FR2340288A1 - Procede de fabrication d'une ceramique a multicouches - Google Patents
Procede de fabrication d'une ceramique a multicouchesInfo
- Publication number
- FR2340288A1 FR2340288A1 FR7639690A FR7639690A FR2340288A1 FR 2340288 A1 FR2340288 A1 FR 2340288A1 FR 7639690 A FR7639690 A FR 7639690A FR 7639690 A FR7639690 A FR 7639690A FR 2340288 A1 FR2340288 A1 FR 2340288A1
- Authority
- FR
- France
- Prior art keywords
- manufacturing process
- layer ceramic
- ceramic
- layer
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
- C04B41/5122—Pd or Pt
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
- C04B41/5133—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal with a composition mainly composed of one or more of the refractory metals
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/88—Metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4857—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/15—Ceramic or glass substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5383—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
- H05K3/4629—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Structural Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Conductive Materials (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/654,686 US4109377A (en) | 1976-02-03 | 1976-02-03 | Method for preparing a multilayer ceramic |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2340288A1 true FR2340288A1 (fr) | 1977-09-02 |
FR2340288B1 FR2340288B1 (fr) | 1979-09-21 |
Family
ID=24625850
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7639690A Granted FR2340288A1 (fr) | 1976-02-03 | 1976-12-23 | Procede de fabrication d'une ceramique a multicouches |
Country Status (6)
Country | Link |
---|---|
US (1) | US4109377A (fr) |
JP (1) | JPS5295058A (fr) |
CA (1) | CA1078079A (fr) |
DE (1) | DE2703956C2 (fr) |
FR (1) | FR2340288A1 (fr) |
GB (1) | GB1565421A (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0016306A1 (fr) * | 1979-03-23 | 1980-10-01 | International Business Machines Corporation | Procédé pour la fabrication d'un empaquetage multicouche en verre-céramique pour le montage de dispositifs semiconducteurs |
FR2496341A1 (fr) * | 1980-12-12 | 1982-06-18 | Thomson Csf | Composant d'interconnexion topologique |
EP0425148A2 (fr) * | 1989-10-23 | 1991-05-02 | AT&T Corp. | Procédé pour la fabrication de circuits multicouches à film épais |
Families Citing this family (82)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4388131A (en) * | 1977-05-02 | 1983-06-14 | Burroughs Corporation | Method of fabricating magnets |
US4243710A (en) * | 1978-12-06 | 1981-01-06 | Ferro Corporation | Thermoplastic electrode ink for the manufacture of ceramic multi-layer capacitor |
US4313262A (en) * | 1979-12-17 | 1982-02-02 | General Electric Company | Molybdenum substrate thick film circuit |
US4355055A (en) * | 1980-02-25 | 1982-10-19 | E. I. Du Pont De Nemours And Company | Use of prolonged tack toners for the preparation of multilayer electric circuits |
US4364100A (en) * | 1980-04-24 | 1982-12-14 | International Business Machines Corporation | Multi-layered metallized silicon matrix substrate |
JPS5922385B2 (ja) * | 1980-04-25 | 1984-05-26 | 日産自動車株式会社 | セラミツク基板のスル−ホ−ル充填用導電体ペ−スト |
JPS6127242Y2 (fr) * | 1980-04-30 | 1986-08-14 | ||
US4320438A (en) * | 1980-05-15 | 1982-03-16 | Cts Corporation | Multi-layer ceramic package |
JPS5824037B2 (ja) * | 1980-05-26 | 1983-05-18 | 富士通株式会社 | 導体ボ−ル配列方法 |
US4336088A (en) * | 1980-06-30 | 1982-06-22 | International Business Machines Corp. | Method of fabricating an improved multi-layer ceramic substrate |
