GB768813A - Substituted 1.2-diphenyl-3.5-dioxo-pyrazolidines and processes for the production thereof - Google Patents

Substituted 1.2-diphenyl-3.5-dioxo-pyrazolidines and processes for the production thereof

Info

Publication number
GB768813A
GB768813A GB12243/55A GB1224355A GB768813A GB 768813 A GB768813 A GB 768813A GB 12243/55 A GB12243/55 A GB 12243/55A GB 1224355 A GB1224355 A GB 1224355A GB 768813 A GB768813 A GB 768813A
Authority
GB
United Kingdom
Prior art keywords
endomethylene
cyclohexenyl
methyl
phenyl
malonic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB12243/55A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
JR Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JR Geigy AG filed Critical JR Geigy AG
Publication of GB768813A publication Critical patent/GB768813A/en
Expired legal-status Critical Current

Links

Classifications

    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients

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  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Pharmacology & Pharmacy (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

The invention comprises compounds of the general formula <FORM:0768813/IV(b)/1> wherein Ar1 and Ar2 are phenyl radicals which may be substituted by alkyl, alkoxy or alkyl mercapto groups of 1 to 4 carbon atoms or by halogen, R1 and R2 are hydrogen or methyl and n is 0-3, their salts with inorganic or organic bases, and their preparation by (a) condensing, preferably in the presence of an alkaline condensation agent, a diester of the appropriately mono-substituted malonic acid with the appropriate 1,2-diarylhydrazine or an N-acyl derivative thereof or (b) condensing in the presence of an acid binding agent, a dichloride, dibromide or mixed anhydride of the appropriately monosubstituted malonic acid with the appropriate 1 : 2-diarylhydrazine or (c) condensing an appropriately mono-substituted malonic acid mono-ester mono-chloride, bromide or mixed anhydride first, corresponding to (b), with the appropriate diarylhydrazine to form a substituted malonic acid hydrazide ester and then condensing, corresponding to (a), to form the required product, and, if desired, converting the products so obtained into their salts with inorganic or organic bases. Alkaline condensation agents referred to are alkali metals, their alcoholates, amides, hydroxides and hydrides, the condensation preferably being performed in an organic solvent at a raised temperature. Acid binding agents referred to are tertiary organic bases, the condensation being effected with or without organic solvents at temperatures near 0 DEG C., with subsequent heating if desired. Salts according to the invention are prepared by reacting the free pyrazolidinediones in aqueous solution or an organic solvent with an inorganic or organic base, e.g. sodium or potassium hydroxide or carbonate, sodium alcoholate or mono-, di- or tri-ethanolamine or ethylene diamine. Examples describe the preparation of the following 3.5-dioxo-pyrazolidines: 1 : 2 - diphenyl - 4 - (21 : 51 - endomethylene - D 31 - cyclohexenyl - methyl)-, 1 : 2 - di - phenyl - 4 - (21 : 51 - endomethylene - D 31-cyclo-hexenyl)-, 1 : 2 - diphenyl - 4 - (61 - methyl - 21 : 51-endomethylene - D 31 - cyclohexenyl - methyl)-, 1 : 2 - diphenyl - 4 [31 - (211 : 511 - endomethyleneD 311-cyclohexenyl) - propyl - (11)]-, 1 : 2 - di - (p - methyl - phenyl) - 4 - (21 : 51 - endomethylene - D 31 - cyclohexenyl)-, 1 : 2 - di - (p - chlor - phenyl) - 4 - 21 : 51 - endomethylene - D 31 - cyclohexenyl)-, 1 : 2-di-(m-brom-phenyl)-4-(21 : 51-endomethylene - D 31 - cyclohexenyl)-, 1 : 2 - di - (m-methylmercapto) - 4 - [21 : 51 - endomethylene - D 31-cyclohexenyl - (11)]- and 1 : 2 - di - (p - methoxy-phenyl) - 4 - [21 : 51 - endomethylene-D 31-cyclohexenyl - (11)]-; a - (2 : 5 - endomethylene - D 3-cyclohexenyl) - a - carbethoxyacetylhydrazo - benzene is an intermediate in one preparation of the second of the above compounds. The preparation of sodium salts of some of the above compounds is also described. A list of further starting materials is also given, including 4-ethoxy-41-bromo-hydrazobenzene. Starting materials. Compounds of the general formula <FORM:0768813/IV(b)/2> where X is a hydrocarbon radical, are prepared by condensation of sodium malonic acid diesters with the appropriate 21 : 51-endomethylene-D 31-cyclohexenyl-alkyl halides, themselves prepared by the addition of cyclopentadiene to unsaturated aliphatic halogen compounds such as vinyl bromide, allyl chloride or methallyl chloride. Acid halides are obtained from the above esters by alkaline saponification, liberation of the acids and treatment thereof with inorganic acid halides. Mixed anhydrides, when X is an acetyl radical, are obtained from the free acid and excess acetic anhydride. In the examples, the following compounds are prepared by the above methods: malonic acid diethyl esters, free acids and dichlorides substituted by [(6-methyl-2 : 5-endomethylene-D 3-cyclohexenyl - methyl)]- and [2 : 5 - endomethylene - D 3 - cyclohexenyl - (1)] - radicals, [3-(21 : 51 - endomethylene - D 31 - cyclohexenyl)-propyl-(1)]-malonic acid diethyl ester and 6-methyl - 2 : 5 - endomethylene - D 3 - cyclo - hexenyl - methyl bromide. 1-Bromobutene-(2) is prepared from butadiene and hydrogen bromide in glacial acetic acid. 3-(21 : 51-Endomethylene - D 3 - cyclohexenyl) - propyl bromide is obtained from PBr3 and the corresponding propanol, itself obtained by converting 2 : 5-endomethylene - D 3 - cyclohexenyl - (1) - methyl bromide into the corresponding Grignard compound and reacting this with ethylene oxide. p.p1 - Dimethyl-, p.p1-dichloro-, m.m1-dibromo- and m.m1 - dimethylmercapto - hydrazo - benzenes are produced by reduction with zinc dust and alkali of p-nitrotoluene, p-nitrochlorobenzene, m-bromonitrobenzene and mi-nitrothioanisole respectively. Specification 646,597 is referred to.
GB12243/55A 1954-05-07 1955-04-28 Substituted 1.2-diphenyl-3.5-dioxo-pyrazolidines and processes for the production thereof Expired GB768813A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH768813X 1954-05-07

