FI20215575A1 - - Google Patents

Download PDF

Info

Publication number
FI20215575A1
FI20215575A1 FI20215575A FI20215575A FI20215575A1 FI 20215575 A1 FI20215575 A1 FI 20215575A1 FI 20215575 A FI20215575 A FI 20215575A FI 20215575 A FI20215575 A FI 20215575A FI 20215575 A1 FI20215575 A1 FI 20215575A1
Authority
FI
Finland
Prior art keywords
primary
substrate
blaze
facet
etch
Prior art date
Application number
FI20215575A
Other languages
English (en)
Finnish (fi)
Other versions
FI130664B1 (fi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to FI20215575A priority Critical patent/FI130664B1/fi
Priority to CN202280033920.6A priority patent/CN117413209A/zh
Priority to EP22723709.6A priority patent/EP4341730B1/en
Priority to US18/560,321 priority patent/US12663567B2/en
Priority to KR1020237041908A priority patent/KR20240006598A/ko
Priority to JP2023569921A priority patent/JP2024518514A/ja
Priority to PCT/FI2022/050316 priority patent/WO2022243598A1/en
Priority to TW111118262A priority patent/TW202303194A/zh
Publication of FI20215575A1 publication Critical patent/FI20215575A1/fi
Application granted granted Critical
Publication of FI130664B1 publication Critical patent/FI130664B1/fi

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
    • G03H1/182—Post-exposure processing, e.g. latensification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
FI20215575A 2021-05-17 2021-05-17 Menetelmä porrastetun hilan valmistamiseksi FI130664B1 (fi)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FI20215575A FI130664B1 (fi) 2021-05-17 2021-05-17 Menetelmä porrastetun hilan valmistamiseksi
CN202280033920.6A CN117413209A (zh) 2021-05-17 2022-05-11 用于制造闪耀光栅的方法
EP22723709.6A EP4341730B1 (en) 2021-05-17 2022-05-11 Method for fabricating a blazed grating
US18/560,321 US12663567B2 (en) 2021-05-17 2022-05-11 Method for fabricating a blazed grating
KR1020237041908A KR20240006598A (ko) 2021-05-17 2022-05-11 블레이즈 격자 제작 방법
JP2023569921A JP2024518514A (ja) 2021-05-17 2022-05-11 ブレーズド格子を製造する方法
PCT/FI2022/050316 WO2022243598A1 (en) 2021-05-17 2022-05-11 Method for fabricating a blazed grating
TW111118262A TW202303194A (zh) 2021-05-17 2022-05-16 閃耀光柵之製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20215575A FI130664B1 (fi) 2021-05-17 2021-05-17 Menetelmä porrastetun hilan valmistamiseksi

Publications (2)

Publication Number Publication Date
FI20215575A1 true FI20215575A1 (enExample) 2022-11-18
FI130664B1 FI130664B1 (fi) 2024-01-09

Family

ID=81654644

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20215575A FI130664B1 (fi) 2021-05-17 2021-05-17 Menetelmä porrastetun hilan valmistamiseksi

Country Status (8)

Country Link
US (1) US12663567B2 (enExample)
EP (1) EP4341730B1 (enExample)
JP (1) JP2024518514A (enExample)
KR (1) KR20240006598A (enExample)
CN (1) CN117413209A (enExample)
FI (1) FI130664B1 (enExample)
TW (1) TW202303194A (enExample)
WO (1) WO2022243598A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114185122B (zh) * 2022-01-21 2024-04-19 北京至格科技有限公司 一种闪耀光栅的制备方法
CN115308826B (zh) * 2022-07-22 2025-07-04 杭州探真纳米科技有限公司 闪耀光栅的制造方法
US20240168207A1 (en) * 2022-11-23 2024-05-23 Google Llc Fabrication of slanted grating master and working stamp using grayscale lithography and plasma etching
WO2024238334A1 (en) * 2023-05-12 2024-11-21 Applied Materials, Inc. Method for fabricating waveguide with variable depth
WO2026039250A1 (en) * 2024-08-16 2026-02-19 Applied Materials, Inc. Method to fabricate blazed grating using spacerand ion beam etching
CN121192058B (zh) * 2025-11-24 2026-05-01 原集微(上海)电子有限公司 通孔刻蚀方法