US4302625A (en) * | 1980-06-30 | 1981-11-24 | International Business Machines Corp. | Multi-layer ceramic substrate |
US4349862A (en) * | 1980-08-11 | 1982-09-14 | International Business Machines Corporation | Capacitive chip carrier and multilayer ceramic capacitors |
US4340618A (en) * | 1981-03-20 | 1982-07-20 | International Business Machines Corporation | Process for forming refractory metal layers on ceramic substrate |
JPS57182971U (fr) * | 1981-05-14 | 1982-11-19 | ||
DE3147790A1 (de) * | 1981-12-03 | 1983-06-09 | Brown, Boveri & Cie Ag, 6800 Mannheim | Leistungsmodul und verfahren zu seiner herstellung |
DE3147789A1 (de) * | 1981-12-03 | 1983-06-09 | Brown, Boveri & Cie Ag, 6800 Mannheim | Leistungsmodul und verfahren zu seiner herstellung |
US4461077A (en) * | 1982-10-04 | 1984-07-24 | General Electric Ceramics, Inc. | Method for preparing ceramic articles having raised, selectively metallized electrical contact points |
JPS5987893A (ja) * | 1982-11-12 | 1984-05-21 | 株式会社日立製作所 | 配線基板とその製造方法およびそれを用いた半導体装置 |
DE3305687A1 (de) * | 1983-02-18 | 1984-08-23 | Raymond E. San Diego Calif. Wiech jun. | Verfahren zur herstellung komplexer mikroschaltungsplatten, -substrate und mikroschaltungen und nach dem verfahren hergestellte substrate und mikroschaltungen |
JPS6028296A (ja) * | 1983-07-27 | 1985-02-13 | 株式会社日立製作所 | セラミツク多層配線回路板 |
US4540621A (en) * | 1983-07-29 | 1985-09-10 | Eggerding Carl L | Dielectric substrates comprising cordierite and method of forming the same |
US4546065A (en) * | 1983-08-08 | 1985-10-08 | International Business Machines Corporation | Process for forming a pattern of metallurgy on the top of a ceramic substrate |
FR2556503B1 (fr) * | 1983-12-08 | 1986-12-12 | Eurofarad | Substrat d'interconnexion en alumine pour composant electronique |
US4671928A (en) * | 1984-04-26 | 1987-06-09 | International Business Machines Corporation | Method of controlling the sintering of metal particles |
US4572754A (en) * | 1984-05-21 | 1986-02-25 | Ctx Corporation | Method of making an electrically insulative substrate |
US4521449A (en) * | 1984-05-21 | 1985-06-04 | International Business Machines Corporation | Process for forming a high density metallurgy system on a substrate and structure thereof |
US4562513A (en) * | 1984-05-21 | 1985-12-31 | International Business Machines Corporation | Process for forming a high density metallurgy system on a substrate and structure thereof |
JPS60250686A (ja) * | 1984-05-25 | 1985-12-11 | 日本碍子株式会社 | セラミツク配線基板の製造方法 |
US4598107A (en) * | 1984-06-25 | 1986-07-01 | International Business Machines Corporation | Stepwise/ultimate density milling |
US4657778A (en) * | 1984-08-01 | 1987-04-14 | Moran Peter L | Multilayer systems and their method of production |
FR2571545B1 (fr) * | 1984-10-05 | 1987-11-27 | Thomson Csf | Procede de fabrication d'un substrat de circuit hybride de forme non plane, et circuit hybride non plan obtenu par ce procede |
US4581098A (en) * | 1984-10-19 | 1986-04-08 | International Business Machines Corporation | MLC green sheet process |
US4645552A (en) * | 1984-11-19 | 1987-02-24 | Hughes Aircraft Company | Process for fabricating dimensionally stable interconnect boards |
JPH0610927B2 (ja) * | 1985-04-05 | 1994-02-09 | 株式会社日立製作所 | セラミック基板の製造方法 |
US4628406A (en) * | 1985-05-20 | 1986-12-09 | Tektronix, Inc. | Method of packaging integrated circuit chips, and integrated circuit package |
JPH0714105B2 (ja) * | 1986-05-19 | 1995-02-15 | 日本電装株式会社 | 混成集積回路基板及びその製造方法 |
JPS62287658A (ja) * | 1986-06-06 | 1987-12-14 | Hitachi Ltd | セラミックス多層回路板 |
US4763403A (en) * | 1986-12-16 | 1988-08-16 | Eastman Kodak Company | Method of making an electronic component |
