IL182064A - Method for adjusting optical device for lighting, optical device for lighting, exposure system, and exposure method - Google Patents
Method for adjusting optical device for lighting, optical device for lighting, exposure system, and exposure methodInfo
- Publication number
- IL182064A IL182064A IL182064A IL18206407A IL182064A IL 182064 A IL182064 A IL 182064A IL 182064 A IL182064 A IL 182064A IL 18206407 A IL18206407 A IL 18206407A IL 182064 A IL182064 A IL 182064A
- Authority
- IL
- Israel
- Prior art keywords
- polarization
- illumination optical
- optical apparatus
- light
- phase difference
- Prior art date
Links
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- 238000000034 method Methods 0.000 title claims description 85
- 230000010287 polarization Effects 0.000 claims description 570
- 238000005286 illumination Methods 0.000 claims description 323
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- 238000004519 manufacturing process Methods 0.000 claims description 93
- 230000010363 phase shift Effects 0.000 claims description 77
- 210000001747 pupil Anatomy 0.000 claims description 76
- 239000000758 substrate Substances 0.000 claims description 41
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- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
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- 239000010436 fluorite Substances 0.000 description 2
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- 238000001459 lithography Methods 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/007—Optical devices or arrangements for the control of light using movable or deformable optical elements the movable or deformable optical element controlling the colour, i.e. a spectral characteristic, of the light
- G02B26/008—Optical devices or arrangements for the control of light using movable or deformable optical elements the movable or deformable optical element controlling the colour, i.e. a spectral characteristic, of the light in the form of devices for effecting sequential colour changes, e.g. colour wheels
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/706843—Metrology apparatus
- G03F7/706849—Irradiation branch, e.g. optical system details, illumination mode or polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Computer Networks & Wireless Communication (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Astronomy & Astrophysics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Polarising Elements (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005013576 | 2005-01-21 | ||
| JP2005120709 | 2005-04-19 | ||
| PCT/JP2006/300584 WO2006077849A1 (ja) | 2005-01-21 | 2006-01-18 | 照明光学装置の調整方法、照明光学装置、露光装置、および露光方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL182064A0 IL182064A0 (en) | 2007-07-24 |
| IL182064A true IL182064A (en) | 2012-01-31 |
Family
ID=36692238
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL182064A IL182064A (en) | 2005-01-21 | 2007-03-20 | Method for adjusting optical device for lighting, optical device for lighting, exposure system, and exposure method |
| IL216818A IL216818A (en) | 2005-01-21 | 2011-12-07 | Method for adjusting optical device for lighting, optical device for lighting, exposure system and exposure method |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL216818A IL216818A (en) | 2005-01-21 | 2011-12-07 | Method for adjusting optical device for lighting, optical device for lighting, exposure system and exposure method |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20070146676A1 (enExample) |
| EP (3) | EP3153925A3 (enExample) |
| JP (3) | JP4582096B2 (enExample) |
| KR (6) | KR101642242B1 (enExample) |
| CN (3) | CN101164142B (enExample) |
| HK (1) | HK1251992A1 (enExample) |
| IL (2) | IL182064A (enExample) |
| SG (1) | SG159495A1 (enExample) |
| TW (4) | TWI453795B (enExample) |
| WO (1) | WO2006077849A1 (enExample) |
Families Citing this family (121)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101484435B1 (ko) | 2003-04-09 | 2015-01-19 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| TWI628698B (zh) | 2003-10-28 | 2018-07-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
| TWI612338B (zh) * | 2003-11-20 | 2018-01-21 | 尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
| US20070019179A1 (en) | 2004-01-16 | 2007-01-25 | Damian Fiolka | Polarization-modulating optical element |