Family Cites Families (107)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3669673A (en) 1970-10-23 1972-06-13 Rca Corp Recording of a continuous tone focused image on a diffraction grating
US3944420A (en) 1974-05-22 1976-03-16 Rca Corporation Generation of permanent phase holograms and relief patterns in durable media by chemical etching
US4057326A (en) 1976-05-27 1977-11-08 Rca Corporation Simplified and improved diffractive subtractive color filtering technique
DE2657246C2 (de) 1976-12-17 1978-09-28 Hoechst Ag, 6000 Frankfurt Original eines Informationsträgers, Verfahren zum Herstellen des Originals, Verfahren zum Herstellen einer Matrize zum Prägen des Originals sowie Informa tionsträger, der mit der Matrize hergestellt ist
JPS5634205A (en) 1979-08-28 1981-04-06 Nec Corp Feedback amplifier
JPS6033503A (ja) * 1983-08-05 1985-02-20 Agency Of Ind Science & Technol ブレ−ズド格子の製造方法
JPS6033504A (ja) * 1983-08-05 1985-02-20 Agency Of Ind Science & Technol ブレ−ズド格子の製造方法
JPS60103310A (ja) 1983-11-11 1985-06-07 Pioneer Electronic Corp マイクロフレネルレンズの製造方法
JPS60188909A (ja) * 1984-03-08 1985-09-26 Canon Inc グレ−テイングカツプラ−の作製方法
JPS6242103A (ja) * 1985-08-20 1987-02-24 Nippon Sheet Glass Co Ltd ブレ−ズ格子の製造方法
JPS63168601A (ja) * 1986-12-29 1988-07-12 Shimadzu Corp 回折格子及びその作製方法
JPS6415705A (en) 1987-07-09 1989-01-19 Matsushita Electric Industrial Co Ltd Production of fine element
US5113288A (en) 1990-04-04 1992-05-12 Nikon Corporation Behind stop wide angle lens system
JPH04186829A (ja) * 1990-11-21 1992-07-03 Fujitsu Ltd 半導体装置の製造方法
DE4100291C1 (enExample) 1991-01-08 1991-10-02 Leybold Ag, 6450 Hanau, De
JPH06258510A (ja) 1993-03-09 1994-09-16 Canon Inc 回折格子製作用成形型およびその製造方法
US5561558A (en) 1993-10-18 1996-10-01 Matsushita Electric Industrial Co., Ltd. Diffractive optical device
JP3323884B2 (ja) * 1994-02-08 2002-09-09 シャープ株式会社 ホログラフィック回折格子の製造方法
DE4421392A1 (de) 1994-06-18 1995-12-21 Karlsruhe Forschzent Gitterstruktur und deren Verwendung
US5907436A (en) 1995-09-29 1999-05-25 The Regents Of The University Of California Multilayer dielectric diffraction gratings
JPH1078667A (ja) 1996-09-04 1998-03-24 Ebara Corp 微細加工方法
CA2197706A1 (en) 1997-02-14 1998-08-14 Peter Ehbets Method of fabricating apodized phase mask
US6071652A (en) 1997-03-21 2000-06-06 Digital Optics Corporation Fabricating optical elements using a photoresist formed from contact printing of a gray level mask
JPH1131863A (ja) 1997-07-11 1999-02-02 Hitachi Ltd 回折格子の製造方法及びそれを用いて製造した半導体レーザ及びそれを用いた光応用システム
US6475704B1 (en) 1997-09-12 2002-11-05 Canon Kabushiki Kaisha Method for forming fine structure
JPH11160510A (ja) 1997-09-12 1999-06-18 Canon Inc 多段階段状素子の作製方法又は該素子作製用モールド型の作製方法
CA2214927A1 (en) 1997-10-31 1999-04-30 Pin Long Methods for making phase masks with spatial variable first order efficiency for fiber bragg grating fabrication
US6534221B2 (en) 1998-03-28 2003-03-18 Gray Scale Technologies, Inc. Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics
JP3576885B2 (ja) 1998-09-18 2004-10-13 キヤノン株式会社 素子の製造方法
US6670105B2 (en) 1998-09-18 2003-12-30 Canon Kabushiki Kaisha Method of manufacturing diffractive optical element
JP2000258608A (ja) 1999-03-11 2000-09-22 Canon Inc 光学素子への成膜方法
JP2001004821A (ja) 1999-06-24 2001-01-12 Canon Inc 回折光学素子及びその製造方法
JP3569911B2 (ja) 1999-11-02 2004-09-29 久夫 高津 粘着テープ体
JP2001343512A (ja) 2000-05-31 2001-12-14 Canon Inc 回折光学素子及びそれを有する光学系
WO2002006860A1 (en) 2000-07-13 2002-01-24 Network Photonics, Inc. Diffraction grating with reduced polarization-dependent loss
JP2002189112A (ja) 2000-12-22 2002-07-05 Canon Inc 回折光学素子の製造方法、回折光学素子の製造方法によって製造したことを特徴とする回折光学素子製造用金型、回折光学素子、および該回折光学素子を有する光学系、光学機器、露光装置、デバイス製造方法、デバイス
KR100368930B1 (ko) 2001-03-29 2003-01-24 한국과학기술원 반도체 기판 위에 높이 떠 있는 3차원 금속 소자, 그 회로모델, 및 그 제조방법
CN100592112C (zh) 2002-02-12 2010-02-24 奥尔利康贸易股份公司（特吕巴赫） 包括亚微米空心空间的部件