Publications (1)

Publication Number Publication Date
GB768813A true GB768813A (en) 1957-02-20

Family

ID=4535231

Family Applications (1)

Application Number Title Priority Date Filing Date
GB12243/55A Expired GB768813A (en) 1954-05-07 1955-04-28 Substituted 1.2-diphenyl-3.5-dioxo-pyrazolidines and processes for the production thereof

Country Status (1)

Country Link
GB (1) GB768813A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2336843A (en) * 1998-04-30 1999-11-03 Hyundai Electronics Ind Carboxyl-containing alicyclic monomers for photoresist resins
US6291131B1 (en) 1998-08-26 2001-09-18 Hyundai Electronics Industries Co., Ltd. Monomers for photoresist, polymers thereof, and photoresist compositions using the same
US6369181B1 (en) 1997-12-29 2002-04-09 Hyundai Electronics Industries Co., Ltd. Copolymer resin, preparation thereof, and photoresist using the same
US6391518B1 (en) 1998-07-27 2002-05-21 Hyundai Electronics Industries Co., Ltd. Polymers and photoresist compositions using the same
US6410670B1 (en) 1998-08-26 2002-06-25 Hyundai Electronics Industries Co., Ltd. Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
US6569971B2 (en) 1998-08-27 2003-05-27 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6369181B1 (en) 1997-12-29 2002-04-09 Hyundai Electronics Industries Co., Ltd. Copolymer resin, preparation thereof, and photoresist using the same
US6608158B2 (en) 1997-12-29 2003-08-19 Hyundai Electronics Industries Co., Ltd. Copolymer resin, preparation thereof, and photoresist using the same
GB2336843A (en) * 1998-04-30 1999-11-03 Hyundai Electronics Ind Carboxyl-containing alicyclic monomers for photoresist resins
US6265130B1 (en) 1998-04-30 2001-07-24 Hyundai Electronics Industries Co., Ltd. Photoresist polymers of carboxyl-containing alicyclic compounds
US6376632B1 (en) 1998-04-30 2002-04-23 Hyundai Electronics Industries Co., Ltd. Photoresist polymers of carboxyl-containing alicyclic compounds
GB2336843B (en) * 1998-04-30 2003-11-05 Hyundai Electronics Ind Carboxyl-containing alicyclic compounds and a process for preparing the same
US6391518B1 (en) 1998-07-27 2002-05-21 Hyundai Electronics Industries Co., Ltd. Polymers and photoresist compositions using the same
US6291131B1 (en) 1998-08-26 2001-09-18 Hyundai Electronics Industries Co., Ltd. Monomers for photoresist, polymers thereof, and photoresist compositions using the same
US6410670B1 (en) 1998-08-26 2002-06-25 Hyundai Electronics Industries Co., Ltd. Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
US6586619B2 (en) 1998-08-26 2003-07-01 Hyundai Electronics Industries Co., Ltd. Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
US6569971B2 (en) 1998-08-27 2003-05-27 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same
US6987155B2 (en) 1998-08-27 2006-01-17 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same

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