AU1346088A (en) * | 1987-02-04 | 1988-08-24 | Coors Porcelain Company | Ceramic substrate with conductively-filled vias and method for producing |
JPS63240096A (ja) * | 1987-03-27 | 1988-10-05 | 富士通株式会社 | グリ−ンシ−ト多層法 |
US4837408A (en) * | 1987-05-21 | 1989-06-06 | Ngk Spark Plug Co., Ltd. | High density multilayer wiring board and the manufacturing thereof |
US4970122A (en) * | 1987-08-21 | 1990-11-13 | Delco Electronics Corporation | Moisture sensor and method of fabrication thereof |
US4846869A (en) * | 1987-08-21 | 1989-07-11 | Delco Electronics Corporation | Method of fabrication a curved glass sheet with a conductive oxide coating |
US4797605A (en) * | 1987-08-21 | 1989-01-10 | Delco Electronics Corporation | Moisture sensor and method of fabrication thereof |
DE3809350A1 (de) * | 1988-03-19 | 1989-09-28 | Hoechst Ceram Tec Ag | Verfahren zur erhoehung der brennschwindung von keramischen foliengiessmassen |
DE68909665T2 (de) * | 1988-04-26 | 1994-02-10 | Toto Ltd | Verfahren zur Herstellung dielektrischer Keramik für elektrostatische Haltevorrichtungen. |
US5502889A (en) * | 1988-06-10 | 1996-04-02 | Sheldahl, Inc. | Method for electrically and mechanically connecting at least two conductive layers |
US5170245A (en) * | 1988-06-15 | 1992-12-08 | International Business Machines Corp. | Semiconductor device having metallic interconnects formed by grit blasting |
US4896464A (en) * | 1988-06-15 | 1990-01-30 | International Business Machines Corporation | Formation of metallic interconnects by grit blasting |
US5224017A (en) * | 1989-05-17 | 1993-06-29 | The Charles Stark Draper Laboratory, Inc. | Composite heat transfer device |
US4953273A (en) * | 1989-05-25 | 1990-09-04 | American Technical Ceramics Corporation | Process for applying conductive terminations to ceramic components |
DE3923533A1 (de) * | 1989-07-15 | 1991-01-24 | Diehl Gmbh & Co | Anordnung eines integrierten schaltkreises auf einem schaltungstraeger |
JPH03125443A (ja) * | 1989-10-09 | 1991-05-28 | Sharp Corp | 実装基板の電極及び該実装基板の電極を有する液晶表示装置 |
KR920002589B1 (ko) * | 1990-03-30 | 1992-03-30 | 삼성코닝 주식회사 | 금속 인쇄된 세라믹 팩키지의 제조방법 |
US5316989A (en) * | 1991-05-08 | 1994-05-31 | Gilbert James | Method for making a smooth-surface ceramic |
DE4240812A1 (de) * | 1992-12-04 | 1994-06-09 | Bosch Gmbh Robert | Heizeranordnung für einen Meßfühler zur Bestimmung von Bestandteilen in Gasen |
JP2858073B2 (ja) * | 1992-12-28 | 1999-02-17 | ティーディーケイ株式会社 | 多層セラミック部品 |
US5727310A (en) * | 1993-01-08 | 1998-03-17 | Sheldahl, Inc. | Method of manufacturing a multilayer electronic circuit |
JPH06296084A (ja) * | 1993-02-12 | 1994-10-21 | Ngk Spark Plug Co Ltd | 高熱伝導体及びこれを備えた配線基板とこれらの製造方法 |
US5384681A (en) * | 1993-03-01 | 1995-01-24 | Toto Ltd. | Electrostatic chuck |
US5428190A (en) * | 1993-07-02 | 1995-06-27 | Sheldahl, Inc. | Rigid-flex board with anisotropic interconnect and method of manufacture |
US5459923A (en) * | 1993-07-28 | 1995-10-24 | E-Systems, Inc. | Method of marking hermetic packages for electrical device |
DE4338706A1 (de) * | 1993-08-24 | 1995-05-04 | Schulz Harder Juergen | Mehrschicht-Substrat |
DE4328353C2 (de) * | 1993-08-17 | 1996-06-05 | Schulz Harder Juergen | Mehrschicht-Substrat |
US5527998A (en) * | 1993-10-22 | 1996-06-18 | Sheldahl, Inc. | Flexible multilayer printed circuit boards and methods of manufacture |
MY119247A (en) * | 1994-10-31 | 2005-04-30 | Tdk Corp | Manufacturing method and manufacturing apparatus for ceramic electronic components |
US5819652A (en) * | 1994-12-14 | 1998-10-13 | International Business Machines Corporation | Reduced cavity depth screening stencil |
KR100244965B1 (ko) * | 1997-08-12 | 2000-02-15 | 윤종용 | 인쇄회로기판과 볼 그리드 어레이 패키지의 제조 방법 |