| CN1910522B (zh) | 2004-01-16 | 2010-05-26 | 卡尔蔡司Smt股份公司 | 偏振调制光学元件 |
| US8270077B2 (en) * | 2004-01-16 | 2012-09-18 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
| TWI395068B (zh) | 2004-01-27 | 2013-05-01 | 尼康股份有限公司 | 光學系統、曝光裝置以及曝光方法 |
| TWI614795B (zh) | 2004-02-06 | 2018-02-11 | Nikon Corporation | 光學照明裝置、曝光裝置、曝光方法以及元件製造方法 |
| US7324280B2 (en) | 2004-05-25 | 2008-01-29 | Asml Holding N.V. | Apparatus for providing a pattern of polarization |
| US7697138B2 (en) * | 2005-01-19 | 2010-04-13 | Litel Instruments | Method and apparatus for determination of source polarization matrix |
| TWI453795B (zh) * | 2005-01-21 | 2014-09-21 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
| US7375799B2 (en) | 2005-02-25 | 2008-05-20 | Asml Netherlands B.V. | Lithographic apparatus |
| JP4612849B2 (ja) * | 2005-03-01 | 2011-01-12 | キヤノン株式会社 | 露光方法、露光装置及びデバイス製造方法 |
| TW200710592A (en) * | 2005-06-13 | 2007-03-16 | Asml Netherlands Bv | Lithographic device, and method |
| DE102006031807A1 (de) * | 2005-07-12 | 2007-01-18 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie Depolarisator |
| JP4920041B2 (ja) | 2005-10-04 | 2012-04-18 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学系とりわけマイクロリソグラフィック投影露光機における偏光分布に影響を与えるための装置及び方法 |
| JP5067162B2 (ja) * | 2005-11-10 | 2012-11-07 | 株式会社ニコン | 照明光学装置、露光装置、および露光方法 |
| JP2007220767A (ja) * | 2006-02-15 | 2007-08-30 | Canon Inc | 露光装置及びデバイス製造方法 |
| KR101486589B1 (ko) * | 2006-04-17 | 2015-01-26 | 가부시키가이샤 니콘 | 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법 |
| WO2008004654A1 (en) * | 2006-07-07 | 2008-01-10 | Nikon Corporation | Illuminating optical apparatus, exposure apparatus and device manufacturing method |
| JP5308638B2 (ja) * | 2006-07-14 | 2013-10-09 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置用の照明光学系 |
| DE102006032810A1 (de) | 2006-07-14 | 2008-01-17 | Carl Zeiss Smt Ag | Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement |
| JP2008108851A (ja) * | 2006-10-24 | 2008-05-08 | Canon Inc | 照明装置及び当該照明装置を有する露光装置、並びに、デバイス製造方法 |
| DE102007027985A1 (de) | 2006-12-21 | 2008-06-26 | Carl Zeiss Smt Ag | Optisches System, insbesondere Beleuchtungseinrichtung oder Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| US7952685B2 (en) * | 2007-03-15 | 2011-05-31 | Carl Zeiss Smt Ag | Illuminator for a lithographic apparatus and method |
| WO2008119794A1 (en) * | 2007-04-03 | 2008-10-09 | Carl Zeiss Smt Ag | Optical system, in particular illumination device or projection objective of a microlithographic projection exposure apparatus |
| DE102008011134A1 (de) | 2007-04-03 | 2008-10-09 | Carl Zeiss Smt Ag | Verfahren zum Anpassen der Abbildungseigenschaften von wenigstens zwei mikrolithographischen Projektionsbelichtungsanlagen aneinander |
| US7872731B2 (en) * | 2007-04-20 | 2011-01-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7817250B2 (en) | 2007-07-18 | 2010-10-19 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus |
| DE102007043958B4 (de) * | 2007-09-14 | 2011-08-25 | Carl Zeiss SMT GmbH, 73447 | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
| US8451427B2 (en) | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
| US20090091730A1 (en) * | 2007-10-03 | 2009-04-09 | Nikon Corporation | Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method |
| JPWO2009048051A1 (ja) * | 2007-10-12 | 2011-02-17 | 株式会社ニコン | 照明光学装置、並びに露光方法及び装置 |
| JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
| KR101562073B1 (ko) | 2007-10-16 | 2015-10-21 | 가부시키가이샤 니콘 | 조명 광학 시스템, 노광 장치 및 디바이스 제조 방법 |
| EP2179329A1 (en) * | 2007-10-16 | 2010-04-28 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| JP2010004008A (ja) * | 2007-10-31 | 2010-01-07 | Nikon Corp | 光学ユニット、照明光学装置、露光装置、露光方法、およびデバイス製造方法 |
| US9116346B2 (en) * | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| JP5326259B2 (ja) | 2007-11-08 | 2013-10-30 | 株式会社ニコン | 照明光学装置、露光装置、およびデバイス製造方法 |
| DE102007055062A1 (de) * | 2007-11-16 | 2009-05-28 | Carl Zeiss Smt Ag | Optisches System, sowie Verfahren zur Charakterisierung eines optischen Systems |
| DE102007055567A1 (de) * | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optisches System |
| US8040492B2 (en) * | 2007-11-27 | 2011-10-18 | Carl Zeiss Smt Gmbh | Illumination system of a microlithographic projection exposure apparatus |
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