US6913871B2 (en) 2002-07-23 2005-07-05 Intel Corporation Fabricating sub-resolution structures in planar lightwave devices
US6905618B2 (en) 2002-07-30 2005-06-14 Agilent Technologies, Inc. Diffractive optical elements and methods of making the same
EP1547132A1 (en) 2002-09-18 2005-06-29 Tokyo University of Science Surface processing method
JP4349104B2 (ja) 2003-11-27 2009-10-21 株式会社島津製作所 ブレーズド・ホログラフィック・グレーティング、その製造方法、及びレプリカグレーティング
JP2005202104A (ja) 2004-01-15 2005-07-28 Nikon Corp 偏光化素子の製造方法、偏光化素子、および画像投影装置の製造方法、並びに画像投影装置
US20050275944A1 (en) 2004-06-11 2005-12-15 Wang Jian J Optical films and methods of making the same
JP4415774B2 (ja) 2004-06-30 2010-02-17 富士ゼロックス株式会社 画像形成装置および画像形成方法
CN1797199A (zh) 2004-12-22 2006-07-05 中国科学院光电技术研究所 移动灰阶掩模微纳结构成形方法
KR20060090433A (ko) 2005-02-05 2006-08-11 삼성에스디아이 주식회사 평판 디스플레이 장치 및 이의 제조 방법
WO2006120720A1 (ja) 2005-05-02 2006-11-16 Oki Electric Industry Co., Ltd. 回折光学素子の製造方法
JP2007057622A (ja) 2005-08-22 2007-03-08 Ricoh Co Ltd 光学素子及びその製造方法、光学素子用形状転写型の製造方法及び光学素子用転写型
EP1930776A4 (en) 2005-09-09 2008-11-26 Univ Tokyo Sci Educ Found PROCESS FOR PRODUCING A THREE-DIMENSIONAL FORM, PROCESS FOR MANUFACTURING A MICROFABRICATION PRODUCT, PROCESS FOR PRODUCING A MICROSTRUCTURE FORMULATION, THREE-DIMENSIONAL FORM, MICROFABRICATION PRODUCT, MICROSTRUCTURE FORMING AND OPTICAL DEVICE
EP1942364A1 (en) 2005-09-14 2008-07-09 Mirage Innovations Ltd. Diffractive optical relay and method for manufacturing the same
DE602007001530D1 (de) 2006-01-21 2009-08-20 Suisse Electronique Microtech Modensprungfreies laser mit einem mikrohergestelltes gitter mit blaze-bereich
JP2007212575A (ja) 2006-02-07 2007-08-23 Ricoh Co Ltd 光回折素子、光線走査方法、光線走査装置及び画像形成装置
JP2007328096A (ja) 2006-06-07 2007-12-20 Ricoh Co Ltd 回折光学素子とその作製方法および光学モジュール
WO2008022097A2 (en) 2006-08-15 2008-02-21 Api Nanofabrication And Research Corp. Methods for forming patterned structures
JP2008089923A (ja) 2006-09-29 2008-04-17 Oki Electric Ind Co Ltd 光学素子の製造方法
DE102007021036A1 (de) 2007-05-04 2008-11-06 Carl Zeiss Ag Anzeigevorrichtung und Anzeigeverfahren zur binokularen Darstellung eines mehrfarbigen Bildes
US8317321B2 (en) 2007-07-03 2012-11-27 Pixeloptics, Inc. Multifocal lens with a diffractive optical power region
US20090023011A1 (en) 2007-07-20 2009-01-22 Hewlett-Packard Development Company, L.P. Systems and Methods for Forming Conductive Traces on Plastic Substrates
KR100947945B1 (ko) * 2007-11-30 2010-03-15 주식회사 동부하이텍 반도체 소자의 제조 방법
US20090231702A1 (en) 2008-03-17 2009-09-17 Qihong Wu Optical films and methods of making the same
JP5194925B2 (ja) * 2008-03-25 2013-05-08 オムロン株式会社 レジスト露光方法
US7972959B2 (en) 2008-12-01 2011-07-05 Applied Materials, Inc. Self aligned double patterning flow with non-sacrificial features
JP5402317B2 (ja) 2009-06-29 2014-01-29 セイコーエプソン株式会社 偏光素子および偏光素子の製造方法、投写型表示装置、液晶装置、電子機器
US8435415B2 (en) 2009-11-24 2013-05-07 The United States of America, as represented by the Secretary of Commerce, The National Institute of Standards and Technology Nanofabrication process and nanodevice
US9791623B2 (en) 2009-11-30 2017-10-17 Board Of Regents, The University Of Texas System Multilevel leaky-mode resonant optical devices
JP2011215267A (ja) 2010-03-31 2011-10-27 Nagoya Univ 色消しレンズとその製造方法、および色消しレンズを備えた光学装置
WO2011129814A1 (en) 2010-04-13 2011-10-20 Hewlett-Packard Development Company, L.P. Controlling phase response in a sub-wavelength grating optical device
JP2012013930A (ja) 2010-06-30 2012-01-19 Nagoya Univ グリズムとその製造方法、およびグリズムを備えた光学装置
SG10201508629SA (en) 2010-10-28 2015-11-27 Univ Singapore Lithography method and apparatus
CN101986173B (zh) 2010-12-02 2012-04-25 苏州大学 一种计算全息片
CN102360093A (zh) * 2011-10-19 2012-02-22 苏州大学 一种全息闪耀光栅制作方法
CN102323634B (zh) * 2011-10-19 2016-06-22 苏州大学 一种全息双闪耀光栅的制作方法
TWI440833B (zh) 2011-12-30 2014-06-11 Oto Photonics Inc 混合式繞射光柵、模具及繞射光柵及其模具的製造方法
