지스트
KR100520148B1 (ko) 1997-12-31 2006-05-12 주식회사 하이닉스반도체 신규한바이시클로알켄유도체와이를이용한포토레지스트중합체및이중합체를함유한포토레지스트조성물
KR100334387B1 (ko) 1997-12-31 2002-11-22 주식회사 하이닉스반도체 공중합체수지와그제조방법및이수지를이용한포토레지스트
KR19990081722A (ko) 1998-04-30 1999-11-15 김영환 카르복실기 함유 지환족 유도체 및 그의 제조방법
KR100376983B1 (ko) 1998-04-30 2003-08-02 주식회사 하이닉스반도체 포토레지스트중합체및이를이용한미세패턴의형성방법
KR100376984B1 (ko) 1998-04-30 2003-07-16 주식회사 하이닉스반도체 포토레지스트중합체및이를이용한미세패턴의형성방법
KR100419028B1 (ko) 1998-05-13 2004-07-19 주식회사 하이닉스반도체 옥사비시클로화합물,이화합물이도입된포토레지스트중합체및이를이용한포토레지스트미세패턴의형성방법
KR100403325B1 (ko) 1998-07-27 2004-03-24 주식회사 하이닉스반도체 포토레지스트중합체및이를이용한포토레지스트조성물
KR20000015014A (ko) 1998-08-26 2000-03-15 김영환 신규의 포토레지스트용 단량체, 중합체 및 이를 이용한 포토레지스트 조성물

Also Published As

Publication number Publication date
ITTO990725A1 (it) 2001-02-26
JP3587743B2 (ja) 2004-11-10
GB9920124D0 (en) 1999-10-27
IT1307051B1 (it) 2001-10-23
CN1247858A (zh) 2000-03-22
TW535033B (en) 2003-06-01
FR2782715B1 (fr) 2004-09-10
FR2782715A1 (fr) 2000-03-03
DE19940516A1 (de) 2000-03-09
US20020091216A1 (en) 2002-07-11
NL1012916C2 (nl) 2002-12-03
GB2340831B (en) 2004-05-12
CN1240666C (zh) 2006-02-08
GB2340831A (en) 2000-03-01
JP2000086726A (ja) 2000-03-28
US6586619B2 (en) 2003-07-01
US6410670B1 (en) 2002-06-25

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