US6016005A (en) * | 1998-02-09 | 2000-01-18 | Cellarosi; Mario J. | Multilayer, high density micro circuit module and method of manufacturing same |
JP3669255B2 (ja) * | 2000-09-19 | 2005-07-06 | 株式会社村田製作所 | セラミック多層基板の製造方法および未焼成セラミック積層体 |
JP3807257B2 (ja) * | 2001-06-25 | 2006-08-09 | 松下電器産業株式会社 | セラミック部品の製造方法 |
US7222419B2 (en) * | 2001-12-19 | 2007-05-29 | Chung-Shan Institute Of Science And Technology | Method of fabricating a ceramic substrate with a thermal conductive plug of a multi-chip package |
WO2003101166A1 (fr) * | 2002-05-28 | 2003-12-04 | Sumitomo Electric Industries, Ltd. | Pastille frittee a base de nitrure d'aluminium comportant une couche metallisee et procede de preparation associe |
KR20030074582A (ko) * | 2003-09-03 | 2003-09-19 | 학교법인 한국정보통신학원 | 초고주파 다층회로 구조 및 제작 방법 |
US8191756B2 (en) | 2004-11-04 | 2012-06-05 | Microchips, Inc. | Hermetically sealing using a cold welded tongue and groove structure |
US7460356B2 (en) | 2007-03-20 | 2008-12-02 | Avx Corporation | Neutral electrolyte for a wet electrolytic capacitor |
US7649730B2 (en) * | 2007-03-20 | 2010-01-19 | Avx Corporation | Wet electrolytic capacitor containing a plurality of thin powder-formed anodes |
US7554792B2 (en) | 2007-03-20 | 2009-06-30 | Avx Corporation | Cathode coating for a wet electrolytic capacitor |
DE102013012731A1 (de) * | 2013-08-01 | 2015-02-05 | Krohne Messtechnik Gmbh | Verfahren zur Herstellung eines Gaskonverters und entsprechender Gaskonverter |
CN106507603A (zh) * | 2016-12-30 | 2017-03-15 | 桂林电子科技大学 | 一种符合人机工程学的快速定位操作的贴片工序辅助装置 |
CN112415072A (zh) * | 2019-08-21 | 2021-02-26 | 恩德莱斯和豪瑟尔分析仪表两合公司 | 制造传感器元件的方法和离子选择性电极 |
CN110981549A (zh) * | 2019-12-09 | 2020-04-10 | 浙江安力能源有限公司 | 一种氧化铝陶瓷生产工艺 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3093490A (en) * | 1960-04-08 | 1963-06-11 | Eitel Mccullough Inc | Ceramic metalizing mixture and method of compounding it |
US3838204A (en) * | 1966-03-30 | 1974-09-24 | Ibm | Multilayer circuits |
US3561110A (en) * | 1967-08-31 | 1971-02-09 | Ibm | Method of making connections and conductive paths |
US3815187A (en) * | 1972-07-12 | 1974-06-11 | Union Carbide Corp | Process for making ceramic capacitors |
US3798762A (en) * | 1972-08-14 | 1974-03-26 | Us Army | Circuit board processing |
-
1976
- 1976-02-03 US US05/654,686 patent/US4109377A/en not_active Expired - Lifetime
- 1976-12-23 FR FR7639690A patent/FR2340288A1/fr active Granted
-
1977
- 1977-01-10 GB GB805/77A patent/GB1565421A/en not_active Expired
- 1977-02-01 DE DE2703956A patent/DE2703956C2/de not_active Expired
- 1977-02-03 JP JP1032077A patent/JPS5295058A/ja active Granted
- 1977-02-03 CA CA271,025A patent/CA1078079A/fr not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0016306A1 (fr) * | 1979-03-23 | 1980-10-01 | International Business Machines Corporation | Procédé pour la fabrication d'un empaquetage multicouche en verre-céramique pour le montage de dispositifs semiconducteurs |
FR2496341A1 (fr) * | 1980-12-12 | 1982-06-18 | Thomson Csf | Composant d'interconnexion topologique |
EP0425148A2 (fr) * | 1989-10-23 | 1991-05-02 | AT&T Corp. | Procédé pour la fabrication de circuits multicouches à film épais |
EP0425148A3 (en) * | 1989-10-23 | 1991-08-14 | American Telephone And Telegraph Company | Method of forming multilayer thick film circuits |
Also Published As
Publication number | Publication date |
---|---|
FR2340288B1 (fr) | 1979-09-21 |
CA1078079A (fr) | 1980-05-20 |
GB1565421A (en) | 1980-04-23 |
JPS5615159B2 (fr) | 1981-04-08 |
DE2703956C2 (de) | 1986-01-02 |
DE2703956A1 (de) | 1977-08-04 |
JPS5295058A (en) | 1977-08-10 |
US4109377A (en) | 1978-08-29 |
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