WO2015035127A1 (en) 2013-09-06 2015-03-12 Massachusetts Institute Of Technology Metallic dielectric photonic crystals and methods of fabrication
JP5929860B2 (ja) 2013-09-24 2016-06-08 ウシオ電機株式会社 グリッド偏光素子製造方法
CN103901520B (zh) 2014-04-23 2016-07-06 中国科学技术大学 一种顶角90°三角形槽阶梯光栅的制作方法
US20160033784A1 (en) 2014-07-30 2016-02-04 Tapani Levola Optical Components
KR20160020622A (ko) 2014-08-13 2016-02-24 삼성디스플레이 주식회사 편광 소자 및 이의 제조방법
EP3012860A1 (en) 2014-10-22 2016-04-27 IMEC vzw A method for forming contact vias
US9941389B2 (en) 2015-04-20 2018-04-10 Board Of Regents, The University Of Texas System Fabricating large area multi-tier nanostructures
WO2016185602A1 (ja) 2015-05-21 2016-11-24 ナルックス株式会社 回折光学素子
US9946072B2 (en) 2015-10-29 2018-04-17 Microsoft Technology Licensing, Llc Diffractive optical element with uncoupled grating structures
KR102626696B1 (ko) 2015-11-13 2024-01-19 도판 인사츠 가부시키가이샤 고체 촬상 소자 및 그의 제조 방법
SG10202004257WA (en) 2015-11-24 2020-06-29 Harvard College Atomic layer deposition process for fabricating dielectric metasurfaces for wavelengths in the visible spectrum
CN109196387A (zh) 2016-04-05 2019-01-11 哈佛学院院长及董事 用于亚波长分辨率成像的超透镜
US9885870B2 (en) 2016-04-25 2018-02-06 Microsoft Technology Licensing, Llc Diffractive optical elements with analog modulations and switching
US10061124B2 (en) 2016-04-29 2018-08-28 Microsoft Technology Licensing, Llc Robust architecture for large field of view components
CN105785493B (zh) 2016-05-09 2019-01-22 深圳市华星光电技术有限公司 金属光栅偏光片及其制作方法
US10241244B2 (en) 2016-07-29 2019-03-26 Lumentum Operations Llc Thin film total internal reflection diffraction grating for single polarization or dual polarization
WO2018026412A1 (en) 2016-08-02 2018-02-08 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Naval Research Laboratory Fabrication method for digital etching of nanometer-scale level structures
CN110036317B (zh) * 2016-10-05 2021-11-26 奇跃公司 制作非均匀衍射光栅
JP6923277B2 (ja) 2016-12-23 2021-08-25 インテル・コーポレーション 高度なリソグラフィおよび自己組織化デバイス
CN116520644A (zh) * 2017-11-29 2023-08-01 应用材料公司 波导组合器的直接蚀刻制造的方法
US10598832B2 (en) * 2018-01-09 2020-03-24 Varian Semiconductor Equipment Associates, Inc. System and method for forming diffracted optical element having varied gratings
US10649141B1 (en) 2018-04-23 2020-05-12 Facebook Technologies, Llc Gratings with variable etch heights for waveguide displays
US10761334B2 (en) * 2018-07-13 2020-09-01 Varian Semiconductor Equipment Associates, Inc. System and method for optimally forming gratings of diffracted optical elements
US10795173B2 (en) 2018-07-13 2020-10-06 Varian Semiconductor Equipment Associates, Inc. System and method for optimally forming gratings of diffracted optical elements
EP4745457A3 (en) * 2018-07-24 2026-07-22 Magic Leap, Inc. Diffractive optical elements with mitigation of rebounce-induced light loss and related systems and methods
US11226439B2 (en) * 2018-11-09 2022-01-18 Applied Materials, Inc. System and method for forming surface relief gratings
US11512385B2 (en) * 2018-12-17 2022-11-29 Applied Materials, Inc. Method of forming gratings
WO2020131317A1 (en) * 2018-12-17 2020-06-25 Applied Materials, Inc. Methods for controlling etch depth by localized heating
WO2020185954A1 (en) 2019-03-12 2020-09-17 Magic Leap, Inc. Waveguides with high index materials and methods of fabrication thereof
EP4018230B1 (en) * 2019-08-21 2024-07-31 Snap Inc. Manufacture of surface relief structures
US10823888B1 (en) * 2019-11-12 2020-11-03 Applied Materials, Inc. Methods of producing slanted gratings with variable etch depths
US11226446B2 (en) * 2020-05-06 2022-01-18 Facebook Technologies, Llc Hydrogen/nitrogen doping and chemically assisted etching of high refractive index gratings
US20220397708A1 (en) * 2021-06-10 2022-12-15 Meta Platforms Technologies, Llc Method of etching surface-relief structures

Also Published As

Publication number Publication date
FI130664B1 (fi) 2024-01-09
JP2024518514A (ja) 2024-05-01
WO2022243598A1 (en) 2022-11-24
US12663567B2 (en) 2026-06-23
TW202303194A (zh) 2023-01-16
CN117413209A (zh) 2024-01-16
EP4341730A1 (en) 2024-03-27
US20240241296A1 (en) 2024-07-18
KR20240006598A (ko) 2024-01-15
EP4341730B1 (en) 2025-07-02
EP4341730C0 (en) 2025-07-02

Similar Documents

Publication Publication Date Title
EP4341730B1 (en) Method for fabricating a blazed grating
JP7634052B2 (ja) 可変エッチング深さを有する斜め格子を製造する方法
US12276816B2 (en) Wafer level microstructures for an optical lens
US20260130190A1 (en) Formation of angled gratings
FI128376B (en) Process for the preparation of a diffractive grating with varying efficiency and a diffraction grating
US11686890B2 (en) Multi-level diffractive optical element thin film coating
US11762134B2 (en) Diffractive optical element
JP6514326B2 (ja) グレーティングの構造及びこれを備えたグレーティングカプラの製造方法
US20170294478A1 (en) Method of monolithic integration of hyperspectral image sensor
EP1542043A1 (en) Diffractive optical device and method for producing same
JP2024518514A5 (enExample)
CN100523873C (zh) 有抗反射涂层的衍射光学元件
US20140321806A1 (en) Optical waveguide and method for manufacturing same
US12099296B2 (en) Method for producing optical element and optical element
EP4612533A1 (en) Method of applying a dielectric coating on a component of an electrical device
WO2003042720A2 (en) Multidimensional optical grating fabrication and application